摘要:
A Phase Change Memory device with reduced programming disturbance and its operation are described. The Phase Change Memory includes an array with word lines and bit lines and voltage controlling elements coupled to bit lines adjacent to an addressed bit line to maintain the voltage of the adjacent bit lines within an allowed range.
摘要:
Embodiments include but are not limited to apparatuses and systems including a plurality of memory cells, each memory cell including a selector and a storage element coupled to the selector. A word-line may be coupled to the memory cells and may have a word-line driver including a pull-up resistor coupled to the selectors for the memory cells to access respective storage elements of the memory cells. Other embodiments may be described and claimed.
摘要:
Embodiments include but are not limited to apparatuses and systems including a plurality of memory cells, each memory cell including a selector and a storage element coupled to the selector. A word-line may be coupled to the memory cells and may have a word-line driver including a pull-up resistor coupled to the selectors for the memory cells to access respective storage elements of the memory cells. Other embodiments may be described and claimed.
摘要:
A bipolar junction transistor may act as a select device for a semiconductor memory. The bipolar junction transistor may be formed of a stack of base and collector layers. Sets of parallel trenches are formed in a first direction down to the base and in a second direction down to the collector. The trenches may be used to form local enhancement implants into the exposed portion of the base and collector in each trench. As a result of the local enhancement implants, in some embodiments, leakage current may be reduced, active current capability may be higher, gain may be higher, base resistance may be reduced, breakdown voltage may be increased, and parasitic effects with adjacent junctions may be reduced.
摘要:
A bipolar junction transistor may act as a select device for a semiconductor memory. The bipolar junction transistor may be formed of a stack of base and collector layers. Sets of parallel trenches are formed in a first direction down to the base and in a second direction down to the collector. The trenches may be used to form local enhancement implants into the exposed portion of the base and collector in each trench. As a result of the local enhancement implants, in some embodiments, leakage current may be reduced, active current capability may be higher, gain may be higher, base resistance may be reduced, breakdown voltage may be increased, and parasitic effects with adjacent junctions may be reduced.
摘要:
A bipolar junction transistor may act as a select device for a semiconductor memory. The bipolar junction transistor may be formed of a stack of base and collector layers. Sets of parallel trenches are formed in a first direction down to the base and in a second direction down to the collector. The trenches may be used to form local enhancement implants into the exposed portion of the base and collector in each trench. As a result of the local enhancement implants, in some embodiments, leakage current may be reduced, active current capability may be higher, gain may be higher, base resistance may be reduced, breakdown voltage may be increased, and parasitic effects with adjacent junctions may be reduced.
摘要:
A process manufactures an array of cells in a body of semiconductor material wherein a common conduction region of a first conductivity type and a plurality of shared control regions, of a second conductivity type, are formed in the body. The shared control regions extend on the common conduction region and are laterally delimited by insulating regions. Then, a grid-like layer is formed on the body to delimit a first plurality of empty regions directly overlying the body and conductive regions of semiconductor material and the first conductivity type are formed by filling the first plurality of empty regions, each conductive region forming, together with the common conduction region and an own shared control region, a bipolar junction transistor.
摘要:
Subject matter disclosed herein relates to techniques involving a structural relaxation (SR) phenomenon for increasing resistance of a Reset state of phase change memory.
摘要:
A self-aligned vertical heater element is deposited directly on the silicide of a selection device, and a phase change chalcogenide material is deposited directly on the vertical heater element. The fabrication process allows for self-alignment between the chalcogenide line and vertical heater element. In an embodiment, the vertical heater element is L-shaped, having a vertical wall along the wordline direction and a horizontal base. The vertical wall and the horizontal base may have the same thickness.
摘要:
Subject matter disclosed herein relates to techniques involving a structural relaxation (SR) phenomenon for increasing resistance of a Reset state of phase change memory.