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    Methods and systems for providing print media distortion compensation
    1.
    发明授权
    Methods and systems for providing print media distortion compensation 有权
    提供打印介质失真补偿的方法和系统

    公开(公告)号：US08100498B2

    公开(公告)日：2012-01-24

    申请号：US11860507

    申请日：2007-09-24

    申请人： Carl E. Picciotto ,  Jun Gao

    发明人： Carl E. Picciotto ,  Jun Gao

    IPC分类号： B41J29/393

    CPC分类号： B41J29/393 ,  G03G15/5062 ,  G03G2215/0059 ,  G03G2215/00776 ,  G03G2215/0158

    摘要： A reference image of an area of a print media is captured at approximately a first time by an image acquisition system. A first application of ink is applied onto the print media area by a printing assembly at the first time. A comparison image of the print media area is captured at a second time by the image acquisition system subsequent to the first application of ink onto the print media area. The reference image and the comparison image are processed to determine a relative displacement of a feature pattern on the print media between approximately the first time and the second time. A second application of ink from the printing assembly onto the print media is adjusted based on the determination.

    摘要翻译： 由图像采集系统在大约第一时间捕获打印介质的区域的参考图像。 第一次使用墨水通过印刷组件在印刷介质区域上施加。 在将墨水首次施加到打印介质区域之后，由图像采集系统第二次捕获打印介质区域的比较图像。 处理参考图像和比较图像以在大约第一时间和第二时间之间确定打印介质上的特征图案的相对位移。 基于该确定来调整从打印组件到打印介质的墨水的第二次应用。

    Multiple layer alignment sensing
    5.
    发明授权
    Multiple layer alignment sensing 失效
    多层对齐检测

    公开(公告)号：US07650029B2

    公开(公告)日：2010-01-19

    申请号：US10995840

    申请日：2004-11-23

    申请人： Carl E. Picciotto ,  Jun Gao

    发明人： Carl E. Picciotto ,  Jun Gao

    IPC分类号： G06K9/00

    CPC分类号： G03F9/7003 ,  G03F9/7038 ,  G03F9/7088

    摘要： Using an imaging system in relation to a plurality of material layers is described, the material layers being separated by a distance greater than a depth of field of the imaging system. A focal plane of the imaging system and a first of the plurality of material layers are brought into correspondence. A first image including at least a portion of the first material layer having a first feature of interest thereon is stored. The focal plane of the imaging system and a second of the plurality of material layers are brought into correspondence. A second image including at least a portion of the second material layer having a second feature of interest thereon is acquired. The first and second images are processed for automatic computation of an alignment measurement between the first and second features of interest.

    摘要翻译： 描述了相对于多个材料层使用成像系统，材料层被分离大于成像系统的景深的距离。 使成像系统的焦平面和多个材料层中的第一个成对准。 存储包括其上具有感兴趣的第一特征的第一材料层的至少一部分的第一图像。 使成像系统的焦平面和多个材料层中的第二个成对应。 获取包括具有第二特征的第二材料层的至少一部分的第二图像。 处理第一和第二图像以自动计算感兴趣的第一和第二特征之间的对准测量。

    Displacement estimation system and method
    6.
    发明授权
    Displacement estimation system and method 失效
    位移估计系统和方法

    公开(公告)号：US07085673B2

    公开(公告)日：2006-08-01

    申请号：US10930614

    申请日：2004-08-31

    申请人： Carl E. Picciotto ,  Jun Gao ,  Wei Wu

    发明人： Carl E. Picciotto ,  Jun Gao ,  Wei Wu

    IPC分类号： G01B21/02 ,  G06K9/32

    CPC分类号： G06T7/20 ,  G06T7/70

    摘要： A displacement estimation system including a data acquisition system and a processing system is provided. The data acquisition system is configured to capture a first frame from a first substrate including a first pattern and a second substrate including a second pattern at a first time and capture a second frame from a third substrate including a third pattern and a fourth substrate including a fourth pattern at a second time subsequent to the first time. The first pattern and the third pattern are substantially identical, and the second pattern and the fourth pattern are substantially identical. The processing system is configured to calculate a first displacement between the first pattern and the third pattern using the first frame and the second frame and calculate a second displacement between the second pattern and the fourth pattern using the first frame and the second frame.

