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公开(公告)号：US07191508B2
公开(公告)日：2007-03-20
申请号：US10917591
申请日：2004-08-13
CPC分类号： G11B5/3173 , G11B5/102 , G11B5/105 , G11B5/3106 , G11B5/3163 , Y10T29/49032 , Y10T29/49041
摘要： A method for manufacturing thin-film magnetic head sliders is disclosed. Initially, an elastic layer, which may be made of poly-dimethyl siloxane (PDMS), is spun on a wafer and is thermally cured. Then, a resist layer is spun on the elastic layer. Both the resist layer and the elastic layer are subsequently peeled off together from the wafer. Next, the peeled resist layer/elastic layer is applied onto a group of magnetic heads with the resist layer in direct contact with the magnetic heads. Finally, the elastic layer is peeled off from the resist layer such that the resist layer remains attaching to the magnetic heads.
摘要翻译： 公开了一种制造薄膜磁头滑块的方法。 最初，可以由聚二甲基硅氧烷（PDMS）制成的弹性层在晶片上旋转并被热固化。 然后，在弹性层上旋转抗蚀剂层。 抗蚀剂层和弹性层随后从晶片一起剥离。 接下来，将剥离的抗蚀剂层/弹性层施加到一组磁头上，其中抗蚀剂层与磁头直接接触。 最后，弹性层从抗蚀剂层剥离，使得抗蚀剂层保持附着在磁头上。
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公开(公告)号：US5734519A
公开(公告)日：1998-03-31
申请号：US37064
申请日：1993-03-25
申请人： Robert Edward Fontana, Jr. , Cherngye Hwang , Vlad Joseph Novotny , Timothy Clark Reiley , Celia Elizabeth Yeack-Scranton , Clinton David Snyder
发明人： Robert Edward Fontana, Jr. , Cherngye Hwang , Vlad Joseph Novotny , Timothy Clark Reiley , Celia Elizabeth Yeack-Scranton , Clinton David Snyder
摘要： A contact recording disk file uses an integrated head-suspension assembly having a head carrier with a dual-layer wear pad for contacting the disk during read and write operations. The outer wear layer of the pad is relatively soft and wear prone compared to a harder and more wear-resistant inner layer. The outer wear layer wears away at a relatively rapid rate during initial wear-in of the head carrier. In this manner the head pole pieces, which extend into the wear pad, are rapidly put into contact with the disk, thereby compensating for initial misalignment of the wear pad with the surface of the disk. The inner wear layer then provides wear resistance over the life of the disk file. In the preferred embodiment, both the outer and inner wear layers are formed of essentially amorphous carbon doped with different amounts of hydrogen.
摘要翻译： 接触式记录磁盘文件使用集成的头悬挂组件，其具有带有双层磨损垫的头部托架，用于在读取和写入操作期间接触盘。 相对于较硬和更耐磨的内层，该垫的外部耐磨层相对较软并且容易发生倾向。 在头托架的初始磨损期间，外磨损层以相对较快的速度磨损。 以这种方式，延伸到耐磨垫中的头部极片迅速地与盘接触，从而补偿磨损垫与盘表面的初始不对准。 然后，内部磨损层在磁盘文件的使用寿命内提供耐磨性。 在优选实施例中，外耐磨层和内耐磨层均由掺杂有不同量氢的基本无定形碳形成。
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公开(公告)号：US07236328B2
公开(公告)日：2007-06-26
申请号：US09758939
申请日：2001-01-10
申请人： Jennifer Lu , Dennis Richard McKean , Cherngye Hwang , Shi Ning
发明人： Jennifer Lu , Dennis Richard McKean , Cherngye Hwang , Shi Ning
IPC分类号： G11B15/64
CPC分类号： G11B5/6005
摘要： The present invention relates to a method for producing a transducer slider. The method involves first coating a substrate with a radiation-sensitive layer and exposing the radiation-sensitive layer to radiation according to an intensity pattern. Preferably, the intensity pattern is provided using a grayscale mask. Once the image is developed into the radiation-sensitive layer, the image is transferred into the substrate to form a transducer slider having a surface profile comprising a tapered edge. In the alternative or in addition, the surface profile may comprise a rounded corner. The invention also relates to a structure for forming a transducer slider.
