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公开(公告)号：US20240230530A9
公开(公告)日：2024-07-11
申请号：US17972339
申请日：2022-10-24
Applicant: Applied Materials Israel Ltd.
Inventor： Benny Kirshner , Boris Golberg
CPC classification number: G01N21/47 , G01N21/9501 , G01N2201/0636
Abstract: A method for phase retrieval, the method may include (a) obtaining multiple out-of-focus intensity images of one or more point spread function targets; wherein the out-of-focus intensity images are generated by based on residual collected light signals obtained by a residual collection channel of an optical unit having a numerical aperture that exceeds 0.8; and (b) calculating phase information, based on the multiple out-of-focus intensity images and on a vectorial model of the point spread function.
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2.发明授权公开(公告)号：US10054551B2
公开(公告)日：2018-08-21
申请号：US15134278
申请日：2016-04-20
Applicant: APPLIED MATERIALS ISRAEL LTD.
Inventor： Boris Golberg , Ron Naftali
IPC: G01N21/88
CPC classification number: G01N21/8851 , G01N2201/063 , G01N2201/105
Abstract: An inspection system that may include an illumination module that may be configured to scan a sample during multiple scan iterations; wherein during each scan iteration the illumination module scans each beam of a plurality of spaced apart beams along a scan line; a mechanical stage that may be configured to move the sample during the multiple scan iterations; a detection module; and a processor; wherein when the inspection system operates in an interlaced mode, the mechanical stage may be configured to move at a first speed thereby preventing a substantial overlap between scan lines obtained during the multiple scan iterations; wherein when the inspection system operates in a non-interlaced mode: the mechanical stage may be configured to move at a second speed that differs from the first speed thereby introducing an overlap between scan lines of different beams that may be obtained during different scan iterations; the detection module may be configured to generate detection signals in response to a detection of radiation emitted from the sample as a result of each scan line; and wherein the processor may be configured to independently process detection signals relating to different scan lines.
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3.发明申请公开(公告)号：US20170307539A1
公开(公告)日：2017-10-26
申请号：US15134278
申请日：2016-04-20
Applicant: APPLIED MATERIALS ISRAEL LTD.
Inventor： Boris Golberg , Ron Naftali
IPC: G01N21/88
CPC classification number: G01N21/8851 , G01N2201/063 , G01N2201/105
Abstract: An inspection system that may include an illumination module that may be configured to scan a sample during multiple scan iterations; wherein during each scan iteration the illumination module scans each beam of a plurality of spaced apart beams along a scan line; a mechanical stage that may be configured to move the sample during the multiple scan iterations; a detection module; and a processor; wherein when the inspection system operates in an interlaced mode, the mechanical stage may be configured to move at a first speed thereby preventing a substantial overlap between scan lines obtained during the multiple scan iterations; wherein when the inspection system operates in a non-interlaced mode: the mechanical stage may be configured to move at a second speed that differs from the first speed thereby introducing an overlap between scan lines of different beams that may be obtained during different scan iterations; the detection module may be configured to generate detection signals in response to a detection of radiation emitted from the sample as a result of each scan line; and wherein the processor may be configured to independently process detection signals relating to different scan lines.
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公开(公告)号：US20210372936A1
公开(公告)日：2021-12-02
申请号：US16885785
申请日：2020-05-28
Applicant: Applied Materials Israel Ltd.
Inventor： Boris Golberg , Roman Naidis
Abstract: A method and a system for obtaining information from a sample. The system may include (i) a spatial filter that includes a blocking element and an aperture; (ii) an illumination unit; and (iii) an optical unit that includes an optical objective assembly. The illumination unit may be configured to illuminate the optical objective assembly with oblique radiation. The optical objective assembly may be configured to (a) focus the oblique radiation onto the sample, (b) collect radiation from the sample to provide collected radiation, and (c) reflect the oblique radiation to provide back reflected radiation. The optical unit may be configured to (a) focus the collected radiation to provide focused collected radiation, (b) direct the focused collection radiation towards the aperture, (c) focus the back reflected radiation to provide focused back reflected radiation, and (d) direct the focused back reflected radiation towards the blocking element.
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公开(公告)号：US10177048B2
公开(公告)日：2019-01-08
申请号：US14639003
申请日：2015-03-04
Applicant: APPLIED MATERIALS ISRAEL LTD.
Inventor： Juergen Frosien , Jacob Levin , Igor Krivts (Krayvitz) , Yoram Uziel , Boris Golberg
Abstract: A system for inspecting and reviewing a sample, the system may include a chamber that is arranged to receive the sample and to maintain vacuum within the chamber during at least a scan period; an inspection unit; a review unit; and a mechanical stage for moving the sample, according to a scan pattern and during the scan period, in relation to the inspection unit and the review unit while a spatial relationship between the inspection unit and the review unit remains unchanged; wherein the inspection unit is arranged to detect, during the scan period, multiple suspected defects of the sample; and wherein the review unit is arranged to (a) receive, during the scan period, information about the multiple suspected defects; and (b) locate, during the scan period and in response to the information about the multiple suspected defects, at least one actual defect.
