公开(公告)号：US20120045899A1

公开(公告)日：2012-02-23

申请号：US13266034

申请日：2010-04-21

申请人： Daisuke Maruyama ,  Hiroaki Yaguchi ,  Yasushi Sakaida

发明人： Daisuke Maruyama ,  Hiroaki Yaguchi ,  Yasushi Sakaida

IPC分类号： H01L21/311 ,  B05D5/00 ,  B05D3/02 ,  C09D183/04

CPC分类号： G03F7/40

摘要： There is provided to a pattern reversal film forming composition that is capable of forming a pattern reversal film which is not mixed with a resist pattern formed on a substrate, and that is only capable of forming a pattern reversal film advantageously covering the pattern, but also irrespective of whether the resist pattern is coarse or fine, capable of forming a planar film excellent in temporal stability on the pattern. A pattern reversal film forming composition including a polysiloxane, an additive and an organic solvent, characterized in that the polysiloxane is a product of a hydrolysis and/or condensation reaction of a silane compound containing a tetraalkoxysilane of Si(OR1)4 and an alkoxysilane of XnSi(OR2)4-n, and the tetraalkoxysilane is used in a ratio of 1 to 50% by mole based on the number of moles of the whole silane compound; and a pattern reversal film and a method of forming a reversed pattern in which the composition is used.

摘要翻译： 提供了能够形成图案反转膜的图案反转膜形成组合物，其不与形成在基底上的抗蚀剂图案混合，并且仅能够形成有利地覆盖图案的图案反转膜，而且 无论抗蚀剂图案是粗糙还是微细，都能够形成在图案上的时间稳定性优异的平面膜。 一种包含聚硅氧烷，添加剂和有机溶剂的图案反转膜形成组合物，其特征在于所述聚硅氧烷是含有Si（OR 1）4的四烷氧基硅烷和含有Si（OR 1）4）的烷氧基​​硅烷的硅烷化合物的水解和/或缩合反应的产物， XnSi（OR2）4-n，四烷氧基硅烷的用量相对于全部硅烷化合物的摩尔数为1〜50摩尔％ 和图案反转膜以及形成其中使用组合物的反转图案的方法。

公开(公告)号：US08658341B2

公开(公告)日：2014-02-25

申请号：US13266034

申请日：2010-04-21

申请人： Daisuke Maruyama ,  Hiroaki Yaguchi ,  Yasushi Sakaida

发明人： Daisuke Maruyama ,  Hiroaki Yaguchi ,  Yasushi Sakaida

IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/028 ,  G03F7/075 ,  G03F7/11

CPC分类号： G03F7/40

摘要： There is provided to a pattern reversal film forming composition that is capable of forming a pattern reversal film which is not mixed with a resist pattern formed on a substrate, and that is only capable of forming a pattern reversal film advantageously covering the pattern, but also irrespective of whether the resist pattern is coarse or fine, capable of forming a planar film excellent in temporal stability on the pattern. A pattern reversal film forming composition including a polysiloxane, an additive and an organic solvent, characterized in that the polysiloxane is a product of a hydrolysis and/or condensation reaction of a silane compound containing a tetraalkoxysilane of Si(OR1)4 and an alkoxysilane of XnSi(OR2)4-n, and the tetraalkoxysilane is used in a ratio of 1 to 50% by mole based on the number of moles of the whole silane compound; and a pattern reversal film and a method of forming a reversed pattern in which the composition is used.

摘要翻译： 提供了能够形成图案反转膜的图案反转膜形成组合物，其不与形成在基底上的抗蚀剂图案混合，并且仅能够形成有利地覆盖图案的图案反转膜，而且 无论抗蚀剂图案是粗糙还是微细，都能够形成在图案上的时间稳定性优异的平面膜。 一种包含聚硅氧烷，添加剂和有机溶剂的图案反转膜形成组合物，其特征在于所述聚硅氧烷是含有Si（OR 1）4的四烷氧基硅烷和含有Si（OR 1）4）的烷氧基​​硅烷的硅烷化合物的水解和/或缩合反应的产物， XnSi（OR2）4-n，四烷氧基硅烷的用量相对于全部硅烷化合物的摩尔数为1〜50摩尔％ 和图案反转膜以及形成其中使用组合物的反转图案的方法。

公开(公告)号：US20110117746A1

公开(公告)日：2011-05-19

申请号：US13054665

申请日：2009-07-23

申请人： Daisuke Maruyama ,  Yasushi Sakaida ,  BangChing Ho ,  Keisuke Hashimoto ,  Noriaki Fujitani

