Method for removing a contamination layer from an optical surface and arrangement therefor as well as a method for generating a cleaning gas and arrangement therefor
    3.
    发明申请
    Method for removing a contamination layer from an optical surface and arrangement therefor as well as a method for generating a cleaning gas and arrangement therefor 有权
    用于从光学表面除去污染层的方法及其设置方法以及用于产生清洁气体的方法及其装置

    公开(公告)号:US20100288302A1

    公开(公告)日:2010-11-18

    申请号:US12662840

    申请日:2010-05-06

    IPC分类号: B08B7/00 B08B5/02

    CPC分类号: B08B5/02 B08B7/00 G03F7/70925

    摘要: The invention is directed to a method for at least partially removing a contamination layer (15) from an optical surface (14a) of an EUV-reflective optical element (14) by bringing a cleaning gas into contact with the contamination layer. In the method, a jet (20) of cleaning gas is directed to the contamination layer (15) for removing material from the contamination layer (15). The contamination layer (15) is monitored for generating a signal indicative of the thickness of the contamination layer (15) and the jet (20) of cleaning gas is controlled by moving the jet (20) of cleaning gas relative to the optical surface (14a) using this signal as a feedback signal. A cleaning arrangement (19 to 24) for carrying out the method is also disclosed. The invention also relates to a method for generating a jet (20) of cleaning gas and to a corresponding cleaning gas generation arrangement.

    摘要翻译: 本发明涉及通过使清洁气体与污染层接触来至少部分地从EUV反射型光学元件(14)的光学表面(14a)去除污染物层(15)的方法。 在该方法中,将清洁气体的喷嘴(20)引导到污染层(15),以从污染层(15)去除材料。 监测污染层(15)以产生指示污染层(15)的厚度的信号,并且通过相对于光学表面移动清洁气体的喷嘴(20)来控制清洁气体的喷射(20) 14a)使用该信号作为反馈信号。 还公开了一种用于执行该方法的清洁装置(19至24)。 本发明还涉及一种用于产生清洁气体的喷嘴(20)和相应的清洁气体产生装置的方法。

    Cleaning method, apparatus and cleaning system
    4.
    发明授权
    Cleaning method, apparatus and cleaning system 有权
    清洁方法,设备和清洁系统

    公开(公告)号:US07671347B2

    公开(公告)日:2010-03-02

    申请号:US11544931

    申请日:2006-10-10

    IPC分类号: G21K5/00

    CPC分类号: G03F7/70925

    摘要: A method to clean optical elements of an apparatus, the apparatus being configured to project a beam of radiation onto a target portion of a substrate, the apparatus comprising a plurality of optical elements arranged in sequence in the path of the radiation beam, wherein the cleaning method comprises: cleaning one or more second optical elements of the sequence, which receive one or more relatively low second radiation doses during operation of the apparatus, utilizing cumulatively shorter cleaning periods than one or more first optical elements of the sequence that receive one or more first radiation doses during operation of the apparatus, a second radiation dose being lower than each relatively high first radiation dose.

    摘要翻译: 一种清洁装置的光学元件的方法,该装置被配置为将辐射束投影到基板的目标部分上,该装置包括依次布置在辐射束的路径中的多个光学元件,其中清洁 方法包括:清洁序列的一个或多个第二光学元件,其在装置的操作期间接收一个或多个相对较低的第二辐射剂量,利用比接收一个或多个序列的序列的一个或多个第一光学元件累积更短的清洁周期 在装置运行期间的第一辐射剂量,第二辐射剂量低于每个相对高的第一辐射剂量。

    Cleaning method, apparatus and cleaning system
    9.
    发明申请
    Cleaning method, apparatus and cleaning system 有权
    清洁方法,设备和清洁系统

    公开(公告)号:US20080083878A1

    公开(公告)日:2008-04-10

    申请号:US11544931

    申请日:2006-10-10

    IPC分类号: G01J1/42

    CPC分类号: G03F7/70925

    摘要: A method to clean optical elements of an apparatus, the apparatus being configured to project a beam of radiation onto a target portion of a substrate, the apparatus comprising a plurality of optical elements arranged in sequence in the path of the radiation beam, wherein the cleaning method comprises: cleaning one or more second optical elements of the sequence, which receive one or more relatively low second radiation doses during operation of the apparatus, utilizing cumulatively shorter cleaning periods than one or more first optical elements of the sequence that receive one or more first radiation doses during operation of the apparatus, a second radiation dose being lower than each relatively high first radiation dose.

    摘要翻译: 一种清洁装置的光学元件的方法,该装置被配置为将辐射束投影到基板的目标部分上,该装置包括依次布置在辐射束的路径中的多个光学元件,其中清洁 方法包括:清洁序列的一个或多个第二光学元件,其在装置的操作期间接收一个或多个相对较低的第二辐射剂量,利用比接收一个或多个序列的序列的一个或多个第一光学元件累积更短的清洁周期 在装置运行期间的第一辐射剂量,第二辐射剂量低于每个相对高的第一辐射剂量。