公开(公告)号：US20230122695A1

公开(公告)日：2023-04-20

申请号：US18067632

申请日：2022-12-16

Applicant: Applied Materials, Inc.

Inventor： Dmitry Lubomirsky ,  Xiao Ming He ,  Jennifer Y. Sun ,  Xiaowei Wu ,  Laksheswar Kalita ,  Soonam Park

IPC: H01J37/32 ,  C23C16/458 ,  C23C16/46

Abstract: A ground shield of a processing chamber includes a ceramic body including a ground shield plate, a raised edge extending from an upper surface of the ground shield plate, and a hollow shaft that extends from a lower surface of the ground shield plate. An electrically conductive layer is formed on and conforms to at least the upper surface of the ground shield plate and an interior surface of the hollow shaft. A first protective layer is formed on at least the electrically conductive layer. A heater plate of a heater first within the raised edge and on the ground shield plate such that the heater plate is disposed on top of the first protective layer, the electrically conductive layer, and the upper surface of the ground shield plate.

公开(公告)号：US11658014B2

公开(公告)日：2023-05-23

申请号：US16846295

申请日：2020-04-11

Applicant: APPLIED MATERIALS, INC.

Inventor： Pingyan Lei ,  Dien-Yeh Wu ,  Xiao Ming He ,  Jennifer Y. Sun ,  Lei Zhou ,  Takashi Kuratomi ,  Avgerinos V. Gelatos ,  Mei Chang ,  Steven D. Marcus

IPC: C23C16/06 ,  C23C16/44 ,  H01J37/32 ,  H01L21/67 ,  C23C16/455 ,  H01L21/285

CPC classification number: H01J37/32477 ,  C23C16/06 ,  C23C16/4404 ,  C23C16/45536 ,  C23C16/45544 ,  C23C16/45565 ,  H01J37/32467 ,  H01L21/28556 ,  H01L21/67017 ,  H01J2237/3321

Abstract: Methods and apparatus for depositing a coating on a semiconductor manufacturing apparatus component are provided herein. In some embodiments, a method of depositing a coating on a semiconductor manufacturing apparatus component includes: sequentially exposing a semiconductor manufacturing apparatus component including nickel or nickel alloy to an aluminum precursor and a reactant to form an aluminum containing layer on a surface of the semiconductor manufacturing apparatus component by a deposition process.

公开(公告)号：US11667578B2

公开(公告)日：2023-06-06

申请号：US17686053

申请日：2022-03-03

Applicant: Applied Materials, Inc.

Inventor： Guodong Zhan ,  Xiaowei Wu ,  Xiao Ming He ,  Jennifer Y. Sun

IPC: C04B35/505 ,  C23C16/30 ,  C23C16/455 ,  C23C4/134 ,  C23C4/10 ,  C04B35/628 ,  C04B35/622 ,  C04B35/64 ,  C04B35/632 ,  C23C16/44 ,  C04B35/486 ,  C23C14/34 ,  C04B35/645 ,  C23C16/40 ,  C01F17/265 ,  C01F17/218

CPC classification number: C04B35/505 ,  C01F17/218 ,  C01F17/265 ,  C04B35/486 ,  C04B35/62222 ,  C04B35/62813 ,  C04B35/62815 ,  C04B35/62823 ,  C04B35/62828 ,  C04B35/62884 ,  C04B35/62889 ,  C04B35/62897 ,  C04B35/6325 ,  C04B35/64 ,  C04B35/645 ,  C23C4/10 ,  C23C4/134 ,  C23C14/3414 ,  C23C16/30 ,  C23C16/405 ,  C23C16/4417 ,  C23C16/45525 ,  C23C16/45555 ,  C01P2004/64 ,  C01P2004/84 ,  C04B2235/3222 ,  C04B2235/3224 ,  C04B2235/3225 ,  C04B2235/3227 ,  C04B2235/3244 ,  C04B2235/441 ,  C04B2235/445 ,  C04B2235/52 ,  C04B2235/528 ,  C04B2235/5454 ,  C04B2235/666 ,  C04B2235/77 ,  C04B2235/96 ,  C04B2235/9607

Abstract: Methods of forming nanoceramic materials and components. The methods may include performing atomic layer deposition to form a plurality of nanoparticles, including forming a thin film coating over core particles, or sintering the nanoparticles in a mold. The nanoparticles can include a first material selected from a rare earth metal-containing oxide, a rare earth metal-containing fluoride, a rare earth metal-containing oxyfluoride or combinations thereof.

公开(公告)号：US11562890B2

公开(公告)日：2023-01-24

申请号：US16212580

申请日：2018-12-06

Applicant: Applied Materials, Inc.

