公开(公告)号：US5245050A

公开(公告)日：1993-09-14

申请号：US427085

申请日：1989-10-03

申请人： Akira Endo ,  Tadashi Toshioka ,  Isao Umezawa ,  Masayuki Yuasa ,  Takashi Inaba ,  Tsutomu Inoue

发明人： Akira Endo ,  Tadashi Toshioka ,  Isao Umezawa ,  Masayuki Yuasa ,  Takashi Inaba ,  Tsutomu Inoue

IPC分类号： A61K31/22 ,  A61K31/365 ,  A61K31/366 ,  A61P3/06 ,  C07C67/293 ,  C07C67/313 ,  C07C69/00 ,  C07C69/24 ,  C07D309/30

CPC分类号： C07C69/00 ,  C07D309/30 ,  C07C2103/00

摘要： A compound represented by the following general formula: ##STR1## wherein R.sub.1 and R.sub.2 are the same or different, and represent a hydrogen or halogen, and ring-opened free acid, amides and salts thereof are provided. The present invention also provides a process for the production of the above-mentioned compound starting from the known compound ML-236B.

摘要翻译： PCT No.PCT / JP89 / 00201 Sec。 371日期：1989年10月3日 102（e）日期1989年10月3日PCT 1989年2月28日PCT PCT。 出版物WO89 / 08094 日本9月8日，1989年由以下通式表示的化合物：其中R 1和R 2相同或不同，表示氢或卤素，并且提供开环游离酸，酰胺和盐。 本发明还提供从已知化合物ML-236B开始制备上述化合物的方法。

公开(公告)号：US08853656B2

公开(公告)日：2014-10-07

申请号：US12535014

申请日：2009-08-04

申请人： Tatsuya Yanagida ,  Masaki Nakano ,  Akira Endo

发明人： Tatsuya Yanagida ,  Masaki Nakano ,  Akira Endo

IPC分类号： H05G2/00

CPC分类号： H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

摘要： Offset in the ejection direction of target material droplets is corrected in order to stabilize EUV output in an EUV light source device. An extreme ultraviolet light source device includes a droplet generation device 110 that outputs target material droplets 101 towards a predetermined plasma emission point 103; a charging device 130 that charges the target material droplets 101; a trajectory correction device 140 that generates a force field in the trajectory to correct the travel direction of the charged target material droplets 101a so that the charged target material droplets 101a travel towards the plasma emission point 103; and a laser light source 150 that irradiates, at the plasma emission point 103, a laser beam onto the charged target material to generate plasma thereby.

摘要翻译： 校正目标材料液滴的排出方向的偏移，以便稳定EUV光源装置中的EUV输出。 极紫外光源装置包括：液滴产生装置110，其将目标材料液滴101朝向预定等离子体发射点103输出; 对目标材料液滴101进行充电的充电装置130; 轨迹校正装置140，其在轨迹中产生力场，以校正充电的目标材料液滴101a的行进方向，使得带电目标材料液滴101a朝向等离子体发射点103行进; 以及激光源150，其在等离子体发射点103处将激光束照射到带电目标材料上以产生等离子体。

公开(公告)号：US08804778B2

公开(公告)日：2014-08-12

申请号：US12580523

申请日：2009-10-16

申请人： Osamu Wakabayashi ,  Akira Endo ,  Krzysztof Nowak ,  Takashi Suganuma ,  Masato Moriya

发明人： Osamu Wakabayashi ,  Akira Endo ,  Krzysztof Nowak ,  Takashi Suganuma ,  Masato Moriya

IPC分类号： H01S3/10

CPC分类号： H01S3/2316 ,  B82Y20/00 ,  G03F7/70033 ,  H01S3/0007 ,  H01S3/107 ,  H01S3/2232 ,  H01S3/235 ,  H01S5/02284 ,  H01S5/0654 ,  H01S5/06837 ,  H01S5/0687 ,  H01S5/141 ,  H01S5/3402 ,  H01S5/4012 ,  H01S5/4062 ,  H01S5/4087

摘要： An extreme ultraviolet light source apparatus comprises a laser apparatus having a master oscillator outputting one or more longitudinal-mode-laser lights, an amplifier with a molecular gas as an amplifying agency amplifying a longitudinal-mode laser light of which wavelength is included in one of amplifiable lines, and a controller adjusting the master oscillator so that the wavelength of the longitudinal-mode laser light outputted from the master oscillator is included in one of the amplifiable lines, the laser apparatus being used as a driver laser, wherein the laser apparatus irradiates a target material with a laser light for generating plasma, and the extreme ultraviolet light is emitted from the plasma and outputted from the extreme ultraviolet light source apparatus.

