公开(公告)号：US07333179B2

公开(公告)日：2008-02-19

申请号：US10918182

申请日：2004-08-13

申请人： Bausan Yuan ,  Martin E. Lee ,  W. Thomas Novak

发明人： Bausan Yuan ,  Martin E. Lee ,  W. Thomas Novak

IPC分类号： G03B27/58 ,  G03B27/62

CPC分类号： G03F7/70775 ,  G03F7/70725 ,  G03F7/70758 ,  G03F7/70766

摘要： Methods and apparatus for providing a stage with a relatively high positioning bandwidth and low transmissibility are disclosed. According to one aspect of the present invention, a method for positioning a stage including providing a first force of a first magnitude to the stage using a primary actuator and providing a second force of a second magnitude to the stage using a secondary actuator. The first force is arranged to cause the stage to translate along a first axis. The secondary actuator is also arranged to cause the stage to translate along the first axis, and has a relatively high positioning bandwidth. The first force is arranged to enable the stage to be relatively coarsely positioned and the second force is arranged to enable the stage to be relatively finely positioned. In one embodiment, the secondary actuator is one of a voice coil motor and a piezoelectric motor.

摘要翻译： 公开了提供具有相对高的定位带宽和低传输性的平台的方法和装置。 根据本发明的一个方面，一种用于定位平台的方法，包括使用主致动器向舞台提供第一幅度的第一力，并使用辅助致动器向舞台提供第二大小的第二力。 第一力布置成使得台架沿着第一轴线平移。 次级致动器还被布置成使得平台沿着第一轴线平移，并且具有相对较高的定位带宽。 第一力被布置成使得台架能够相对粗略地定位，并且第二力被布置成使得台架能够相对精细地定位。 在一个实施例中，次级致动器是音圈电动机和压电电动机之一。

公开(公告)号：US06963821B2

公开(公告)日：2005-11-08

申请号：US10361700

申请日：2003-02-11

申请人： Michael Binnard ,  W. Thomas Novak ,  Toshio Ueta ,  Bausan Yuan

发明人： Michael Binnard ,  W. Thomas Novak ,  Toshio Ueta ,  Bausan Yuan

IPC分类号： B23Q11/00 ,  G03F7/20 ,  G01B11/24

CPC分类号： G03F7/70766 ,  B23Q11/0032 ,  G03F7/70725

摘要： A wafer stage countermass assembly generally includes a base supporting one or more stages and first and second countermasses. The first and second stages move in one or more degrees of freedom. The countermasses move in at least one degree of freedom and, under ideal conditions, move to counter the movement of the stages in operation and thus preserve the systems center of gravity to avoid unwanted body motion. However, under actual conditions the countermasses may under travel or over travel their ideal trajectory. To more closely track the ideal trajectory, a controller actuates trim motors to apply small forces to the countermasses to push them towards a reference position in the Y direction. A second embodiment also takes into account the X position the stage(s) to cancel torque.

摘要翻译： 晶片台反质量组件通常包括支撑一个或多个阶段的基座和第一和第二反作用力。 第一和第二阶段以一个或多个自由度移动。 反恐怖主义至少有一个自由度，在理想条件下，可以抵抗运行阶段的运动，从而保持系统的重心，避免不必要的身体运动。 然而，在实际情况下，反恐怖主义可能在行进或超越其理想轨迹。 为了更紧密地跟踪理想轨迹，控制器启动微调电机，以将小的力施加到反作用体上，将其推向Y方向的参考位置。 第二实施例还考虑到X位置，以消除扭矩的阶段。

公开(公告)号：US07172493B2

公开(公告)日：2007-02-06

申请号：US11252483

申请日：2005-10-18

申请人： W. Thomas Novak ,  Douglas C. Watson ,  Pai-Hsueh Yang ,  Bausan Yuan

发明人： W. Thomas Novak ,  Douglas C. Watson ,  Pai-Hsueh Yang ,  Bausan Yuan

IPC分类号： B24B49/00

CPC分类号： B24B37/042 ,  B24B37/005 ,  B24B37/30 ,  B24B41/068

摘要： A polishing apparatus (10) for polishing a device (12) with a polishing pad (48) includes a pad holder (50) and an actuator assembly (432). The pad holder (50) retains the polishing pad (48). The actuator assembly (432) includes a plurality of spaced apart actuators (438F) (438S) (438T) that are coupled to the pad holder (50). The actuators (438F) (438S) (438T) cooperate to direct forces on the pad holder (50) to alter the pressure of the polishing pad (48) on the device (12). At least one of the actuators (438F) (438S) (438T) includes a first actuator subassembly (440) and a second actuator subassembly (442) that interacts with the first actuator subassembly (440) to direct a force on the pad holder (50). The second actuator subassembly (442) is coupled to the pad holder (50) and the second actuator subassembly (442) rotates with the pad holder (50) relative to the first actuator subassembly (440).

