Moving mechanism with high bandwidth response and low force transmissibility
    1.
    发明授权
    Moving mechanism with high bandwidth response and low force transmissibility 有权
    具有高带宽响应和低力传递性的移动机构

    公开(公告)号:US07333179B2

    公开(公告)日:2008-02-19

    申请号:US10918182

    申请日:2004-08-13

    IPC分类号: G03B27/58 G03B27/62

    摘要: Methods and apparatus for providing a stage with a relatively high positioning bandwidth and low transmissibility are disclosed. According to one aspect of the present invention, a method for positioning a stage including providing a first force of a first magnitude to the stage using a primary actuator and providing a second force of a second magnitude to the stage using a secondary actuator. The first force is arranged to cause the stage to translate along a first axis. The secondary actuator is also arranged to cause the stage to translate along the first axis, and has a relatively high positioning bandwidth. The first force is arranged to enable the stage to be relatively coarsely positioned and the second force is arranged to enable the stage to be relatively finely positioned. In one embodiment, the secondary actuator is one of a voice coil motor and a piezoelectric motor.

    摘要翻译: 公开了提供具有相对高的定位带宽和低传输性的平台的方法和装置。 根据本发明的一个方面,一种用于定位平台的方法,包括使用主致动器向舞台提供第一幅度的第一力,并使用辅助致动器向舞台提供第二大小的第二力。 第一力布置成使得台架沿着第一轴线平移。 次级致动器还被布置成使得平台沿着第一轴线平移,并且具有相对较高的定位带宽。 第一力被布置成使得台架能够相对粗略地定位,并且第二力被布置成使得台架能够相对精细地定位。 在一个实施例中,次级致动器是音圈电动机和压电电动机之一。

    Projection optical device and exposure apparatus
    2.
    发明授权
    Projection optical device and exposure apparatus 有权
    投影光学装置和曝光装置

    公开(公告)号:US08767172B2

    公开(公告)日:2014-07-01

    申请号:US12926159

    申请日:2010-10-28

    IPC分类号: G03B27/42

    摘要: A projection optical device includes a projection optical system which projects an image of a pattern, a support member attached to the projection optical system, and a plurality of coupling members connected to the support member. The coupling members suspend and support the projection optical system through the support member from an upper direction of the support member. The projection optical device can include a frame to which one end of each of the coupling members is attached, such that the projection optical system hangs from the frame via the support member and the coupling members. A projection optical device also can include a liquid supply which supplies a temperature-controlled liquid to a side surface of a projection optical system utilizing gravity to cause the temperature-controlled liquid to flow along the side surface of the projection optical system.

    摘要翻译: 投影光学装置包括投影图案的投影光学系统,附接到投影光学系统的支撑构件和连接到支撑构件的多个联接构件。 联接构件从支撑构件的上方通过支撑构件悬挂并支撑投影光学系统。 投影光学装置可以包括框架,每个联接构件的一端被附接到框架,使得投影光学系统经由支撑构件和联接构件从框架悬挂。 投影光学装置还可以包括液体供应源,其利用重力将温度控制的液体供应到投影光学系统的侧表面,以使温度控制的液体沿着投影光学系统的侧表面流动。

    Projection optical device and exposure apparatus
    3.
    发明申请
    Projection optical device and exposure apparatus 有权
    投影光学装置和曝光装置

    公开(公告)号:US20110043781A1

    公开(公告)日:2011-02-24

    申请号:US12926159

    申请日:2010-10-28

    IPC分类号: G03B27/54 G03B27/58

    摘要: A projection optical device includes a projection optical system which projects an image of a pattern, a support member attached to the projection optical system, and a plurality of coupling members connected to the support member. The coupling members suspend and support the projection optical system through the support member from an upper direction of the support member. The projection optical device can include a frame to which one end of each of the coupling members is attached, such that the projection optical system hangs from the frame via the support member and the coupling members. A projection optical device also can include a liquid supply which supplies a temperature-controlled liquid to a side surface of a projection optical system utilizing gravity to cause the temperature-controlled liquid to flow along the side surface of the projection optical system.

