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公开(公告)号:US20060169912A1
公开(公告)日:2006-08-03
申请号:US11281175
申请日:2005-11-17
申请人: Anthony Renau , Donna Smatlak , James Buff , Eric Hermanson
发明人: Anthony Renau , Donna Smatlak , James Buff , Eric Hermanson
IPC分类号: H01J1/50
CPC分类号: H01J27/02 , H01J37/026 , H01J37/05 , H01J37/3171 , H01J2237/0041 , H01J2237/055 , H01J2237/057 , H05H7/08
摘要: One or more electron sources are utilized to inject electrons into an ion beam being transported between the polepieces of a magnet. In some embodiments, the electron sources are located in cavities in one or both polepieces of the magnet. In other embodiments, a radio frequency or microwave plasma flood gun is located in a cavity in at least one of the polepieces or between the polepieces.
摘要翻译: 一个或多个电子源用于将电子注入到在磁体的极柱之间传输的离子束中。 在一些实施例中,电子源位于磁体的一个或两个磁极中的空腔中。 在其他实施例中,无线电频率或微波等离子体喷枪位于至少一个极杆中或杆之间的空腔中。
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公开(公告)号:US07402816B2
公开(公告)日:2008-07-22
申请号:US11281175
申请日:2005-11-17
申请人: Anthony Renau , Donna L. Smatlak , James Buff , Eric Hermanson
发明人: Anthony Renau , Donna L. Smatlak , James Buff , Eric Hermanson
IPC分类号: H01J1/50
CPC分类号: H01J27/02 , H01J37/026 , H01J37/05 , H01J37/3171 , H01J2237/0041 , H01J2237/055 , H01J2237/057 , H05H7/08
摘要: One or more electron sources are utilized to inject electrons into an ion beam being transported between the polepieces of a magnet. In some embodiments, the electron sources are located in cavities in one or both polepieces of the magnet. In other embodiments, a radio frequency or microwave plasma flood gun is located in a cavity in at least one of the polepieces or between the polepieces.
摘要翻译: 一个或多个电子源用于将电子注入到在磁体的极柱之间传输的离子束中。 在一些实施例中,电子源位于磁体的一个或两个磁极中的空腔中。 在其他实施例中,无线电频率或微波等离子体喷枪位于至少一个极杆中或杆之间的空腔中。
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公开(公告)号:US08455760B2
公开(公告)日:2013-06-04
申请号:US12983706
申请日:2011-01-03
申请人: Russell J. Low , Kasegn Tekletsadik , Anthony Renau , Piotr R. Lubicki , D. Jeffrey Lischer , Steve Krause , Eric Hermanson , Doug E. May
发明人: Russell J. Low , Kasegn Tekletsadik , Anthony Renau , Piotr R. Lubicki , D. Jeffrey Lischer , Steve Krause , Eric Hermanson , Doug E. May
IPC分类号: H01R4/02
CPC分类号: H05H7/00 , H01B17/66 , H01J37/241 , H01J37/3171 , H01J2237/038
摘要: Methods of interfacing parts in a high voltage environment and related structures are disclosed. A method comprises: providing a first part and a second part; and interfacing the first part and the second part to create a first substantially zero electrical field area at a first outer extent of an interface between the first and second parts and a reduced electrical field area in a different portion of the interface.
摘要翻译: 公开了在高电压环境中部分接口的相关结构的方法。 一种方法包括:提供第一部分和第二部分; 以及接合所述第一部分和所述第二部分以在所述第一部分和所述第二部分之间的界面的第一外部范围处形成第一基本为零的电场区域,以及在所述界面的不同部分中的减小的电场区域。
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公开(公告)号:US07170067B2
公开(公告)日:2007-01-30
申请号:US11093930
申请日:2005-03-30
申请人: Anthony Renau , Eric Hermanson , Joseph C. Olson , Gordon Angel
发明人: Anthony Renau , Eric Hermanson , Joseph C. Olson , Gordon Angel
IPC分类号: H01J49/00
CPC分类号: H01J37/244 , H01J37/3171 , H01J2237/004 , H01J2237/24405 , H01J2237/31703 , H01J2237/31705
摘要: The present invention provides a combined electrostatically suppressed Faraday and energy contamination monitor and related methods for its use. The apparatus of the present invention is capable of selectively measuring two properties of an ion beam, including, for example, a current and a level of energy contamination in a decelerated ion beam. A first aspect of the invention provides an ion beam measurement apparatus comprising an aperture for receiving the ion beam, a negatively biased electrode disposed adjacent to the aperture, a positively biased electrode disposed adjacent to the negatively biased electrode, a selectively biased electrode disposed adjacent to the positively biased electrode, and a collector, wherein the selectively biased electrode may selectively be negatively biased or positively biased.
