公开(公告)号：US20060139604A1

公开(公告)日：2006-06-29

申请号：US11319199

申请日：2005-12-28

申请人： Arnoud Wassink ,  Levinus Bakker ,  Johannes Moors ,  Frank Schuurmans

发明人： Arnoud Wassink ,  Levinus Bakker ,  Johannes Moors ,  Frank Schuurmans

IPC分类号： G02B5/08 ,  G03B27/54

CPC分类号： G03F7/70916

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a projection system configured to project the radiation beam onto a substrate, and a filter system for filtering debris particles out of the radiation beam. The filter system includes a plurality of foils for trapping the debris particles, a support for holding the plurality of foils, and a cooling system having a surface that is arranged to be cooled. The cooling system and the support are positioned with respect to each other such that a gap is formed between the surface of the cooling system and the support. The cooling system is further arranged to inject gas into the gap.

公开(公告)号：US20060219950A1

公开(公告)日：2006-10-05

申请号：US11094490

申请日：2005-03-31

申请人： Levinus Bakker ,  Vadim Banine ,  Vladimir Ivanov ,  Konstantin Koshelev ,  Bastiaan Mertens ,  Johannes Moors ,  Frank Schuurmans ,  Givi Zukavishvili ,  Bastiaan Wolschrijn ,  Marc Van Der Velden

发明人： Levinus Bakker ,  Vadim Banine ,  Vladimir Ivanov ,  Konstantin Koshelev ,  Bastiaan Mertens ,  Johannes Moors ,  Frank Schuurmans ,  Givi Zukavishvili ,  Bastiaan Wolschrijn ,  Marc Van Der Velden

IPC分类号： G03F7/20 ,  G21K5/00

CPC分类号： G03F7/70933 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70916

摘要： A lithographic apparatus is arranged to project a beam from a radiation source onto a substrate. The apparatus includes an optical element in a path of the beam, a gas inlet for introducing a gas into the path of the beam so that the gas will be ionized by the beam to create electric fields toward the optical element, and a gas source coupled to the gas inlet for supplying the gas. The gas has a threshold of kinetic energy for sputtering the optical element that is greater than the kinetic energy developed by ions of the gas in the electric fields.

摘要翻译： 光刻设备被布置成将来自辐射源的光束投影到基底上。 该装置包括在光束的路径中的光学元件，用于将气体引入光束的路径中的气体入口，使得气体将被光束离子化以产生朝向光学元件的电场，并且气体源耦合 到用于供应气体的气体入口。 气体具有用于溅射光学元件的动能阈值，其大于由电场中的气体的离子产生的动能。

公开(公告)号：US20060061740A1

公开(公告)日：2006-03-23

申请号：US10944422

申请日：2004-09-20

申请人： Levinus Bakker ,  Vadim Banine ,  Arnoud Wassink

发明人： Levinus Bakker ,  Vadim Banine ,  Arnoud Wassink

IPC分类号： G03B27/52

CPC分类号： G03F7/70916 ,  G03F7/70058

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam substantially from a light emitting point. The illumination system includes a contaminant trapping system. The trapping system includes a contaminant trap having a central zone and a peripheral zone. The trap includes a plurality of platelets that extend substantially outwards through the peripheral zone. The light emitting point is in a plane with which the platelets coincide. Each of the platelets has a normal with a component directed towards the central zone.

摘要翻译： 光刻设备包括被配置为基本上从发光点调节辐射束的照明系统。 照明系统包括污染物捕集系统。 捕集系统包括具有中心区域和周边区域的污染物阱。 捕获器包括多个基本上向外延伸通过周边区域的血小板。 发光点在与血小板重合的平面中。 每个血小板具有正常的，部件指向中心区。

公开(公告)号：US20060175558A1

公开(公告)日：2006-08-10

申请号：US11051477

申请日：2005-02-07

申请人： Levinus Bakker ,  Vadim Banine ,  Johannes Josephina Moors ,  Carolus Ida Maria Spee ,  Johannes Leonardus Franken ,  Arnoud Wassink ,  Paul Antonius Brom

发明人： Levinus Bakker ,  Vadim Banine ,  Johannes Josephina Moors ,  Carolus Ida Maria Spee ,  Johannes Leonardus Franken ,  Arnoud Wassink ,  Paul Antonius Brom

IPC分类号： G03B7/20

CPC分类号： G03F7/70175 ,  G03F7/70916

摘要： A method for removal of deposition on a radiation collector of a lithographic apparatus includes providing a gas barrier to an end of a radiation collector, thereby providing a radiation collector enclosure volume; providing a gas to the enclosure volume, the gas selected from a halogen containing gas and a hydrogen containing gas; and removing at least part of the deposition from the radiation collector. A lithographic apparatus includes a radiation collector; a circumferential hull enclosing the radiation collector; a gas barrier at an end of the radiation collector, thereby providing a radiation collector enclosure volume. The radiation collector is enclosed by the circumferential hull and the gas barrier. An inlet provides a gas to the radiation collector enclosure volume and an outlet removes a gas from the radiation collector enclosure volume.

