公开(公告)号：US6072581A

公开(公告)日：2000-06-06

申请号：US183057

申请日：1998-10-30

Applicant: David Stephenson ,  Xavier Colonna de Lega

Inventor： David Stephenson ,  Xavier Colonna de Lega

IPC: G01B9/02 ,  G01B11/24 ,  G01B11/30 ,  G02B5/18

CPC classification number: G01B11/2441 ,  G01B11/306

Abstract: The optical assembly of a GDI instrument is configured to deviate or steer stray beams away from the pupil of the instrument's imaging device and/or to suppress stray beams. Stray beam deviation is optimized by selecting particular wedge and/or tilt configurations that achieve the desired stray beam deviation while avoiding or at least minimizing phase offset at the optimum metrology plane. Stray beam suppression can be achieved by providing the diffractive groove profile of the instrument's optical assembly with smooth edges. The resultant profile facilitates effective diffraction order management as well as a reduction in back reflection. The invention is particularly well-suited for use with a GDI instrument in which the optical assembly comprises first and second diffraction gratings. In this case, any average phase offset that remains after setting wedge and/or tilt can be eliminated by inserting a suitable compensating plate between the first and second diffraction gratings or between the second diffraction grating and the object.

Abstract translation: GDI仪器的光学组件被配置为偏离或引导杂散光束远离仪器的成像装置的光瞳和/或抑制杂散光束。 通过选择实现期望的杂散光束偏移的特定楔形和/或倾斜配置来优化杂散光束偏移，同时避免或至少最小化最佳计量平面处的相位偏移。 可以通过提供具有光滑边缘的仪器光学组件的衍射凹槽轮廓来实现杂散光束抑制。 所得到的轮廓有助于有效的衍射顺序管理以及减少背反射。 本发明特别适用于GDI仪器，其中光学组件包括第一和第二衍射光栅。 在这种情况下，通过在第一和第二衍射光栅之间或第二衍射光栅与物体之间插入合适的补偿板，可以消除在设置楔形和/或倾斜之后保留的任何平均相位偏移。

公开(公告)号：US20090303493A1

公开(公告)日：2009-12-10

申请号：US12540709

申请日：2009-08-13

Applicant: Xavier Colonna de Lega ,  Robert Stoner ,  Peter de Groot

Inventor： Xavier Colonna de Lega ,  Robert Stoner ,  Peter de Groot

IPC: G01B11/02

CPC classification number: G01B9/02063 ,  G01B9/02057 ,  G01B9/02087 ,  G01B9/0209

Abstract: A method is disclosed which includes: using a scanning interferometry system, generating a sequence of phase-shifted interferometry images at different scan positions of an object comprising a buried surface, identifying a scan position corresponding to a position of best focus for the buried surface based on the sequence of phase-shifted interferometry images of the object, and generating a final image based on the phase-shifted interferometry images and the scan position, where the interferometric fringes in the final image are reduced relative to the interferometric fringes in the phase-shifted interferometry images.

Abstract translation: 公开了一种方法，其包括：使用扫描干涉测量系统，在包括掩埋表面的物体的不同扫描位置处产生相移干涉测量图像序列，识别对应于掩埋表面的最佳焦点位置的扫描位置 根据对象的相移干涉图像的序列，并且基于相移干涉测量图像和扫描位置生成最终图像，其中最终图像中的干涉条纹相对于相位干涉图像中的干涉条纹减小， 移位干涉图像。

公开(公告)号：US08189202B2

公开(公告)日：2012-05-29

申请号：US12535357

申请日：2009-08-04

Applicant: Jan Liesener ,  Xavier Colonna de Lega ,  Peter de Groot

Inventor： Jan Liesener ,  Xavier Colonna de Lega ,  Peter de Groot

IPC: G01B11/02

CPC classification number: G01B9/02043 ,  G01B9/02057 ,  G01B9/02083 ,  G01B9/0209 ,  G01B2290/70 ,  G03F7/70633 ,  H01L23/544 ,  H01L2924/0002 ,  H01L2924/00

Abstract: Systems are disclosed that include an interferometer configured to direct test light to an overlay test pad and subsequently combine it with reference light, the test and reference light being derived from a common source, one or more optics configured to direct at least a portion of the combined light to a multi-element detector so that different regions of the detector correspond to different illumination angles of the overlay test pad by the test light, the detector being configured to produce an interference signal based on the combined light, and an electronic processor in communication with the multi-element detector. The overlay test pad comprises a first patterned structure and a second patterned structure and the electronic processor is configured to determine information about the relative alignment between the first and second patterned structures based on the interference signal.

