Renewal proposal support system
    1.
    发明申请
    Renewal proposal support system 审中-公开
    更新提案支持系统

    公开(公告)号:US20060085278A1

    公开(公告)日:2006-04-20

    申请号:US11218763

    申请日:2005-09-06

    IPC分类号: G06Q30/00

    CPC分类号: G06Q30/02 G06Q30/0601

    摘要: A renewal proposal support system that performs communication with a sales terminal device includes a configuration information storage unit for storing information on components of a product provided for a customer, a component information storage unit for storing the components, a configuration rule storage unit for storing information on advisability of combination between the components, and a control unit for performing processing on a change of one of the components. The control means refers to the configuration information storage unit, thereby displaying the components on the sales terminal device, and notifies an operator of the sales terminal device of other component that cannot be combined with the one of the components targeted for the change, upon receipt of a command for the change of the one of the components from the sales terminal device.

    摘要翻译: 与销售终端装置进行通信的更新建议支援系统包括配置信息存储单元,用于存储关于为顾客提供的商品的组成部分的信息,用于存储组件的组件信息存储单元,用于存储信息的配置规则存储单元 关于组件之间的组合的可取性,以及用于对一个部件的改变进行处理的控制单元。 控制装置参考配置信息存储单元,从而在销售终端设备上显示组件,并且在接收到时向销售终端设备通知其他组件的其他组件不能与为改变目标的组件之一组合 用于更改销售终端设备中的一个组件的命令。

    Vacuum processing apparatus and operating method of vacuum processing apparatus
    2.
    发明授权
    Vacuum processing apparatus and operating method of vacuum processing apparatus 有权
    真空处理装置和真空处理装置的操作方法

    公开(公告)号:US09011065B2

    公开(公告)日:2015-04-21

    申请号:US12871333

    申请日:2010-08-30

    IPC分类号: H01L21/677 H01L21/67

    摘要: A vacuum processing apparatus which includes an atmospheric transfer chamber having a plurality of cassette stands for transferring a wafer, a lock chamber for storing the wafer, a first vacuum transfer chamber to which the wafer from the lock chamber is transferred, a transfer intermediate chamber connected to the first vacuum transfer chamber, and a second vacuum transfer chamber connected to the transfer intermediate chamber. At least one vacuum processing chamber is connected to the first vacuum transfer chamber, and two or more vacuum processing chambers are connected to a rear side of the second vacuum transfer chamber. A plurality of gate valves are disposed between the first vacuum transfer chamber and each of the lock chamber, the transfer intermediate chamber, and the vacuum processing chamber coupled to the first vacuum transfer chamber. A control unit is also provided for controlling operation of the gate valves.

    摘要翻译: 一种真空处理装置,包括具有用于传送晶片的多个盒架的大气传送室,用于存储晶片的锁定室,来自锁定室的晶片被转移到的第一真空传送室,连接到传送中间室 到第一真空传送室,以及连接到传送中间室的第二真空传送室。 至少一个真空处理室连接到第一真空传送室,并且两个或更多个真空处理室连接到第二真空传送室的后侧。 多个闸阀设置在第一真空传送室与联接到第一真空传送室的锁定室,传送中间室和真空处理室中的每一个之间。 还设置有用于控制闸阀的操作的控制单元。

    Apparatus and method for inspecting pattern
    3.
    发明授权
    Apparatus and method for inspecting pattern 失效
    用于检查图案的装置和方法

    公开(公告)号:US08149395B2

    公开(公告)日:2012-04-03

    申请号:US13069091

    申请日:2011-03-22

    IPC分类号: G01N21/00

    摘要: A method and apparatus for inspecting defects includes emitting an ultraviolet light from an ultraviolet light source, illuminating a specimen with the ultraviolet light in which a polarization condition of the ultraviolet light is controlled, controlling a polarization condition of light reflected from the specimen which is illuminated by the polarization condition controlled ultraviolet light, detecting the light reflected from the specimen, processing the detected light so as to detect defects, and outputting information about the defects. The ultraviolet light source is disposed in a clean environment supplied with clean gas and separated from outside.

