公开(公告)号：US09551070B2

公开(公告)日：2017-01-24

申请号：US14291781

申请日：2014-05-30

Applicant: APPLIED MATERIALS, INC.

Inventor： Mei Chang ,  Chien-Teh Kao ,  Juno Yu-Ting Huang

IPC: C23C16/455 ,  C23C16/22 ,  C23C16/44 ,  C23C16/458 ,  H01J37/32

CPC classification number: C23C16/45525 ,  C23C16/22 ,  C23C16/4401 ,  C23C16/4581 ,  H01J37/32477 ,  H01J37/32715

Abstract: Corrosion resistant substrate supports and methods of making corrosion resistant substrate supports are provided herein. In some embodiments, a method of making corrosion resistant substrate supports includes exposing the substrate support disposed within a substrate processing chamber to a process gas comprising an aluminum containing precursor; and depositing an aluminum containing layer atop surfaces of the substrate support.

Abstract translation: 本文提供了耐腐蚀基板支撑件和制造耐腐蚀基板支撑件的方法。 在一些实施例中，制造耐腐蚀的衬底支撑件的方法包括将设置在衬底处理室内的衬底支撑件暴露于包含含铝前体的工艺气体; 以及在所述基底支撑体的表面的顶部上沉积含铝层。

公开(公告)号：US20160372324A1

公开(公告)日：2016-12-22

申请号：US15184521

申请日：2016-06-16

Applicant: Applied Materials, Inc.

Inventor： Chien-Teh Kao ,  Benjamin Schmiege ,  Xuesong Lu ,  Juno Yu-Ting Huang ,  Yu Lei ,  Yung-Hsin Lee ,  Srinivas Gandikota ,  Rajkumar Jakkaraju ,  Chikuang Charles Wang ,  Ghazal Saheli ,  Benjamin C. Wang ,  Xinliang Lu ,  Pingyan Lei

IPC: H01L21/02 ,  H01L21/306

CPC classification number: H01L21/02186 ,  H01L21/02274 ,  H01L21/0228 ,  H01L21/0337 ,  H01L21/31144

Abstract: Methods for depositing titanium oxide films by atomic layer deposition are disclosed. Titanium oxide films may include a titanium nitride cap, an oxygen rich titanium nitride cap or a mixed oxide nitride layer. Also described are methods for self-aligned double patterning including titanium oxide spacer films.

Abstract translation: 公开了通过原子层沉积沉积氧化钛膜的方法。 氧化钛膜可以包括氮化钛盖，富氧氮化钛盖或混合氧化物氮化物层。 还描述了包括氧化钛间隔膜的自对准双重图案的方法。

公开(公告)号：US20150345017A1

公开(公告)日：2015-12-03

申请号：US14291781

申请日：2014-05-30

Applicant: APPLIED MATERIALS, INC.

Inventor： Mei Chang ,  Chien-Teh Kao ,  Juno Yu-Ting Huang

IPC: C23C16/455 ,  C23C16/458 ,  C23C16/06

CPC classification number: C23C16/45525 ,  C23C16/22 ,  C23C16/4401 ,  C23C16/4581 ,  H01J37/32477 ,  H01J37/32715

Abstract: Corrosion resistant substrate supports and methods of making corrosion resistant substrate supports are provided herein. In some embodiments, a method of making corrosion resistant substrate supports includes exposing the substrate support disposed within a substrate processing chamber to a process gas comprising an aluminum containing precursor; and depositing an aluminum containing layer atop surfaces of the substrate support.

Abstract translation: 本文提供了耐腐蚀基板支撑件和制造耐腐蚀基板支撑件的方法。 在一些实施例中，制造耐腐蚀的衬底支撑件的方法包括将设置在衬底处理室内的衬底支撑件暴露于包含含铝前体的工艺气体; 以及在所述基底支撑体的表面的顶部上沉积含铝层。

公开(公告)号：US09881787B2

公开(公告)日：2018-01-30

申请号：US15184521

申请日：2016-06-16

Applicant: Applied Materials, Inc.

Inventor： Chien-Teh Kao ,  Benjamin Schmiege ,  Xuesong Lu ,  Juno Yu-Ting Huang ,  Yu Lei ,  Yung-Hsin Lee ,  Srinivas Gandikota ,  Rajkumar Jakkaraju ,  Chikuang Charles Wang ,  Ghazal Saheli ,  Benjamin C. Wang ,  Xinliang Lu ,  Pingyan Lei

IPC: H01L21/02 ,  H01L21/311

CPC classification number: H01L21/02186 ,  H01L21/02274 ,  H01L21/0228 ,  H01L21/0337 ,  H01L21/31144

Abstract: Methods for depositing titanium oxide films by atomic layer deposition are disclosed. Titanium oxide films may include a titanium nitride cap, an oxygen rich titanium nitride cap or a mixed oxide nitride layer. Also described are methods for self-aligned double patterning including titanium oxide spacer films.