Abstract translation: 公开了一种系统，其包括被配置为将测试光引导到覆盖测试焊盘并随后将其与参考光组合的干涉仪，测试和参考光源自公共源，一个或多个光学器件被配置为引导至少一部分 将光组合到多元件检测器，使得检测器的不同区域对应于测试光的覆盖测试垫的不同照明角度，检测器被配置为基于组合的光产生干涉​​信号，以及电子处理器 与多元素检测器通信。 覆盖测试焊盘包括第一图案化结构和第二图案化结构，并且电子处理器被配置为基于干扰信号来确定关于第一和第二图案化结构之间的相对对准的信息。

公开(公告)号：US06226092B1

公开(公告)日：2001-05-01

申请号：US09321475

申请日：1999-05-27

Applicant: Xavier Colonna de Lega

Inventor： Xavier Colonna de Lega

IPC: G01B902

CPC classification number: G01B9/02098 ,  G01B9/02022 ,  G01B11/2441

Abstract: A full-field, geometrically-desensitized interferometer (GDI) instrument incorporates a combination of reflecting and refracting optics to perform beam splitting and recombining operations for surface profilometry. Symmetrically-positioned inbound and outbound optical subassemblies typically are arranged to direct inbound collimated beams from a light generator to the profiled surface of a test object and to direct outbound reflected beams to an imaging device as a single recombined outbound interference beam. Every point on the detector has a corresponding point on the object from which reflected illumination originated from both reflected beams. The optical path difference between the two inbound beams or between the two reflected outbound beams can be substantially independent of field position. The resultant instrument, in addition to being capable of full-field imaging, exhibits several advantages including 1) a large working distance, 2) the employment of readily-available non-diffractive elements, and 3) the ability to transmit light with high efficiency.

Abstract translation: 全场，几何脱敏干涉仪（GDI）仪器结合了反射和折射光学元件，以进行表面轮廓测量的分束和重组操作。 对称定位的入射和出射光学子组件通常被布置成将来自光发生器的入射准直光束引导到测试对象的成型表面，并且将出射反射光束作为单个重新组合的出射干涉光束引导到成像装置。 检测器上的每个点在物体上具有对应的点，反射照明源自两个反射光束。 两个入射光束之间或两个反射出射光束之间的光程差可以基本上与场位置无关。 所得到的仪器除了能够进行全场成像外，还具有以下优点：1）工作距离大，2）使用易于获得的非衍射元件，以及3）高效传输光的能力 。

公开(公告)号：US20120089365A1

公开(公告)日：2012-04-12

申请号：US13267408

申请日：2011-10-06

Applicant: Martin Fay ,  Jan Liesener ,  Peter de Groot ,  Xavier Colonna de Lega

Inventor： Martin Fay ,  Jan Liesener ,  Peter de Groot ,  Xavier Colonna de Lega

IPC: G01B11/24 ,  G01B11/06 ,  G06F17/10 ,  G06F19/00

CPC classification number: G01B11/2441 ,  G01B9/02011 ,  G01B9/02029 ,  G01B9/0203 ,  G01B9/02043 ,  G01B9/02083 ,  G01B9/0209 ,  G01B11/0675 ,  G01B2210/56 ,  G01B2290/70

Abstract: A method includes fitting a function to a subset of reflectivity data comprising values for the reflectivity of a test object for different wavelengths, different scattering angles, and/or different polarization states; determining values for the function at certain wavelengths and scattering angles and/or polarization states; and determining information about the test object based on the determined values.

Abstract translation: 一种方法包括将功能拟合到包括不同波长，不同散射角和/或不同极化状态的测试对象的反射率的值的反射率数据子集; 确定在某些波长和散射角度和/或偏振状态下的功能的值; 以及基于所确定的值来确定关于所述测试对象的信息。

公开(公告)号：US20110032535A1

公开(公告)日：2011-02-10

申请号：US12535357

申请日：2009-08-04

Applicant: Jan Liesener ,  Xavier Colonna de Lega ,  Peter de Groot

Inventor： Jan Liesener ,  Xavier Colonna de Lega ,  Peter de Groot

IPC: G01B11/02

CPC classification number: G01B9/02043 ,  G01B9/02057 ,  G01B9/02083 ,  G01B9/0209 ,  G01B2290/70 ,  G03F7/70633 ,  H01L23/544 ,  H01L2924/0002 ,  H01L2924/00

Abstract: Systems are disclosed that include an interferometer configured to direct test light to an overlay test pad and subsequently combine it with reference light, the test and reference light being derived from a common source, one or more optics configured to direct at least a portion of the combined light to a multi-element detector so that different regions of the detector correspond to different illumination angles of the overlay test pad by the test light, the detector being configured to produce an interference signal based on the combined light, and an electronic processor in communication with the multi-element detector. The overlay test pad comprises a first patterned structure and a second patterned structure and the electronic processor is configured to determine information about the relative alignment between the first and second patterned structures based on the interference signal.

