ADHESIVE COMPOSITION, ADHESIVE LAYER AND ADHESIVE SHEET
    3.
    发明申请
    ADHESIVE COMPOSITION, ADHESIVE LAYER AND ADHESIVE SHEET 有权
    胶粘组合物,粘合层和粘合片

    公开(公告)号:US20130143999A1

    公开(公告)日:2013-06-06

    申请号:US13814696

    申请日:2011-08-09

    IPC分类号: C09J133/10

    摘要: Provided are: an adhesive composition that is capable of providing an adhesive layer in which titanium-based nanoparticles are stably dispersed, said adhesive layer having more enhanced mechanical characteristics, excellent refractive index and excellent adhesive force; and an adhesive sheet or the like which uses the adhesive composition. An adhesive composition is prepared so as to contain: a (meth)acryl-based polymer that contains, as a monomer component, 50% by weight or more of a (meth)acrylate represented by the formula CH2═C(R1)COOR2 (wherein R1 represents hydrogen or a methyl group, and R2 represents a substituted or unsubstituted alkyl group of 1 to 20 carbon atoms), has a weight average molecular weight of from 500,000 to 3,000,000 as determined by gel permeation chromatography, and does not substantially contain an acid component; an aromatic polymer that has a weight average molecular weight of from 200 to 900 as determined by gel permeation chromatography in an amount of 120-400 parts by weight per 100 parts by weight of the (meth)acrylic polymer; and titanium-based nanoparticles that has an average particle size of 5 to 100 nm in an amount of 150 to 600 parts by weight per 100 parts by weight of the (meth)acrylic polymer.

    摘要翻译: 提供:能够提供其中钛基纳米粒子稳定分散的粘合剂层的粘合剂组合物,所述粘合剂层具有更强的机械特性,优异的折射率和优异的粘合力; 以及使用该粘合剂组合物的粘合片等。 制备粘合剂组合物以包含:(甲基)丙烯酸基聚合物,其包含作为单体成分的50重量%以上由式CH 2 = C(R 1)COOR 2表示的(甲基)丙烯酸酯 其中R1表示氢或甲基,R2表示取代或未取代的碳原子数为1〜20的烷基),通过凝胶渗透色谱法测定的重均分子量为500,000〜3,000,000,基本上不含有 酸组分; 通过凝胶渗透色谱测定的重均分子量为200-900的芳族聚合物,每100重量份的(甲基)丙烯酸聚合物的量为120-400重量份; 和相对于(甲基)丙烯酸系聚合物100重量份,平均粒径为5〜100nm的钛系纳米粒子为150〜600重量份。

    Method for producing a copolymer solution with a uniform concentration for semiconductor lithography
    4.
    发明授权
    Method for producing a copolymer solution with a uniform concentration for semiconductor lithography 有权
    用于半导体光刻的具有均匀浓度的共聚物溶液的制备方法

    公开(公告)号:US08377625B2

    公开(公告)日:2013-02-19

    申请号:US12607324

    申请日:2009-10-28

    IPC分类号: G03F7/00

    摘要: A method of producing a copolymer solution for semiconductor lithography having a copolymer and a solvent for coating film formation, which copolymer contains at least one repeating unit selected from the group consisting of: a repeating unit (A) having a hydroxyl group; a repeating unit (B) having a structure in which a hydroxyl group is protected by a group which suppresses dissolution into an alkaline developer and which dissociates in the action of an acid; a repeating unit (C) having a lactone structure; and a repeating unit (D) having a cyclic ether structure, the difference in the copolymer concentration among a plurality of containers which were filled with copolymer solution from the same manufacturing lot is not more than a certain range, or the method includes a certain production step.

    摘要翻译: 一种制备用于半导体光刻的共聚物溶液的方法,其具有共聚物和用于涂膜形成的溶剂,该共聚物含有至少一种选自由以下组成的组的重复单元:具有羟基的重复单元(A) 重复单元(B),其具有羟基被抑制溶解于碱性显影剂中并在酸作用中解离的基团保护的结构; 具有内酯结构的重复单元(C); 和具有环醚结构的重复单元(D),填充有来自同一制造批次的共聚物溶液的多个容器中的共聚物浓度的差异不大于一定范围,或者该方法包括一定的生产 步。

    METHOD FOR PRODUCING A COPOLYMER SOLUTION WITH A UNIFORM CONCENTRATION FOR SEMICONDUCTOR LITHOGRAPHY
    7.
    发明申请
    METHOD FOR PRODUCING A COPOLYMER SOLUTION WITH A UNIFORM CONCENTRATION FOR SEMICONDUCTOR LITHOGRAPHY 有权
    用于半导体层析的均匀浓度的共聚物溶液的制备方法

    公开(公告)号:US20100143842A1

    公开(公告)日:2010-06-10

    申请号:US12607324

    申请日:2009-10-28

    IPC分类号: G03F7/004

    摘要: A method of producing a copolymer solution for semiconductor lithography having a copolymer and a solvent for coating film formation, which copolymer contains at least one repeating unit selected from the group consisting of: a repeating unit (A) having a hydroxyl group; a repeating unit (B) having a structure in which a hydroxyl group is protected by a group which suppresses dissolution into an alkaline developer and which dissociates in the action of an acid; a repeating unit (C) having a lactone structure; and a repeating unit (D) having a cyclic ether structure, the difference in the copolymer concentration among a plurality of containers which were filled with copolymer solution from the same manufacturing lot is not more than a certain range, or the method includes a certain production step.