摘要翻译： 一种极紫外光源装置包括具有输出一个或多个纵模式激光灯的主振荡器的激光装置，具有分子气体的放大器作为放大器，放大其中包​​含波长的纵模式激光， 以及调节主振荡器的控制器，使得从主振荡器输出的纵模激光的波长包括在可放大线之一中，激光装置用作驱动激光器，其中激光装置照射 具有用于产生等离子体的激光的目标材料，并且从等离子体发射极紫外光并从极紫外光源装置输出。

公开(公告)号：US08569721B2

公开(公告)日：2013-10-29

申请号：US12372958

申请日：2009-02-18

申请人： Masaki Nakano ,  Akira Endo

发明人： Masaki Nakano ,  Akira Endo

IPC分类号： H05H1/00

CPC分类号： H05G2/003 ,  H05G2/006 ,  H05G2/008

摘要： In an LPP type EUV light source apparatus, the intensity of radiated EUV light is stabilized by improving the positional stability of droplets. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a target supply division including a target tank for storing a target material therein and an injection nozzle for injecting the target material in a jet form, for supplying the target material into the chamber; a charging electrode applied with a direct-current voltage between the target tank and itself, for charging droplets when the target material in the jet form injected from the injection nozzle is broken up into the droplets; a laser for applying a laser beam to the droplets of the target material to generate plasma; and a collector mirror for collecting extreme ultra violet light radiated from the plasma to output the extreme ultra violet light.

摘要翻译： 在LPP型EUV光源装置中，通过提高液滴的位置稳定性来稳定辐射EUV光的强度。 极紫外光源装置包括：产生极紫外光的室; 目标供给部，包括用于存储目标材料的目标罐和用于将喷射形式的目标材料喷射的喷嘴，用于将目标材料供应到所述室中; 充电电极，其在目标罐和本身之间施加直流电压，用于在从注射喷嘴注入的喷射形式的目标材料分解成液滴时充入液滴; 用于将激光束施加到目标材料的液滴以产生等离子体的激光器; 以及用于收集从等离子体辐射的极紫外光以输出极紫外光的集光镜。

公开(公告)号：US08558202B2

公开(公告)日：2013-10-15

申请号：US13336749

申请日：2011-12-23

申请人： Tatsuya Yanagida ,  Akira Endo ,  Hiroshi Komori ,  Shinji Nagai ,  Kouji Kakizaki ,  Tamotsu Abe ,  Hideo Hoshino

发明人： Tatsuya Yanagida ,  Akira Endo ,  Hiroshi Komori ,  Shinji Nagai ,  Kouji Kakizaki ,  Tamotsu Abe ,  Hideo Hoshino

IPC分类号： A61N5/06 ,  G01J3/10 ,  H05G2/00

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/008

摘要： In an EUV light source apparatus, a collector mirror is protected from debris damaging a mirror coating. The EUV light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target supply unit for supplying a target material into the chamber; a plasma generation laser unit for irradiating the target material within the chamber with a plasma generation laser beam to generate plasma; an ionization laser unit for irradiating neutral particles produced at plasma generation with an ionization laser beam to convert the neutral particles into ions; a collector mirror for collecting the extreme ultraviolet light radiated from the plasma; and a magnetic field or electric field forming unit for forming a magnetic field or an electric field within the chamber so as to trap the ions.

