摘要:
An electron-optical system with a variable-shaped beam for generating and measuring microstructures, such as circuits on a semiconductor substrate, generates the variable-shaped electron beam by the use of electron-optical shadow projection imaging and has a remote focus multipole Wehnelt electrode for adjusting, focusing, and controlling the intensity of the electron beam. The system also has a ferrite polecylinder in the beam projections lens with field attenuation or may have a beam projection lens with an external air gap. The length of the electron beam is approximately 60 centimeters.
摘要:
A high current electron source with a narrow energy band of the type employed in an electron beam printer has a beam generating system consisting of a cathode and focusing electrodes and an anode with at least one electrode functioning to astigmatically focus at least one electron crossover in the low velocity range. For varying the position and shape of the crossover in a simple manner for adaptation to particular use conditions of the high current electron source, the Wehnelt electrode of the electron source consists of one or more cylinder lenses or of an electrostatic multipole element, or an electromagnetic multipole element is disposed in the plane of a conventional non-ferromagnetic Wehnelt electrode with a circular aperture for the electron beam. By pole reversal of the Wehnelt voltage or of the coil current and by changing the size of the current, the shape and azimuth position of the first crossover in the cathode space can be varied to any configuration. By so doing, an energy spread of the electrons is prevented and an optimum illumination of surfaces to be imaged is achieved.
摘要:
A method and device for correcting errors and setting the focus of an electron optical condenser of a microprojector which condenser produces a bundle of axially parallel electron rays for illuminating a large surface transmission mask to create an image which is projected by means of an electron optical lens system on a surface of a wafer characterized by placing an annular field stop or diaphragm which passes a bundle of rays having a ring-shaped or annular cross section and recording the image in a plane preferably adjacent the surface of the wafer. The recording can be accomplished by utilizing a photographic plate or by utilizing a detector arrangement. When the image on the recording unit is the same size and shape as the annular field stop, then the electron optical condenser has the correct focal length and the source is disposed on the front focal plane.
摘要:
For testing an interconnect network for shorts and interruptions, a point of the network to be tested is charged with a particle beam. Subsequently, a potential at least one further contact point is read with the same particle beam and an unaltered primary energy. An identification of potential occurs by documenting the secondary electrons triggered at the contact points. In order to avoid a disturbing change of potential during the measuring phase, the measuring time is only a fraction of the time for charging the network.
摘要:
A method and apparatus for measuring lengths in a scanning particle microscope employ a device for generating a particle beam directed toward a specimen stage on which a specimen is mounted. A second stage is placed over the specimen stage above the specimen, the second stage carrying a calibrated grid structure covering the region of the specimen to be measured. The grid structure is disposed a distance from the specimen which is less than or equal to the depth of focus of the apparatus. The grid structure is of known dimensions, and is utilized to provide bench marks for measuring distances on the specimen, and can be displaced as needed to measure longer distances.
摘要:
An electrostatic-magnetic lens is provided having either a symmetrical or asymmetrical magnetic lens which is overlaid with an electrostatic immersion lens. One electrode of the immersion lens is formed as a hollow cylinder, which is within an upper pole piece of the magnetic lens concentrically relative to the axis of symmetry thereof and extending into the region of the pole piece gap. The lower pole piece of the magnetic lens is preferably at a ground potential and clad with the beam guiding tube for protection against contamination and forming the lower electrode of the electrostatic immersion lens.
摘要:
In an exemplary system, a two stage deflection system responds to a first control signal of low frequency such that extra-axial chromatic errors due to electrostatic and magnetic deflection are made equal and opposite. The magnetic and electrostatic deflection systems may be arranged in either order along the beam path just so the low frequency electrostatic deflection is one-half the magnetic deflection and is in an opposite direction at the target. A second higher frequency control signal controls only the electrostatic deflection system. Preferably the deflection velocities at the target produced by the two control signals are equal, with the higher frequency being an integral multiple of the lower frequency and with the control signals being poled to provide opposite deflections. When the two deflection velocities are superimposed, the resultant is then a step type deflection as a function of time.
摘要:
A focused ion beam device is described comprising a gas field ion source with an emitter emitting an ion beam including ions of gas, an ion beam column and a beam current control loop comprising a beam current measurement device. Furthermore, the focused ion beam device may have a sample charge control comprising measuring the sample charge. A method of operating a focused ion beam device is provided comprising applying a voltage between an emitter an electrode, applying gas to the emitter, emitting ions of a gas from the emitter and controlling a beam current by measuring the beam current with a beam current measurement device.
摘要:
The present invention relates to a beam optical component (1, 201) for acting on a charged particle beam (63) including a first element (3; 203) having a first opening (9; 209) for acting on the charged particle beam (63), at least a second element (5; 205) for acting on the charged particle beam (63); at least one distance piece (20a, 20b, 20c) positioned between the first element (3; 203) and the second element (5; 205) to define a minimum distance between the first element (3; 203) and the second element (5; 205); and a first holding piece (30a; 30b; 30c) for abutting the first element (3) to the at least one distance piece (20a, 20b, 20c), whereby the first holding piece (30a; 30b; 30c) is attached to the at least one distance piece (20a, 20b, 20c). First and second elements (3; 203; 5; 205) are preferably electrodes or pole pieces to act on the charged particle beam by an electrostatic or magnetic force. With the first holding piece (30a; 30b; 30c) attached to the at least one distance piece, distorting mechanical forces on the first and second elements (3, 5) are reduced which improves the performance of the respective beam optical components (1; 201).
摘要:
The present invention relates to a beam optical component including a charged particle lens for focusing a charged particle beam, the charged particle lens comprising a first element having a first opening for focusing the charged particle beam; a second element having a second opening for focusing the charged particle beam and first driving means connected with at least one of the first element and the second element for aligning the first opening with respect to the second opening. With the first driving means, the first opening and the second opening can be aligned with respect to each other during beam operation to provide a superior alignment of the beam optical component for a better beam focusing. The present invention also relates to a charged particle beam device that uses said beam optical component for focusing the charged particle beam, and a method to align first opening and second opening with respect to each other.