USE OF PHOSPHINIC ACIDS AND/OR PHOSPHONIC ACIDS IN REDOX PROCESSES
    3.
    发明申请
    USE OF PHOSPHINIC ACIDS AND/OR PHOSPHONIC ACIDS IN REDOX PROCESSES 失效
    磷酸和/或磷酸在氧化还原过程中的使用

    公开(公告)号:US20090166212A1

    公开(公告)日:2009-07-02

    申请号:US12303006

    申请日:2007-05-04

    IPC分类号: C25D3/04 C25D3/00 C25D3/22

    摘要: The present invention relates to the use of phosphinic acids and/or phosphonic acids and salts thereof, preferably as surface-active compounds, in redox processes, in particular in electroplating technology, particularly preferably in electroplating baths, and to electroplating baths comprising these compounds.

    摘要翻译: 本发明涉及次膦酸和/或膦酸及其盐,优选作为表面活性化合物在氧化还原过程中的应用,特别是在电镀技术中,尤其是电镀浴中以及包含这些化合物的电镀浴中的用途。