    摘要翻译: 投影光学装置包括投影图案的投影光学系统,附接到投影光学系统的支撑构件和连接到支撑构件的多个联接构件。 联接构件从支撑构件的上方通过支撑构件悬挂并支撑投影光学系统。 投影光学装置可以包括框架,每个联接构件的一端被附接到框架,使得投影光学系统经由支撑构件和联接构件从框架悬挂。 投影光学装置还可以包括液体供应源,其利用重力将温度控制的液体供应到投影光学系统的侧表面,以使温度控制的液体沿着投影光学系统的侧表面流动。

    Support assembly for an exposure apparatus

    公开(公告)号:US06646719B2

    公开(公告)日:2003-11-11

    申请号:US09773289

    申请日:2001-01-31

    IPC分类号: G03B2758

    摘要: A support assembly (12) for an exposure apparatus (10) is provided herein. The support assembly (12) supports the components of the exposure apparatus (10) above a mounting base (32). The exposure apparatus (10) includes noisy components (42) and quiet components (44). The support assembly (12) includes an outer frame (34) and an inner frame (36). As provided herein, the outer frame (34) supports some of the components of the exposure apparatus (10) and the inner frame (36) supports some of the components of the exposure apparatus (10). Preferably, the outer frame (34) is used to support the quiet components (44) while the inner frame (36) is used to support the noisy components (42). Uniquely, a portion of the inner frame (36) is positioned within a portion of the outer frame (34). As a result of this design, both frames (34) (36) can effectively be mounted at the same mounting locations 37 of the mounting base (32). Further, the overall space taken up by the frames (34) (36) is minimized.

    Inspection tool for testing and adjusting a projection unit of a lithography system

    公开(公告)号:USH2114H1

    公开(公告)日:2005-02-01

    申请号:US10298286

    申请日:2002-11-14

    摘要: An inspection system and method are disclosed. The inspection system is configured to inspect a projection unit having multiple optical subsystems. The optical subsystems are configured to project an image during a lithography step. The inspection system provides self calibration by measuring both a test mask and the aerial image of the test mask with the same detector assembly. The inspection system is also capable of measuring multiple fields simultaneously using multiple detectors and 6 axis interferometry to accurately determine the position of each detector. Additionally, the inspection system is capable of measuring the distance between the test mask and the detector assembly with an indirect path around the projection unit which normally blocks the direct path.

    System and method for holding a device with minimal deformation
    6.
    发明授权
    System and method for holding a device with minimal deformation 失效
    用于保持最小变形的装置的系统和方法

    公开(公告)号:US06888620B2

    公开(公告)日:2005-05-03

    申请号:US09997553

    申请日:2001-11-29

    摘要: A stage assembly (10) for moving and positioning a device (26) includes a device table (20), a device holder (24) that retains the device (26), and a stage mover assembly (14). The stage assembly (10) includes one or more features that can isolate the device holder 24 and the device (26) from deformation. In some embodiments, the stage assembly (10) allows precise rotation of the device (26) between a first position (42) and a second position (44) without influencing the flatness of the device (26) and without deflecting and distorting the device (26). For example, the stage assembly (10) can include a carrier (60) and a holder connector assembly (62). The carrier (60) is supported above the device table (20) and rotates relative to the device table (20). The holder connector assembly (62) connects the device holder (24) to the carrier (60). Further, the stage assembly (10) can include a holder mover (120) that rotates the device holder (24) relative to the device table (20). Additionally, the stage assembly (10) can include a fluid connector (94) that connects the device holder (24) in fluid communication with the device table (20).

