公开(公告)号：US07041931B2

公开(公告)日：2006-05-09

申请号：US10280660

申请日：2002-10-24

申请人： Dean Jennings ,  Joseph M. Ranish ,  Brian Haas ,  Ajit Balakrishna ,  Sundar Ramamurthy ,  Aaron Hunter ,  Mark Yam

发明人： Dean Jennings ,  Joseph M. Ranish ,  Brian Haas ,  Ajit Balakrishna ,  Sundar Ramamurthy ,  Aaron Hunter ,  Mark Yam

IPC分类号： F27B5/14

CPC分类号： H01L21/67248 ,  F27B5/16 ,  F27B17/0025 ,  F27D19/00 ,  F27D21/0014 ,  H01L21/67115

摘要： In a system for thermal processing of a semiconductor substrate, a reflector plate has a stepped surface facing the substrate during heating and cooling of the substrate. The raised surface of the reflector plate has reduced reflectivity, providing advantages during, among other things, cooling of the substrate. The reflector plate also includes a number of recesses to which one or more pyrometers are coupled. These recesses have a highly reflective surface, providing advantages in the performance of the pyrometers.

摘要翻译： 在半导体衬底的热处理系统中，反射板在衬底的加热和冷却期间具有面向衬底的台阶表面。 反射板的凸起表面具有降低的反射率，在基板的冷却等方面提供了优点。 反射板还包括多个凹槽，一个或多个高温计与之连接。 这些凹槽具有高度反射的表面，在高温计的性能方面具有优势。

公开(公告)号：US07127367B2

公开(公告)日：2006-10-24

申请号：US10950145

申请日：2004-09-24

申请人： Balasubramanian Ramachandran ,  Joseph Michael Ranish ,  Ravi Jallepally ,  Sundar Ramamurthy ,  Raman Achutharaman ,  Brian Haas ,  Aaron Hunter

发明人： Balasubramanian Ramachandran ,  Joseph Michael Ranish ,  Ravi Jallepally ,  Sundar Ramamurthy ,  Raman Achutharaman ,  Brian Haas ,  Aaron Hunter

IPC分类号： G01K5/00 ,  G01K7/00 ,  G01K11/00

CPC分类号： H01L21/67103

摘要： Method and apparatus for obtaining a tailored heat transfer profile in a chamber housing a microprocessor manufacturing process, including estimating heat transfer properties of the chamber; estimating heat absorptive properties of a wafer; adjusting the physical characteristics of the chamber to correct the heat transfer properties; and utilizing the chamber for manufacturing microprocessors.

摘要翻译： 用于在容纳微处理器制造过程的腔室中获得定制的传热轮廓的方法和装置，包括估计腔室的传热特性; 估计晶片的吸热性能; 调整室的物理特性以校正传热性能; 并利用该腔室制造微处理器。

公开(公告)号：US20080090309A1

公开(公告)日：2008-04-17

申请号：US11751027

申请日：2007-05-20

申请人： JOSEPH RANISH ,  Balasubramanian Ramachandran ,  Ravi Jallepally ,  Sundar Ramamurthy ,  Vedapuram Achutharaman ,  Brian Haas ,  Aaron Hunter ,  Wolfgang Aderhold

发明人： JOSEPH RANISH ,  Balasubramanian Ramachandran ,  Ravi Jallepally ,  Sundar Ramamurthy ,  Vedapuram Achutharaman ,  Brian Haas ,  Aaron Hunter ,  Wolfgang Aderhold

IPC分类号： H01L21/324

CPC分类号： H01L21/67248 ,  H01L21/324 ,  H01L21/67115

摘要： A method for rapid thermal annealing is disclosed. As the substrate is inserted into an annealing chamber, it begins to heat due to the heat radiating from chamber components that were heated when a previous substrate was annealed. Thus, the leading edge of the substrate may be at an elevated temperature while the trailing edge of the substrate may be at room temperature while the substrate is inserted causing a temperature gradient is present across the substrate. Once the substrate is completely inserted into the annealing chamber, the temperature gradient may still be present. By compensating for the temperature gradient across the substrate, the substrate may be annealed uniformly.

摘要翻译： 公开了一种快速热退火的方法。 当衬底被插入退火室时，由于从先前的衬底退火时被加热的腔室部件散发的热量开始加热。 因此，衬底的前缘可能处于升高的温度，而衬底的后缘可能在室温下而衬底被插入，导致衬底上存在温度梯度。 一旦基板完全插入退火室，温度梯度可能仍然存在。 通过补偿跨越衬底的温度梯度，衬底可以均匀退火。

公开(公告)号：US20050102108A1

公开(公告)日：2005-05-12

申请号：US10950145

申请日：2004-09-24

申请人： Balasubramanian Ramachandran ,  Joseph Ranish ,  Ravi Jallepally ,  Sundar Ramamurthy ,  Raman Achutharaman ,  Brian Haas ,  Aaron Hunter

发明人： Balasubramanian Ramachandran ,  Joseph Ranish ,  Ravi Jallepally ,  Sundar Ramamurthy ,  Raman Achutharaman ,  Brian Haas ,  Aaron Hunter

IPC分类号： H01L21/00 ,  G01N31/00

CPC分类号： H01L21/67103

摘要： Method and apparatus for obtaining a tailored heat transfer profile in a chamber housing a microprocessor manufacturing process, including estimating heat transfer properties of the chamber; estimating heat absorptive properties of a wafer; adjusting the physical characteristics of the chamber to correct the heat transfer properties; and utilizing the chamber for manufacturing microprocessors.

