Fabricating Bipolar Junction Select Transistors for Semiconductor Memories
    2.
    发明申请
    Fabricating Bipolar Junction Select Transistors for Semiconductor Memories 有权
    制造半导体存储器的双极结选择晶体管

    公开(公告)号:US20110039391A1

    公开(公告)日:2011-02-17

    申请号:US12912829

    申请日:2010-10-27

    IPC分类号: H01L21/331

    CPC分类号: H01L29/73 H01L27/24

    摘要: A bipolar junction transistor may act as a select device for a semiconductor memory. The bipolar junction transistor may be formed of a stack of base and collector layers. Sets of parallel trenches are formed in a first direction down to the base and in a second direction down to the collector. The trenches may be used to form local enhancement implants into the exposed portion of the base and collector in each trench. As a result of the local enhancement implants, in some embodiments, leakage current may be reduced, active current capability may be higher, gain may be higher, base resistance may be reduced, breakdown voltage may be increased, and parasitic effects with adjacent junctions may be reduced.

    摘要翻译: 双极结型晶体管可以用作半导体存储器的选择器件。 双极结晶体管可以由基极和集电极层的堆叠形成。 一组平行的沟槽沿着第一方向下降到底部并且沿着第二方向形成在收集器的下方。 沟槽可以用于在每个沟槽中的基底和收集器的暴露部分中形成局部增强植入物。 作为局部增强植入物的结果,在一些实施例中,泄漏电流可能降低,有效电流能力可能更高,增益可能更高,基极电阻可能降低,击穿电压可能增加,并且具有相邻接点的寄生效应 减少

    Fabricating bipolar junction select transistors for semiconductor memories
    3.
    发明授权
    Fabricating bipolar junction select transistors for semiconductor memories 有权
    制造用于半导体存储器的双极结选择晶体管

    公开(公告)号:US08076211B2

    公开(公告)日:2011-12-13

    申请号:US12912829

    申请日:2010-10-27

    IPC分类号: H01L21/8222 H01L21/331

    CPC分类号: H01L29/73 H01L27/24

    摘要: A bipolar junction transistor may act as a select device for a semiconductor memory. The bipolar junction transistor may be formed of a stack of base and collector layers. Sets of parallel trenches are formed in a first direction down to the base and in a second direction down to the collector. The trenches may be used to form local enhancement implants into the exposed portion of the base and collector in each trench. As a result of the local enhancement implants, in some embodiments, leakage current may be reduced, active current capability may be higher, gain may be higher, base resistance may be reduced, breakdown voltage may be increased, and parasitic effects with adjacent junctions may be reduced.

    摘要翻译: 双极结型晶体管可以用作半导体存储器的选择器件。 双极结晶体管可以由基极和集电极层的堆叠形成。 一组平行的沟槽沿着第一方向下降到底部并且沿着第二方向形成在收集器的下方。 沟槽可以用于在每个沟槽中的基底和收集器的暴露部分中形成局部增强植入物。 作为局部增强植入物的结果,在一些实施例中,泄漏电流可能降低,有效电流能力可能更高,增益可能更高,基极电阻可能降低,击穿电压可能增加,并且具有相邻接点的寄生效应 减少

    Fabricating bipolar junction select transistors for semiconductor memories
    4.
    发明授权
    Fabricating bipolar junction select transistors for semiconductor memories 有权
    制造用于半导体存储器的双极结选择晶体管

    公开(公告)号:US07847373B2

    公开(公告)日:2010-12-07

    申请号:US12341027

    申请日:2008-12-22

    CPC分类号: H01L29/73 H01L27/24

    摘要: A bipolar junction transistor may act as a select device for a semiconductor memory. The bipolar junction transistor may be formed of a stack of base and collector layers. Sets of parallel trenches are formed in a first direction down to the base and in a second direction down to the collector. The trenches may be used to form local enhancement implants into the exposed portion of the base and collector in each trench. As a result of the local enhancement implants, in some embodiments, leakage current may be reduced, active current capability may be higher, gain may be higher, base resistance may be reduced, breakdown voltage may be increased, and parasitic effects with adjacent junctions may be reduced.

    摘要翻译: 双极结型晶体管可以用作半导体存储器的选择器件。 双极结晶体管可以由基极和集电极层的堆叠形成。 一组平行的沟槽沿着第一方向下降到底部并且沿着第二方向形成在收集器的下方。 沟槽可以用于在每个沟槽中的基底和收集器的暴露部分中形成局部增强植入物。 作为局部增强植入物的结果,在一些实施例中,泄漏电流可能降低,有效电流能力可能更高,增益可能更高,基极电阻可能降低,击穿电压可能增加,并且具有相邻接点的寄生效应 减少

    RESISTIVE MEMORY CELL AND METHOD FOR MANUFACTURING A RESISTIVE MEMORY CELL
    10.
    发明申请
    RESISTIVE MEMORY CELL AND METHOD FOR MANUFACTURING A RESISTIVE MEMORY CELL 审中-公开
    电阻记忆体和制造电阻记忆体的方法

    公开(公告)号:US20100078619A1

    公开(公告)日:2010-04-01

    申请号:US12570256

    申请日:2009-09-30

    IPC分类号: H01L45/00 H01L21/02

    CPC分类号: H01L27/24

    摘要: A resistive memory cell includes a structural layer, a pore in the structural layer, a selector, having a coupling terminal accommodated in the pore, and a storage element of a resistive memory material, arranged in the pore and electrically coupled to the coupling terminal of the selector. The storage element has a tubular portion, extending transversely to an electrical coupling interface of the coupling terminal.

    摘要翻译: 电阻式存储单元包括结构层,结构层中的孔,具有容纳在孔中的耦合端的选择器和电阻式存储材料的存储元件,布置在孔中并电耦合到 选择器。 存储元件具有管状部分,横向于耦合端子的电耦合接口延伸。