摘要翻译： 用于去除光刻设备的辐射收集器上的沉积的方法包括向辐射收集器的端部提供气体阻挡层，从而提供辐射收集器外壳体积; 向封闭体积提供气体，所述气体选自含卤素气体和含氢气体; 以及从所述辐射收集器去除所述沉积物的至少一部分。 光刻设备包括辐射收集器; 围绕辐射收集器的周向船体; 在辐射收集器的端部处的气体屏障，从而提供辐射收集器外壳体积。 辐射收集器被周向壳体和气体屏障包围。 入口为辐射收集器外壳体积提供气体，出口从辐射收集器外壳体积中除去气体。

公开(公告)号：US20070140910A1

公开(公告)日：2007-06-21

申请号：US11311623

申请日：2005-12-20

申请人： Vadim Banine ,  Levinus Bakker ,  Ralph Kurt ,  Johannes Moors ,  Lucas Stevens ,  Peter Zalm

发明人： Vadim Banine ,  Levinus Bakker ,  Ralph Kurt ,  Johannes Moors ,  Lucas Stevens ,  Peter Zalm

IPC分类号： G01N33/00

CPC分类号： G01N25/142 ,  G01N25/68 ,  Y10T436/25875

摘要： A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.

摘要翻译： 一种用于检测光刻设备的内部空间中的至少一种污染物质的系统，包括：被配置为与所述内部空间接触的至少一个监测表面;被配置为将所述监测表面的温度控制在至少 一个检测温度，以及至少一个检测器，被配置为检测所述至少一种污染物质到所述监测表面上的冷凝。

公开(公告)号：US20050098741A1

公开(公告)日：2005-05-12

申请号：US11000381

申请日：2004-12-01

申请人： Levinus Bakker ,  Frank Schuurmans ,  Vadim Banine

发明人： Levinus Bakker ,  Frank Schuurmans ,  Vadim Banine

IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/425

CPC分类号： G03F7/70166 ,  G03F7/70058 ,  G03F7/708 ,  G03F7/70825 ,  G03F7/70916 ,  G03F7/70983

摘要： A lithographic projection apparatus for EUV lithography includes a foil trap, or channel barrier. The foil trap forms an open structure after the source to let the radiation pass unhindered. The foil trap is configured to be rotatable around an optical axis. By rotating the foil trap, an impulse transverse to the direction of propagation of the radiation can be transferred on debris present in the beam. This debris will not pass the foil trap. In this way, the amount of debris on the optical components downstream of the foil trap is reduced. The foil trap may be alternately rotated around the optical axis in a first direction and a second direction opposite the first direction.

摘要翻译： 用于EUV光刻的光刻投影装置包括箔陷阱或通道屏障。 箔夹在源之后形成开放结构，以使辐射不受阻碍地通过。 箔捕获器被配置为围绕光轴可旋转。 通过旋转箔捕获器，横向于辐射传播方向的脉冲可以转移到光束中存在的碎片上。 这个碎片不会通过箔片陷阱。 以这种方式，箔陷阱下游的光学部件上的碎屑的量减少。 箔捕获器可以在与第一方向相反的第一方向和第二方向上围绕光轴交替旋转。

公开(公告)号：US20070222956A1

公开(公告)日：2007-09-27

申请号：US11798710

申请日：2007-05-16

申请人： Levinus Bakker ,  Marcel Marie Dierichs ,  Johannes Freriks ,  Frank Schuurmans ,  Jakob Vijfvinkel ,  Wilhelmus Box

发明人： Levinus Bakker ,  Marcel Marie Dierichs ,  Johannes Freriks ,  Frank Schuurmans ,  Jakob Vijfvinkel ,  Wilhelmus Box

IPC分类号： G03B27/52

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70916

摘要： A contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris from the radiation source. The contamination barrier includes a support structure, a plurality of plate members arranged on the support structure and extending in a radial direction from an axis of the support structure, and a shield configured to block at least part of the support structure from being hit by radiation or debris from the radiation source.

摘要翻译： 被配置为允许来自辐射源的辐射通过并捕获来自辐射源的碎屑的污染屏障。 污染屏障包括支撑结构，布置在支撑结构上并沿着径向方向从支撑结构的轴线延伸的多个板构件以及被构造成阻挡支撑结构的至少一部分被辐射撞击的屏蔽 或来自辐射源的碎片。

