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公开(公告)号：US09599890B2
公开(公告)日：2017-03-21
申请号：US14654277
申请日：2013-12-16
CPC分类号： G03F1/76 , B82Y30/00 , C08L53/00 , G03F1/00 , G03F7/0002 , G03F7/325 , H01L21/0274
摘要： The invention concerns a manufacturing method for nanolithography masks from a PS-b-PMMA block copolymer film deposited on a surface to be etched, said copolymer film comprising PMMA nanodomains orientated perpendicularly to the surface to be etched, said method being characterized in that it comprises the following steps: partially irradiating said copolymer film to form a first irradiated area and a second non-irradiated area in said copolymer film, then treating said copolymer film in a developer solvent to selectively remove at least said PMMA nanodomains of said first irradiated area of said copolymer film.
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公开(公告)号：US20140370198A1
公开(公告)日：2014-12-18
申请号：US14363868
申请日：2012-12-05
IPC分类号： B05D3/10 , C09D153/00 , B05D5/00 , B05D3/02 , B05D3/06
CPC分类号： B05D3/108 , B05D3/0254 , B05D3/06 , B05D5/00 , B05D7/52 , B05D7/56 , C08F293/005 , C08F2438/02 , C09D125/08 , C09D125/14 , C09D133/04 , C09D133/10 , C09D153/00 , G03F7/0002 , G03F7/16 , C08F212/08 , C08F220/14
摘要： The invention relates to a surface preparation method using a combination of at least two polymers, which are the same or different, which are grafted hierarchically or multiply on a surface, and also to the use of this preparation method, more particularly in applications for controlling the surface energy of a substrate. The invention may allow a block polymer to be structured with a minimum of defects.
摘要翻译： 本发明涉及使用至少两种相同或不同的聚合物的组合的表面制备方法，所述聚合物在表面上分层或多次接枝，也涉及使用该制备方法，更具体地说，涉及用于控制 衬底的表面能。 本发明可以允许嵌段聚合物以最小的缺陷构造。
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公开(公告)号：US09527108B2
公开(公告)日：2016-12-27
申请号：US14363868
申请日：2012-12-05
IPC分类号： B05D3/10 , C08F293/00 , C09D153/00 , C09D125/14 , G03F7/16 , B05D7/00 , C09D125/08 , C09D133/04 , C09D133/10 , B05D3/02 , B05D3/06 , B05D5/00 , G03F7/00
CPC分类号： B05D3/108 , B05D3/0254 , B05D3/06 , B05D5/00 , B05D7/52 , B05D7/56 , C08F293/005 , C08F2438/02 , C09D125/08 , C09D125/14 , C09D133/04 , C09D133/10 , C09D153/00 , G03F7/0002 , G03F7/16 , C08F212/08 , C08F220/14
摘要： The invention relates to a surface preparation method using a combination of at least two polymers, which are the same or different, which are grafted hierarchically or multiply on a surface, and also to the use of this preparation method, more particularly in applications for controlling the surface energy of a substrate. The invention may allow a block polymer to be structured with a minimum of defects.
摘要翻译： 本发明涉及使用至少两种相同或不同的聚合物的组合的表面制备方法，所述聚合物在表面上分层或多次接枝，也涉及使用该制备方法，更具体地说，涉及用于控制 衬底的表面能。 本发明可以允许嵌段聚合物以最小的缺陷构造。
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公开(公告)号：US10928725B2
公开(公告)日：2021-02-23
申请号：US16304897
申请日：2017-05-23
IPC分类号： H01L21/3213 , H01L21/311 , H01L21/033 , H01L21/027 , G03F7/00 , B81C1/00
摘要： A method for the directed self-assembly of a block copolymer by graphoepitaxy, includes forming a guide pattern, the guide pattern having a cavity with a bottom and side walls; forming a functionalisation layer on the guide pattern that has a first portion and a second portion disposed, respectively, on the bottom and side walls of the cavity; forming a protective layer on the first and second portions of the functionalisation layer; etching the protective layer and the second portion of the functionalisation layer such that a portion of the protective layer is retained and the side walls of the cavity are exposed, the retained portion of the protective layer having a thickness of less than 15 nm; selectively etching the portion of the protective layer relative to the first portion of the functionalisation layer and to the guide pattern; and depositing a block copolymer in the cavity.
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