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    MATERIAL DISPENSING AND COMPACTION IN ADDITIVE MANUFACTURING
    5.
    发明申请
    MATERIAL DISPENSING AND COMPACTION IN ADDITIVE MANUFACTURING 审中-公开
    添加剂制造中的材料分配和压实

    公开(公告)号：US20160368054A1

    公开(公告)日：2016-12-22

    申请号：US15186060

    申请日：2016-06-17

    申请人： Applied Materials, Inc.

    发明人： Hou T. Ng ,  Nag B. Patibandla ,  Ajey M. Joshi ,  Ashavani Kumar ,  Kasiraman Krishnan

    IPC分类号： B22F3/105 ,  B33Y30/00 ,  B33Y50/02 ,  B33Y10/00

    摘要： An additive manufacturing apparatus for forming a part includes a support, a first dispenser to deliver a layer of first particles on a support or an underlying layer on the support, a second dispenser to deliver second particles onto the layer of first particles such that the second particles infiltrate into the layer of first particles, an energy source to fuse the first particle and second particles to form a fused layer of the part, and a controller coupled to the first dispenser, second dispenser and energy source.

    摘要翻译： 一种用于形成部件的添加剂制造设备包括支撑件，第一分配器，用于在支撑件上或支撑体上的下层上输送第一颗粒层，第二分配器，用于将第二颗粒递送到第一颗粒层上， 颗粒渗透到第一颗粒层中，能量源将第一颗粒和第二颗粒融合以形成该部分的熔融层，以及耦合到第一分配器，第二分配器和能量源的控制器。

    Precursor formulations for polishing pads produced by an additive manufacturing process
    6.
    发明授权
    Precursor formulations for polishing pads produced by an additive manufacturing process 有权

    公开(公告)号：US11446788B2

    公开(公告)日：2022-09-20

    申请号：US16541641

    申请日：2019-08-15

    申请人： Applied Materials, Inc.

    发明人： Rajeev Bajaj ,  Daniel Redfield ,  Mahendra C. Orilall ,  Boyi Fu ,  Ashwin Chockalingam ,  Ashavani Kumar ,  Fred C. Redeker ,  Nag B. Patibandla

    IPC分类号： B24D18/00 ,  B24D3/28 ,  B33Y80/00 ,  B33Y10/00

    摘要： Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material and structural properties, and new methods of manufacturing the same. According to one or more embodiments of the disclosure, it has been discovered that a polishing pad with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments of the present disclosure thus may provide an advanced polishing pad that has discrete features and geometries, formed from at least two different materials that include functional polymers, functional oligomers, reactive diluents, and curing agents. For example, the advanced polishing pad may be formed from a plurality of polymeric layers, by the automated sequential deposition of at least one resin precursor composition followed by at least one curing step, wherein each layer may represent at least one polymer composition, and/or regions of different compositions.