摘要翻译： 用于用抛光垫（48）抛光装置（12）的抛光装置（10）包括垫保持器（50）和致动器组件（432）。 垫保持器（50）保持抛光垫（48）。 致动器组件（432）包括多个间隔开的致动器（438F）（438S）（438T），其联接到所述垫保持器（50）。 致动器（438F）（438S）（438T）协作以引导焊盘保持器（50）上的力，以改变设备（12）上的抛光垫（48）的压力。 致动器（438F）（438T）（438T）中的至少一个包括与第一致动器子组件（440）相互作用的第一致动器子组件（440）和第二致动器子组件（442），以将力 垫座（50）。 第二致动器子组件（442）联接到焊盘保持器（50），并且第二致动器子组件（442）相对于第一致动器子组件（440）与焊盘保持器（50）一起旋转。

公开(公告)号：US20110043781A1

公开(公告)日：2011-02-24

申请号：US12926159

申请日：2010-10-28

申请人： Akimitsu Ebihara ,  Martin E. Lee ,  Bausan Yuan

发明人： Akimitsu Ebihara ,  Martin E. Lee ,  Bausan Yuan

IPC分类号： G03B27/54 ,  G03B27/58

CPC分类号： G03F7/709 ,  G03F7/70808 ,  G03F7/70833 ,  G03F7/70891

摘要： A projection optical device includes a projection optical system which projects an image of a pattern, a support member attached to the projection optical system, and a plurality of coupling members connected to the support member. The coupling members suspend and support the projection optical system through the support member from an upper direction of the support member. The projection optical device can include a frame to which one end of each of the coupling members is attached, such that the projection optical system hangs from the frame via the support member and the coupling members. A projection optical device also can include a liquid supply which supplies a temperature-controlled liquid to a side surface of a projection optical system utilizing gravity to cause the temperature-controlled liquid to flow along the side surface of the projection optical system.

摘要翻译： 投影光学装置包括投影图案的投影光学系统，附接到投影光学系统的支撑构件和连接到支撑构件的多个联接构件。 联接构件从支撑构件的上方通过支撑构件悬挂并支撑投影光学系统。 投影光学装置可以包括框架，每个联接构件的一端被附接到框架，使得投影光学系统经由支撑构件和联接构件从框架悬挂。 投影光学装置还可以包括液体供应源，其利用重力将温度控制的液体供应到投影光学系统的侧表面，以使温度控制的液体沿着投影光学系统的侧表面流动。

公开(公告)号：US06646719B2

公开(公告)日：2003-11-11

申请号：US09773289

申请日：2001-01-31

申请人： Martin E. Lee ,  Bausan Yuan ,  Yutaka Hayashi

发明人： Martin E. Lee ,  Bausan Yuan ,  Yutaka Hayashi

IPC分类号： G03B2758

CPC分类号： G03F7/70708 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70833

摘要： A support assembly (12) for an exposure apparatus (10) is provided herein. The support assembly (12) supports the components of the exposure apparatus (10) above a mounting base (32). The exposure apparatus (10) includes noisy components (42) and quiet components (44). The support assembly (12) includes an outer frame (34) and an inner frame (36). As provided herein, the outer frame (34) supports some of the components of the exposure apparatus (10) and the inner frame (36) supports some of the components of the exposure apparatus (10). Preferably, the outer frame (34) is used to support the quiet components (44) while the inner frame (36) is used to support the noisy components (42). Uniquely, a portion of the inner frame (36) is positioned within a portion of the outer frame (34). As a result of this design, both frames (34) (36) can effectively be mounted at the same mounting locations 37 of the mounting base (32). Further, the overall space taken up by the frames (34) (36) is minimized.