公开(公告)号：US08507883B2

公开(公告)日：2013-08-13

申请号：US12559977

申请日：2009-09-15

申请人： Akira Endo ,  Hideo Hoshino ,  Kouji Kakizaki ,  Tamotsu Abe ,  Akira Sumitani ,  Takanobu Ishihara ,  Shinji Nagai ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

发明人： Akira Endo ,  Hideo Hoshino ,  Kouji Kakizaki ,  Tamotsu Abe ,  Akira Sumitani ,  Takanobu Ishihara ,  Shinji Nagai ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

IPC分类号： G21G4/00

CPC分类号： H05G2/003 ,  H05G2/008

摘要： An extreme ultraviolet light source apparatus provided with a magnetic field forming unit having sufficient capability of protection against ions radiated from plasma while using a relatively small magnetic source. The apparatus includes: a target nozzle for injecting a target material; a driver laser for applying a laser beam to the target material to generate plasma; a collector mirror for collecting extreme ultraviolet light radiated from the plasma; and a magnetic field forming unit including at least one magnetic source and at least one magnetic material having two leading end parts projecting from the at least one magnetic source to face each other with a plasma emission point in between, and forming a magnetic field between a trajectory of the target material and the collector mirror.

摘要翻译： 一种极紫外光源装置，其具有磁场形成单元，该磁场形成单元在使用相对较小的磁源时具有足够的抵抗从等离子体辐射的离子的能力。 该装置包括：用于注射目标材料的目标喷嘴; 用于将激光束施加到目标材料以产生等离子体的驱动激光器; 用于收集从等离子体辐射的极紫外光的收集镜; 以及磁场形成单元，其包括至少一个磁源和至少一个磁性材料，所述至少一个磁性材料具有从所述至少一个磁源突出的两个前端部分，其间具有等离子体发射点，并在其之间形成磁场 目标材料和收集镜的轨迹。

公开(公告)号：US08476609B2

公开(公告)日：2013-07-02

申请号：US13306358

申请日：2011-11-29

申请人： Akira Endo ,  Krzysztof Nowak ,  Hideo Hoshino ,  Tatsuya Ariga ,  Masato Moriya ,  Osamu Wakabayashi

发明人： Akira Endo ,  Krzysztof Nowak ,  Hideo Hoshino ,  Tatsuya Ariga ,  Masato Moriya ,  Osamu Wakabayashi

IPC分类号： G02B26/02

CPC分类号： H05G2/003 ,  H01S3/005 ,  H01S3/0064 ,  H01S3/2316 ,  H05G2/008

摘要： An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.

摘要翻译： 本发明的EUV光源能够在高热负荷状态下稳定且连续地使用饱和吸收体。 可饱和吸收体（SA）装置设置在激光束线上以吸收诸如自激振荡光，寄生振荡光或返回光的微弱光。 来自SA气瓶的SA气体和来自缓冲气瓶的缓冲气体混合成混合气体。 混合气体经由供给管路供给到SA气室，吸收激光束中包含的微弱光。 混合气体通过排气管道排出，并被送到热交换器。 由热交换器冷却的混合气体通过循环泵送回到SA气室。

公开(公告)号：US08471226B2

公开(公告)日：2013-06-25

申请号：US12547896

申请日：2009-08-26

申请人： Hiroshi Komori ,  Tatsuya Yanagida ,  Yoshifumi Ueno ,  Akira Sumitani ,  Akira Endo ,  Tsukasa Hori

发明人： Hiroshi Komori ,  Tatsuya Yanagida ,  Yoshifumi Ueno ,  Akira Sumitani ,  Akira Endo ,  Tsukasa Hori

IPC分类号： A61N5/06

CPC分类号： G21K5/00 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： An EUV (Extreme Ultra Violet) light source device ionizes a target material in an ionizer, and supplies the ionized target material to a point of generating a plasma. This reduces the generation of debris. The ionizer simultaneously irradiates laser beams of plural wavelengths corresponding to the excited level of tin on a target material to ionize the target material. The ionized target material is extracted from the ionizer with a high voltage applied from an ion beam extractor, and accelerated and supplied to a plasma generation chamber. When driver laser beam is irradiated on the ionized target material, a plasma is generated, thereby emitting EUV radiation.