    摘要翻译: 用于检查缺陷的方法和装置包括从紫外光源发射紫外光,用受紫外光的偏振条件的紫外线照射样本,控制从被照射的样本反射的光的偏振状态 通过偏光条件控制的紫外光,检测从样本反射的光,处理检测到的光以检测缺陷,并输出关于缺陷的信息。 紫外光源设置在清洁环境中,并提供清洁气体并与外界分离。

    Method And Apparatus For Inspecting A Pattern Formed On A Substrate
    4.
    发明申请
    Method And Apparatus For Inspecting A Pattern Formed On A Substrate 有权
    检查基板上形成的图案的方法和装置

    公开(公告)号:US20100104173A1

    公开(公告)日:2010-04-29

    申请号:US12649898

    申请日:2009-12-30

    IPC分类号: G06K9/62

    CPC分类号: G03F7/7065 G01N21/95684

    摘要: A pattern inspection method and apparatus in which a deep ultraviolet light or an ultraviolet light is irradiated onto a specimen on which a pattern is formed, an image of the specimen which is irradiated with the deep ultraviolet light or the ultraviolet light is formed and the formed image is detected with a rear-surface irradiation type image sensor, which is sensitive to wavelengths of no greater than 400 nmm. A signal outputted from the image sensor is processed so as to detect a defect of the specimen by converting an analog image signal outputted from the image sensor to a digital image signal with an A/D converter, and a display displays information of the defect detected.

    摘要翻译: 将深紫外光或紫外线照射到形成有图案的试样上的图案检查方法和装置形成了被深紫外线或紫外线照射的样本的图像,形成 使用对不大于400nm的波长敏感的背面照射型图像传感器来检测图像。 处理从图像传感器输出的信号,以便通过用A / D转换器将从图像传感器输出的模拟图像信号转换为数字图像信号来检测样本的缺陷,并且显示器显示检测到的缺陷的信息 。

    Method And Apparatus For Inspecting Pattern Defects
    5.
    发明申请
    Method And Apparatus For Inspecting Pattern Defects 有权
    检查图案缺陷的方法和装置

    公开(公告)号:US20090153840A1

    公开(公告)日:2009-06-18

    申请号:US12366003

    申请日:2009-02-05

    IPC分类号: G01N21/88 G01N21/00

    摘要: An apparatus and method for inspecting defects includes an illuminator for irradiating light having an ultraviolet wavelength emitted from a light source onto a specimen through a reflection objective lens, an image-former for forming an image of light reflected from the specimen by the illumination of the light from the illuminator, which is passed through at least the reflection objective lens, a detector which detects the image of light formed by the image-former with an image sensor, and an image processor for processing a signal output from the detector to detect defects on the specimen. The image sensor is a reverse-surface irradiation type image sensor.

    摘要翻译: 用于检查缺陷的装置和方法包括:照射器,用于将通过光源发射的具有从光源发射的紫外线波长的光通过反射物镜照射到样本上;成像器,用于形成从样本反射的光的图像, 至少通过反射物镜的照明器的光,用图像传感器检测由成像器形成的光的图像的检测器,以及用于处理从检测器输出的信号以检测缺陷的图像处理器 在标本上。 图像传感器是反面照射型图像传感器。

    Method and apparatus for inspecting a pattern formed on a substrate
    7.
    发明授权
    Method and apparatus for inspecting a pattern formed on a substrate 有权
    用于检查在基板上形成的图案的方法和装置

    公开(公告)号:US08253934B2

    公开(公告)日:2012-08-28

    申请号:US12649898

    申请日:2009-12-30

    IPC分类号: G01N21/00

    CPC分类号: G03F7/7065 G01N21/95684

    摘要: A pattern inspection method and apparatus in which a deep ultraviolet light or an ultraviolet light is irradiated onto a specimen on which a pattern is formed, an image of the specimen which is irradiated with the deep ultraviolet light or the ultraviolet light is formed and the formed image is detected with a rear-surface irradiation type image sensor, which is sensitive to wavelengths of no greater than 400 nmm. A signal outputted from the image sensor is processed so as to detect a defect of the specimen by converting an analog image signal outputted from the image sensor to a digital image signal with an A/D converter, and a display displays information of the defect detected.

