公开(公告)号：US20070002297A1

公开(公告)日：2007-01-04

申请号：US11169305

申请日：2005-06-29

申请人： Bernardus Luttikhuis ,  Petrus Bartray ,  Wilhelmus Box ,  Marco Stavenga ,  Thijs Harink

发明人： Bernardus Luttikhuis ,  Petrus Bartray ,  Wilhelmus Box ,  Marco Stavenga ,  Thijs Harink

IPC分类号： G03B27/52

CPC分类号： G03F7/70916 ,  G03F7/7075 ,  G03F7/70791

摘要： A lithographic apparatus comprises a substrate table that supports a substrate and a substrate handler that moves the substrate relative to the substrate table. The substrate handler is adapted to load substrates on to and unload substrates from the substrate table before and after exposure. Also, a clean gas supply system supplies a clean gas to at least one location at which the substrate is located. The clean gas supply system is moveably mounted. A device manufacturing method utilizing the lithographic apparatus can be used to manufacture at least one of a flat panel display and an integrated circuit device.

摘要翻译： 光刻设备包括支撑衬底的衬底台和相对于衬底台移动衬底的衬底处理器。 衬底处理器适于在曝光之前和之后将衬底加载到衬底台上并从衬底台卸载衬底。 此外，清洁气体供应系统将清洁气体提供到至少一个位置，在该位置处衬底被定位。 清洁气体供应系统可移动安装。 利用光刻设备的器件制造方法可用于制造平板显示器和集成电路器件中的至少一个。

公开(公告)号：US20050151954A1

公开(公告)日：2005-07-14

申请号：US10986182

申请日：2004-11-12

申请人： Petrus Bartray ,  Wilhelmus Box ,  Carlo Luijten ,  Bernardus Luttikhuis ,  Michael Ten Bhomer ,  Ferdy Migchelbrink ,  Jan Kuit

发明人： Petrus Bartray ,  Wilhelmus Box ,  Carlo Luijten ,  Bernardus Luttikhuis ,  Michael Ten Bhomer ,  Ferdy Migchelbrink ,  Jan Kuit

IPC分类号： H01L21/027 ,  G02B7/02 ,  G03B27/42 ,  G03F7/20 ,  G03B27/58

CPC分类号： G03F7/7095 ,  G02B7/028 ,  G03F7/70833 ,  G03F7/70858 ,  G03F7/709

摘要： A lithographic apparatus is provided that includes an illumination system for conditioning a beam of radiation, and a support for supporting a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, an isolated reference frame for providing a reference surface, and a measuring system for measuring the substrate with respect to the reference surface. The reference frame includes a material having a coefficient of thermal expansion of greater than about 2.9×10−6/K.

摘要翻译： 提供了一种光刻设备，其包括用于调节辐射束的照明系统和用于支撑图案形成装置的支撑件。 图案形成装置用于使辐射束在其横截面上具有图案。 该装置还包括用于保持基板的基板台，用于将图案化的光束投影到基板的目标部分上的投影系统，用于提供参考表面的隔离参考框架，以及用于测量基板相对于基板的测量系统 参考面。 参考框架包括具有大于约2.9×10 -6 / K的热膨胀系数的材料。

公开(公告)号：US20050018157A1

公开(公告)日：2005-01-27

申请号：US10875510

申请日：2004-06-25

申请人： Wilhelmus Box ,  Johannes Wilhelmus Jacobs ,  Paulus Liebregts ,  Thijs Harink

发明人： Wilhelmus Box ,  Johannes Wilhelmus Jacobs ,  Paulus Liebregts ,  Thijs Harink

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/52

CPC分类号： G03F7/70891 ,  G03F7/70916

摘要： A lithographic projection apparatus is disclosed. The apparatus includes a substrate support for supporting at least one substrate, a radiation system for providing at least one beam of radiation, and a vacuum chamber. The vacuum chamber includes a patterning device and/or a projection system. The patterning device is arranged for patterning the beam of radiation according to a desired pattern, and the projection system is arranged for projecting the patterned beam of radiation onto a target portion of the substrate. The apparatus also includes at least one thermal shield for thermally conditioning at least part of the apparatus. The thermal shield includes particle transmission channels for transmitting particles through the shield, from a first side of the shield to a second side of the shield.

