摘要:
The subject is to provide a polymer material which enables to improve planarity and planarization efficiency of a polished surface and is useful as a polishing pad which generates only a few scratches. The said subject is solved by a polymer material having a tensile modulus at 50° C. after saturation swelling with 50° C. water of 130 to 800 MPa, a loss tangent at 50° C. of not more than 0.2, and a contact angle with water of not more than 80°.
摘要:
The subject is to provide a polymer material which enables to improve planarity and planarization efficiency of a polished surface and is useful as a polishing pad which generates only a few scratches. The said subject is solved by a polymer material having a tensile modulus at 50° C. after saturation swelling with 50° C. water of 130 to 800 MPa, a loss tangent at 50° C. of not more than 0.2, and a contact angle with water of not more than 80°.
摘要:
The invention provides a polishing pad to polish a metal layer. The polishing pad has a storage elastic modulus at 80° C. of 200 to 900 MPa and a storage elastic modulus at 110° C. of 40 MPa or less. The invention also provides a method of polishing a metal layer using the pad.
摘要:
The invention provides a polishing pad to polish a metal layer. The polishing pad has a storage elastic modulus at 80° C. of 200 to 900 MPa and a storage elastic modulus at 110° C. of 40 MPa or less. The invention also provides a method of polishing a metal layer using the pad.
摘要:
The present invention aims to provide a polyurethane foam, suitably usable as a polishing pad, having a uniform foam structure, which can achieve the improvements in the flatness of the surface of polished materials and in the planarization efficiency, and can extend the polishing pad life longer than that of the conventional polyurethane foams. This aim can be achieved by providing a polyurethane foam having a density of 0.5 to 1.0 g/cm3, a cell size of 5 to 200 μm and a hardness [JIS-C hardness] of not less than 90, comprising a thermoplastic polyurethane which is obtained by a reaction of a high polymer polyol, an organic diisocyanate and a chain extender, contains not less than 6% by weight of a nitrogen atom derived from the isocyanate group, and has a storage elastic modulus measured at 50° C. [E′50] of not less than 5×109 dyn/cm2.
摘要翻译:本发明的目的在于提供一种适合用作抛光垫的聚氨酯泡沫,其具有均匀的泡沫结构,其可以实现抛光材料表面的平整度和平坦化效率的提高,并且可以延长抛光垫寿命 比常规聚氨酯泡沫的长。 该目的可以通过提供密度为0.5〜1.0g / cm 3的聚氨酯泡沫,电池尺寸为5〜200μm,硬度[JIS-C硬度]为不小于 90,其包含通过高分子多元醇,有机二异氰酸酯和扩链剂的反应获得的热塑性聚氨酯,含有不少于6重量%的来自异氰酸酯基团的氮原子,并且具有储能弹性模量 在50℃下测量。[E'50]不小于5×10 9 dyn / cm 2。
摘要:
The present invention provides a slurry for chemical mechanical polishing comprising water-soluble clathrate compound (a), polymer compound (b) having an acidic group optionally in a salt form as a side chain, polishing abrasive grain (c) and water (d), wherein the content of the water-soluble clathrate compound (a) is 0.001 mass %-3 mass % of the total amount of the slurry, the polymer compound (b) has a weight average molecular weight of not less than 1,000 and less than 1,000,000, and the content of the polymer compound (b) is 0.12 mass %-3 mass % of the total amount of the slurry, and a polishing method for substrate using the slurry.
摘要:
The present invention provides a slurry for chemical mechanical polishing comprising water-soluble clathrate compound (a), polymer compound (b) having an acidic group optionally in a salt form as a side chain, polishing abrasive grain (c) and water (d), wherein the content of the water-soluble clathrate compound (a) is 0.001 mass %-3 mass % of the total amount of the slurry, the polymer compound (b) has a weight average molecular weight of not less than 1,000 and less than 1,000,000, and the content of the polymer compound (b) is 0.12 mass %-3 mass % of the total amount of the slurry, and a polishing method for substrate using the slurry.
摘要:
The present invention provides an erosion inhibitor for chemical mechanical polishing, which contains compound (a) having a molecular weight of not more than 100,000 and not less than 4 hydroxyl groups, and compound (b) having not less than 4 amino groups, and which has a mass ratio of the compound (a) and the compound (b) (the compound (a)/the compound (b)) of 0.10-500.
摘要:
(A) A polyester resin composition comprising a copolymerized polyethylene terephthalate (copolymerized PET) comprising 5 to 40 mole % of naphthalenedicarboxylic acid units, a cobalt compound and/or a manganese compound, an olefin polymer and a compatibility-improving agent, in specific amounts; and (B) a polyester resin composition comprising the above copolymerized PET which contains specific amounts of both a cobalt compound and a manganese compound are excellent in resistance to hydrogen peroxide, flavor-barrier properties, gas-barrier properties, heatsealability and mechanical properties such as elongation and strength and, utilizing these features, are effectively usable for various end-uses in particular as packaging materials for beverages such as fruit juices containing flavor components.