Non-volatile reprogrammable logic circuits by combining negative differential resistance devices and magnetic devices
    1.
    发明授权
    Non-volatile reprogrammable logic circuits by combining negative differential resistance devices and magnetic devices 失效
    通过组合负差分电阻器件和磁性器件的非易失性可编程逻辑电路

    公开(公告)号:US06316965B1

    公开(公告)日:2001-11-13

    申请号:US09593809

    申请日:2000-06-15

    IPC分类号: H03K1910

    CPC分类号: B82Y10/00 H03K3/315 H03K19/10

    摘要: A circuit includes at least one negative differential resistance (NDR) device and at least one magnetic device having reversibly variable resistance, wherein the negative differential resistance device and the magnetic device are operatively connected so that changing the resistance of the magnetic device changes the current-voltage response characteristics of the circuit. NDR devices and magnetic devices can be arranged to form multiple value logic (MVL) cells and monostable-bistable transition logic elements (MOBILE), and these logic cells can form the components of a field programmable gate array.

    摘要翻译: 电路包括至少一个负差分电阻(NDR)装置和至少一个具有可逆电阻的磁性装置,其中负差动电阻装置和磁性装置可操作地连接,使得磁性装置的电阻改变电流 - 电路的电压响应特性。 NDR器件和磁性器件可以被布置成形成多值逻辑(MVL)单元和单稳态双稳态转换逻辑元件(MOBILE),并且这些逻辑单元可以形成现场可编程门阵列的组件。

    Passivating layer for III-V semiconductor materials
    8.
    发明授权
    Passivating layer for III-V semiconductor materials 失效
    III-V半导体材料的钝化层

    公开(公告)号:US4828935A

    公开(公告)日:1989-05-09

    申请号:US176115

    申请日:1988-03-30

    IPC分类号: H01L21/314

    摘要: A passivating or insulating layer is described for semiconductor substrat The passivating layer is of the formula Zn.sub.1-x-y M.sub.x Q.sub.y Se:D where 0.ltoreq.x.ltoreq.1, 0.ltoreq.y.ltoreq.1, M and Q represent different specified elements and D represents a dopant. It is prefered that M and Q are Fe or Mn. The substrate is preferably a III-V semiconductor compound. The devices are capable of rapid switching among other uses.

    摘要翻译: 半导体衬底描述钝化或绝缘层。 钝化层具有式Zn1-x-yMxQySe:D,其中0≤x≤1,0≤y≤1,M和Q表示不同的特定元素,D表示掺杂剂。 M和Q优选为Fe或Mn。 基板优选为III-V族半导体化合物。 这些设备能够在其他用途​​之间快速切换。

    Graphene Spin Filters via Chemical Vapor Deposition
    10.
    发明申请
    Graphene Spin Filters via Chemical Vapor Deposition 审中-公开
    石墨烯旋转过滤器通过化学气相沉积

    公开(公告)号:US20150299850A1

    公开(公告)日:2015-10-22

    申请号:US14657665

    申请日:2015-03-13

    摘要: A method of making a graphene spin filter device by chemical vapor deposition comprising providing a first crystalline ferromagnetic metal surface, performing chemical vapor deposition and growing a graphene film on the first ferromagnetic metal surface, and depositing a second ferromagnetic film on the graphene film. A graphene spin filter device wherein the graphene is grown by chemical vapor deposition comprising a first crystalline ferromagnetic metal surface, a graphene film grown by chemical vapor deposition on the first ferromagnetic metal surface, and a second ferromagnetic film on the graphene film.

    摘要翻译: 一种通过化学气相沉积制造石墨烯自旋过滤器装置的方法,包括提供第一结晶铁磁金属表面,进行化学气相沉积并在第一铁磁金属表面上生长石墨烯膜,以及在石墨烯膜上沉积第二铁磁膜。 一种石墨烯自旋过滤器装置,其中通过化学气相沉积生长石墨烯,其包括第一结晶铁磁金属表面,通过化学气相沉积在第一强磁性金属表面上生长的石墨烯膜和在石墨烯膜上的第二铁磁膜。