Abstract translation: 公开了一种系统，其包括被配置为将测试光引导到覆盖测试焊盘并随后将其与参考光组合的干涉仪，测试和参考光源自公共源，一个或多个光学器件被配置为引导至少一部分 将光组合到多元件检测器，使得检测器的不同区域对应于测试光的覆盖测试垫的不同照明角度，检测器被配置为基于组合的光产生干涉​​信号，以及电子处理器 与多元素检测器通信。 覆盖测试焊盘包括第一图案化结构和第二图案化结构，并且电子处理器被配置为基于干扰信号来确定关于第一和第二图案化结构之间的相对对准的信息。

公开(公告)号：US20090262362A1

公开(公告)日：2009-10-22

申请号：US12427079

申请日：2009-04-21

Applicant: Peter de Groot ,  Jan Liesener ,  Xavier Colonna de Lega

Inventor： Peter de Groot ,  Jan Liesener ,  Xavier Colonna de Lega

IPC: G01B11/02 ,  H05K3/00 ,  H01J9/42

CPC classification number: G01B9/02084 ,  G01B9/02057 ,  G01B9/0209 ,  G01B2290/70 ,  G01N21/95607 ,  G03F7/70633 ,  Y10T29/49004

Abstract: In general, in a first aspect, the invention features a system including an interferometer configured to direct test light to an overlay target and subsequently combine it with reference light to form an interference pattern, the test and reference light being derived from a common source, a multi-element detector, one or more optics to image the overlay target on the multi-element detector; and an electronic processor in communication with the multi-element detector. The overlay target includes a first pattern and a second pattern and the electronic processor is configured to determine information about the relative alignment between the first and second patterns.

Abstract translation: 通常，在第一方面，本发明的特征在于一种包括干涉仪的系统，该干涉仪被配置为将测试光引导到覆盖目标，并随后将其与参考光组合以形成干涉图案，测试和参考光源自公共源， 多元素检测器，用于对多元件检测器上的覆盖目标进行成像的一个或多个光学元件; 以及与多元件检测器通信的电子处理器。 覆盖目标包括第一图案和第二图案，并且电子处理器被配置为确定关于第一图案和第二图案之间的相对对准的信息。

公开(公告)号：US20090128827A1

公开(公告)日：2009-05-21

申请号：US12267077

申请日：2008-11-07

Applicant: Peter de Groot ,  Xavier Colonna de Lega

Inventor： Peter de Groot ,  Xavier Colonna de Lega

IPC: G01B9/02

CPC classification number: G02B21/0004

Abstract: In one aspect, the disclosure features methods that include using a microscope to direct light to a test object and to direct the light reflected from the test object to a detector, where the light includes components having orthogonal polarization states, varying an optical path length difference (OPD) between the components of the light, acquiring an interference signal from the detector while varying the OPD between the components, and determining information about the test object based on the acquired interference signal.

Abstract translation: 在一个方面，本发明的特征在于包括使用显微镜将光引导到测试对象并将从测试对象反射的光引导到检测器的方法，其中光包括具有正交偏振态的分量，改变光路长度差 （OPD），在改变组件之间的OPD的同时获取来自检测器的干扰信号，并且基于所获取的干扰信号确定关于测试对象的信息。

公开(公告)号：US20130155413A1

公开(公告)日：2013-06-20

申请号：US13765936

申请日：2013-02-13

Applicant: Jan Liesener ,  Mark Davidson ,  Peter J. de Groot ,  Xavier Colonna de Lega ,  Leslie L. Deck

Inventor： Jan Liesener ,  Mark Davidson ,  Peter J. de Groot ,  Xavier Colonna de Lega ,  Leslie L. Deck

IPC: G01B9/02

CPC classification number: G01B9/0209 ,  G01B9/02007 ,  G01B9/0201 ,  G01B9/02027 ,  G01B9/02039 ,  G01B9/02057 ,  G01B9/02068 ,  G01B9/02077 ,  G01B11/2441 ,  G01B2290/45 ,  G01B2290/70 ,  Y10T29/49002

