摘要:
The present invention provides a slurry for chemical mechanical polishing comprising water-soluble clathrate compound (a), polymer compound (b) having an acidic group optionally in a salt form as a side chain, polishing abrasive grain (c) and water (d), wherein the content of the water-soluble clathrate compound (a) is 0.001 mass %-3 mass % of the total amount of the slurry, the polymer compound (b) has a weight average molecular weight of not less than 1,000 and less than 1,000,000, and the content of the polymer compound (b) is 0.12 mass %-3 mass % of the total amount of the slurry, and a polishing method for substrate using the slurry.
摘要:
The present invention provides an erosion inhibitor for chemical mechanical polishing, which contains compound (a) having a molecular weight of not more than 100,000 and not less than 4 hydroxyl groups, and compound (b) having not less than 4 amino groups, and which has a mass ratio of the compound (a) and the compound (b) (the compound (a)/the compound (b)) of 0.10-500.
摘要:
The present invention provides a slurry for chemical mechanical polishing comprising water-soluble clathrate compound (a), polymer compound (b) having an acidic group optionally in a salt form as a side chain, polishing abrasive grain (c) and water (d), wherein the content of the water-soluble clathrate compound (a) is 0.001 mass %-3 mass % of the total amount of the slurry, the polymer compound (b) has a weight average molecular weight of not less than 1,000 and less than 1,000,000, and the content of the polymer compound (b) is 0.12 mass %-3 mass % of the total amount of the slurry, and a polishing method for substrate using the slurry.
摘要:
The invention provides a polishing pad to polish a metal layer. The polishing pad has a storage elastic modulus at 80° C. of 200 to 900 MPa and a storage elastic modulus at 110° C. of 40 MPa or less. The invention also provides a method of polishing a metal layer using the pad.
摘要:
The invention provides a polishing pad to polish a metal layer. The polishing pad has a storage elastic modulus at 80° C. of 200 to 900 MPa and a storage elastic modulus at 110° C. of 40 MPa or less. The invention also provides a method of polishing a metal layer using the pad.
摘要:
The invention provides a cushion for a polishing pad, wherein, when a dynamic compression viscoelasticity measurement is performed under conditions of 23° C., a static load of 27.6 kPa, a frequency of 11 Hz and an amplitude of 1 μm, (1) a phase difference between dynamic stress and deformation is 4° or less, and (2) a ratio of the maximum value of the deformation amount to the maximum value of the dynamic stress ([maximum value of deformation amount]/[maximum value of dynamic stress]) is 0.5 μm/kPa or more. The invention also provides a polishing pad having a layer of the cushion for a polishing pad and a polishing layer.
摘要:
The invention provides a cushion for a polishing pad, wherein, when a dynamic compression viscoelasticity measurement is performed under conditions of 23° C., a static load of 27.6 kPa, a frequency of 11 Hz and an amplitude of 1 μm, (1) a phase difference between dynamic stress and deformation is 4° or less, and (2) a ratio of the maximum value of the deformation amount to the maximum value of the dynamic stress ([maximum value of deformation amount]/[maximum value of dynamic stress]) is 0.5 μm/kPa or more. The invention also provides a polishing pad having a layer of the cushion for a polishing pad and a polishing layer.
摘要:
To secure insulation between electrical conductors at a coil end, a first electrical conductor at one coil end is arranged so as to intersect a radially adjacent second electrical conductor at one point or more. The electrical conductor is formed with radial indentations in side faces that are opposite side faces in opposing electrical conductors at any of the intersecting portions, the indentations having depths that increase toward the near ear of the electrical conductors. Sufficient clearances are thereby secured between electrical conductors in their intersecting portions near their ends where the insulating films are susceptible to damage because of welding heat. Electrical insulation is thus ensured, and the cooling efficiency at the coil end is improved.
摘要:
A method of manufacturing a stator winding includes a twisting step of U-shaped conductor segments having a pair of straight portions by moving the straight portions in the circumferential direction while restraining the turn portions of the U-shaped conductor segments in the axial direction by a pressing tool. After the previously twisted U-shaped conductor segments are inserted into slots of a stator core, the straight portions are bent in the circumferential direction. The pressing tool is constituted of a stationary top plate that has recesses into which the straight portions are inserted and a movable top plate that is movable to close the recesses after the straight portions are inserted in the recesses.
摘要:
A rotor for a vehicular alternating current generator has a relief space portion formed between axial holes of a pair of pole cores and a shaft for receiving therein a plastically deformed portion produced when the shaft is press-fitted in the axial holes of the pole cores. The relief space portion is located adjacent to a pair of closely contacting inner end faces of the pole cores so that the plastically deformed portion is let to move into a radially outward direction rather than further continuing movement in an axial direction within the relief space portion. The plastically deformed portion is thus prevented from entering between the inner end faces of the pole cores.