摘要翻译： EUV（Extreme Ultra Violet）光源装置将离子发生器中的目标材料离子化，并将电离靶材材料提供到产生等离子体的点。 这减少了碎片的产生。 离子发生器同时将与激发的锡水平相对应的多个波长的激光束照射在目标材料上以电离目标材料。 电离目标材料从离子束提取器施加的高电压从电离器中提取，并被加速并提供给等离子体产生室。 当驱动激光束照射在电离靶材上时，产生等离子体，从而发射EUV辐射。

公开(公告)号：US08164076B2

公开(公告)日：2012-04-24

申请号：US12569194

申请日：2009-09-29

申请人： Akira Endo ,  Yoshifumi Ueno ,  Youichi Sasaki ,  Osamu Wakabayashi

发明人： Akira Endo ,  Yoshifumi Ueno ,  Youichi Sasaki ,  Osamu Wakabayashi

IPC分类号： H05G2/00

CPC分类号： G21K5/00 ,  G03F7/70033 ,  H05G2/00 ,  H05G2/003 ,  H05G2/008

摘要： An extreme ultraviolet light source apparatus, which is to generate an extreme ultraviolet light by irradiating a target with a main pulse laser light after irradiating the target with a prepulse laser light, the extreme ultraviolet light source apparatus comprises: a prepulse laser light source generating a pre-plasma by irradiating the target with the prepulse laser light while a part of the target remains, the pre-plasma being generated at a different region from a target region, the different region being located on an incident side of the prepulse laser light; and a main pulse laser light source generating the extreme ultraviolet light by irradiating the pre-plasma with the main pulse laser light.

摘要翻译： 一种极紫外光源装置，其特征在于，所述极紫外光源装置包括：前脉冲激光光源，其产生前脉冲激光光源，所述极紫外光源装置包括：前脉冲激光光源，其通过用前脉冲激光照射所述靶之后用主脉冲激光照射靶， 在一部分目标物保留的同时用前脉冲激光照射靶的预等离子体，在与目标区域不同的区域产生预等离子体，不同的区域位于预激光激光的入射侧; 以及通过用主脉冲激光照射预等离子体而产生极紫外光的主脉冲激光光源。

公开(公告)号：US20110057126A1

公开(公告)日：2011-03-10

申请号：US12943090

申请日：2010-11-10

申请人： HIDEO HOSHINO ,  Tamotsu Abe ,  Akira Endo

发明人： HIDEO HOSHINO ,  Tamotsu Abe ,  Akira Endo

IPC分类号： H01J27/24

CPC分类号： H01S3/2383 ,  G03F7/70033 ,  H01S3/0057 ,  H01S3/2308 ,  H01S5/4012

摘要： An extreme ultra violet light source apparatus by which EUV light can be efficiently obtained uses a driver laser which can realize a desired pulse width with substantially homogeneous intensity. The apparatus generates extreme ultra violet light by applying a laser beam to a target, and includes a chamber in which extreme ultra violet light is generated; a target supply unit which supplies a liquid or solid metal target to a predetermined position within the chamber; a laser beam generating unit which synthesizes pulse laser beams having delays different from one another to generate a single pulse laser beam or a pulse train laser beam having substantially homogeneous intensity, and applies the laser beam to the target supplied by the target supply unit to generate plasma; and a collector mirror which collects the extreme ultra violet light radiated from the plasma and outputs it.

摘要翻译： 可以有效地获得EUV光的极端紫外光源装置使用驱动激光，其能够以基本均匀的强度实现期望的脉冲宽度。 该装置通过向目标物施加激光束而产生极紫外光，并且包括产生极紫外光的室; 目标供应单元，其将液体或固体金属靶供应到所述室内的预定位置; 激光束产生单元，其合成具有彼此不同的延迟的脉冲激光束，以产生具有基本均匀强度的单脉冲激光束或脉冲串激光束，并将激光束施加到由目标供给单元提供的目标，以产生 等离子体; 以及收集从等离子体辐射的极紫外光并将其输出的收集镜。