    摘要翻译: 用于移动和定位装置(26)的平台组件(10)包括装置台(20),保持装置(26)的装置保持器(24)和平台移动器组件(14)。 台架组件(10)包括可以隔离设备保持器24和设备(26)不变形的一个或多个特征。 在一些实施例中,台架组件(10)允许装置(26)在第一位置(42)和第二位置(44)之间精确地旋转,而不影响装置(26)的平坦度,并且不会使装置偏转和变形 (26)。 例如,台架组件(10)可以包括托架(60)和托架连接器组件(62)。 载体(60)被支撑在装置台(20)上方并相对于装置台(20)旋转。 支架连接器组件(62)将装置支架(24)连接到支架(60)上。 此外,台架组件(10)可以包括相对于设备台(20)旋转设备保持器(24)的保持器移动器(120)。 另外,台架组件(10)可以包括流体连接器(94),其连接与装置台(20)流体连通的装置保持器(24)。

    Exposure method, and method of making exposure apparatus having dynamically isolated support structure
    7.
    发明授权
    Exposure method, and method of making exposure apparatus having dynamically isolated support structure 有权
    曝光方法以及具有动态隔离的支撑结构的曝光装置的方法

    公开(公告)号:US06188195B1

    公开(公告)日:2001-02-13

    申请号:US09318623

    申请日:1999-05-26

    申请人: Martin E. Lee

    发明人: Martin E. Lee

    IPC分类号: H01L21027

    摘要: A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means of motor coils on the window frame guide co-operating with magnetic tracks fixed on the base. The stage is driven inside the window frame guide in the Y-axis direction by motor coils located on the stage co-operating with magnetic tracks located on the window frame guide. Forces from the drive motors of both the window frame guide and the stage are transmitted through the center of gravity of the stage, thereby eliminating unwanted moments of inertia. Additionally, reaction forces caused by the drive motors are isolated from the projection lens and the alignment portions of the photolithography machine. This isolation is accomplished by providing a mechanical support for the stage independent of the support for its window frame guide. The window frame guide is a hinged structure capable of a slight yawing (rotational) motion due to hinged flexures which connect the window frame guide members.

    摘要翻译: 适于在光刻机中支撑掩模版的引导阶段机构包括在基座上沿X-Y方向移动的台。 围绕舞台的是一个矩形的窗框导轨,它通过与固定在底座上的磁道配合的窗框导轨上的电机线圈在两个固定导轨上沿X轴方向驱动。 通过位于与窗框引导件上的磁迹配合的台上的电动机线圈,该平台在Y轴方向上在窗框引导件的内部被驱动。 来自窗框引导件和台架的驱动马达的力通过载物台的重心传递,从而消除不必要的惯性矩。 此外,由驱动马达引起的反作用力与投影透镜和光刻机的对准部分隔离。 这种隔离是通过为舞台独立于其窗框引导件的支撑提供机械支撑来实现的。 窗框引导件是由于连接窗框引导构件的铰链弯曲而能够轻微偏转(旋转)运动的铰链结构。

    X-Y stage with arcuate surface bearings
    8.
    发明授权
    X-Y stage with arcuate surface bearings 失效
    X-Y平台带弧形表面轴承

    公开(公告)号:US6132091A

    公开(公告)日:2000-10-17

    申请号:US193915

    申请日:1998-11-17

    摘要: A two-axis stage assembly includes a generally planar horizontally mounted base plate; a stage plate generally parallel to the base plate, the stage plate having a first axis and second orthogonal axis; a set of spaced bearings depending from a bottom surface of said stage plate, the bearings each having an arcuate bottom surface in rocking contact with a facing support surface of the base plate; a joint attached to the bottom surface of the stage plate and pivotably mounting each bearing, the joint being positioned at the center of curvature of the arcuate bottom surface of the associated bearing; and where an axial movement of the stage plate rocks the bearing arcuate bottom surfaces with respect to the facing support surface of the base plate.

