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公开(公告)号：US20170106496A1
公开(公告)日：2017-04-20
申请号：US15176998
申请日：2016-06-08
Applicant: Applied Materials, Inc.
Inventor： Patrick ALA , Bo B. DING , Yongqi HU , Simon YAVELBERG , Mats LARSSON
IPC: B24B37/32
CPC classification number: B24B37/32
Abstract: An external clamp ring for a chemical mechanical polishing (CMP) carrier head having a hydrophobic coating, and a carrier head having the same are described herein. In one embodiment, an external clamp ring is provided that includes a cylindrical body having an outer cylindrical wall and an inner cylindrical wall. A hydrophobic layer disposed is on the outer cylindrical wall.
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公开(公告)号：US20180224412A1
公开(公告)日：2018-08-09
申请号：US15429038
申请日：2017-02-09
Applicant: Applied Materials, Inc.
Inventor： Tasnuva TABASSUM , Mats LARSSON , Kevin A. PAPKE
CPC classification number: G01N33/005 , G01N33/2025 , G01N2033/0095 , G01N2033/0096
Abstract: Embodiments of the disclosure generally relate to a system, apparatus and method for testing a coating over a semiconductor chamber component. In one embodiment, a test station comprises a hollow tube, a sensor coupled to a top end of the tube and a processing system communicatively coupled to the sensor. The hollow tube has an open bottom end configured for sealingly engaging a coating layer of the semiconductor chamber component. The sensor is configured to detect the presence of a gaseous byproduct of a reaction between a reagent disposed in the hollow tube and a base layer disposed under the coating layer. The processing system is configured to determine exposure of the base layer through the coating layer in response to information about the presence of the gaseous byproduct. In another embodiment, the processing system is communicatively coupled to each sensor of a plurality of test stations.
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公开(公告)号：US20200270747A1
公开(公告)日：2020-08-27
申请号：US16791264
申请日：2020-02-14
Applicant: Applied Materials, Inc.
Inventor： Mats LARSSON , Kevin A. PAPKE , Chirag Shaileshbhai KHAIRNAR , Rajasekhar PATIBANDLA , Karthikeyan BALARAMAN , Balamurugan RAMASAMY , Kartik SHAH , Umesh M. KELKAR
IPC: C23C16/02 , C23C16/513 , C23C16/56 , C23C16/40
Abstract: One embodiment of the disclosure provides a method of fabricating a chamber component with a coating layer disposed on an interface layer with desired film properties. In one embodiment, a method of fabricating a coating material includes providing a base structure comprising an aluminum or silicon containing material, forming an interface layer on the base structure, wherein the interface layer comprises one or more elements from at least one of Ta, Al, Si, Mg, Y, or combinations thereof, and forming a coating layer on the interface layer, wherein the coating layer has a molecular structure of SivYwMgxAlyOz. In another embodiment, a chamber component includes an interface layer disposed on a base structure, wherein the interface layer is selected from at least one of Ta, Al, Si, Mg, Y, or combinations thereof, and a coating layer disposed on the interface layer, wherein the coating layer has a molecular structure of SivYwMgxAlyOz.
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公开(公告)号：US20200020511A1
公开(公告)日：2020-01-16
申请号：US16412109
申请日：2019-05-14
Applicant: Applied Materials, Inc.
Inventor： Karthikeyan BALARAMAN , Balamurugan RAMASAMY , Kartik SHAH , Mats LARSSON , Kevin A. PAPKE , Rajasekhar PATIBANDLA , Sathyanarayana BINDIGANAVALE , Umesh M. KELKAR
Abstract: Embodiments of the present disclosure provide protective coatings, i.e., diffusion and thermal barrier coatings, for aluminum alloy substrates. In particular, embodiments described herein provide a protective layer stack comprising a tantalum nitride layer disposed on an aluminum alloy substrate and a ceramic layer disposed on the tantalum nitride layer. In some embodiments, the aluminum alloy substrates comprise processing chambers and processing chamber components used in the field of electronic device manufacturing, e.g., semiconductor device manufacturing. In one embodiment, an article includes a substrate, a tantalum nitride layer disposed on the substrate, and a ceramic layer disposed on the tantalum nitride layer.
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Patent Agency Ranking
公开(公告)号：US20180052104A1
公开(公告)日：2018-02-22
申请号：US15243282
申请日：2016-08-22
Applicant: Applied Materials, Inc.
Inventor： Mats LARSSON , Kevin A. PAPKE
CPC classification number: G01N21/64 , G01N3/56 , G01N2201/06113 , H01J37/32082 , H01J37/32458 , H01J37/32467 , H01J37/32477 , H01J37/32697 , H01J37/32715 , H01J37/32935 , H01J2237/24592 , H01J2237/334
Abstract: The present invention generally relates method and part wear indicator for identifying an eroded chamber component in an etching or other plasma processing chamber. In one embodiment, a chamber component has a part wear indicator. The chamber component has a body. The body has a top surface and a bottom surface. A part wear indicator material is disposed in the chamber component body. The part wear indicator has a body. The body of the part wear indicator has a transparent first layer. A second layer has a tracer material disposed therein and wherein the first layer is closer to the top surface of the top surface than the second layer.
