METHOD AND STRUCTURE FOR FORMING A GYROSCOPE AND ACCELEROMETER
    1.
    发明申请
    METHOD AND STRUCTURE FOR FORMING A GYROSCOPE AND ACCELEROMETER 失效
    形成陀螺仪和加速度计的方法和结构

    公开(公告)号:US20120228727A1

    公开(公告)日:2012-09-13

    申请号:US13480351

    申请日:2012-05-24

    IPC分类号: H01L29/84 H01L21/02

    摘要: A method for fabricating a micro electromechanical device includes providing a first substrate including control circuitry. The first substrate has a top surface and a bottom surface. The method also includes forming an insulating layer on the top surface of the first substrate, removing a first portion of the insulating layer so as to form a plurality of standoff structures, and bonding a second substrate to the first substrate. The method further includes thinning the second substrate to a predetermined thickness and forming a plurality of trenches in the second substrate. Each of the plurality of trenches extends to the top surface of the first substrate. Moreover, the method includes filling at least a portion of each of the plurality of trenches with a conductive material, forming the micro electromechanical device in the second substrate, and bonding a third substrate to the second substrate.

    摘要翻译: 一种用于制造微机电装置的方法包括提供包括控制电路的第一基板。 第一衬底具有顶表面和底表面。 该方法还包括在第一衬底的顶表面上形成绝缘层,去除绝缘层的第一部分以形成多个间隔结构,并将第二衬底接合到第一衬底。 该方法还包括将第二衬底稀薄至预定厚度,并在第二衬底中形成多个沟槽。 多个沟槽中的每一个延伸到第一衬底的顶表面。 此外,该方法包括用导电材料填充多个沟槽中的每一个的至少一部分,在第二衬底中形成微机电器件,以及将第三衬底接合到第二衬底。

    Method and structure for forming a gyroscope and accelerometer
    2.
    发明授权
    Method and structure for forming a gyroscope and accelerometer 失效
    用于形成陀螺仪和加速度计的方法和结构

    公开(公告)号:US08530259B2

    公开(公告)日:2013-09-10

    申请号:US13480351

    申请日:2012-05-24

    IPC分类号: H01L21/00

    摘要: A method for fabricating a micro electromechanical device includes providing a first substrate including control circuitry. The first substrate has a top surface and a bottom surface. The method also includes forming an insulating layer on the top surface of the first substrate, removing a first portion of the insulating layer so as to form a plurality of standoff structures, and bonding a second substrate to the first substrate. The method further includes thinning the second substrate to a predetermined thickness and forming a plurality of trenches in the second substrate. Each of the plurality of trenches extends to the top surface of the first substrate. Moreover, the method includes filling at least a portion of each of the plurality of trenches with a conductive material, forming the micro electromechanical device in the second substrate, and bonding a third substrate to the second substrate.

    摘要翻译: 一种用于制造微机电装置的方法包括提供包括控制电路的第一基板。 第一衬底具有顶表面和底表面。 该方法还包括在第一衬底的顶表面上形成绝缘层,去除绝缘层的第一部分以形成多个间隔结构,并将第二衬底接合到第一衬底。 该方法还包括将第二衬底稀薄至预定厚度,并在第二衬底中形成多个沟槽。 多个沟槽中的每一个延伸到第一衬底的顶表面。 此外,该方法包括用导电材料填充多个沟槽中的每一个的至少一部分,在第二衬底中形成微机电器件,以及将第三衬底接合到第二衬底。

    Method and structure for forming a gyroscope and accelerometer
    3.
    发明授权
    Method and structure for forming a gyroscope and accelerometer 有权
    用于形成陀螺仪和加速度计的方法和结构

    公开(公告)号:US08207004B2

    公开(公告)日:2012-06-26

    申请号:US12620872

    申请日:2009-11-18

    IPC分类号: H01L21/00

    摘要: A method for fabricating a micro electromechanical device includes providing a first substrate including control circuitry. The first substrate has a top surface and a bottom surface. The method also includes forming an insulating layer on the top surface of the first substrate, removing a first portion of the insulating layer so as to form a plurality of standoff structures, and bonding a second substrate to the first substrate. The method further includes thinning the second substrate to a predetermined thickness and forming a plurality of trenches in the second substrate. Each of the plurality of trenches extends to the top surface of the first substrate. Moreover, the method includes filling at least a portion of each of the plurality of trenches with a conductive material, forming the micro electromechanical device in the second substrate, and bonding a third substrate to the second substrate.