Abstract: A system includes an interference microscope having one or more optical elements arranged to image a test object to an image plane by combining test light from the test object with reference light from a reference object to form an interference pattern at the image plane, wherein the test and reference light are derived from a common broadband light source. The system includes a scanning stage configured to scan an optical path difference (OPD) between the test and reference light, a multi-element detector positioned at the image plane and configured to record the interference pattern for each of a series of OPD increments and to generate multiple interferometry signals each having a fringe carrier frequency indicative of changes in the OPD as the OPD is scanned, where there is phase diversity among the interferometry signals, and an electronic processor coupled to the multi-element detector and scanning stage and configured to process the interference signals based on the phase diversity to determine information about the OPD increments having sensitivity to perturbations to the OPD increments at frequencies greater than the fringe carrier frequency.

Abstract translation: 一种系统包括具有一个或多个光学元件的干涉显微镜，该光学元件被布置成通过将来自测试对象的测试光与来自参考对象的参考光组合在一起而在图像平面上形成干涉图案来将测试对象图像成像平面，其中测试 参考光源自普通宽带光源。 该系统包括被配置为扫描测试和参考光之间的光程差（OPD）的扫描级，位于图像平面处的多元件检测器，并且被配置为记录一系列OPD增量中的每一个的干涉图案，并且 生成多个干涉测量信号，每个干涉测量信号具有指示在扫描OPD时OPD变化的边缘载波频率，其中在干涉测量信号之间存在相位分集，以及耦合到多元件检测器和扫描级的电子处理器并且被配置为处理 基于相位分集的干扰信号以确定关于具有对大于边缘载波频率的频率的对OPD的扰动敏感度的OPD增量的信息。

公开(公告)号：US20100128280A1

公开(公告)日：2010-05-27

申请号：US12509098

申请日：2009-07-24

Applicant: Mark Davidson ,  Jan Liesener ,  Peter de Groot ,  Xavier Colonna de Lega ,  Leslie L. Deck

Inventor： Mark Davidson ,  Jan Liesener ,  Peter de Groot ,  Xavier Colonna de Lega ,  Leslie L. Deck

IPC: G01B9/02

CPC classification number: G01B9/0209 ,  G01B9/02007 ,  G01B9/0201 ,  G01B9/02027 ,  G01B9/02039 ,  G01B9/02057 ,  G01B9/02068 ,  G01B9/02077 ,  G01B11/2441 ,  G01B2290/45 ,  G01B2290/70 ,  Y10T29/49002

Abstract: In general, in one aspect, the invention features apparatus that includes a broadband scanning interferometry system including interferometer optics for combining test light from a test object with reference light from a reference object to form an interference pattern on a detector, wherein the test and reference light are derived from a common light source. The interferometry system further includes a scanning stage configured to scan an optical path difference (OPD) between the test and reference light from the common source to the detector and a detector system including the detector for recording the interference pattern for each of a series of OPD increments, wherein the frequency of each OPD increment defines a frame rate. The interferometer optics are configured to produce at least two monitor interferometry signals each indicative of changes in the OPD as the OPD is scanned, wherein the detector system is further configured to record the monitor interferometry signals. The apparatus also includes an electronic processor electronically coupled to the detection system and scanning stage and configured to determine information about the OPD increments with sensitivity to perturbations to the OPD increments at frequencies greater than the frame rate.

Abstract translation: 一般来说，一方面，本发明的特征在于，包括宽带扫描干涉测量系统的装置，其包括用于将来自测试对象的测试光与来自参考物体的参考光组合在一起的干涉仪光学元件，以在检测器上形成干涉图案，其中测试和参考 光源自普通光源。 所述干涉测量系统还包括扫描级，其被配置为扫描来自所述公共源的所述测试参考光与所述检测器之间的光程差（OPD）;以及检测器系统，包括用于记录一系列OPD中的每一个的干涉图案的检测器 增量，其中每个OPD增量的频率定义帧速率。 干涉仪光学器件被配置为产生至少两个监视器干涉测量信号，每个监视器干涉测量信号指示当OPD被扫描时OPD的变化，其中检测器系统还被配置为记录监视器干涉测量信号。 该装置还包括电子处理器，其电耦合到检测系统和扫描级，并且被配置为以大于帧速率的频率灵敏地确定对OPD增量的扰动的OPD增量的信息。