    摘要翻译: 一种制备用于半导体光刻的共聚物溶液的方法,其具有共聚物和用于涂膜形成的溶剂,该共聚物含有至少一种选自由以下组成的组的重复单元:具有羟基的重复单元(A) 重复单元(B),其具有羟基被抑制溶解于碱性显影剂中并在酸作用中解离的基团保护的结构; 具有内酯结构的重复单元(C); 和具有环醚结构的重复单元(D),填充有来自同一制造批次的共聚物溶液的多个容器中的共聚物浓度的差异不大于一定范围,或者该方法包括一定的生产 步。

    Thermoplastic resin composition, molded article, and film
    8.
    发明授权
    Thermoplastic resin composition, molded article, and film 失效
    热塑性树脂组合物,模制品和薄膜

    公开(公告)号:US07462671B2

    公开(公告)日:2008-12-09

    申请号:US10547887

    申请日:2004-03-05

    IPC分类号: C08F283/00 C08F34/02

    摘要: The present invention relates to a thermoplastic resin composition which contains a thermoplastic polymer (A) containing a glutaric anhydride-containing component shown in the following general formula (1), where R1 and R2 are the same or different and each represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and a rubber-containing polymer compound (B), and satisfies the following conditions of (I) and/or (II), (I) a total light transmittance per 2 mm of the thickness of the thermoplastic resin composition is more than 90%, (II) a weight-average molecular weight of a thermoplastic polymer (A) is from 30,000 to 150,000 and a glass transition temperature is at least 130° C. According to the present invention, a thermoplastic composition having high heat resistance, superior mechanical properties, colorless transparency, optical isotropy and moldability, as well as solvent resistance, is provided.

    摘要翻译: 本发明涉及含有含有下述通式(1)所示的含戊二酸酐的成分的热塑性聚合物(A)的热塑性树脂组合物,其中R 1和R 2相同或不同,各自表示氢原子或 具有1至5个碳原子的烷基和含橡胶的聚合物化合物(B),并且满足以下条件(I)和/或(II),(I)每2mm的总光线透射率 的热塑性树脂组合物的重均分子量大于90%,(II)热塑性聚合物(A)的重均分子量为30,000〜150,000,玻璃化转变温度为130℃以上。根据本发明, 提供了具有高耐热性,优异的机械性能,无色透明性,光学各向同性和成型性以及耐溶剂性的热塑性组合物。

    Hologram and holographic viewing device incorporating it
    10.
    发明授权
    Hologram and holographic viewing device incorporating it 有权
    全息图和全息查看设备

    公开(公告)号:US07301683B2

    公开(公告)日:2007-11-27

    申请号:US11238630

    申请日:2005-09-28

    申请人: Akiko Tanaka

    发明人: Akiko Tanaka

    IPC分类号: G03H1/08

    摘要: The invention relates to a hologram that enables two or more different images to be simultaneously reconstructed even in a state where the hologram is fixed in terms of relative position with respect to an eye, and a holographic viewing device that incorporates it. The hologram 14 is fabricated by applying Fourier transform to a plurality of input image to obtain a plurality of corresponding Fourier transform images 13-1, 13-2 and arraying the Fourier transform images 13-1, 13-2 on the same plane according to a given two-dimensional array principle into a computer-generated hologram. When a plurality of point light sources 231 to 239 located behind the hologram 14 are viewed through the hologram 14, a plurality of images are simultaneously and parallel reconstructed (28) in correspondence to the array positions of the plurality of Fourier transform images.

    摘要翻译: 本发明涉及一种全息图,即使在全息图相对于眼睛的相对位置固定的状态下也能同时重建两个或更多个不同的图像,以及包含该全息图的全息图。 通过对多个输入图像应用傅立叶变换来制作全息图14,以获得多个对应的傅里叶变换图像13-1,3-2,并根据相同的平面将傅里叶变换图像13-1,23排列在同一平面上 给定的二维阵列原理转化为计算机生成的全息图。 当通过全息图14观察位于全息图14之后的多个点光源23 1至23 9“时,多个图像被同时并行重建(28) 对应于多个傅里叶变换图像的阵列位置。