公开(公告)号：US20050253091A1

公开(公告)日：2005-11-17

申请号：US10844577

申请日：2004-05-13

申请人： Ralph Kurt ,  Levinus Bakker ,  Frank Schuurmans ,  Jan Van Der Werf

发明人： Ralph Kurt ,  Levinus Bakker ,  Frank Schuurmans ,  Jan Van Der Werf

IPC分类号： G03B27/52 ,  G03F7/20 ,  G21K1/06 ,  G21K5/00 ,  G21K5/02 ,  H01L21/027

CPC分类号： B82Y10/00 ,  G03F7/70033 ,  G03F7/7005 ,  G21K1/06

摘要： A lithographic projection apparatus includes an illumination system configured to provide a beam of radiation; a support configured to support a patterning device, the patterning device configured to impart the beam of radiation with a pattern in its cross section; a substrate table configured to hold a substrate, and a projection system configured to project the patterned beam of radiation onto a target portion of the substrate, wherein the illumination system has a radiation source and at least one mirror configured to enhance an output of the source. The illumination system may include a second radiation source and at least one mirror positioned between the radiation sources to image the output of the second source onto the first source, thereby enhancing the output of the source. The radiation sources may be operable to emit radiation in the EUV wavelength range.

摘要翻译： 光刻投影设备包括被配置为提供辐射束的照明系统; 被配置为支撑图案形成装置的支撑件，所述图案形成装置被构造成在其横截面中赋予所述辐射束的图案; 被配置为保持衬底的衬底台和被配置为将所述图案化的辐射束投射到所述衬底的目标部分上的投影系统，其中所述照明系统具有辐射源和至少一个配置成增强所述源的输出的反射镜 。 照明系统可以包括第二辐射源和位于辐射源之间的至少一个反射镜，以将第二源的输出成像到第一源上，从而增强源的输出。 辐射源可以可操作地发射EUV波长范围内的辐射。

公开(公告)号：US20050111080A1

公开(公告)日：2005-05-26

申请号：US10968471

申请日：2004-10-20

申请人： Levinus Bakker ,  Frank Schuurmans

发明人： Levinus Bakker ,  Frank Schuurmans

IPC分类号： G02B1/00 ,  G02B1/10 ,  G02B5/08 ,  G03F1/24 ,  G03F7/20 ,  G21K1/06 ,  G21K5/00 ,  H01L21/00 ,  H01L21/027

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F7/70166 ,  G03F7/70316 ,  G03F7/70916 ,  G03F7/70958 ,  G21K1/06

摘要： A top layer of a predetermined metal is provided on a mirror for use in a lithographic apparatus having source to provide radiation of a desired wavelength. The source generates a stream of undesired metal particles that are deposited to form smaller and larger nuclei on the mirror. The top layer may interdiffuse in a predetermined temperature range with nuclei of the metal deposition. An additional layer of an alloy of the metal particles and the metal of the top layer is formed that has a higher reflectivity than a layer only comprising the metal particles would have.

摘要翻译： 预定金属的顶层设置在用于具有源以提供期望波长的辐射的光刻设备的反射镜上。 源产生不想要的金属颗粒流，其沉积以在反射镜上形成更小和更大的核。 顶层可以在与金属沉积的核的预定温度范围内相互扩散。 形成金属颗粒和顶层金属的合金的附加层，其具有比仅包含金属颗粒将具有的层更高的反射率。

公开(公告)号：US20060250599A1

公开(公告)日：2006-11-09

申请号：US11482147

申请日：2006-07-07

申请人： Levinus Bakker ,  Jeroen Jonkers ,  Frank Schuurmans ,  Hugo Visser

发明人： Levinus Bakker ,  Jeroen Jonkers ,  Frank Schuurmans ,  Hugo Visser

IPC分类号： G03B27/54

CPC分类号： B82Y10/00 ,  G02B17/004 ,  G02B17/006 ,  G02B27/0043 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70891 ,  G03F7/70916

摘要： A lithographic projection apparatus includes a reflector assembly, the reflector assembly includes a first and a second reflector extending in a direction of an optical axis, the first and second reflector each having a reflective surface, a backing surface and an entry section at respectively a first and a second distance from the optical axis, the first distance being larger than the second distance, rays deriving from a point on the optical axis being cut off by the entry sections of the first and second reflectors and being reflected on the reflective surface of the first reflector and defining a high radiation intensity zone and a low radiation intensity zone between the reflectors; a radial support member configured to support the reflectors extending in the low radiation intensity zone, wherein the radial support member creates a shade in a downstream direction of the optical axis and a virtual shade in an upstream direction of the optical axis; and a structure placed in the virtual shade.

摘要翻译： 光刻投影设备包括反射器组件，反射器组件包括沿光轴方向延伸的第一和第二反射器，第一和第二反射器各自具有反射表面，背衬表面和入口部分分别为第一 并且与所述光轴的距离为第二距离，所述第一距离大于所述第二距离，从所述光轴上的点导出的光线被所述第一反射器和所述第二反射器的入射部分切断并且在所述光轴的反射表面上被反射 第一反射器并且在反射器之间限定高辐射强度区域和低辐射强度区域; 径向支撑构件，构造成支撑在低辐射强度区域中延伸的反射器，其中径向支撑构件在光轴的下游方向上产生阴影，并在光轴的上游方向上产生虚拟阴影; 以及放置在虚拟阴影中的结构。