发明人： Daisuke Maruyama ,  Yasushi Sakaida ,  BangChing Ho ,  Keisuke Hashimoto ,  Noriaki Fujitani

IPC分类号： H01L21/31 ,  C09D183/04

CPC分类号： H01L21/02282 ,  C08G77/04 ,  C08G77/60 ,  C08L83/04 ,  G03F7/405 ,  H01L21/02211 ,  H01L21/02216 ,  H01L21/0337 ,  H01L21/3121 ,  H01L21/3122

摘要： It is an object to provide a coating composition applicable to “reversal patterning” and suitable for forming a film covering a resist pattern. The object is accomplished by a coating composition for lithography comprising an organopolysiloxane, a solvent containing the prescribed organic solvent as a main component, and a quaternary ammonium salt or a quaternary phosphonium salt; or a coating composition for lithography comprising a polysilane, a solvent containing the prescribed organic solvent as a main component, and at least one additive selected from a group consisting of a crosslinking agent, a quaternary ammonium salt, a quaternary phosphonium salt, and a sulfonic acid compound, wherein the polysilane has, at a terminal thereof, a silanol group or a silanol group together with a hydrogen atom.

摘要翻译： 本发明的目的是提供适用于“反转图案化”并适用于形成覆盖抗蚀剂图案的膜的涂料组合物。 该目的通过一种用于光刻的涂料组合物来实现，该涂料组合物包含有机聚硅氧烷，含有规定的有机溶剂作为主要成分的溶剂，以及季铵盐或季鏻盐; 或用于光刻的涂料组合物，其包含聚硅烷，含有规定的有机溶剂作为主要成分的溶剂和至少一种选自交联剂，季铵盐，季鏻盐和磺酸盐的添加剂 酸化合物，其中聚硅烷在其末端具有硅烷醇基或硅烷醇基以及氢原子。

公开(公告)号：US09220519B2

公开(公告)日：2015-12-29

申请号：US13822574

申请日：2011-09-13

申请人： Ryutaku Kaneyama ,  Koichi Kuramoto ,  Keitarou Yamamoto ,  Daisuke Maruyama

发明人： Ryutaku Kaneyama ,  Koichi Kuramoto ,  Keitarou Yamamoto ,  Daisuke Maruyama

IPC分类号： A61B17/17 ,  A61B17/02 ,  A61B17/15 ,  A61F2/46 ,  A61F2/38

CPC分类号： A61B17/1764 ,  A61B17/025 ,  A61B17/155 ,  A61B2017/0268 ,  A61F2/389 ,  A61F2/4684

摘要： A bone resection jig that can make ligament tension equal at extension and flexion positions without any actual measurements when resecting femur and tibia during artificial knee joint replacement surgery. The bone resection jig used in artificial knee joint replacement surgery includes a spacer block (1) comprised of a grip (6), a hollow box (7) that is provided on an other end side of the grip and has a vertical hole (7a) therein, and a reference spacer part (8) that extends out from the hollow box (7) and is adapted be inserted into the resection region between femur and tibia; a reference pin guide (2) which, when the femur and tibia are in the flexion position, is inserted into the vertical hole (7a) of the hollow box, extends on the reference spacer part (8) to the other end side of the grip so as to come into contact with a resection plane (FH) of the tip of the distal end of the femur, and is formed with guide holes (9) for guiding reference pins (3) to be installed from a front side into the resection plane (FH) of the tip of the distal end of the femur; and an aiming member (12) which is, after the spacer block (1) has been removed from a space between the femur and tibia leaving the reference pins (3), brought onto the reference pins (3) by being guided thereby, the aiming member being provided with an indicator (14) that indicates a resection plane (FR) at a back of the distal end of the femur when the aiming member (12) comes into contact with the resection plane (FH) of the tip of the distal end of the femur.

