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    Nanocomposite photosensitive composition and use thereof
    1.
    发明申请
    Nanocomposite photosensitive composition and use thereof 有权
    纳米复合光敏组合物及其用途

    公开(公告)号：US20060228645A1

    公开(公告)日：2006-10-12

    申请号：US11103134

    申请日：2005-04-11

    申请人： Chunwei Chen ,  Ping-Hung Lu ,  Hong Zhuang ,  Mark Neisser

    发明人： Chunwei Chen ,  Ping-Hung Lu ,  Hong Zhuang ,  Mark Neisser

    IPC分类号： G03C1/00

    CPC分类号： G03F7/0047 ,  G03F7/027 ,  G03F7/0382 ,  Y10S430/106

    摘要： The present invention relates to a photoresist composition suitable for image-wise exposure and development as a negative photoresist comprising a negative photoresist composition and an inorganic particle material having an average particle size equal or greater than 10 nanometers, wherein the thickness of the photoresist coating film is greater than 5 microns. The negative photoresist composition is selected from (1) a composition comprising (i) a resin binder, (ii) a photoacid generator, and (iii) a cross-linking agent; or (2) a composition comprising (i) a resin binder, (ii) optionally, addition-polymerizeable, ethylenically unsaturated compound(s) and (iii) a photoinitiator; or (3) a composition comprising (i) a photopolymerizable compound containing at least two pendant unsaturated groups; (ii) ethylenically unsaturated photopolymerizable polyalkylene oxide hydrophilic compound(s); and (iii) a photoinitiator

    摘要翻译： 本发明涉及一种光刻胶组合物，其适用于作为负性光致抗蚀剂的成像曝光和显影，其包含负性光致抗蚀剂组合物和平均粒度等于或大于10纳米的无机颗粒材料，其中光致抗蚀剂涂膜的厚度 大于5微米。 负光致抗蚀剂组合物选自（1）包含（i）树脂粘合剂，（ii）光致酸产生剂和（iii）交联剂）的组合物; 或（2）组合物，其包含（i）树脂粘合剂，（ii）任选的可加成聚合的烯属不饱和化合物和（iii）光引发剂; 或（3）包含（i）含有至少两个侧链不饱和基团的光聚合化合物的组合物; （ii）烯属不饱和光聚合聚环氧烷亲水化合物; 和（iii）光引发剂

    Nanocomposite photoresist composition for imaging thick films
    2.
    发明授权
    Nanocomposite photoresist composition for imaging thick films 有权
    用于成像厚膜的纳米复合光致抗蚀剂组合物

    公开(公告)号：US07524606B2

    公开(公告)日：2009-04-28

    申请号：US11103093

    申请日：2005-04-11

    申请人： Chunwei Chen ,  Ping-Hung Lu ,  Hong Zhuang ,  Mark Neisser

    发明人： Chunwei Chen ,  Ping-Hung Lu ,  Hong Zhuang ,  Mark Neisser

    IPC分类号： G03F7/00 ,  G03F7/004

    CPC分类号： G03F7/0226 ,  G03F7/0047 ,  G03F7/0392 ,  Y10S430/106 ,  Y10S430/114 ,  Y10S430/118 ,  Y10S430/151

    摘要： The present invention relates to a photoresist composition suitable for image-wise exposure and development as a positive photoresist comprising a positive photoresist composition and an inorganic particle material having an average particle size equal or greater than 10 nanometers, wherein the thickness of the photoresist coating film is greater than 5 microns. The positive photoresist composition can be selected from (1) a composition comprising (i) a film-forming resin having acid labile groups, and (ii) a photoacid generator, or (2) a composition comprising (i) a film-forming novolak resin, and (ii) a photoactive compound, or (3) a composition comprising (i) a film-forming resin, (ii) a photoacid generator, and (iii) a dissolution inhibitor.

    摘要翻译： 本发明涉及适用于作为正性光致抗蚀剂的成像曝光和显影的光致抗蚀剂组合物，其包含正性光致抗蚀剂组合物和平均粒度等于或大于10纳米的无机颗粒材料，其中光致抗蚀剂涂膜的厚度 大于5微米。 正光致抗蚀剂组合物可以选自（1）包含（i）具有酸不稳定基团的成膜树脂和（ii）光酸产生剂的组合物的组合物，或（2）包含（i）成膜酚醛清漆 树脂，和（ii）光活性化合物，或（3）包含（i）成膜树脂，（ii）光致酸发生剂和（iii）溶解抑制剂的组合物。

    NANOCOMPOSITE PHOTOSENSITIVE COMPOSITION AND USE THEREOF
    3.
    发明申请
    NANOCOMPOSITE PHOTOSENSITIVE COMPOSITION AND USE THEREOF 审中-公开
    纳米复合光敏组合物及其用途