公开(公告)号：US08767172B2

公开(公告)日：2014-07-01

申请号：US12926159

申请日：2010-10-28

申请人： Akimitsu Ebihara ,  Martin E. Lee ,  Bausan Yuan

发明人： Akimitsu Ebihara ,  Martin E. Lee ,  Bausan Yuan

IPC分类号： G03B27/42

CPC分类号： G03F7/709 ,  G03F7/70808 ,  G03F7/70833 ,  G03F7/70891

摘要： A projection optical device includes a projection optical system which projects an image of a pattern, a support member attached to the projection optical system, and a plurality of coupling members connected to the support member. The coupling members suspend and support the projection optical system through the support member from an upper direction of the support member. The projection optical device can include a frame to which one end of each of the coupling members is attached, such that the projection optical system hangs from the frame via the support member and the coupling members. A projection optical device also can include a liquid supply which supplies a temperature-controlled liquid to a side surface of a projection optical system utilizing gravity to cause the temperature-controlled liquid to flow along the side surface of the projection optical system.

摘要翻译： 投影光学装置包括投影图案的投影光学系统，附接到投影光学系统的支撑构件和连接到支撑构件的多个联接构件。 联接构件从支撑构件的上方通过支撑构件悬挂并支撑投影光学系统。 投影光学装置可以包括框架，每个联接构件的一端被附接到框架，使得投影光学系统经由支撑构件和联接构件从框架悬挂。 投影光学装置还可以包括液体供应源，其利用重力将温度控制的液体供应到投影光学系统的侧表面，以使温度控制的液体沿着投影光学系统的侧表面流动。

公开(公告)号：US20080275661A1

公开(公告)日：2008-11-06

申请号：US11986314

申请日：2007-11-19

申请人： Pai-Hsueh Yang ,  Bausan Yuan ,  Kazuo Masaki ,  Kazuhiro Hirano ,  Xiao-Feng Yang ,  Scott Coakley ,  Michael B. Binnard

发明人： Pai-Hsueh Yang ,  Bausan Yuan ,  Kazuo Masaki ,  Kazuhiro Hirano ,  Xiao-Feng Yang ,  Scott Coakley ,  Michael B. Binnard

IPC分类号： G01L25/00

CPC分类号： G03F7/70758 ,  G03F7/70725

摘要： Methods, apparatus, and systems are disclosed for identifying force-ripple and/or side-forces in actuators used for moving a multiple-axis stage. The identified force-ripple and/or side-forces can be mapped, and maps of corresponding position-dependent compensation ratios useful for correcting same are obtained. The methods are especially useful for stages providing motion in at least one degree of freedom using multiple (redundant) actuators. In an exemplary method a stage member is displaced, using at least one selected actuator, multiple times over a set distance in the range of motion of the subject actuator(s). Each displacement has a predetermined trajectory and respective starting point in the range. For each displacement, respective section force-command(s) are extracted and normalized to a reference section force-command to define a section compensation-ratio. Multiple section compensation-ratios are assembled, as functions of displacement in the range, to provide a map of compensation ratios for the actuator(s) throughout the range.

摘要翻译： 公开了用于识别用于移动多轴平台的致动器中的力波动和/或侧向力的方法，装置和系统。 可以对所识别的力 - 纹波和/或侧向力进行映射，并且获得用于校正相应的位置相关的补偿比的映射。 这些方法对于使用多个（冗余）致动器在至少一个自由度中提供运动的阶段特别有用。 在示例性方法中，使用至少一个所选择的致动器，在主体致动器的运动范围内的设定距离上移动台架构件多次。 每个位移具有预定的轨迹和该范围内的相应起始点。 对于每个位移，提取相应的截面力命令并将其归一化为参考部分力命令以定义截面补偿比。 组合多段补偿比作为该范围内的位移的函数，以提供在整个范围内的致动器的补偿比的图。

公开(公告)号：US20060061751A1

公开(公告)日：2006-03-23

申请号：US10945638

申请日：2004-09-21

申请人： Ting-Chien Teng ,  Bausan Yuan

发明人： Ting-Chien Teng ,  Bausan Yuan

IPC分类号： G03B27/58

CPC分类号： G03F7/70716

摘要： A stage assembly (220) includes a stage base (202) having a guide surface (203), a first stage (206), a second stage (208), and a first mover subassembly (216) including a first mover (231) and a second mover (232) that are arranged in series. The stage base (202) supports the first stage (206), which moves relative to the stage base (202). The movers (231, 232) cooperate to move the second stage (208) relative to the first stage (206). The movers (231, 232) can include one or more attraction-only type actuators. The movers (231, 232) cooperate to move the second stage (208) along an axis that is substantially perpendicular to the guide surface (203). The stage assembly (220) can also include a second mover subassembly (216) that cooperates with the first mover subassembly (216) to move the second stage (208) with two or more degrees of freedom relative to the first stage (206). Further, the first mover (231) can directly move a portion of the second mover (232).