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公开(公告)号：US20160336149A1
公开(公告)日：2016-11-17
申请号：US14714022
申请日：2015-05-15
Applicant: Applied Materials, Inc.
Inventor： Mats LARSSON , Wai-Fan YAU
IPC: H01J37/32
CPC classification number: H01J37/32467 , H01J37/32651 , H01J37/32935
Abstract: A method and apparatus for monitoring wear of a chamber component is disclosed herein. In one embodiment, a chamber component is provided. The chamber component includes a body including a first material, a second material disposed on the first material, the second material having an exposed surface defining an interior surface of the chamber component, and a wear surface disposed at a wear depth below the exposed surface of the second material, the wear surface comprising a third material having a composition that is different than a composition of the first material and the second material.
Abstract translation: 本文公开了一种用于监测室部件的磨损的方法和装置。 在一个实施例中，提供腔室部件。 室部件包括主体，该主体包括第一材料，设置在第一材料上的第二材料，第二材料具有限定室部件内表面的暴露表面，以及设置在磨损深度低于暴露表面的磨损深度的磨损表面 所述第二材料，所述磨损表面包括具有不同于所述第一材料和所述第二材料的组成的组成的第三材料。
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公开(公告)号：US20230167543A1
公开(公告)日：2023-06-01
申请号：US18101944
申请日：2023-01-26
Applicant: Applied Materials, Inc.
Inventor： Mats LARSSON , Kevin A. PAPKE , Chirag Shaileshbhai KHAIRNAR , Rajasekhar PATIBANDLA , Karthikeyan BALARAMAN , Balamurugan RAMASAMY , Kartik SHAH , Umesh M. KELKAR
IPC: C23C16/02 , C23C16/40 , C23C16/56 , C23C16/513 , C23C16/44 , C04B35/18 , C04B35/44 , C04B35/10 , C04B35/20 , C04B35/505 , C04B35/14 , C04B35/04 , C04B35/16 , C04B35/01 , C04B35/195
CPC classification number: C23C16/0281 , C23C16/405 , C23C16/56 , C23C16/513 , C23C16/4404 , C04B35/18 , C04B35/44 , C04B35/10 , C04B35/20 , C04B35/505 , C04B35/14 , C04B35/04 , C04B35/16 , C04B35/01 , C04B35/195 , Y10S156/914 , Y10T428/1317 , Y10T428/12743 , Y10T428/1259 , Y10T428/12667 , Y10T428/12764 , Y10T428/12604 , Y10T428/31504 , Y10T428/12736 , Y10T428/1266 , Y10T428/12597 , Y10T428/12611 , Y10T428/31678 , C04B2235/96
Abstract: One embodiment of the disclosure provides a method of fabricating a chamber component with a coating layer disposed on an interface layer with desired film properties. In one embodiment, a method of fabricating a coating material includes providing a base structure comprising an aluminum or silicon containing material, forming an interface layer on the base structure, wherein the interface layer comprises one or more elements from at least one of Ta, Al, Si, Mg, Y, or combinations thereof, and forming a coating layer on the interface layer, wherein the coating layer has a molecular structure of SivYwMgxAlyOz. In another embodiment, a chamber component includes an interface layer disposed on a base structure, wherein the interface layer is selected from at least one of Ta, Al, Si, Mg, Y, or combinations thereof, and a coating layer disposed on the interface layer, wherein the coating layer has a molecular structure of SivYwMgxAlyOz.
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公开(公告)号：US20200013589A1
公开(公告)日：2020-01-09
申请号：US16401871
申请日：2019-05-02
Applicant: Applied Materials, Inc.
Inventor： Karthikeyan BALARAMAN , Sathyanarayana BINDIGANAVALE , Rajasekhar PATIBANDLA , Balamurugan RAMASAMY , Kartik SHAH , Umesh M. KELKAR , Mats LARSSON , Kevin A. PAPKE , William M. LU
Abstract: Embodiments of the present disclosure are directed towards a protective multilayer coating for process chamber components exposed to temperatures from about 20° C. to about 300° C. during use of the process chamber. The protective multilayer coating comprises a bond layer and a top layer, the bond layer is formed on a chamber component to reduce the stress between the top layer and the chamber component. The reduced stress decreases or prevents particle shedding from the top layer of the multilayer coating during and after use of the process chamber. The bond layer comprises titanium, titanium nitride, aluminum, or combinations thereof, and the top layer comprises tungsten nitride.
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公开(公告)号：US20180105701A1
公开(公告)日：2018-04-19
申请号：US15784058
申请日：2017-10-13
Applicant: Applied Materials, Inc.
Inventor： Mats LARSSON , Yogita PAREEK , Jianqi WANG , Kevin A. PAPKE
CPC classification number: C09D5/08 , B05D1/18 , C09D1/00 , H01J37/32495 , H01J2237/334 , H01L21/67069 , H01L21/6831
Abstract: Embodiments of the disclosure provide a chamber component for use in a plasma processing chamber apparatus. The chamber component may include a coating layer that provides a fluorine-rich surface. In one embodiment, a chamber component, for use in a plasma processing apparatus, includes a body having an outer layer comprising yttria having a coating layer formed thereon, wherein the coating layer comprises a yttrium fluoride containing material.
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