摘要翻译： 一种骨切除夹具，可以在人造膝关节置换手术期间切除股骨和胫骨时，使韧带张力在延伸和屈曲位置处相等，无需实际测量。 用于人造膝关节置换手术的骨切割夹具包括由手柄（6），中空盒（7）构成的间隔块（1），其设置在手柄的另一端侧并具有垂直孔（7a ）和从所述中空箱（7）延伸并且适于插入到股骨和胫骨之间的切除区域中的参考间隔件部分（8） 参考销引导件（2），当股骨和胫骨处于屈曲位置时，其被插入中空箱的垂直孔（7a）中，在参考间隔部分（8）上延伸到另一端 抓握，以与股骨远端的尖端的切除面（FH）接触，并形成有引导孔（9），用于将从前侧安装的参考销（3）引导到 股骨远端尖端切除面（FH）; 以及瞄准构件（12），其在从离开所述基准销（3）的所述股骨和胫骨之间的空间中移除所述间隔块（1）之后，通过被引导而被引导到所述基准销（3）上， 瞄准构件设置有指示器（14），当瞄准构件（12）与所述对象构件（12）的尖端的切除面（FH）接触时，所述指示器（14）指示在所述股骨的远端的后部处的切除面（FR） 股骨远端。

公开(公告)号：US08619096B2

公开(公告)日：2013-12-31

申请号：US12793785

申请日：2010-06-04

申请人： Ai Ishida ,  Daisuke Maruyama ,  Hiroshi Ouchiyama ,  Takayuki Sato

发明人： Ai Ishida ,  Daisuke Maruyama ,  Hiroshi Ouchiyama ,  Takayuki Sato

IPC分类号： G09G5/00

CPC分类号： G06F3/1415 ,  G09B5/00 ,  G09G2340/125 ,  G09G2370/027 ,  G11B27/28 ,  G11B27/3081

摘要： Evaluating a delivered video using a marker. A marker can be generated to be superimposed and displayed on an evaluation range from coordinate values specifying the evaluation range input to evaluate the video and that adds the marker to the video and causing the video with the marker to be deliver. An image can be generated in the evaluation range at predetermined intervals starting from the input time of the coordinate values. A similarity between two images arranged in the order of time from the input time by comparing the two images can be calculated, and a determination can be made whether the similarity is within an allowable range. The time of one of the two images generated as an extinction time of the displayed marker can be selected when the similarity is determined to be not within the allowable range.

摘要翻译： 使用标记评估传送的视频。 可以生成标记以在指定评估范围输入的坐标值的评估范围上叠加并显示以评估视频，并且将标记添加到视频并使得标记的视频被传送。 可以在从坐标值的输入时间开始的预定间隔的评估范围内生成图像。 可以计算通过比较两个图像从输入时间开始按时间顺序布置的两个图像之间的相似度，并且可以确定相似度是否在容许范围内。 当相似性被确定为不在容许范围内时，可以选择作为显示标记的消光时间生成的两个图像之一的时间。

公开(公告)号：US08332715B2

公开(公告)日：2012-12-11

申请号：US12805067

申请日：2010-07-09

申请人： Daisuke Maruyama

发明人： Daisuke Maruyama

IPC分类号： H03M13/00

CPC分类号： G01R31/318547 ,  G01R31/318307

摘要： A test pattern generating device generates a test pattern with respect to a semiconductor circuit having first and second common circuits and a non-common circuit, wherein each of the common circuits has a scan chain for checking an operation of the circuit by applying a test pattern from the outside of the circuit. A set of scan chains and a set of assumed faults are created for each of the common circuits. Any of the common circuits is determined as the common circuit of a first test target. After the determined common circuit of the first test target is subjected to ATPG and detection of circuit fault, a test pattern generated in successful ATPG about the common circuit of the first test target is diverted to the common circuit determined as the second test target, and ATPG and detection of a circuit fault of the non-common circuit part.

摘要翻译： 测试图形生成装置相对于具有第一和第二公共电路的半导体电路和非公共电路生成测试图案，其中每个公共电路具有用于通过应用测试图案来检查电路的操作的扫描链 从电路外面。 为每个公共电路创建一组扫描链和一组假设故障。 任何公共电路被确定为第一测试目标的公共电路。 在第一测试目标的确定的公共电路经受ATPG并检测到电路故障之后，在成功的ATPG上产生的关于第一测试目标的公共电路的测试模式被转移到被确定为第二测试目标的公共电路，并且 ATPG和非共同电路的电路故障检测。

公开(公告)号：US20110108760A1

公开(公告)日：2011-05-12

申请号：US12938734

申请日：2010-11-03

申请人： Yuya Mukainakano ,  Daisuke Maruyama ,  Ken Baba ,  Ryuji Shiozaki

发明人： Yuya Mukainakano ,  Daisuke Maruyama ,  Ken Baba ,  Ryuji Shiozaki

IPC分类号： H01M4/88 ,  H01M4/485

CPC分类号： H01M4/485 ,  H01M4/1391 ,  H01M10/0525

摘要： An electrode material uses, as an active material, sodium vanadium oxide represented by NaxV2O5 (0