摘要翻译： 本发明涉及一种用于制造换能器滑块的方法。 该方法包括首先用辐射敏感层涂覆基底，并根据强度图案将辐射敏感层暴露于辐射。 优选地，使用灰度掩模提供强度图案。 一旦将图像显影到辐射敏感层中，则将图像转移到基底中以形成具有包括锥形边缘的表面轮廓的换能器滑块。 在替代或另外，表面轮廓可以包括圆角。 本发明还涉及一种用于形成换能器滑块的结构。
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公开(公告)号：US07396636B2
公开(公告)日：2008-07-08
申请号：US10928038
申请日：2004-08-27
申请人： Cherngye Hwang , Kim Y. Lee , Dennis R. McKean , Gary Suzuki
发明人： Cherngye Hwang , Kim Y. Lee , Dennis R. McKean , Gary Suzuki
IPC分类号： G03F7/00
CPC分类号： G11B5/6005 , G11B5/3163 , G11B5/3173
摘要： A method for creating segmented resist islands for photolithography on single sliders is disclosed. The method includes ramping the temperature of a number of single sliders, to a temperature that is below a proper softbake temperature. The single sliders reside in a divider and the single sliders and walls of the divider have a layer of resist deposited on them. Coarse lithography is then performed to remove the resist from above portions of the walls of the divider; and the temperature of the single sliders, the resist and the divider is then ramped to a proper softbake temperature.
摘要翻译： 公开了一种用于在单个滑块上创建用于光刻的分割的抗蚀岛的方法。 该方法包括将多个单个滑块的温度升高到低于适当的软烘烤温度的温度。 单个滑块位于分隔器中，分隔器的单个滑块和壁具有沉积在其上的抗蚀剂层。 然后进行粗光刻以从分隔器的壁的上部的部分去除抗蚀剂; 然后将单个滑块，抗蚀剂和分隔器的温度倾斜到适当的软烘烤温度。
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公开(公告)号：US20050091836A1
公开(公告)日：2005-05-05
申请号：US10917591
申请日：2004-08-13
申请人： Cherngye Hwang , Kim Lee , Gary McClelland , Dennis McKean , Timothy Reiley
发明人： Cherngye Hwang , Kim Lee , Gary McClelland , Dennis McKean , Timothy Reiley
CPC分类号： G11B5/3173 , G11B5/102 , G11B5/105 , G11B5/3106 , G11B5/3163 , Y10T29/49032 , Y10T29/49041
摘要： A method for manufacturing thin-film magnetic head sliders is disclosed. Initially, an elastic layer, which may be made of poly-dimethyl siloxane (PDMS), is spun on a wafer and is thermally cured. Then, a resist layer is spun on the elastic layer. Both the resist layer and the elastic layer are subsequently peeled off together from the wafer. Next, the peeled resist layer/elastic layer is applied onto a group of magnetic heads with the resist layer in direct contact with the magnetic heads. Finally, the elastic layer is peeled off from the resist layer such that the resist layer remains attaching to the magnetic heads.
摘要翻译： 公开了一种制造薄膜磁头滑块的方法。 最初，可以由聚二甲基硅氧烷（PDMS）制成的弹性层在晶片上旋转并被热固化。 然后，在弹性层上旋转抗蚀剂层。 抗蚀剂层和弹性层随后从晶片一起剥离。 接下来，将剥离的抗蚀剂层/弹性层施加到一组磁头上，其中抗蚀剂层与磁头直接接触。 最后，弹性层从抗蚀剂层剥离，使得抗蚀剂层保持附着在磁头上。
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公开(公告)号：US09349395B2
公开(公告)日：2016-05-24
申请号：US13601739
申请日：2012-08-31
CPC分类号： H01J37/32825 , G11B5/3163 , H01J37/32816 , H01J37/3411 , H01J2237/334
摘要： A method according to one embodiment includes placing a substrate in a chamber; and plasma sputtering the substrate in a presence of a non-zero pressure of a vapor, wherein the vapor at the non-zero pressure is effective to diminish an etch rate of a first material of the substrate. A plasma sputtering apparatus according to one embodiment includes a chamber; a reservoir in the chamber for releasing a vapor at an established rate; a mount for a substrate; and a plasma source.
摘要翻译： 根据一个实施例的方法包括将衬底放置在腔室中; 以及在非零压力蒸汽的存在下等离子体溅射所述衬底，其中所述非零压力下的蒸气有效地降低所述衬底的第一材料的蚀刻速率。 根据一个实施例的等离子体溅射装置包括室; 用于以确定的速率释放蒸气的室中的储存器; 用于衬底的安装件; 和等离子体源。
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公开(公告)号：US20140061033A1
公开(公告)日：2014-03-06
申请号：US13601739
申请日：2012-08-31
CPC分类号： H01J37/32825 , G11B5/3163 , H01J37/32816 , H01J37/3411 , H01J2237/334
摘要： A method according to one embodiment includes placing a substrate in a chamber; and plasma sputtering the substrate in a presence of a non-zero pressure of a vapor, wherein the vapor at the non-zero pressure is effective to diminish an etch rate of a first material of the substrate. A plasma sputtering apparatus according to one embodiment includes a chamber; a reservoir in the chamber for releasing a vapor at an established rate; a mount for a substrate; and a plasma source.