摘要翻译： 舞台组件（220）包括具有引导表面（203），第一舞台（206），第二舞台（208）和包括第一移动器（231）的第一移动器子组件（216）的舞台基座（202） 和串联布置的第二移动器（232）。 舞台基座（202）支撑相对于舞台基座（202）移动的第一舞台（206）。 移动器（231,232）协作以相对于第一级（206）移动第二级（208）。 移动器（231,232）可以包括一个或多个仅吸引型的致动器。 移动器（231,232）协作以沿着基本上垂直于引导表面（203）的轴线移动第二阶段（208）。 舞台组件（220）还可以包括与第一移动器子组件（216）协作以相对于第一舞台（206）以两个或更多个自由度移动第二舞台（208）的第二动子子组件（216）。 此外，第一移动器（231）可以直接移动第二移动器（232）的一部分。

公开(公告)号：US06987558B2

公开(公告)日：2006-01-17

申请号：US09759524

申请日：2001-01-16

申请人： Bausan Yuan ,  Michael Binnard

发明人： Bausan Yuan ,  Michael Binnard

IPC分类号： G03B27/58 ,  G02B27/42

CPC分类号： F16F7/1005 ,  G03F7/70716 ,  G03F7/70766

摘要： A stage assembly and support system are provided to stabilize a stage base, such as a wafer stage base or a reticle stage base, minimizing forces transmitted from the stage assembly to a stationary surface, such as the ground, and thereby preventing vibration of other parts or systems in a wafer manufacturing process. Depending of the applicable photolithography system, a reticle stage and/or a wafer stage are accelerated in response to a wafer manufacturing control system to position the semiconductor substrates. The jerking motions of the reticle stage and/or wafer stage cause reaction forces acting on the reticle stage base and/or wafer stage base. The reaction forces induce vibration to the stationary surface and surrounding parts of the photolithography system. The wafer stage assembly and support system according to this invention allow the reticle stage base and/or wafer stage base to move relative the stationary surface. The base, acting as a massive reaction mass, stores a kinetic energy from the reaction force and gradually dissipates such energy by applying small forces to the reaction mass. The stage assembly and support system according to this invention are also capable of canceling any disturbance forces acting on the base.

公开(公告)号：US20050286050A1

公开(公告)日：2005-12-29

申请号：US10882131

申请日：2004-06-29

申请人： Bausan Yuan ,  Martin Lee ,  Nobutaka Magome ,  Hidemi Kawai

发明人： Bausan Yuan ,  Martin Lee ,  Nobutaka Magome ,  Hidemi Kawai

IPC分类号： G01B11/00 ,  G03F7/20

CPC分类号： G03F7/70591

摘要： Embodiments of the present invention are directed to an apparatus and a method for through lens measurement for a projection system. In one embodiment, an apparatus for through lens image measurement comprises a projection lens housing containing lens elements therein, and a reflective member having a center of curvature on a first plane. The reflective member is attached to the lens housing. An optical system includes a light source, a position detector, and one or more optical elements. The optical system is attached to the lens housing and configured to direct a light from the light source through the lens elements to the reflective member which reflects the light back through the lens elements and toward the position detector. The position detector is configured to detect any image shift at the first plane due to misalignment of the lens elements with respect to the lens housing.

摘要翻译： 本发明的实施例涉及一种用于投影系统的透镜测量的装置和方法。 在一个实施例中，用于透镜图像测量的装置包括在其中容纳透镜元件的投影透镜壳体和在第一平面上具有曲率中心的反射构件。 反射构件附接到透镜壳体。 光学系统包括光源，位置检测器和一个或多个光学元件。 光学系统附接到透镜壳体并且被配置为将来自光源的光通过透镜元件引导到反射构件，反射构件将光反射回透镜元件并朝向位置检测器。 位置检测器被配置为由于透镜元件相对于透镜壳体的未对准而检测在第一平面处的任何图像偏移。