    摘要翻译: 一种用于制造微机电装置的方法包括提供包括控制电路的第一基板。 第一衬底具有顶表面和底表面。 该方法还包括在第一衬底的顶表面上形成绝缘层,去除绝缘层的第一部分以形成多个间隔结构,并将第二衬底接合到第一衬底。 该方法还包括将第二衬底稀薄至预定厚度,并在第二衬底中形成多个沟槽。 多个沟槽中的每一个延伸到第一衬底的顶表面。 此外,该方法包括用导电材料填充多个沟槽中的每一个的至少一部分,在第二衬底中形成微机电器件,以及将第三衬底接合到第二衬底。

    Method and structure for forming a gyroscope and accelerometer
    4.
    发明申请
    Method and structure for forming a gyroscope and accelerometer 有权
    用于形成陀螺仪和加速度计的方法和结构

    公开(公告)号:US20100109102A1

    公开(公告)日:2010-05-06

    申请号:US12620872

    申请日:2009-11-18

    IPC分类号: H01L29/84 H01L21/50

    摘要: A method for fabricating a micro electromechanical device includes providing a first substrate including control circuitry. The first substrate has a top surface and a bottom surface. The method also includes forming an insulating layer on the top surface of the first substrate, removing a first portion of the insulating layer so as to form a plurality of standoff structures, and bonding a second substrate to the first substrate. The method further includes thinning the second substrate to a predetermined thickness and forming a plurality of trenches in the second substrate. Each of the plurality of trenches extends to the top surface of the first substrate. Moreover, the method includes filling at least a portion of each of the plurality of trenches with a conductive material, forming the micro electromechanical device in the second substrate, and bonding a third substrate to the second substrate.

    摘要翻译: 一种用于制造微机电装置的方法包括提供包括控制电路的第一基板。 第一衬底具有顶表面和底表面。 该方法还包括在第一衬底的顶表面上形成绝缘层,去除绝缘层的第一部分以形成多个间隔结构,并将第二衬底接合到第一衬底。 该方法还包括将第二衬底稀薄至预定厚度,并在第二衬底中形成多个沟槽。 多个沟槽中的每一个延伸到第一衬底的顶表面。 此外,该方法包括用导电材料填充多个沟槽中的每一个的至少一部分,在第二衬底中形成微机电器件,以及将第三衬底接合到第二衬底。

    High fill ratio silicon spatial light modulator
    5.
    发明申请
    High fill ratio silicon spatial light modulator 有权
    高填充率硅空间光调制器

    公开(公告)号:US20070097487A1

    公开(公告)日:2007-05-03

    申请号:US11448149

    申请日:2006-06-05

    IPC分类号: G02B26/00

    CPC分类号: G02B26/0841 G02B26/008

    摘要: An optical deflection device for a display application. The optical deflection device includes a semiconductor substrate including an upper surface region and one or more electrode devices provided overlying the upper surface region. The optical deflection device also includes a hinge device including a silicon material and coupled to the upper surface region. The optical deflection device further includes a spacing defined between the upper surface region and the hinge device and a mirror structure including a post portion coupled to the hinge device and a mirror plate portion coupled to the post portion and overlying the hinge device.

    摘要翻译: 一种用于显示器应用的光学偏转装置。 光偏转装置包括:半导体衬底,包括上表面区域和设置在上表面区域上的一个或多个电极器件。 光学偏转装置还包括铰链装置,其包括硅材料并且连接到上表面区域。 光学偏转装置还包括限定在上表面区域和铰链装置之间的间隔,以及反射镜结构,其包括联接到铰链装置的柱部分和耦合到柱部分并且覆盖铰链装置的镜板部分。

    Projection display system including a high fill ratio silicon spatial light modulator
    7.
    发明申请
    Projection display system including a high fill ratio silicon spatial light modulator 有权
    投影显示系统包括高填充率硅空间光调制器

    公开(公告)号:US20070097486A1

    公开(公告)日:2007-05-03

    申请号:US11448537

    申请日:2006-06-05

    IPC分类号: G02B26/00

    CPC分类号: G02B26/0841

    摘要: A display system includes a light source and a first optical system coupled to the light source and adapted to provide an illumination beam along an illumination path. The display system also includes a spatial light modulator positioned in the illumination path. The spatial light modulator includes a semiconductor substrate including a plurality of electrode devices and a hinge structure coupled to the semiconductor substrate. The hinge structure includes silicon material. The spatial light modulator also includes a mirror post coupled to the hinge structure and extending to a predetermined distance from the semiconductor substrate and a mirror plate coupled to the mirror post and overlying the plurality of electrode devices. The display system further includes a second optical system coupled to the spatial light modulator and adapted to project an image onto a projection surface.

    摘要翻译: 显示系统包括光源和耦合到光源并适于沿照明路径提供照明光束的第一光学系统。 显示系统还包括位于照明路径中的空间光调制器。 空间光调制器包括包括多个电极器件和耦合到半导体衬底的铰链结构的半导体衬底。 铰链结构包括硅材料。 空间光调制器还包括耦合到铰链结构并且延伸到半导体衬底预定距离的镜柱和耦合到镜柱并且覆盖多个电极器件的镜板。 显示系统还包括耦合到空间光调制器并适于将图像投影到投影表面上的第二光学系统。