摘要翻译： 公开了一种光刻投影装置。 该装置包括用于支撑至少一个基板的基板支撑件，用于提供至少一个辐射束的辐射系统和真空室。 真空室包括图案形成装置和/或投影系统。 图案形成装置被布置成根据期望的图案图案化辐射束，并且投影系统被布置用于将图案化的辐射束投影到基板的目标部分上。 该装置还包括至少一个热屏蔽件，用于热调节装置的至少一部分。 热屏蔽包括用于将颗粒从屏蔽件的第一侧传送到屏蔽件的第二侧的颗粒传输通道。

公开(公告)号：US20050122490A1

公开(公告)日：2005-06-09

申请号：US10729376

申请日：2003-12-08

申请人： Bernardus Luttikhuis ,  Pertrus Bartray ,  Wilhelmus Box ,  Martinus Hendrikus Leenders ,  Marc Maria Van Der Wijst

发明人： Bernardus Luttikhuis ,  Pertrus Bartray ,  Wilhelmus Box ,  Martinus Hendrikus Leenders ,  Marc Maria Van Der Wijst

IPC分类号： G21K5/02 ,  F16F15/04 ,  G03F7/20 ,  H01L21/027 ,  G03B27/52

CPC分类号： G03F7/70858

摘要： A lithographic apparatus includes an illumination system for providing a beam of radiation, a support structure constructed to support a patterning device, which serves to impart the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a reference frame with a position sensor and the substrate being located thereon. The apparatus further includes a heat transport system having a heating element, in thermal interaction with at least one of the projection system and the reference frame, for heat transport to or from at least one of the projection system and the reference frame, wherein the heat transport system, is coupled to a further frame which is mechanically isolated from the reference frame.

公开(公告)号：US20050024611A1

公开(公告)日：2005-02-03

申请号：US10876786

申请日：2004-06-25

申请人： Pertrus Bartray ,  Wilhelmus Box ,  Dominicus Jacobus Franken ,  Bernardus Luttikhuis ,  Engelbertus Van Der Pasch ,  Marc Van Der Wijst ,  Marc Engels

发明人： Pertrus Bartray ,  Wilhelmus Box ,  Dominicus Jacobus Franken ,  Bernardus Luttikhuis ,  Engelbertus Van Der Pasch ,  Marc Van Der Wijst ,  Marc Engels

IPC分类号： G01B11/00 ,  G03F7/20 ,  H01L21/027 ,  G03B27/42 ,  G03C5/00 ,  G03F9/00

CPC分类号： G03F7/70716 ,  G03F7/70775

摘要： A lithographic apparatus is disclosed. The apparatus includes a radiation system for supplying a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a projection system for projecting the patterned beam of radiation onto a target portion of a substrate, and an assembly for determining a spatial position of the patterning device relative to the projection system. The assembly includes a measuring unit that has a plurality of sensors that are mounted on the projection system.

摘要翻译： 公开了一种光刻设备。 该装置包括用于提供辐射束的辐射系统和用于支撑图案形成装置的支撑结构。 图案形成装置用于根据期望的图案对辐射束进行图案化。 该装置还包括用于将图案化的辐射束投影到基板的目标部分上的投影系统和用于确定图案形成装置相对于投影系统的空间位置的组件。 组件包括具有安装在投影系统上的多个传感器的测量单元。

公开(公告)号：US20070115445A1

公开(公告)日：2007-05-24

申请号：US11602475

申请日：2006-11-21

申请人： Wilhelmus Box ,  Derk Klunder ,  Maarten Marinus Johannes Van Herpen ,  Niels Driessen ,  Hendrikus Schimmel

发明人： Wilhelmus Box ,  Derk Klunder ,  Maarten Marinus Johannes Van Herpen ,  Niels Driessen ,  Hendrikus Schimmel

IPC分类号： G03B27/52

CPC分类号： G03F7/70916 ,  G03F7/70858

摘要： The invention relates to a radiation system for generating a beam of radiation. The radiation system includes an extreme ultraviolet source constructed and arranged to generate extreme ultraviolet radiation, a contamination barrier constructed and arranged to trap contamination from the radiation source, and a temperature sensor constructed and arranged to sense a temperature of the contamination barrier.

摘要翻译： 本发明涉及一种用于产生辐射束的辐射系统。 辐射系统包括构造和布置成产生极紫外辐射的极紫外光源，构造和布置成污染辐射源的污染物的污染屏障，以及构造和布置成感测污染屏障温度的温度传感器。

公开(公告)号：US20060028627A1

公开(公告)日：2006-02-09

申请号：US10910792

申请日：2004-08-04

申请人： Wilhelmus Box

发明人： Wilhelmus Box

IPC分类号： G03B27/52

CPC分类号： G03F7/708

摘要： A lithographic apparatus is disclosed. The apparatus includes the following components: an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, a substrate support constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. At least one of the components that experiences a heat load in use is provided with an integrally mounted heating element arranged to maintain the component at a substantially constant temperature.