摘要翻译: 本发明提供了一种组合静电抑制法拉第和能量污染监测器及其使用的相关方法。 本发明的装置能够选择性地测量离子束的两个特性,包括例如减速离子束中的电流和能量污染水平。 本发明的第一方面提供了一种离子束测量装置,其包括用于接收离子束的孔,邻近孔径设置的负偏置电极,邻近负偏置电极设置的正偏置电极, 正偏置电极和集电极,其中选择性偏置电极可以选择性地被负偏置或正偏置。
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公开(公告)号:US20060192134A1
公开(公告)日:2006-08-31
申请号:US11093930
申请日:2005-03-30
申请人: Anthony Renau , Eric Hermanson , Joseph Olson , Gordon Angel
发明人: Anthony Renau , Eric Hermanson , Joseph Olson , Gordon Angel
IPC分类号: G01K1/08
CPC分类号: H01J37/244 , H01J37/3171 , H01J2237/004 , H01J2237/24405 , H01J2237/31703 , H01J2237/31705
摘要: The present invention provides a combined electrostatically suppressed Faraday and energy contamination monitor and related methods for its use. The apparatus of the present invention is capable of selectively measuring two properties of an ion beam, including, for example, a current and a level of energy contamination in a decelerated ion beam. A first aspect of the invention provides an ion beam measurement apparatus comprising an aperture for receiving the ion beam, a negatively biased electrode disposed adjacent to the aperture, a positively biased electrode disposed adjacent to the negatively biased electrode, a selectively biased electrode disposed adjacent to the positively biased electrode, and a collector, wherein the selectively biased electrode may selectively be negatively biased or positively biased.
摘要翻译: 本发明提供了一种组合静电抑制法拉第和能量污染监测器及其使用的相关方法。 本发明的装置能够选择性地测量离子束的两个特性,包括例如减速离子束中的电流和能量污染水平。 本发明的第一方面提供了一种离子束测量装置,其包括用于接收离子束的孔,邻近孔径设置的负偏置电极,邻近负偏置电极设置的正偏置电极, 正偏置电极和集电极,其中选择性偏置电极可以选择性地被负偏置或正偏置。
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公开(公告)号:US20110094798A1
公开(公告)日:2011-04-28
申请号:US12983706
申请日:2011-01-03
申请人: Russell J. Low , Kasegn D. Tekletsadik , Anthony Renau , Piotr R. Lubicki , D. Jeffrey Lischer , Steve Krause , Eric Hermanson , Doug E. May
发明人: Russell J. Low , Kasegn D. Tekletsadik , Anthony Renau , Piotr R. Lubicki , D. Jeffrey Lischer , Steve Krause , Eric Hermanson , Doug E. May
IPC分类号: H01R4/00
CPC分类号: H05H7/00 , H01B17/66 , H01J37/241 , H01J37/3171 , H01J2237/038
摘要: Methods of interfacing parts in a high voltage environment and related structures are disclosed. A method comprises: providing a first part and a second part; and interfacing the first part and the second part to create a first substantially zero electrical field area at a first outer extent of an interface between the first and second parts and a reduced electrical field area in a different portion of the interface.
摘要翻译: 公开了在高电压环境中部分接口的相关结构的方法。 一种方法包括:提供第一部分和第二部分; 以及接合所述第一部分和所述第二部分以在所述第一部分和所述第二部分之间的界面的第一外部范围处形成第一基本为零的电场区域,以及在所述界面的不同部分中的减小的电场区域。
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公开(公告)号:US07863520B2
公开(公告)日:2011-01-04
申请号:US11838360
申请日:2007-08-14
申请人: Russell J. Low , Kasegn D. Tekletsadik , Anthony Renau , Piotr R. Lubicki , D. Jeffrey Lischer , Steve Krause , Eric Hermanson , Doug E. May
发明人: Russell J. Low , Kasegn D. Tekletsadik , Anthony Renau , Piotr R. Lubicki , D. Jeffrey Lischer , Steve Krause , Eric Hermanson , Doug E. May
IPC分类号: H01R4/02
CPC分类号: H05H7/00 , H01B17/66 , H01J37/241 , H01J37/3171 , H01J2237/038
摘要: Methods of interfacing parts in a high voltage environment and related structures are disclosed. A method comprises: providing an insulation medium between a first part and a second part in a high voltage environment; and interfacing the first part and the second part by compressing the first part and the second part against the insulation medium.