Inventor： Dmitry Lubomirsky ,  Xiao Ming He ,  Jennifer Y. Sun ,  Xiaowei Wu ,  Laksheswar Kalita ,  Soonam Park

IPC: H01J37/32 ,  C23C16/458 ,  C23C16/46

Abstract: A substrate support assembly includes a ground shield and a heater that is surrounded by the ground shield. The ground shield includes a plate. In one embodiment, the ground shield is composed of a ceramic body and includes an electrically conductive layer, a first protective layer on the upper surface of the plate. In another embodiment, the ground shield is composed of an electrically conductive body and a first protective layer on the upper surface of the plate.

公开(公告)号：US20220234959A1

公开(公告)日：2022-07-28

申请号：US17686053

申请日：2022-03-03

Applicant: Applied Materials, Inc.

Inventor： Guodong Zhan ,  Xiaowei Wu ,  Xiao Ming He ,  Jennifer Y. Sun

IPC: C04B35/505 ,  C23C16/30 ,  C23C16/455 ,  C23C4/134 ,  C23C4/10 ,  C04B35/628 ,  C04B35/622 ,  C04B35/64 ,  C04B35/632 ,  C23C16/44 ,  C04B35/486 ,  C23C14/34 ,  C04B35/645 ,  C23C16/40 ,  C01F17/265 ,  C01F17/218

Abstract: Methods of forming nanoceramic materials and components. The methods may include performing atomic layer deposition to form a plurality of nanoparticles, including forming a thin film coating over core particles, or sintering the nanoparticles in a mold. The nanoparticles can include a first material selected from a rare earth metal-containing oxide, a rare earth metal-containing fluoride, a rare earth metal-containing oxyfluoride or combinations thereof.

公开(公告)号：US20200185203A1

公开(公告)日：2020-06-11

申请号：US16212580

申请日：2018-12-06

Applicant: Applied Materials, Inc.

Inventor： Dmitry Lubomirsky ,  Xiao Ming He ,  Jennifer Y. Sun ,  Xiaowei Wu ,  Laksheswar Kalita ,  Soonam Park

IPC: H01J37/32 ,  C23C16/458 ,  C23C16/46

Abstract: A substrate support assembly includes a ground shield and a heater that is surrounded by the ground shield. The ground shield includes a plate. In one embodiment, the ground shield is composed of a ceramic body and includes an electrically conductive layer, a first protective layer on the upper surface of the plate. In another embodiment, the ground shield is composed of an electrically conductive body and a first protective layer on the upper surface of the plate.

公开(公告)号：US20190127280A1

公开(公告)日：2019-05-02

申请号：US16168003

申请日：2018-10-23

Applicant: Applied Materials, Inc.

Inventor： Guodong Zhan ,  Xiaowei Wu ,  Xiao Ming He ,  Jennifer Y. Sun

IPC: C04B35/505 ,  C23C16/30 ,  C23C16/455 ,  C23C4/134 ,  C23C4/10 ,  C04B35/628 ,  C04B35/622 ,  C04B35/64

Abstract: Nanopowders containing nanoparticles having a core particle with a thin film coating. The core particles and thin film coatings are, independently, formed from at least one of a rare earth metal-containing oxide, a rare earth metal-containing fluoride, a rare earth metal-containing oxyfluoride or combinations thereof. The thin film coating may be formed using a non-line of sight technique such as atomic layer deposition (ALD). Also disclosed herein are nanoceramic materials formed from the nanopowders and methods of making and using the nanopowders.

公开(公告)号：US20240400461A1

公开(公告)日：2024-12-05

申请号：US18802002

申请日：2024-08-13

Applicant: Applied Materials, Inc.

Inventor： Guodong Zhan ,  Xiaowei Wu ,  Xiao Ming He ,  Jennifer Y. Sun

IPC: C04B35/505 ,  C01F17/218 ,  C01F17/265 ,  C04B35/486 ,  C04B35/622 ,  C04B35/628 ,  C04B35/632 ,  C04B35/64 ,  C04B35/645 ,  C23C4/10 ,  C23C4/134 ,  C23C14/34 ,  C23C16/30 ,  C23C16/40 ,  C23C16/44 ,  C23C16/455

Abstract: Disclosed are methods of forming a chamber component for a process chamber. The methods may include filling a mold with nanoparticles or plasma spraying nanoparticles, where at least a portion of the nanoparticles include a core particle and a thin film coating over the core particle. The core particle and thin film are formed of, independently, a rare earth metal-containing oxide, a rare earth metal-containing fluoride, a rare earth metal-containing oxyfluoride, or combinations thereof. The nanoparticles may have a donut-shape having a spherical form with indentations on opposite sides. The methods also may include sintering the nanoparticles to form the chamber component and materials. Further described are chamber components and coatings formed from the described nanoparticles.