摘要翻译： 公开了一种光刻设备。 该装置包括以下组件：被配置为调节辐射束的照明系统，被构造成支撑图案形成装置的支撑件，被构造成保持衬底的衬底支撑件以及配置成将图案化的辐射束投影到目标部分上的投影系统 的基底。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 在使用中经受热负荷的部件中的至少一个设置有被整体安装的加热元件，其布置成将部件保持在基本恒定的温度。

公开(公告)号：US20070222956A1

公开(公告)日：2007-09-27

申请号：US11798710

申请日：2007-05-16

申请人： Levinus Bakker ,  Marcel Marie Dierichs ,  Johannes Freriks ,  Frank Schuurmans ,  Jakob Vijfvinkel ,  Wilhelmus Box

发明人： Levinus Bakker ,  Marcel Marie Dierichs ,  Johannes Freriks ,  Frank Schuurmans ,  Jakob Vijfvinkel ,  Wilhelmus Box

IPC分类号： G03B27/52

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70916

摘要： A contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris from the radiation source. The contamination barrier includes a support structure, a plurality of plate members arranged on the support structure and extending in a radial direction from an axis of the support structure, and a shield configured to block at least part of the support structure from being hit by radiation or debris from the radiation source.

摘要翻译： 被配置为允许来自辐射源的辐射通过并捕获来自辐射源的碎屑的污染屏障。 污染屏障包括支撑结构，布置在支撑结构上并沿着径向方向从支撑结构的轴线延伸的多个板构件以及被构造成阻挡支撑结构的至少一部分被辐射撞击的屏蔽 或来自辐射源的碎片。

公开(公告)号：US20050248739A1

公开(公告)日：2005-11-10

申请号：US10838525

申请日：2004-05-05

申请人： Wilhelmus Box ,  Bernardus Antonius Luttikhuis ,  Thomas Henricus Verhagen

发明人： Wilhelmus Box ,  Bernardus Antonius Luttikhuis ,  Thomas Henricus Verhagen

IPC分类号： G03F7/20 ,  G03B27/52 ,  H01L21/027

CPC分类号： G03F7/70833 ,  G03F7/70891

摘要： A lithographic apparatus having an illumination system configured to provide a radiation beam; a support structure configured to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section, thus providing a patterned radiation beam; a substrate table configured to hold a substrate; a projection system arranged to project the patterned radiation beam onto a target portion of the substrate, and a projection system support configured to support the projection system on a reference frame. The lithographic apparatus further includes a thermal conditioning system configured to thermally condition the projection system support. The invention further relates to a thermal conditioning system constructed and arranged to thermally condition a projection system support. The invention further relates to a device manufacturing method and a method for manufacturing a device.

摘要翻译： 一种具有被配置为提供辐射束的照明系统的光刻设备; 构造成支撑图案形成装置的支撑结构，所述图案形成装置能够在其横截面中赋予所述辐射束图案，从而提供图案化的辐射束; 被配置为保持基板的基板台; 投影系统，布置成将图案化的辐射束投影到基板的目标部分上;以及投影系统支撑件，被配置为将投影系统支撑在参考系上。 光刻设备还包括被配置为热调节投影系统支撑件的热调节系统。 本发明还涉及一种构造和布置成对投影系统支撑件进行热调节的热调节系统。 本发明还涉及一种用于制造器件的器件制造方法和方法。

公开(公告)号：US20050105070A1

公开(公告)日：2005-05-19

申请号：US10735847

申请日：2003-12-16

申请人： Pertrus Bartray ,  Wilhelmus Box ,  Bernardus Antonius Luttikhuis ,  Michael Ten Bhomer

发明人： Pertrus Bartray ,  Wilhelmus Box ,  Bernardus Antonius Luttikhuis ,  Michael Ten Bhomer

IPC分类号： H01L21/027 ,  G02B7/02 ,  G03B27/42 ,  G03F7/20

CPC分类号： G03F7/7095 ,  G02B7/028 ,  G03F7/70833 ,  G03F7/70858 ,  G03F7/709

摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a reference frame that provides a reference surface with respect to which a position of at least one of the substrate and the patterning structure is measured. The reference frame includes a material that has a coefficient of thermal expansion of greater than about 2.9×10−6/K.

摘要翻译： 公开了一种光刻设备。 该装置包括提供辐射束的照明系统和支撑图形结构的支撑结构。 图案形成结构被配置为在其横截面中赋予辐射束图案。 该装置还包括支撑基板的基板支撑件，将图案化的光束投影到基板的目标部分上的投影系统以及提供参考表面的参考框架，基准面相对于基板的至少一个基板 并且测量图案结构。 参考框架包括具有大于约2.9×10 -6 / K的热膨胀系数的材料。