Substrate processing apparatus including top reflector above annular lamp assembly

    公开(公告)号:US10978276B2

    公开(公告)日:2021-04-13

    申请号:US16749631

    申请日:2020-01-22

    摘要: Embodiments of a method and apparatus for annealing a substrate are disclosed herein. In some embodiments, a substrate anneal chamber includes a chamber body having a chamber wall and an interior volume; a lamp assembly disposed in the interior volume and having a plurality of lamps configured to heat a substrate; a slit valve disposed through a wall of the chamber body and above the lamp assembly to allow the substrate to pass into and out of the interior volume; an annular lamp assembly having at least one lamp disposed in a processing volume in an upper portion of the substrate anneal chamber above the slit valve; and a top reflector disposed above the annular lamp assembly to define an upper portion of the processing volume and to reflect radiation downwards towards the lamp assembly, wherein a bottom surface of the top reflector is exposed to the interior volume.

    ROTATABLE HEATED ELECTROSTATIC CHUCK
    2.
    发明申请
    ROTATABLE HEATED ELECTROSTATIC CHUCK 有权
    可旋转加热静电切割机

    公开(公告)号:US20150170952A1

    公开(公告)日:2015-06-18

    申请号:US14560744

    申请日:2014-12-04

    IPC分类号: H01L21/683 H02N13/00

    摘要: An electrostatic chuck includes a dielectric disk having a support surface to support a substrate and an opposing second surface, wherein at least one chucking electrode is disposed within the dielectric disk; a radio frequency (RF) bias plate disposed below the dielectric disk; a plurality of lamps disposed below the RF bias plate to heat the dielectric disk; a metallic plate disposed below the lamps to absorb heat generated by the lamps; a shaft coupled to the second surface of the dielectric disk at a first end of the shaft to support the dielectric disk in a spaced apart relation to the RF bias plate and extending away from the dielectric disk and through the RF bias plate and the metallic plate; and a rotation assembly coupled to the shaft to rotate the shaft and the dielectric disk with respect to the RF bias plate, lamps, and metallic plate.

    摘要翻译: 静电卡盘包括具有用于支撑基板的支撑表面和相对的第二表面的电介质盘,其中至少一个夹持电极设置在电介质盘内; 设置在介质盘下方的射频(RF)偏置板; 设置在所述RF偏置板下方的多个灯以加热所述电介质盘; 设置在灯下方的金属板,以吸收由灯产生的热量; 在所述轴的第一端处耦合到所述电介质盘的所述第二表面的轴,以将所述电介质盘以与所述RF偏置板隔开的关系支撑并且延伸离开所述电介质盘并且穿过所述RF偏置板和所述金属板 ; 以及联接到所述轴的旋转组件,以相对于所述RF偏置板,灯和金属板旋转所述轴和所述电介质盘。

    SELECTIVE MATERIAL DISPENSING IN ADDITIVE MANUFACTURING

    公开(公告)号:US20210114106A1

    公开(公告)日:2021-04-22

    申请号:US17131639

    申请日:2020-12-22

    摘要: Additive manufacturing includes successively forming a plurality of layers on a support. Depositing a layer from the plurality of layers includes dispensing first particles, selectively dispensing second particles in selected regions corresponding to a surface of the object, and fusing at least a portion of the layer. The layer has the first particles throughout and the second particles in the selected regions. Alternatively or in addition, forming the plurality of layers includes depositing multiple groups of layers. Depositing a group of layers includes, for each layer in the group of layers dispensing a feed material to provide the layer, and after dispensing the feed material and before dispensing a subsequent layer fusing a selected portion of the layer. After all layers in the group of layers are dispensed, a volume of the group of layers that extends through all the layers in the group of layers is fused.

    Substrate processing apparatus including annular lamp assembly

    公开(公告)号:US10573498B2

    公开(公告)日:2020-02-25

    申请号:US15402142

    申请日:2017-01-09

    摘要: Embodiments of a method and apparatus for annealing a substrate are disclosed herein. In some embodiments, a substrate support includes a substrate support pedestal having an upper surface to support a substrate and an opposing bottom surface, wherein the substrate support pedestal is formed of a material that is transparent to radiation; a lamp assembly disposed below the substrate support pedestal and having a plurality of lamps configured to heat the substrate; a pedestal support extending through the lamp assembly to support the substrate support pedestal in a spaced apart relation to the plurality of lamps; a shaft coupled to a second end of the pedestal support opposite the first end; and a rotation assembly coupled to the shaft opposite the pedestal support to rotate the shaft, the pedestal support, and the substrate support pedestal with respect to the lamp assembly.