摘要翻译: 公开了在高压环境中部分接口的相关结构的方法。 一种方法包括:在高压环境中在第一部分和第二部分之间提供绝缘介质; 并且通过将第一部分和第二部分压靠绝缘介质来将第一部分和第二部分接合。
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公开(公告)号:US20090047801A1
公开(公告)日:2009-02-19
申请号:US11838360
申请日:2007-08-14
申请人: Russell J. Low , Kasegn D. Tekletsadik , Anthony Renau , Piotr R. Lubicki , D. Jeffrey Lischer , Steve Krause , Eric Hermanson , Doug E. May
发明人: Russell J. Low , Kasegn D. Tekletsadik , Anthony Renau , Piotr R. Lubicki , D. Jeffrey Lischer , Steve Krause , Eric Hermanson , Doug E. May
IPC分类号: H01R29/00
CPC分类号: H05H7/00 , H01B17/66 , H01J37/241 , H01J37/3171 , H01J2237/038
摘要: Methods of interfacing parts in a high voltage environment and related structures are disclosed. A method comprises: providing an insulation medium between a first part and a second part in a high voltage environment; and interfacing the first part and the second part by compressing the first part and the second part against the insulation medium.
摘要翻译: 公开了在高电压环境中部分接口的相关结构的方法。 一种方法包括:在高压环境中在第一部分和第二部分之间提供绝缘介质; 并且通过将第一部分和第二部分压靠绝缘介质来将第一部分和第二部分接合。
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公开(公告)号:US20050178981A1
公开(公告)日:2005-08-18
申请号:US11056445
申请日:2005-02-11
申请人: Anthony Renau , Joseph Olson , Eric Hermanson , Gordon Angel
发明人: Anthony Renau , Joseph Olson , Eric Hermanson , Gordon Angel
IPC分类号: G21K5/10 , H01J37/08 , H01J37/317
CPC分类号: H01J37/3171 , H01J2237/24405 , H01J2237/304
摘要: An ion beam neutral detector system, an ion implanter system including the detector system and a method of detecting ion beam neutrals that ensures an ion implant is meeting contamination requirements are disclosed. The detector includes an energy contamination monitor positioned with in an ion implanter system. A method of the invention includes implanting the workpiece using an ion beam, and periodically detecting ion beam neutrals in the ion beam such that adjustments to the ion implanter system can be made for optimization
摘要翻译: 公开了一种离子束中性检测器系统,包括检测器系统的离子注入机系统和检测离子束中性物质的方法,其确保离子注入满足污染要求。 检测器包括一个位于离子注入机系统中的能量污染监测器。 本发明的方法包括使用离子束植入工件,并且周期性地检测离子束中的离子束中性粒子,使得可以对离子注入机系统进行调整以进行优化
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公开(公告)号:US07250617B2
公开(公告)日:2007-07-31
申请号:US11056445
申请日:2005-02-11
IPC分类号: H01J37/08
CPC分类号: H01J37/3171 , H01J2237/24405 , H01J2237/304
摘要: An ion beam neutral detector system, an ion implanter system including the detector system and a method of detecting ion beam neutrals that ensures an ion implant is meeting contamination requirements are disclosed. The detector includes an energy contamination monitor positioned with in an ion implanter system. A method of the invention includes implanting the workpiece using an ion beam, and periodically detecting ion beam neutrals in the ion beam such that adjustments to the ion implanter system can be made for optimization.
摘要翻译: 公开了一种离子束中性检测器系统,包括检测器系统的离子注入机系统和检测离子束中性物质的方法,其确保离子注入满足污染要求。 检测器包括一个位于离子注入机系统中的能量污染监测器。 本发明的方法包括使用离子束注入工件,并周期性地检测离子束中的离子束中性粒子,使得可以对离子注入机系统进行优化调整。
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