摘要翻译： 用于在容纳微处理器制造过程的腔室中获得定制的传热轮廓的方法和装置，包括估计腔室的传热特性; 估计晶片的吸热性能; 调整室的物理特性以校正传热性能; 并利用该腔室制造微处理器。

公开(公告)号：US06133152A

公开(公告)日：2000-10-17

申请号：US880194

申请日：1997-05-16

申请人： Benjamin Bierman ,  Meredith J. Williams ,  David S. Ballance ,  Brian Haas ,  Paul Deaton ,  James V. Tietz

发明人： Benjamin Bierman ,  Meredith J. Williams ,  David S. Ballance ,  Brian Haas ,  Paul Deaton ,  James V. Tietz

IPC分类号： H01L21/205 ,  C23C16/44 ,  C23C16/455 ,  C23C16/458 ,  C23C16/48 ,  C30B25/12 ,  C30B25/14 ,  H01L21/26 ,  H01L21/687 ,  H01L21/302

CPC分类号： C23C16/45521 ,  C23C16/4401 ,  C23C16/4584 ,  C23C16/481 ,  C30B25/12 ,  C30B25/14 ,  H01L21/68735 ,  H01L21/68785 ,  H01L21/68792

摘要： An apparatus to isolate a rotating frame in a processing chamber, comprising: a support cylinder rotatably extending from the rotating frame; and a co-rotating edge ring extension extending from the support cylinder to at least one of substantially thermally, optically and mechanically isolate the region above the co-rotating edge ring extension from the region below the co-rotating edge ring extension.

摘要翻译： 一种用于隔离处理室中的旋转框架的装置，包括：可旋转地从所述旋转框架延伸的支撑筒; 以及从所述支撑筒延伸到至少一个基本上热，光学和机械地将所述共旋转边缘环延伸部上方的区域与所述同向旋转边缘环延伸部下方的区域隔开的共同旋转边缘环延伸。

公开(公告)号：US6035100A

公开(公告)日：2000-03-07

申请号：US858089

申请日：1997-05-16

申请人： Benjamin Bierman ,  David S. Ballance ,  James V. Tietz ,  Brian Haas ,  Meredith J. Williams ,  Paul Deaton

发明人： Benjamin Bierman ,  David S. Ballance ,  James V. Tietz ,  Brian Haas ,  Meredith J. Williams ,  Paul Deaton

IPC分类号： G01J5/00 ,  H01L21/00 ,  H01L21/26 ,  F27B5/08 ,  F27B5/14 ,  H01L21/324

CPC分类号： H01L21/67017 ,  G01J5/0003

摘要： In one embodiment, the invention is directed to an apparatus for preventing depositions from occurring on a reflector in a processing chamber, comprising: a cover disposed adjacent to the reflector, the cover optically transparent over a range of wavelengths in which the reflector is reflective; and at least one cover support for maintaining the position of the cover relative to the reflector.

摘要翻译： 在一个实施例中，本发明涉及一种用于防止在处理室中的反射器上发生沉积的装置，包括：邻近反射器布置的盖，所述盖在反射器反射的波长范围内可光学透明; 以及用于保持盖相对于反射器的位置的至少一个盖支撑件。

公开(公告)号：US5920797A

公开(公告)日：1999-07-06

申请号：US758699

申请日：1996-12-03

申请人： David S. Ballance ,  Benjamin Bierman ,  James V. Tietz ,  Brian Haas

发明人： David S. Ballance ,  Benjamin Bierman ,  James V. Tietz ,  Brian Haas

IPC分类号： H01L21/22 ,  H01L21/00 ,  H01L21/205 ,  H01L21/26 ,  H01L21/31 ,  H01L21/683

CPC分类号： H01L21/67115 ,  H01L21/6838 ,  Y10S438/909

摘要： A method of reducing stress on a substrate in a thermal processing chamber. The method includes the steps of supporting a first portion of a substrate by means of contacting the same such that a second portion of the substrate is not contacted, part of the second portion forming one wall of a cavity, and flowing a gas into the cavity such that the pressure of the gas exerts a force on the second portion to at least partially support the second portion.