    摘要翻译: 将深紫外光或紫外线照射到形成有图案的试样上的图案检查方法和装置形成了被深紫外线或紫外线照射的样本的图像,形成 使用对不大于400nm的波长敏感的背面照射型图像传感器来检测图像。 处理从图像传感器输出的信号,以便通过用A / D转换器将从图像传感器输出的模拟图像信号转换为数字图像信号来检测样本的缺陷,并且显示器显示检测到的缺陷的信息 。

    Method and apparatus for inspecting pattern defects
    8.
    发明授权
    Method and apparatus for inspecting pattern defects 有权
    检查图案缺陷的方法和装置

    公开(公告)号:US07489395B2

    公开(公告)日:2009-02-10

    申请号:US11518195

    申请日:2006-09-11

    IPC分类号: G01N21/00

    摘要: A method and apparatus for inspecting pattern defects emitting a laser beam, adjusting a light-amount of the laser beam, converting the light-amount adjusted laser beam into a slit-like laser light flux, lowering coherency of the slit-like laser light flux, and irradiating a sample with the coherence reduced slit-like laser light flux. An image of reflection light from the sample is obtained, and a detector is provided which includes the image sensor for receiving the image of the reflection light and for converting it into a detected image signal. An image processor is provided for detecting defects on patterns formed on the sample in accordance with the detected image signal.

    摘要翻译: 用于检查发射激光束的图案缺陷的方法和装置,调节激光束的光量,将调整光量的激光束转换成狭缝状激光束,降低狭缝状激光光束的相干性 并且用相干减少的狭缝状激光束照射样品。 获得来自样品的反射光的图像,并且提供检测器,其包括用于接收反射光的图像并将其转换成检测到的图像信号的图像传感器。 提供了一种图像处理器,用于根据检测到的图像信号检测在样本上形成的图案上的缺陷。

    Apparatus and method for inspecting pattern
    9.
    发明授权
    Apparatus and method for inspecting pattern 失效
    用于检查图案的装置和方法

    公开(公告)号:US07446866B2

    公开(公告)日:2008-11-04

    申请号:US11488620

    申请日:2006-07-19

    IPC分类号: G01N21/00

    摘要: An apparatus for inspecting defects including a table which mounts a specimen to be inspected and which is movable in a plane, an ultraviolet light source for emitting ultraviolet light, an illuminating unit for illuminating the specimen mounted on the table with light emitted from the ultraviolet light source, a detecting unit for forming an image of the specimen illuminated by the illuminating unit and for detecting the image with an image sensor, and an image processing unit for processing the image detected by the image sensor and for outputting information about defects detected on the specimen. The illuminating unit and detecting unit are disposed in a clean environment which is supplied therein with clean gas and which is separated from outside by a wall.

    摘要翻译: 一种用于检查缺陷的装置,包括安装待检查样本并且可在平面中移动的台面,用于发射紫外线的紫外光源的照明单元,用于对从紫外线发射的光照射安装在桌子上的样本的照明单元 源,用于形成由所述照明单元照射的所述样本的图像并且用图像传感器检测图像的检测单元,以及图像处理单元,用于处理由所述图像传感器检测到的图像,并且用于输出关于在所述图像传感器上检测到的缺陷的信息; 标本。 照明单元和检测单元设置在清洁的环境中,其中提供有清洁的气体并且由壁与外部分离。

    Method for analyzing circuit pattern defects and a system thereof
    10.
    发明授权
    Method for analyzing circuit pattern defects and a system thereof 失效
    电路图形缺陷分析方法及其系统

    公开(公告)号:US07352890B2

    公开(公告)日:2008-04-01

    申请号:US11356210

    申请日:2006-02-17

    IPC分类号: G06K9/00

    摘要: A system for analyzing defects in electronic circuit patterns, including: comparing position information of structural defects with position information of electrical faults and extracting corroborated defects having common position information between the structural defects and electrical faults; classifying images of extracted corroborated defects into critical defect images and non-critical defect images based on a pre-stored classification rule which defines critical and non-critical defects by referring to images of defects, position information of defects, and results of performing an electronic test; modifying the pre-stored classification rule by correcting classification of classified defect images displayed on the screen; and repeating the operations for each subsequent object, wherein for each present object under inspection, using a modified pre-stored classification rule with respect to a previous object, as the pre-stored classification rule for the operations with respect to the present object.

    摘要翻译: 一种用于分析电子电路图案缺陷的系统,包括:将结构缺陷的位置信息与电气故障的位置信息进行比较,并提取在结构缺陷和电气故障之间具有共同位置信息的证实缺陷; 基于预先存储的分类规则将提取的确证缺陷的图像分类为关键缺陷图像和非关键缺陷图像,该分类规则通过参考缺陷图像,缺陷位置信息和执行电子化的结果来定义关键和非关键缺陷 测试; 通过校正显示在屏幕上的分类缺陷图像的分类来修改预先存储的分类规则; 并对每个后续对象重复操作,其中对于被检查的每个当前对象,使用关于先前对象的经修改的预先存储的分类规则作为关于本对象的操作的预先存储的分类规则。