摘要:
A processor includes a scheduler operative to schedule data blocks for transmission from a plurality of queues or other transmission elements, utilizing at least a first table and a second table. The first table may comprise at least first and second first-in first-out (FIFO) lists of entries corresponding to transmission elements for which data blocks are to be scheduled in accordance with a first scheduling algorithm, such as a weighted fair queuing scheduling algorithm. The scheduler maintains a first table pointer identifying at least one of the first and second lists of the first table as having priority over the other of the first and second lists of the first table. The second table includes a plurality of entries corresponding to transmission elements for which data blocks are to be scheduled in accordance with a second scheduling algorithm, such as a constant bit rate or variable bit rate scheduling algorithm. Association of a given one of the transmission elements with a particular one of the second table entries establishes a scheduling rate for that transmission element. The scheduler maintains a second table pointer identifying a current one of the second table entries that is eligible for transmission.
摘要:
In a communication system comprising a link layer device connectable to one or more physical layer devices, at least a given one of a plurality of ports of the one or more physical layer devices is designated as a port for which status information is to be requested by the link layer device on a more frequent basis than such information is to be requested for one or more other ports of the plurality of ports. The ports are then polled by the link layer device in accordance with a non-linear polling sequence such that the at least one designated port is polled more frequently than the one or more other ports. The designated port may comprise a port to which the link layer device transmits data in conjunction with a current data transfer. The non-linear polling sequence may thus be altered dynamically based on particular data transfers that are occurring between a link layer device and a physical layer device in a communication system.
摘要:
Techniques are disclosed for flexible allocation of address pins of an interface bus to particular sub-buses of the interface bus. The interface bus is between at least one physical layer device and a link layer device in a communication system. Each of the sub-buses has an interface block of the link layer device associated therewith, the interface bus being configurable to carry a composite address signal having a plurality of portions each associated with one of the address pins of the interface bus. The interface blocks of the link layer device are controlled such that each of at least a subset of the interface blocks utilizes only particular ones of the address pins that are controllably allocated to the associated sub-bus in accordance with configuration information stored in the link layer device. The composite address signal is generated as a combination of address outputs of the interface blocks.
摘要:
An improved process for forming a UV emitting diode is described. The process includes providing a substrate. A super-lattice is formed directly on the substrate at a temperature of at least 800 to no more than 1,300° C. wherein the super-lattice comprises AlxInyGa1-x-yN wherein 0
摘要翻译:描述了用于形成UV发光二极管的改进方法。 该方法包括提供基底。 超晶格在至少800至不超过1300℃的温度下直接形成在衬底上,其中超晶格包括Al x In y Ga 1-x-y N,其中0
摘要:
The present invention is generally directed to methods of selectively doping a substrate and the resulting selectively doped substrates. The methods include doping an epilayer of a substrate with the selected doping material to adjust the conductivity of either the epilayers grown over a substrate or the substrate itself. The methods utilize lithography to control the location of the doped regions on the substrate. The process steps can be repeated to form a cyclic method of selectively doping different areas of the substrate with the same or different doping materials to further adjust the properties of the resulting substrate.
摘要:
A vertically conducting LED comprising, in a layered arrangement: a highly thermally conductive submount wherein the highly conductive submount has a thermal conductivity of at least 100 W/m0K; a p-type layer comprising Al1-x-yInyGax N wherein 0≦x≦1 and 0≦y≦1; a quantum well layer comprising Al1-x-yInyGaxN wherein 0≦x≦1 and 0≦y≦1; an n-type layer comprising Al1-x-yInyGaxN wherein 0≦x≦1 and 0≦y≦1; and an n-type contact layer wherein the LED has a peak emission at 200-365 nm.
摘要:
Ultraviolet light emitting illuminator, and method for fabricating same, comprises an array of ultraviolet light emitting diodes and a first and a second terminal. When an alternating current is applied across the first and second terminals and thus to each of the diodes, the illuminator emits ultraviolet light at a frequency corresponding to that of the alternating current. The illuminator includes a template with ultraviolet light emitting quantum wells, a first buffer layer with a first type of conductivity and a second buffer layer with a second type of conductivity, all deposited preferably over a strain-relieving layer. A first and second metal contact are applied to the semiconductor layers having the first and second type of conductivity, respectively, to complete the LED. The emission spectrum ranges from 190 nm to 369 nm. The illuminator may be configured in various materials, geometries, sizes and designs.
摘要:
Novel silicon dioxide and silicon nitride deposition methods are generally disclosed. In one embodiment, the method includes depositing silicon on the surface of a substrate having a temperature of between about 65° C. and about 350° C. The heated substrate is exposed to a silicon source that is substantially free from an oxidizing agent. The silicon on the surface is then oxidized with an oxygen source that is substantially free from a silicon source. As a result of oxidizing the silicon, a silicon oxide layer forms on the surface of the substrate. Alternatively, or in additionally, a nitrogen source can be provided to produce silicon nitride on the surface of the substrate.
摘要:
An improved process for forming a UV emitting diode is described. The process includes providing a substrate. A super-lattice is formed directly on the substrate at a temperature of at least 800 to no more than 1,300° C. wherein the super-lattice comprises AlxInyGa1-x-yN wherein 0
摘要翻译:描述了用于形成UV发光二极管的改进方法。 该方法包括提供基底。 超晶格在至少800至不超过1300℃的温度下直接形成在衬底上,其中超晶格包括Al x In y Ga 1-x-y N,其中0
摘要:
A vertical geometry light emitting diode with a strain relieved superlattice layer on a substrate comprising doped AlXInYGa1-X-YN. A first doped layer is on the strain relieved superlattice layer AlXInYGa1-X-YN and the first doped layer has a first conductivity. A multilayer quantum well is on the first doped layer comprising alternating layers quantum wells and barrier layers. The multilayer quantum well terminates with a barrier layer on each side thereof. A second doped layer is on the quantum well wherein the second doped layer comprises AlXInYGa1-X-YN and said second doped layer has a different conductivity than said first doped layer. A contact layer is on the third doped layer and the contact layer has a different conductivity than the third doped layer. A metallic contact is in a vertical geometry orientation.