-
公开(公告)号:US10978276B2
公开(公告)日:2021-04-13
申请号:US16749631
申请日:2020-01-22
发明人: Bharath Swaminathan , Hanbing Wu , John Mazzocco
IPC分类号: H01J37/32 , C23C14/34 , C23C14/50 , C23C14/58 , C23C14/54 , H01L21/687 , H01J37/34 , H01L21/67
摘要: Embodiments of a method and apparatus for annealing a substrate are disclosed herein. In some embodiments, a substrate anneal chamber includes a chamber body having a chamber wall and an interior volume; a lamp assembly disposed in the interior volume and having a plurality of lamps configured to heat a substrate; a slit valve disposed through a wall of the chamber body and above the lamp assembly to allow the substrate to pass into and out of the interior volume; an annular lamp assembly having at least one lamp disposed in a processing volume in an upper portion of the substrate anneal chamber above the slit valve; and a top reflector disposed above the annular lamp assembly to define an upper portion of the processing volume and to reflect radiation downwards towards the lamp assembly, wherein a bottom surface of the top reflector is exposed to the interior volume.
-
公开(公告)号:US20150170952A1
公开(公告)日:2015-06-18
申请号:US14560744
申请日:2014-12-04
发明人: ANANTHA K. SUBRAMANI , Ashish Goel , Wei W. Wang , Bharath Swaminathan , Vijay D. Parkhe , Xiaoxiong Yuan
IPC分类号: H01L21/683 , H02N13/00
CPC分类号: H02N13/00 , H01J37/32091 , H01J37/32715 , H01J37/32724 , H01L21/67103 , H01L21/67115 , H01L21/6831 , H01L21/68742 , H01L21/68792
摘要: An electrostatic chuck includes a dielectric disk having a support surface to support a substrate and an opposing second surface, wherein at least one chucking electrode is disposed within the dielectric disk; a radio frequency (RF) bias plate disposed below the dielectric disk; a plurality of lamps disposed below the RF bias plate to heat the dielectric disk; a metallic plate disposed below the lamps to absorb heat generated by the lamps; a shaft coupled to the second surface of the dielectric disk at a first end of the shaft to support the dielectric disk in a spaced apart relation to the RF bias plate and extending away from the dielectric disk and through the RF bias plate and the metallic plate; and a rotation assembly coupled to the shaft to rotate the shaft and the dielectric disk with respect to the RF bias plate, lamps, and metallic plate.
摘要翻译: 静电卡盘包括具有用于支撑基板的支撑表面和相对的第二表面的电介质盘,其中至少一个夹持电极设置在电介质盘内; 设置在介质盘下方的射频(RF)偏置板; 设置在所述RF偏置板下方的多个灯以加热所述电介质盘; 设置在灯下方的金属板,以吸收由灯产生的热量; 在所述轴的第一端处耦合到所述电介质盘的所述第二表面的轴,以将所述电介质盘以与所述RF偏置板隔开的关系支撑并且延伸离开所述电介质盘并且穿过所述RF偏置板和所述金属板 ; 以及联接到所述轴的旋转组件,以相对于所述RF偏置板,灯和金属板旋转所述轴和所述电介质盘。
-
公开(公告)号:US11802340B2
公开(公告)日:2023-10-31
申请号:US15839018
申请日:2017-12-12
IPC分类号: C23C16/46 , H01L21/687 , H01L21/67 , C23C16/455 , C23C16/458
CPC分类号: C23C16/466 , C23C16/4586 , C23C16/45527 , H01L21/67098 , H01L21/67109 , H01L21/67167 , H01L21/67184 , H01L21/67201 , H01L21/68721 , H01L21/68728 , H01L21/68742 , H01L21/68785
摘要: A cooling chamber comprising a support plate connected to a cryo pump and turbo pump, a clamp ring with a plurality of clamp pads on the bottom thereof where each clamp pad has a beveled surface directed downward and a lift plate to move the clamp ring from a clamp position to a loading position are described. Cluster tools incorporating the cooling chamber and methods of using the cooling chamber are also described.
-
公开(公告)号:US10668533B2
公开(公告)日:2020-06-02
申请号:US15211872
申请日:2016-07-15
发明人: Hou T. Ng , Nag B. Patibandla , Ajey M. Joshi , Bharath Swaminathan , Ashavani Kumar , Eric Ng , Bernard Frey , Kasiraman Krishnan
IPC分类号: B22F3/10 , B22F3/105 , B29C64/153 , B29C64/20 , B22F3/00 , B29C64/371 , B23K26/342 , B23K26/70 , B33Y30/00 , B33Y10/00
摘要: An additive manufacturing system includes a platen having a top surface to support an object being manufactured, a feed material dispenser to deliver a plurality of successive layers of feed material over the platen, an energy source positioned above the platen to fuse at least a portion of an outermost layer of feed material, and a coolant fluid dispenser to deliver a coolant fluid onto the outermost layer of feed material after at least a portion of the outermost layer has been fused.
-
公开(公告)号:US10335856B2
公开(公告)日:2019-07-02
申请号:US15195298
申请日:2016-06-28
发明人: Bharath Swaminathan , Eric Ng , Nag B. Patibandla , Hou T. Ng , Ashavani Kumar , Ajey M. Joshi , Bernard Frey , Kasiraman Krishnan
摘要: An additive manufacturing system includes a platen having a top surface to support an object being manufactured, a dispenser to deliver a plurality of successive layers of precursor material over the platen, a plurality of lamps disposed below the top surface of the platen to heat the platen, and an energy source to fuse at least some of the outermost layer of precursor material.
