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    LARGE AREA IMPRINT LITHOGRAPHY
    2.
    发明申请
    LARGE AREA IMPRINT LITHOGRAPHY 有权
    大面积印刷图

    公开(公告)号：US20130214452A1

    公开(公告)日：2013-08-22

    申请号：US13773217

    申请日：2013-02-21

    申请人： Byung-Jin Choi ,  Se Hyun Ahn ,  Mahadevan GanapathiSubramanian ,  Michael N. Miller ,  Sidlgata V. Sreenivasan

    发明人： Byung-Jin Choi ,  Se Hyun Ahn ,  Mahadevan GanapathiSubramanian ,  Michael N. Miller ,  Sidlgata V. Sreenivasan

    IPC分类号： B29C59/02

    CPC分类号： B29C59/026 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    摘要： Methods and systems are provided for patterning polymerizable material dispensed on flexible substrates or flat substrates using imprint lithography techniques. Template replication methods and systems are also presented where patterns from a master are transferred to flexible substrates to form flexible film templates. Such flexible film templates are then used to pattern large area flat substrates. Contact between the imprint template and substrate can be initiated and propagated by relative translation between the template and the substrate.

    摘要翻译： 提供了使用压印光刻技术对分配在柔性基板或平坦基板上的可聚合材料进行图案化的方法和系统。 还提供了模板复制方法和系统，其中来自主机的模式被转移到柔性基板以形成柔性膜模板。 然后使用这种柔性膜模板来对大面积的平坦基板进行图案化。 可以通过模板和衬底之间的相对平移来启动和传播压印模板和衬底之间的接触。

    Adaptive shape substrate support system
    8.
    发明授权
    Adaptive shape substrate support system 有权
    自适应形状衬底支撑系统

    公开(公告)号：US07307697B2

    公开(公告)日：2007-12-11

    申请号：US11136891

    申请日：2005-05-25

    申请人： Mahadevan GanapathiSubramanian ,  Sidlgata V. Sreenivasan

    发明人： Mahadevan GanapathiSubramanian ,  Sidlgata V. Sreenivasan

    IPC分类号： G03B27/60 ,  G03B27/42 ,  G03B27/58

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/707

    摘要： The present method and system features an active compliant pin chuck to hold a substrate, having opposed first and second surfaces, and compensates for non-planarity in one of the surfaces of the substrate. To that end, the support system includes a chuck having a plurality of piezo pins and reference pins, with the piezo pins being coupled to piezo actuators to undergo relative movement with respect to said reference pins. These and other embodiments are discussed more fully below.

    摘要翻译： 本发明的方法和系统具有主动柔性销卡盘以保持具有相对的第一和第二表面的基板，并且补偿基板的一个表面中的非平面性。 为此，支撑系统包括具有多个压电销和参考销的卡盘，压电销耦合到压电致动器以相对于所述参考销进行相对运动。 以下将更全面地讨论这些和其它实施例。

    Template having a varying thickness to facilitate expelling a gas positioned between a substrate and the template
    10.
    发明授权
    Template having a varying thickness to facilitate expelling a gas positioned between a substrate and the template 有权
    模板具有不同的厚度以便于排出位于基板和模板之间的气体

    公开(公告)号：US08556616B2

    公开(公告)日：2013-10-15

    申请号：US13073533

    申请日：2011-03-28

    申请人： Douglas J. Resnick ,  Mario Johannes Meissl ,  Byung-Jin Choi ,  Sidlgata V. Sreenivasan

    发明人： Douglas J. Resnick ,  Mario Johannes Meissl ,  Byung-Jin Choi ,  Sidlgata V. Sreenivasan

    IPC分类号： B29C59/02

    CPC分类号： H01L21/67126 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/6715

    摘要： A nanoimprint lithography template including, inter alia, a body having first and second opposed sides with a first surface disposed on the first side, the second side having a recess disposed therein, the body having first and second regions with the second region surrounding the first region and the recess in superimposition with the first region, with a portion of the first surface in superimposition with the first region being spaced-apart from the second side a first distance and a portion of the first surface in superimposition with the second region being spaced-apart from the second side a second distance, with the second distance being greater than the first distance; and a mold disposed on the first side of the body in superimposition a portion of the first region.

    摘要翻译： 一种纳米压印光刻模板，其特别包括具有第一和第二相对侧的主体，第一表面设置在第一侧上，第二侧具有设置在其中的凹部，该主体具有第一和第二区域，第二区域围绕第一 所述凹部与所述第一区域叠加，所述第一表面的与所述第一区域重叠的部分与所述第二侧面间隔开第一距离，并且所述第一表面的与所述第二区域重叠的部分间隔开 从第二侧排出第二距离，第二距离大于第一距离; 以及模具，其设置在所述主体的第一侧上，以叠加所述第一区域的一部分。