摘要翻译： 电极材料使用由NaxV2O5（0

公开(公告)号：US20090269274A1

公开(公告)日：2009-10-29

申请号：US12425516

申请日：2009-04-17

申请人： Ryuji Shiozaki ,  Daisuke Maruyama ,  Nobuo Ando

发明人： Ryuji Shiozaki ,  Daisuke Maruyama ,  Nobuo Ando

IPC分类号： C01G31/02

CPC分类号： C30B29/16 ,  B82Y30/00 ,  C01G31/02 ,  C01P2004/64 ,  C01P2006/40 ,  C30B7/08 ,  C30B29/30 ,  C30B29/60 ,  H01M4/485 ,  H01M10/052

摘要： An ammonium metavanadate is heat-treated to 500° C. or less at a predetermined rate of temperature rise, whereby a microcrystal particle of a vanadium pentoxide can be formed. According to the production method described above, a crystal of a nano-vanadium having a layer length of 100 nm or less can be formed. The nano-vanadium formed by the production method described above can effectively be used for an electrode of an electric storage device such as a battery. The production method according to the present invention can be linked to a conventional production method in which an ammonium metavanadate can be formed in the course of the method, whereby the present invention can smoothly be embodied.

摘要翻译： 偏钒酸铵以预定的升温速率被热处理至500℃以下，由此可以形成五氧化二钒的微晶粒子。 根据上述制造方法，可以形成层长度为100nm以下的纳米钒的结晶。 通过上述制造方法形成的纳米钒可以有效地用于诸如电池的蓄电装置的电极。 根据本发明的制造方法可以与在该方法中可以形成偏钒酸铵的常规制造方法相关联，由此可以顺利地实现本发明。

公开(公告)号：US20090117493A1

公开(公告)日：2009-05-07

申请号：US11992595

申请日：2005-09-27

申请人： Takahiro Kishioka ,  Rikimaru Sakamoto ,  Daisuke Maruyama

发明人： Takahiro Kishioka ,  Rikimaru Sakamoto ,  Daisuke Maruyama

IPC分类号： G03F7/20

CPC分类号： G03F7/091

摘要： There is provided anti-reflective coating forming composition containing a reaction product of an isocyanuric acid compound having two or three 2,3-epoxypropyl groups with a benzoic acid compound. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with photoresists, can form a photoresist pattern having no footing at the lower part, and can use in lithography process by use of a light such as ArF excimer laser beam and F2 excimer laser beam, etc.

摘要翻译： 提供了含有具有两个或三个2,3-环氧丙基的异氰脲酸化合物与苯甲酸化合物的反应产物的抗反射涂层形成组合物。 由组合物得到的抗反射涂层对反射光具有很高的防止效果，不会与光致抗蚀剂混合，可以在下部形成没有底脚的光致抗蚀剂图案，并且可以在光刻工艺中使用诸如 ArF准分子激光束和F2准分子激光束等

公开(公告)号：US07437646B2

公开(公告)日：2008-10-14

申请号：US10965766

申请日：2004-10-18

申请人： Daisuke Maruyama

发明人： Daisuke Maruyama

IPC分类号： G01R31/28

CPC分类号： G06F11/263 ,  G01R31/31813 ,  G01R31/318371

摘要： The present invention is a test pattern generating method. And the test pattern generating method provides a counting step for counting the number of faults becoming undetectable respectively, at each of states 0 and 1 that are able to be given to each of input pins of EOR gates when each of the EOR gates becomes a D frontier (different frontier) or a J frontier (justify frontier), a selecting step for selecting a state in which the number of faults becoming undetectable is smaller in the 0 and 1 states as an allocating state to the input pin, based on a counted result at the counting step, and step for generating the test pattern based on a selected state at the selecting step. With this, dynamic compaction can be effectively executed by restraining the increase of the number of test patterns.

摘要翻译： 本发明是测试图形生成方法。 并且测试模式生成方法提供计数步骤，用于在每个EOR门变为D时能够分配给能够被赋予EOR门的每个输入引脚的状态0和1的每个状态变得不可检测的数量的计数步骤 边界（不同边界）或J边界（对齐边界），选择步骤，用于选择在0和1状态中的故障数量变得不可检测的状态，作为对输入引脚的分配状态，基于计数 在计数步骤中产生，以及用于在选择步骤基于选择状态产生测试图案的步骤。 由此，可以通过抑制测试图案的数量的增加来有效地执行动态压缩。