摘要翻译： 一种降低热处理室中的衬底上的应力的方法。 该方法包括以下步骤：通过使基板的第一部分接触而支撑基板的第一部分，使得基板的第二部分不接触，形成空腔的一个壁的第二部分的一部分并将气体流入腔 使得气体的压力在第二部分上施加力以至少部分地支撑第二部分。

公开(公告)号：US20100208272A1

公开(公告)日：2010-08-19

申请号：US12388487

申请日：2009-02-18

申请人： Shouhong Tang ,  George Kren ,  Dieter Mueller ,  Brian Haas ,  Daniel Kavaldjiev

发明人： Shouhong Tang ,  George Kren ,  Dieter Mueller ,  Brian Haas ,  Daniel Kavaldjiev

IPC分类号： G01B11/02

CPC分类号： G01B9/02021 ,  G01B9/02027 ,  G01B9/02057 ,  G01B9/02072 ,  G01B9/0209 ,  G01B11/306

摘要： An interferometer system and method may be used to measure substrate thickness or shape. The system may include two spaced apart reference flats having that form an optical cavity between two parallel reference surfaces. A substrate holder may be configured to place the substrate in the cavity with first and second substrate surfaces substantially parallel with corresponding first and second reference surfaces such that a space between the first or second substrate surface is three millimeters or less from a corresponding one of the reference surfaces or a damping surface. Interferometer devices may be located on diametrically opposite sides of the cavity and optically coupled thereto. The interferometers can map variations in spacing between the substrate surfaces and the reference surfaces, respectively, through interference of light optically coupled to and from to the cavity via the interferometer devices.

摘要翻译： 干涉仪系统和方法可用于测量衬底厚度或形状。 该系统可以包括两个间隔开的参考平面，其具有在两个平行参考表面之间形成光腔。 衬底保持器可以被配置为将衬底放置在空腔中，其中第一和第二衬底表面基本上平行于相应的第一和第二参考表面，使得第一或第二衬底表面之间的空间距离相应的一个 参考表面或阻尼表面。 干涉仪装置可以位于空腔的径向相对的两侧并与之光耦合。 干涉仪可以分别通过经由干涉仪装置光耦合到腔体的光的干涉来映射衬底表面和参考表面之间的间隔的变化。

公开(公告)号：US6123766A

公开(公告)日：2000-09-26

申请号：US872123

申请日：1997-05-16

申请人： Meredith J. Williams ,  David S. Ballance ,  Benjamin Bierman ,  Paul Deaton ,  Brian Haas ,  Nobuyuki Takahashi ,  James V. Tietz

发明人： Meredith J. Williams ,  David S. Ballance ,  Benjamin Bierman ,  Paul Deaton ,  Brian Haas ,  Nobuyuki Takahashi ,  James V. Tietz

IPC分类号： C23C16/46 ,  C30B25/10 ,  C30B25/16

CPC分类号： C23C16/46 ,  C30B25/10 ,  C30B25/16 ,  Y10T117/1008

摘要： A method for controlling the temperature of a substrate in a processing chamber. The processing chamber employs a heating control over at least two heating zones. Each heating zone is independently controllable according to a measured signal corresponding to the substrate temperature and a user-definable offset.

摘要翻译： 一种用于控制处理室中的衬底的温度的方法。 处理室采用对至少两个加热区的加热控制。 根据与衬底温度和用户可定义的偏移相对应的测量信号，每个加热区可独立控制。

公开(公告)号：US08068234B2

公开(公告)日：2011-11-29

申请号：US12388487

申请日：2009-02-18

申请人： Shouhong Tang ,  George Kren ,  Dieter Mueller ,  Brian Haas ,  Daniel Kavaldjiev

发明人： Shouhong Tang ,  George Kren ,  Dieter Mueller ,  Brian Haas ,  Daniel Kavaldjiev

IPC分类号： G01B11/02

CPC分类号： G01B9/02021 ,  G01B9/02027 ,  G01B9/02057 ,  G01B9/02072 ,  G01B9/0209 ,  G01B11/306

摘要： An interferometer system and method may be used to measure substrate thickness or shape. The system may include two spaced apart reference flats having that form an optical cavity between two parallel reference surfaces. A substrate holder may be configured to place the substrate in the cavity with first and second substrate surfaces substantially parallel with corresponding first and second reference surfaces such that a space between the first or second substrate surface is three millimeters or less from a corresponding one of the reference surfaces or a damping surface. Interferometer devices may be located on diametrically opposite sides of the cavity and optically coupled thereto. The interferometers can map variations in spacing between the substrate surfaces and the reference surfaces, respectively, through interference of light optically coupled to and from to the cavity via the interferometer devices.

摘要翻译： 干涉仪系统和方法可用于测量衬底厚度或形状。 该系统可以包括两个间隔开的参考平面，其具有在两个平行参考表面之间形成光腔。 衬底保持器可以被配置为将衬底放置在空腔中，其中第一和第二衬底表面基本上平行于相应的第一和第二参考表面，使得第一或第二衬底表面之间的空间距离相应的一个 参考表面或阻尼表面。 干涉仪装置可以位于空腔的径向相对的两侧并与之光耦合。 干涉仪可以分别通过经由干涉仪装置光耦合到腔体的光的干涉来映射衬底表面和参考表面之间的间隔的变化。