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Patent Agency Ranking
公开(公告)号：US09395266B2
公开(公告)日：2016-07-19
申请号：US14560932
申请日：2014-12-04
Applicant: APPLIED MATERIALS ISRAEL LTD.
Inventor： Boris Golberg , Amir Moshe Sagiv , Haim Feldman , Uriel Malul , Adam Baer
CPC classification number: G01M11/00 , G01N21/8806 , G01N21/9501 , G01N2021/95676 , G02B21/125
Abstract: An on-tool measurement system and a method for measuring optical system's wavefront (WF) aberrations are disclosed. The on-tool measurement system includes an optical setup comprising a moveable deflection element further comprising a highly transparent region. The deflection element includes a first surface configured to project a first image of at least one object onto a sensor and the highly transparent region includes a second surface configured to project a second image of the at least one object onto the sensor. The on-tool measurement system includes a sensor configured to capture the first and second images and a controller configured to measure differential displacements between the first and second images at each deflection element position and to calculate the optical setup local WF gradients that depend on the measured differential displacements.
Abstract translation: 公开了一种工具测量系统和用于测量光学系统的波前（WF）像差的方法。 工具测量系统包括光学装置，其包括还包括高度透明区域的可移动偏转元件。 偏转元件包括被配置为将至少一个物体的第一图像突出到传感器上的第一表面，并且高透明区域包括配置成将至少一个物体的第二图像投影到传感器上的第二表面。 工具测量系统包括被配置为捕获第一和第二图像的传感器和被配置为测量在每个偏转元件位置处的第一和第二图像之间的差分位移的控制器，并且计算取决于被测量的光学设置局部WF梯度 差分位移。
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公开(公告)号：US12092584B2
公开(公告)日：2024-09-17
申请号：US17729863
申请日：2022-04-26
Applicant: Applied Materials Israel Ltd.
Inventor： Boris Golberg
IPC: G01N21/88 , G01N21/956
CPC classification number: G01N21/8851 , G01N21/95623 , G01N2021/8864
Abstract: A method for high throughput defect detection, the method may include (i) performing, using first detection channels, a simultaneous inspection process through a segmented pupil plane that comprises multiple pupil plane segments to select one or more pupil plane segments of interest out of multiple pupil plane segments; (ii) configuring one or more configurable filters related to second detection channels to pass radiation received from the one or more pupil plane segment of interest and to block radiation received from one or more non-of-interest pupil plane segments; and (iii) performing, using the second detection channels, a partially masked pupil plane inspection process.
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公开(公告)号：US20230341334A1
公开(公告)日：2023-10-26
申请号：US17729863
申请日：2022-04-26
Applicant: Applied Materials Israel Ltd.
Inventor： Boris Golberg
IPC: G01N21/88 , G01N21/956
CPC classification number: G01N21/8851 , G01N21/95623 , G01N2021/8864
Abstract: A method for high throughput defect detection, the method may include (i) performing, using first detection channels, a simultaneous inspection process through a segmented pupil plane that comprises multiple pupil plane segments to select one or more pupil plane segments of interest out of multiple pupil plane segments; (ii) configuring one or more configurable filters related to second detection channels to pass radiation received from the one or more pupil plane segment of interest and to block radiation received from one or more non-of-interest pupil plane segments; and (iii) performing, using the second detection channels, a partially masked pupil plane inspection process.
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公开(公告)号：US20180209915A1
公开(公告)日：2018-07-26
申请号：US15412879
申请日：2017-01-23
Applicant: APPLIED MATERIALS ISRAEL LTD.
Inventor： Haim Feldman , Boris Golberg , Ido Dolev
CPC classification number: G01N21/8806 , G01N21/8851 , G01N21/9501 , G02B21/0016 , G02B21/06 , G02B26/0891 , G02B27/0911 , G02B27/0972
Abstract: An illumination module that includes a pair of anamorphic prisms that comprises a first anamorphic prism and a second anamorphic prism; wherein the pair of anamorphic prisms is configured to (a) receive a first radiation beam that propagates along a first optical axis, and (b) asymmetrically magnify the first radiation beam to provide a second radiation beam that propagates along a second optical axis that is parallel to the first optical axis; and a rectangular prism that is configured to receive the second radiation beam and perform a lateral shift of the second radiation beam to provide a third radiation beam; and a rotating mechanism that is configured to change an asymmetrical magnification of the pair of anamorphic prisms by rotating at least one of the first anamorphic prism and the second anamorphic prism.
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公开(公告)号：US09958670B2
公开(公告)日：2018-05-01
申请号：US15270311
申请日：2016-09-20
Applicant: APPLIED MATERIALS ISRAEL LTD.
Inventor： Ron Naftail , Boris Golberg , Rami Elichai
CPC classification number: G02B26/10 , G01N21/8806 , G01N21/9501 , G01N2201/105 , G02B21/002 , G02B27/0966
Abstract: A scanning system that includes an illumination module that is configured to scan, at a first direction, an elongated radiation spot over an object; and a collection module that is configured to (a) collect a collected radiation beam from the object, and (b) optically manipulate the collected radiation beam to provide a counter-scan beam is directed towards a set of detection units and has a focal point that is positioned at a same location regardless of the propagation of the elongated radiation spot along the first direction.
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