公开(公告)号：US09507263B2

公开(公告)日：2016-11-29

申请号：US14245491

申请日：2014-04-04

Applicant: FUJIFILM Corporation

Inventor： Kunihiko Kodama ,  Shinji Tarutani ,  Yuichiro Enomoto ,  Tadashi Oomatsu ,  Takayuki Ito ,  Hirotaka Kitagawa ,  Akiko Hattori

IPC: G03F7/00 ,  G03F7/09

CPC classification number: G03F7/094 ,  G03F7/0002 ,  Y10T428/31504

Abstract: Provided is the pattern formability and line edge roughness of the resultant substrate.An underlay film composition for imprints comprising a compound (A) and a solvent (B), the compound (A) having at least either one of a group (Ka) capable of covalently bonding and/or interacting with a substrate, and, a group (Kb) capable of covalently bonding and/or interacting with a curable composition for imprints, an Ohnishi parameter (Z) calculated from (equation 1) of 3.8 or larger, and a molecular weight of 400 or larger: the Ohnishi parameter=(total number of atoms)/(number of carbon atoms−number of oxygen atoms).  (Equation 1)

公开(公告)号：US09263289B2

公开(公告)日：2016-02-16

申请号：US14550473

申请日：2014-11-21

Applicant: FUJIFILM CORPORATION

Inventor： Akiko Hattori ,  Hirotaka Kitagawa ,  Yuichiro Enomoto

IPC: C08G59/00 ,  H01L21/308 ,  C08F299/02 ,  G03F7/00 ,  C09J163/10 ,  G03F7/038

CPC classification number: H01L21/3086 ,  C08F299/02 ,  C09J163/10 ,  G03F7/0002 ,  G03F7/0388 ,  H01L21/3088 ,  H01L2924/0002 ,  Y10T428/24802 ,  H01L2924/00

Abstract: Provided is an adhesion-promoting composition between a curable composition for imprints and a substrate, which excellent in adhesiveness and can control pattern failure. An adhesion-promoting composition used between a curable composition for imprints and a substrate, which comprises a compound having a molecular weight of 500 or larger and having a reactive group, and has a content of a compound, with a molecular weight of 200 or smaller, of more than 1% by mass and not more than 10% by mass of a total solid content.

Abstract translation: 提供了一种用于印记的可固化组合物和基材之间的粘合促进组合物，其粘合性优异并且可以控制图案破坏。 在用于印记的可固化组合物和基材之间使用的粘合促进组合物，其包含分子量为500以上并具有反应性基团的化合物，并且具有分子量为200以下的化合物 ，超过总固体含量的1质量％且不超过10质量％。

公开(公告)号：US10901561B2

公开(公告)日：2021-01-26

申请号：US16274540

申请日：2019-02-13

Applicant: FUJIFILM Corporation

Inventor： Akiko Hattori ,  Akihiko Ohtsu

IPC: G06F3/041 ,  G06F3/044 ,  H01B5/14

Abstract: An object of the invention is to provide a conductive film having excellent visibility. Another object of the invention is to provide a touch panel sensor and a touch panel. A conductive film according to the embodiment of the invention includes a substrate and a conductive portion which is disposed on the substrate and composed of thin metal wires having a line width of 0.5 μm or greater and less than 2 μm, the thin metal wires form a mesh pattern, a line width L μm of the thin metal wires and an opening ratio A % of the mesh pattern satisfy a relationship represented by Formula (I), and a reflectivity of the thin metal wires at a wavelength of 550 nm is 80% or less. Formula (I): 70≤A

公开(公告)号：US09308676B2

公开(公告)日：2016-04-12

申请号：US14040914

申请日：2013-09-30

Applicant: FUJIFILM Corporation

Inventor： Akihiko Ohtsu ,  Akiko Hattori ,  Katsuhiro Nishimaki

IPC: B44C1/22 ,  B29C33/38 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/00

CPC classification number: B29C33/3842 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: In production of a mold having a deposited film on the surface thereof as a mold release layer, a quartz substrate plasma etched employing an etching gas that includes a sedimentary gas to form a pattern of protrusions and recesses having a desired shape in a structure constituted by the quartz substrate and a mask layer, while a deposited film constituted by sediment of the sedimentary gas is formed along the pattern of protrusions and recesses. The deposited film becomes the mold release layer. Thereby, throughput of mold production is improved in the production of molds having deposited films as mold release layers on the surfaces thereof.

Abstract translation: 在制造其表面具有沉积膜的模具作为脱模层时，使用包括沉积气体的蚀刻气体蚀刻的石英基板等离子体，以形成具有期望形状的突起和凹部的图案，其结构由 石英基板和掩模层，而由沉积气体的沉积物构成的沉积膜沿着突起和凹陷的图案形成。 沉积膜变成脱模层。 因此，在其表面上具有作为脱模层的沉积膜的模具的生产中提高了模具生产的生产量。

公开(公告)号：US09796803B2

公开(公告)日：2017-10-24

申请号：US14549068

申请日：2014-11-20

Applicant: FUJIFILM Corporation

Inventor： Hirotaka Kitagawa ,  Akiko Hattori ,  Yuichiro Enomoto

IPC: C08F220/32 ,  G03F7/00 ,  B29C59/00 ,  C08F220/18 ,  C08F220/28 ,  H01L21/02 ,  B29K33/00

CPC classification number: C08F220/32 ,  B29C59/005 ,  B29K2033/12 ,  C08F220/18 ,  C08F220/28 ,  C08F2220/281 ,  C08F2220/325 ,  G03F7/0002 ,  H01L21/02356

Abstract: An under layer film having excellent surface planarity is provided. In one aspect, the under layer film-forming composition for imprints includes a (meth)acrylic resin (A) containing an ethylenic unsaturated group (P) and a nonionic hydrophilic group (Q), and having a weight average molecular weight of 1,000 or larger; and a solvent (B), the resin (A) having an acid value of smaller than 1.0 mmol/g. In another aspect, the under layer film-forming composition for imprints includes a (meth)acrylic resin (A2) containing an ethylenic unsaturated group (P), and containing, as a nonionic hydrophilic group (Q), a cyclic substituent (Q2) having a carbonyl group in the cyclic structure thereof, with a weight average molecular weight of 1,000 or larger; and a solvent (B).

公开(公告)号：US09893317B2

公开(公告)日：2018-02-13

申请号：US14830127

申请日：2015-08-19

Applicant: FUJIFILM Corporation

Inventor： Hiroshi Kawakami ,  Akihito Amao ,  Akiko Hattori

IPC: H01L51/52 ,  H01L31/04 ,  C08F20/56 ,  C08K5/20 ,  C08F222/38 ,  H01L31/048

CPC classification number: H01L51/5256 ,  C08F20/56 ,  C08F222/385 ,  C08K5/20 ,  C08K2201/008 ,  H01L31/048 ,  H01L31/0481 ,  H01L2251/301 ,  Y10T428/31507 ,  Y10T428/31587 ,  Y10T428/31598

Abstract: The present invention provides a barrier laminate including at least one inorganic barrier layer and at least one organic layer, wherein the organic layer is a layer formed of a polymerizable composition comprising a polymerizable compound represented by general formula (1) below; and a gas barrier film including the barrier laminate and a support that preferably contains a resin consisting of a polymer or a copolymer comprising a cyclic olefin within a repeating unit or a polycarbonate resin: wherein R represents hydrogen atom or methyl group, and Rs may be the same or different to each other.