    摘要翻译： 提供了包括数据采集系统和处理系统的位移估计系统。 数据采集​​系统被配置为在第一时间从包括第一图案的第一基板和包括第二图案的第二基板捕获第一帧，并从包括第三图案的第三基板和包括第三图案的第四基板捕获第二帧 第四模式在第一次之后的第二时间。 第一图案和第三图案基本相同，第二图案和第四图案基本相同。 处理系统被配置为使用第一帧和第二帧来计算第一图案和第三图案之间的第一位移，并且使用第一帧和第二帧计算第二图案和第四图案之间的第二位移。

    Displacement sensing by comparing matrices of pointwise measurements
    7.
    发明授权
    Displacement sensing by comparing matrices of pointwise measurements 失效

    公开(公告)号：US07082378B2

    公开(公告)日：2006-07-25

    申请号：US10994055

    申请日：2004-11-18

    申请人： Carl E. Picciotto ,  Jun Gao ,  Neal W. Meyer

    发明人： Carl E. Picciotto ,  Jun Gao ,  Neal W. Meyer

    IPC分类号： G01B7/00 ,  G06F15/00

    CPC分类号： G01D5/347 ,  G06T7/246 ,  G06T7/70

    摘要： Determining a displacement of a substantially rigid item relative to a frame of reference between a first time and a second time is described. At the first time, a first set of pointwise measurements of a physical property of the item taken at a plurality of fixed locations relative to the frame of reference is acquired. At the second time, a second set of pointwise measurements of the physical property taken at the plurality of fixed locations is acquired. A first matrix derived from the first set of pointwise measurements is compared to a second matrix derived from the second set of pointwise measurements to determine the displacement.

    Determining a dimensional change in a surface using images acquired before and after the dimensional change
    8.
    发明授权
    Determining a dimensional change in a surface using images acquired before and after the dimensional change 失效
    使用在尺寸变化之前和之后获取的图像来确定表面中的尺寸变化

    公开(公告)号：US07796800B2

    公开(公告)日：2010-09-14

    申请号：US11046146

    申请日：2005-01-28

    申请人： Carl E. Picciotto ,  William M. Tong ,  Jun Gao

    发明人： Carl E. Picciotto ,  William M. Tong ,  Jun Gao

    IPC分类号： G06K9/00

    CPC分类号： G01B11/002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/7003 ,  G03F9/7088 ,  G03F9/7092

    摘要： Determining a dimensional change in a surface of an object is described. At a first time, a first image of the surface is acquired at a first spatial window thereon having a first known position relative to a frame of reference. At a second time, a second image of the surface is acquired at a second spatial window thereon having a second known position relative to the frame of reference. The first image and the second image are processed according to an image displacement sensing algorithm to determine a relative translation of a first point on the surface between the first and second times. The relative translation of the first point, the first known position, and the second known position are used to determine the dimensional change in the surface between the first and second times.

    摘要翻译： 描述确定物体表面中的尺寸变化。 在第一时间，在其上具有相对于参照系的第一已知位置的第一空间窗口处获取表面的第一图像。 在第二时间，在其上具有相对于参考框架的第二已知位置的第二空间窗口处获取表面的第二图像。 根据图像位移检测算法处理第一图像和第二图像，以确定第一次和第二次之间表面上的第一点的相对平移。 使用第一点，第一已知位置和第二已知位置的相对平移来确定第一次和第二次之间的表面中的尺寸变化。

    LITHOGRAPHY ALIGNMENT SYSTEM AND METHOD USING nDSE-BASED FEEDBACK CONTROL
    9.
    发明申请
    LITHOGRAPHY ALIGNMENT SYSTEM AND METHOD USING nDSE-BASED FEEDBACK CONTROL 审中-公开
    LITHOGRAPHY对准系统和使用基于nDSE的反馈控制的方法

    公开(公告)号：US20080090312A1

    公开(公告)日：2008-04-17

    申请号：US11550372

    申请日：2006-10-17

    申请人： Inkyu Park ,  Wei Wu ,  Jun Gao ,  Carl E. Picciotto

    发明人： Inkyu Park ,  Wei Wu ,  Jun Gao ,  Carl E. Picciotto

    IPC分类号： H01L21/66

    CPC分类号： G03F9/7038 ,  G03F9/7088 ,  G03F9/7092 ,  G03F9/7096

    摘要： A contact lithography alignment system and method use nanoscale displacement sensing and estimation (nDSE) to maintain an alignment and compensate for a disturbance of one or more objects during contact lithography. A method of maintaining an alignment includes establishing an initial alignment of one or more objects and employing nDSE-based feedback control of relative positions of more or more of the objects to maintain the alignment during contact lithography. A method of disturbance compensation includes acquiring a first image, acquiring a second image, estimating an alignment error using nDSE applied to the first and second image, and adjusting a relative position to reduce the alignment error. A contact lithography system includes an optical sensor, a feedback processor providing nDSE and a position controller that adjusts relative positions of one or more objects to reduce an alignment error determined using the nDSE.

    摘要翻译： 接触光刻对准系统和方法使用纳米尺度位移感测和估计（nDSE）来保持对准并补偿接触光刻期间一个或多个物体的干扰。 保持对准的方法包括建立一个或多个对象的初始对准，并且采用基于nDSE的多个对象的相对位置的反馈控制来保持接触光刻期间的对准。 干扰补偿的方法包括获取第一图像，获取第二图像，使用施加到第一和第二图像的nDSE来估计对准误差，以及调整相对位置以减小对准误差。 接触光刻系统包括光学传感器，提供nDSE的反馈处理器和调整一个或多个对象的相对位置以减少使用nDSE确定的对准误差的位置控制器。