-
公开(公告)号:US20170021418A1
公开(公告)日:2017-01-26
申请号:US15213267
申请日:2016-07-18
发明人: Hou T. Ng , Bharath Swaminathan , Nag B. Patibandla , Ajey M. Joshi , Ashavani Kumar , Eric Ng , Bernard Frey , Kasiraman Krishnan
IPC分类号: B22F3/105 , B28B1/00 , B33Y10/00 , B33Y30/00 , C04B35/64 , B23K15/00 , B23K26/342 , B23K26/70 , H05B3/00 , B29C67/00 , B33Y40/00
CPC分类号: B22F3/1055 , B22F2003/1056 , B22F2003/1057 , B22F2203/11 , B22F2998/10 , B22F2999/00 , B29C64/153 , B29K2105/251 , B33Y10/00 , B33Y30/00 , B33Y40/00 , H05B3/0057 , H05B3/0061 , H05B2203/032 , Y02P10/295 , B22F1/0085
摘要: An additive manufacturing system includes a platen having a top surface to support an object being manufactured, a dispenser to deliver a plurality of successive layers of feed material over the platen, an energy source positioned above the platen to direct a beam to fuse at least some of an outermost layer of feed material, and a plurality of lamps disposed above the platen and around the energy source to radiatively heat the outermost layer of feed material.
摘要翻译: 添加剂制造系统包括具有用于支撑待制造物体的顶表面的压板,用于在压板上方输送多个连续的进料材料层的分配器,位于压板上方的能量源,以引导束熔化至少一些 的最外层进料材料,以及多个灯,其设置在压板上方和能量源周围,以辐射加热进料的最外层。
-
公开(公告)号:US20210205890A1
公开(公告)日:2021-07-08
申请号:US17208992
申请日:2021-03-22
发明人: Hou T. Ng , Nag B. Patibandla , Ajey M. Joshi , Bharath Swaminathan , Ashavani Kumar , Eric Ng , Bernard Frey , Kasiraman Krishnan
IPC分类号: B22F12/00 , B29C64/153 , B29C64/371 , B29C64/364 , B23K26/342 , B23K26/70
摘要: An additive manufacturing system includes a platen having a top surface to support an object being manufactured, a feed material dispenser to deliver a plurality of successive layers of feed material over the platen, an energy source positioned above the platen to fuse at least a portion of an outermost layer of feed material, and a coolant fluid dispenser to deliver a coolant fluid onto the outermost layer of feed material after at least a portion of the outermost layer has been fused.
-
公开(公告)号:US20210114106A1
公开(公告)日:2021-04-22
申请号:US17131639
申请日:2020-12-22
发明人: Hou T. Ng , Nag B. Patibandla , Ajey M. Joshi , Bharath Swaminathan , Ashavani Kumar , Eric Ng , Bernard Frey , Kasiraman Krishnan
IPC分类号: B22F10/00 , B33Y10/00 , B29C64/153 , B33Y50/02 , B22F1/00
摘要: Additive manufacturing includes successively forming a plurality of layers on a support. Depositing a layer from the plurality of layers includes dispensing first particles, selectively dispensing second particles in selected regions corresponding to a surface of the object, and fusing at least a portion of the layer. The layer has the first particles throughout and the second particles in the selected regions. Alternatively or in addition, forming the plurality of layers includes depositing multiple groups of layers. Depositing a group of layers includes, for each layer in the group of layers dispensing a feed material to provide the layer, and after dispensing the feed material and before dispensing a subsequent layer fusing a selected portion of the layer. After all layers in the group of layers are dispensed, a volume of the group of layers that extends through all the layers in the group of layers is fused.
-
公开(公告)号:US10573498B2
公开(公告)日:2020-02-25
申请号:US15402142
申请日:2017-01-09
发明人: Bharath Swaminathan , Hanbing Wu , John Mazzocco
IPC分类号: H01L21/31 , H01L21/469 , H01J37/32 , H01L21/687 , C23C14/34 , C23C14/50 , H01J37/34
摘要: Embodiments of a method and apparatus for annealing a substrate are disclosed herein. In some embodiments, a substrate support includes a substrate support pedestal having an upper surface to support a substrate and an opposing bottom surface, wherein the substrate support pedestal is formed of a material that is transparent to radiation; a lamp assembly disposed below the substrate support pedestal and having a plurality of lamps configured to heat the substrate; a pedestal support extending through the lamp assembly to support the substrate support pedestal in a spaced apart relation to the plurality of lamps; a shaft coupled to a second end of the pedestal support opposite the first end; and a rotation assembly coupled to the shaft opposite the pedestal support to rotate the shaft, the pedestal support, and the substrate support pedestal with respect to the lamp assembly.
-
公开(公告)号:US10384265B2
公开(公告)日:2019-08-20
申请号:US15186277
申请日:2016-06-17
发明人: Bharath Swaminathan , Ajey M. Joshi , Nag B. Patibandla , Hou T. Ng , Ashavani Kumar , Eric Ng , Bernard Frey , Kasiraman Krishnan
IPC分类号: B22F3/105 , B33Y30/00 , B23K26/16 , B22F3/10 , B23K26/342 , B33Y10/00 , B33Y50/02 , B29C64/153 , B23K103/04 , B23K103/08 , B23K103/14 , B23K103/18 , B29C64/245
摘要: A method of additive manufacturing include delivering at least one layer by either depositing a uniform layer of powder on a support and then removing a portion of the layer with a roller with a surface having spatially controlled electrostatic charge, or by depositing powder onto the surface of the roller and moving the roller relative to a support such that the spatially controllable electrostatic charge on the surface of the roller causes transfer of a corresponding portion of the powder from the roller onto the support or an underlying layer.
-
-
-
-
-
-
-
-
-