    摘要翻译: 两轴级组件包括大致平面的水平安装的底板; 大体平行于基板的台板,台板具有第一轴线和第二正交轴线; 一组间隔的轴承,其从所述台板的底面垂直,所述轴承各自具有与所述基板的相对的支撑表面摇摆接触的弓形底表面; 连接在台板的底面上并且可枢转地安装每个轴承的接头,该接头定位在相关轴承的弧形底表面的曲率中心处; 并且其中台板的轴向运动相对于基板的相对的支撑表面摇摆支承弓形底表面。

    Apparatus for projecting a series of images onto dies of a semiconductor
wafer
    9.
    发明授权
    Apparatus for projecting a series of images onto dies of a semiconductor wafer 失效
    用于将一系列图像投影到半导体晶片的管芯上的装置

    公开(公告)号:US4425037A

    公开(公告)日:1984-01-10

    申请号:US378370

    申请日:1982-05-14

    摘要: The apparatus forms one-to-one reticle images on a wafer. The apparatus includes means for holding a reticle containing an image pattern corresponding to the size of the desired wafer pattern. An illumination system substantially uniformly illuminates the reticle pattern. A one-to-one stationary projection optical system projects an image of the reticle pattern onto a predetermined focal plane. Suitable means such as a vacuum chuck holds the wafer. An alignment system steps and orients a wafer chuck to register markings on the individual dies of the wafer with the projected image of corresponding markings on the reticle. A fluid servo system acts on the chuck to hold at least a portion of the wafer in the predetermined focal plane of the projection optical system.

    摘要翻译: 该装置在晶片上形成一对一的掩模版图像。 该装置包括用于保持包含对应于所需晶片图案的尺寸的图像图案的掩模版的装置。 照明系统基本均匀地照射标线图案。 一对一固定投影光学系统将掩模版图案的图像投影到预定焦平面上。 合适的装置如真空吸盘夹持晶片。 对准系统对晶片卡盘进行步骤和定位,以使晶片的各个管芯上的标记与掩模版上相应标记的投影图像对准。 流体伺服系统作用在卡盘上以将晶片的至少一部分保持在投影光学系统的预定焦平面中。

    Holder mover for a stage assembly
    10.
    发明授权
    Holder mover for a stage assembly 失效
    用于舞台组装的持有者

    公开(公告)号:US06882126B2

    公开(公告)日:2005-04-19

    申请号:US09997144

    申请日:2001-11-29

    IPC分类号: B64C17/06 G05B1/06

    CPC分类号: B23Q1/623

    摘要: A stage assembly (10) for moving and positioning a device (26) includes a device table (20), a device holder (24) that retains the device (26), and a stage mover assembly (14). The stage assembly (10) includes one or more features that can isolate the device holder 24 and the device (26) from deformation. In some embodiments, the stage assembly (10) allows precise rotation of the device (26) between a first position (42) and a second position (44) without influencing the flatness of the device (26) and without deflecting and distorting the device (26). For example, the stage assembly (10) can include a carrier (60) and a holder connector assembly (62). The carrier (60) is supported above the device table (20) and rotates relative to the device table (20). The holder connector assembly (62) connects the device holder (24) to the carrier (60). Further, the stage assembly (10) can include a holder mover (120) that rotates the device holder (24) relative to the device table (20). Additionally, the stage assembly (10) can include a fluid connector (94) that connects the device holder (24) in fluid communication with the device table (20).

    摘要翻译: 用于移动和定位装置(26)的平台组件(10)包括装置台(20),保持装置(26)的装置保持器(24)和平台移动器组件(14)。 台架组件(10)包括可以隔离设备保持器24和设备(26)不变形的一个或多个特征。 在一些实施例中,台架组件(10)允许装置(26)在第一位置(42)和第二位置(44)之间精确地旋转,而不影响装置(26)的平坦度,并且不会使装置偏转和变形 (26)。 例如,台架组件(10)可以包括托架(60)和托架连接器组件(62)。 载体(60)被支撑在装置台(20)上方并相对于装置台(20)旋转。 支架连接器组件(62)将装置支架(24)连接到支架(60)上。 此外,台架组件(10)可以包括相对于设备台(20)旋转设备保持器(24)的保持器移动器(120)。 另外,台架组件(10)可以包括流体连接器(94),其连接与装置台(20)流体连通的装置保持器(24)。