公开(公告)号：US20030172872A1

公开(公告)日：2003-09-18

申请号：US10352257

申请日：2003-01-27

Applicant: APPLIED MATERIALS, INC.

Inventor： Randhir P.S. Thakur ,  Alfred W. Mak ,  Ming Xi ,  Walter Benjamin Glenn ,  Ahmad A. Khan ,  Ayad A. Al-Shaikh ,  Avgerinos V. Gelatos ,  Salvador P. Umotoy

IPC: C23C016/00

CPC classification number: C23C16/45544 ,  C23C16/4412 ,  C23C16/452 ,  C23C16/45536 ,  C23C16/45565 ,  C23C16/45582 ,  H01J37/32009 ,  H01J37/32091 ,  H01J37/3244 ,  H01J37/32834 ,  H01L21/6719

Abstract: An apparatus for cyclical depositing of thin films on semiconductor substrates, comprising a process chamber having a gas distribution system with separate paths for process gases and an exhaust system synchronized with operation of valves dosing the process gases into a reaction region of the chamber.

Abstract translation: 一种用于在半导体衬底上循环沉积薄膜的装置，包括具有气体分配系统的处理室，该气体分配系统具有用于处理气体的独立路径，以及与将所述工艺气体计量到所述室的反应区域的阀的操作同步的排气系统。

公开(公告)号：US20030224217A1

公开(公告)日：2003-12-04

申请号：US10278179

申请日：2002-10-21

Applicant: Applied Materials, Inc.

Inventor： Jeong Soo Byun ,  Alfred W. Mak ,  Hui Zhang ,  Hyungsuk Alexander Yoon ,  Avgerinos V. Gelatos ,  Robert L. Jackson ,  Ming Xi ,  Randhir P.S. Thakur

IPC: B32B018/00

CPC classification number: H01L21/76846 ,  C04B35/58007 ,  C04B2235/421 ,  C23C16/38 ,  C23C16/45525 ,  C23C16/56 ,  H01L21/28562 ,  H01L21/76856 ,  H01L21/76864 ,  H01L28/75

Abstract: A process for treating refractory metal-boron layers deposited by atomic layer deposition resulting in the formation of a ternary amorphous refractory metal-nitrogen-boron film is disclosed. The resulting ternary film remains amorphous following thermal annealing at temperatures up to 800null C. The ternary films are formed following thermal annealing in a reactive nitrogen-containing gas. Subsequent processing does not disrupt the amorphous character of the ternary film. arrangement where a blended solution is supplied to a remote point of use.

Abstract translation: 公开了一种用于处理通过原子层沉积沉积的难熔金属 - 硼层的方法，导致形成三元非晶态难熔金属 - 氮 - 硼膜。 所得到的三元膜在温度高达800℃的热退火之后保持无定形。在反应性含氮气体中热退火后形成三元膜。 随后的处理不会破坏三元膜的无定形特性。 将混合溶液供应到远程使用点的布置。