公开(公告)号：US12098107B2

公开(公告)日：2024-09-24

申请号：US18140372

申请日：2023-04-27

Applicant: Applied Materials, Inc.

Inventor： Guodong Zhan ,  Xiaowei Wu ,  Xiao Ming He ,  Jennifer Y. Sun

IPC: C04B35/505 ,  C01F17/218 ,  C01F17/265 ,  C04B35/486 ,  C04B35/622 ,  C04B35/628 ,  C04B35/632 ,  C04B35/64 ,  C04B35/645 ,  C23C4/10 ,  C23C4/134 ,  C23C14/34 ,  C23C16/30 ,  C23C16/40 ,  C23C16/44 ,  C23C16/455

CPC classification number: C04B35/505 ,  C01F17/218 ,  C01F17/265 ,  C04B35/486 ,  C04B35/62222 ,  C04B35/62813 ,  C04B35/62815 ,  C04B35/62823 ,  C04B35/62828 ,  C04B35/62884 ,  C04B35/62889 ,  C04B35/62897 ,  C04B35/6325 ,  C04B35/64 ,  C04B35/645 ,  C23C4/10 ,  C23C4/134 ,  C23C14/3414 ,  C23C16/30 ,  C23C16/405 ,  C23C16/4417 ,  C23C16/45525 ,  C23C16/45555 ,  C01P2004/64 ,  C01P2004/84 ,  C04B2235/3222 ,  C04B2235/3224 ,  C04B2235/3225 ,  C04B2235/3227 ,  C04B2235/3244 ,  C04B2235/441 ,  C04B2235/445 ,  C04B2235/52 ,  C04B2235/528 ,  C04B2235/5454 ,  C04B2235/666 ,  C04B2235/77 ,  C04B2235/96 ,  C04B2235/9607

Abstract: Disclosed are methods of forming a chamber component for a process chamber. The methods may include filling a mold with nanoparticles or plasma spraying nanoparticles, where at least a portion of the nanoparticles include a core particle and a thin film coating over the core particle. The core particle and thin film are formed of, independently, a rare earth metal-containing oxide, a rare earth metal-containing fluoride, a rare earth metal-containing oxyfluoride, or combinations thereof. The nanoparticles may have a donut-shape having a spherical form with indentations on opposite sides. The methods also may include sintering the nanoparticles to form the chamber component and materials. Further described are chamber components and coatings formed from the described nanoparticles.

公开(公告)号：US20230322628A1

公开(公告)日：2023-10-12

申请号：US18140372

申请日：2023-04-27

Applicant: Applied Materials, Inc.

Inventor： Guodong Zhan ,  Xiaowei Wu ,  Xiao Ming He ,  Jennifer Y. Sun

IPC: C04B35/505 ,  C01F17/265 ,  C04B35/486 ,  C04B35/622 ,  C04B35/628 ,  C04B35/632 ,  C04B35/64 ,  C04B35/645 ,  C23C4/10 ,  C23C4/134 ,  C23C14/34 ,  C23C16/30 ,  C23C16/40 ,  C23C16/44 ,  C23C16/455 ,  C01F17/218

CPC classification number: C04B35/505 ,  C01F17/218 ,  C01F17/265 ,  C04B35/486 ,  C04B35/62222 ,  C04B35/62813 ,  C04B35/62815 ,  C04B35/62823 ,  C04B35/62828 ,  C04B35/62884 ,  C04B35/62889 ,  C04B35/62897 ,  C04B35/6325 ,  C04B35/64 ,  C04B35/645 ,  C23C4/10 ,  C23C4/134 ,  C23C14/3414 ,  C23C16/30 ,  C23C16/405 ,  C23C16/4417 ,  C23C16/45525 ,  C23C16/45555 ,  C01P2004/64 ,  C01P2004/84 ,  C04B2235/3222 ,  C04B2235/3224 ,  C04B2235/3225 ,  C04B2235/3227 ,  C04B2235/3244 ,  C04B2235/441 ,  C04B2235/445 ,  C04B2235/52 ,  C04B2235/528 ,  C04B2235/5454 ,  C04B2235/666 ,  C04B2235/77 ,  C04B2235/96 ,  C04B2235/9607

Abstract: Disclosed are methods of forming a chamber component for a process chamber. The methods may include filling a mold with nanoparticles or plasma spraying nanoparticles, where at least a portion of the nanoparticles include a core particle and a thin film coating over the core particle. The core particle and thin film are formed of, independently, a rare earth metal-containing oxide, a rare earth metal-containing fluoride, a rare earth metal-containing oxyfluoride, or combinations thereof. The nanoparticles may have a donut-shape having a spherical form with indentations on opposite sides. The methods also may include sintering the nanoparticles to form the chamber component and materials. Further described are chamber components and coatings formed from the described nanoparticles.