摘要翻译： 根据一个实施例的方法包括将衬底放置在腔室中; 以及在非零压力蒸汽的存在下等离子体溅射所述衬底，其中所述非零压力下的蒸气有效地降低所述衬底的第一材料的蚀刻速率。 根据一个实施例的等离子体溅射装置包括室; 用于以确定的速率释放蒸气的室中的储存器; 用于衬底的安装件; 和等离子体源。
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8.发明授权Magnetic heads having magnetic films that are more recessed than insulating films, and systems having such heads 失效具有比绝缘膜更凹陷的磁性膜的磁头以及具有这种磁头的系统公开(公告)号：US08611049B2
公开(公告)日：2013-12-17
申请号：US12975208
申请日：2010-12-21
IPC分类号： G11B5/127
CPC分类号： G11B5/00826 , G11B5/3116 , G11B5/3163
摘要： A structure according to one embodiment includes a substrate having a media facing side; and a thin film stack formed on the substrate, the thin film stack including magnetic films and insulating films, wherein the thin film stack is recessed from a plane extending along the media facing side of the substrate, wherein the magnetic films are recessed more than the insulating films, wherein the magnetic films each have a substantially flat media facing surface, wherein the insulating films each have a substantially flat media facing surface.
摘要翻译： 根据一个实施例的结构包括具有介质面向侧的基板; 以及形成在所述基板上的薄膜叠层，所述薄膜叠层包括磁性膜和绝缘膜，其中所述薄膜叠层从沿着所述基板的面向介质侧延伸的平面凹陷，其中所述磁性膜比所述 绝缘膜，其中所述磁性膜各自具有基本上平坦的介质面向表面，其中所述绝缘膜各自具有基本平坦的介质面向表面。
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公开(公告)号：US08220136B2
公开(公告)日：2012-07-17
申请号：US11800127
申请日：2007-05-03
CPC分类号： G11B5/4853 , G11B5/102 , G11B5/3163 , G11B5/3173 , Y10T29/49027 , Y10T29/49039 , Y10T29/49041 , Y10T29/49055 , Y10T29/53165 , Y10T156/10
摘要： A method for forming a planarized surface for at least one bar of sliders for utilization in a hard disk drive is disclosed. In general, at least one bar of sliders is placed on an adhesive layer. A single thermoplastic layer is then provided above the at least one bar of sliders. The single thermoplastic layer is then heated to a softening temperature such that the single thermoplastic layer will flow between the at least one bar of sliders. The single thermoplastic layer is then cooled to form a planarized surface of both said single thermoplastic layer and said at least one bar of sliders at said adhesive layer.
摘要翻译： 公开了一种用于形成至少一个用于硬盘驱动器的滑块的平面化表面的方法。 通常，将至少一个滑杆放置在粘合剂层上。 然后在至少一个滑杆上方设置单个热塑性层。 然后将单个热塑性层加热到软化温度，使得单个热塑性层将在至少一个滑块之间流动。 然后将单个热塑性层冷却以在所述粘合剂层处形成所述单一热塑性层和所述至少一个滑块条的平坦化表面。
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公开(公告)号：US08191234B2
公开(公告)日：2012-06-05
申请号：US12184357
申请日：2008-08-01
CPC分类号： G11B5/3106 , G11B5/3163 , G11B5/3169 , Y10T29/49039 , Y10T29/49041 , Y10T29/49048
摘要： A method for protecting a thin film structure including fabricating a plurality of island structures in a recording gap of a magnetic recording head, exposing a substantial portion of the plurality of island structures by removing at least a portion of the surrounding recording gap material via at least one etching process, including ion milling, coating the magnetic recording head containing the plurality of island structures with a coating material, including silicon nitride or aluminum oxide, and removing at least a portion of the coating material via a removal process, including chemical-mechanical polishing or lapping, to expose an uppermost region of at least a portion of said plurality of island structures.
摘要翻译： 一种用于保护薄膜结构的方法，包括在磁记录头的记录间隙中制造多个岛状结构，通过至少除去周围的记录间隙材料的至少一部分而暴露多个岛结构的大部分 一个蚀刻工艺，包括离子铣削，用包括氮化硅或氧化铝的涂层材料涂覆包含多个岛状结构的磁记录头，以及通过去除工艺去除至少一部分涂层材料，包括化学机械 抛光或研磨，以暴露所述多个岛结构的至少一部分的最上部区域。
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