    公开(公告)号：US20070141510A1

    公开(公告)日：2007-06-21

    申请号：US11627545

    申请日：2007-01-26

    申请人： Chunwei Chen ,  Ping-Hung Lu ,  Hong Zhuang ,  Mark Neisser

    发明人： Chunwei Chen ,  Ping-Hung Lu ,  Hong Zhuang ,  Mark Neisser

    IPC分类号： G03C1/00

    CPC分类号： G03F7/0047 ,  G03F7/027 ,  G03F7/0382 ,  Y10S430/106

    摘要： The present invention relates to a photoresist composition suitable for image-wise exposure and development as a negative photoresist comprising a negative photoresist composition and an inorganic particle material having an average particle size equal or greater than 10 nanometers, wherein the thickness of the photoresist coating film is greater than 5 microns. The negative photoresist composition is selected from (1) a composition comprising (i) a resin binder, (ii) a photoacid generator, and (iii) a cross-linking agent; or (2) a composition comprising (i) a resin binder, (ii) optionally, addition-polymerizable, ethylenically unsaturated compound(s) and (iii) a photoinitiator; or (3) a composition comprising (i) a photopolymerizable compound containing at least two pendant unsaturated groups; (ii) ethylenically unsaturated photopolymerizable polyalkylene oxide hydrophilic compound(s); and (iii) a photoinitiator

    摘要翻译： 本发明涉及一种光刻胶组合物，其适用于作为负性光致抗蚀剂的成像曝光和显影，其包含负性光致抗蚀剂组合物和平均粒度等于或大于10纳米的无机颗粒材料，其中光致抗蚀剂涂膜的厚度 大于5微米。 负光致抗蚀剂组合物选自（1）包含（i）树脂粘合剂，（ii）光致酸产生剂和（iii）交联剂）的组合物; 或（2）包含（i）树脂粘合剂，（ii）任选的可加成聚合的烯属不饱和化合物和（iii）光引发剂的组合物; 或（3）包含（i）含有至少两个侧链不饱和基团的光聚合化合物的组合物; （ii）烯属不饱和光聚合聚环氧烷亲水化合物; 和（iii）光引发剂

    Nanocomposite photosensitive composition and use thereof
    5.
    发明授权
    Nanocomposite photosensitive composition and use thereof 有权
    纳米复合光敏组合物及其用途

    公开(公告)号：US07247419B2

    公开(公告)日：2007-07-24

    申请号：US11103134

    申请日：2005-04-11

    申请人： Chunwei Chen ,  Ping-Hung Lu ,  Hong Zhuang ,  Mark Neisser

    发明人： Chunwei Chen ,  Ping-Hung Lu ,  Hong Zhuang ,  Mark Neisser

    IPC分类号： G03C1/00 ,  G03F7/004

    CPC分类号： G03F7/0047 ,  G03F7/027 ,  G03F7/0382 ,  Y10S430/106

    摘要： The present invention relates to a photoresist composition suitable for image-wise exposure and development as a negative photoresist comprising a negative photoresist composition and an inorganic particle material having an average particle size equal or greater than 10 nanometers, wherein the thickness of the photoresist coating film is greater than 5 microns. The negative photoresist composition is selected from (1) a composition comprising (i) a resin binder, (ii) a photoacid generator, and (iii) a cross-linking agent; or (2) a composition comprising (i) a resin binder, (ii) optionally, addition-polymerizeable, ethylenically unsaturated compound(s) and (iii) a photoinitiator; or (3) a composition comprising (i) a photopolymerizable compound containing at least two pendant unsaturated groups; (ii) ethylenically unsaturated photopolymerizable polyalkylene oxide hydrophilic compound(s); and (iii) a photoinitiator.

    摘要翻译： 本发明涉及一种光刻胶组合物，其适用于作为负性光致抗蚀剂的成像曝光和显影，其包含负性光致抗蚀剂组合物和平均粒度等于或大于10纳米的无机颗粒材料，其中光致抗蚀剂涂膜的厚度 大于5微米。 负光致抗蚀剂组合物选自（1）包含（i）树脂粘合剂，（ii）光致酸产生剂和（iii）交联剂）的组合物; 或（2）组合物，其包含（i）树脂粘合剂，（ii）任选的可加成聚合的烯属不饱和化合物和（iii）光引发剂; 或（3）包含（i）含有至少两个侧链不饱和基团的光聚合化合物的组合物; （ii）烯属不饱和光聚合聚环氧烷亲水化合物; 和（iii）光引发剂。