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    Device for applying layers of hard material by dusting
    4.
    发明授权
    Device for applying layers of hard material by dusting 有权
    用于通过除尘施加硬质材料层的装置

    公开(公告)号：US06315877B1

    公开(公告)日：2001-11-13

    申请号：US09485713

    申请日：2000-03-01

    申请人： Klaus Goedicke ,  Fred Fietzke

    发明人： Klaus Goedicke ,  Fred Fietzke

    IPC分类号： C23C1434

    CPC分类号： C23C14/352 ,  C23C14/505 ,  C23C14/541

    摘要： A device for the sputter application of hard material coatings, including an exhaustible vacuum chamber, at least one sputtering source for depositing a coating material, a plurality of fixtures for supporting a plurality parts to be coated, the fixtures being mounted on planet gears which are movable via a planetary drive, a centrally disposed heating device, a reactive gas inlet, and a plurality of movable screens for covering the at least one sputtering source, the screens being arranged to surround the fixtures, wherein the heating device, the screens, and the planetary drive comprise an assembly which is removable from the vacuum chamber.

    摘要翻译： 用于溅射施加硬质材料涂层的装置，包括可抽真空的真空室，至少一个用于沉积涂层材料的溅射源，用于支撑待涂覆的多个部件的多个固定装置，固定装置安装在行星齿轮上 可通过行星驱动器，中央布置的加热装置，反应气体入口和用于覆盖至少一个溅射源的多个可移动屏幕移动，所述屏幕被布置成围绕固定装置，其中加热装置，屏幕和 行星驱动器包括可从真空室移除的组件。

    Vacuum-coated compound body and process for its production
    5.
    发明授权
    Vacuum-coated compound body and process for its production 失效
    真空镀膜复合体及其生产工艺

    公开(公告)号：US5693417A

    公开(公告)日：1997-12-02

    申请号：US445523

    申请日：1995-05-22

    申请人： Klaus Goedicke ,  Gunter Hotzsch ,  Fred Fietzke ,  Olaf Zywitzki ,  Siegfried Schiller ,  Jonathan Reschke ,  Wolfgang Hempel

    发明人： Klaus Goedicke ,  Gunter Hotzsch ,  Fred Fietzke ,  Olaf Zywitzki ,  Siegfried Schiller ,  Jonathan Reschke ,  Wolfgang Hempel

    IPC分类号： C23C14/00 ,  C23C14/08 ,  C23C8/00

    CPC分类号： C23C14/081 ,  C23C14/0036 ,  Y10T428/24975 ,  Y10T428/265

    摘要： Vacuum coated compound body and a process for its production. Such compound bodies, when coated in a known manner, have a carrier of a metal or of an alloy, a layer that is thermally, mechanically and chemically unstable, with their surface showing cracks and being partially porous. These shortcomings are overcome via an improved eco-friendly vacuum deposition process wherein at least one layer of a material having an outer layer is of Al.sub.2 O.sub.3, is applied to the metal or alloy carrier at a maximum of 700.degree. C., with this layer being completely crystalline and comprised of an .alpha.Al.sub.2 O.sub.3 phase and possibly of a .gamma.Al.sub.2 O.sub.3 phase with a (440) texture, having a compressive stress of at least 1 Gpa and a hardness of at least 20 Gpa, with the Al.sub.2 O.sub.3 layer being deposited via reactive magnetron sputtering, wherein the magnetrons are pulse powered, the pulse frequency lies between 20 and 100 Khz, and the deposition rate is at least 1 nm/s, with the compound bodies being utilized for cutting treatments, particularly as drills, milling cutters, reamers, broaches or saw blades.

    摘要翻译： 真空涂层复合体及其生产工艺。 当以已知的方式涂覆时，这种复合体具有金属或合金的载体，即热，机械和化学不稳定的层，其表面显示出裂纹并且是部分多孔的。 通过改进的环保真空沉积工艺克服了这些缺点，其中至少一层具有外层的材料为Al 2 O 3，最多在700℃下施加到金属或合金载体上，该层为 完全结晶并且由αAl 2 O 3相和可能具有（440）织构的γAl 2 O 3相组成，具有至少1Gpa的压缩应力和至少20Gpa的硬度，其中Al 2 O 3层通过反应磁控管沉积 溅射，其中磁控管是脉冲供电的，脉冲频率在20和100KHz之间，并且沉积速率为至少1nm / s，复合体用于切割处理，特别是作为钻头，铣刀，铰刀， 拉刀或锯片。

    Process and device for the coating of substrates by means of bipolar pulsed magnetron sputtering and the use thereof
    6.
    发明授权
    Process and device for the coating of substrates by means of bipolar pulsed magnetron sputtering and the use thereof 失效
    用于通过双极脉冲磁控溅射法涂覆基板的方法和装置及其用途

    公开(公告)号：US06620299B1

    公开(公告)日：2003-09-16

    申请号：US09868636

    申请日：2001-06-27

    申请人： Fred Fietzke ,  Klaus Goedicke ,  Siegfried Schiller

    发明人： Fred Fietzke ,  Klaus Goedicke ,  Siegfried Schiller

    IPC分类号： C23C1434

    CPC分类号： C23C14/352 ,  H01J37/3405

    摘要： Process and device for coating substrates utilizing bipolar pulsed magnetron sputtering in the frequency range between 10 and 100 kHz, wherein the device includes at least three magnetron sources. Each of the at least three magnetron sources includes a target. At least two of the targets are connected to a potential-free bipolar power supply device. The at least three targets are arranged relative to the substrates in such a way that the substrates are located at least partially inside a discharge current during a coating of the substrates. A switching device is adapted to connect the targets to the bipolar power supply device. A technological predetermined program is used for controlling the switching device. The switching device connects at least two of the targets at a time to the bipolar power supply device according to the technologically predetermined program.

    摘要翻译： 在10至100kHz的频率范围内使用双极性脉冲磁控溅射涂覆基底的方法和装置，其中该装置包括至少三个磁控管源。 至少三个磁控管源中的每一个包括目标。 至少两个目标连接到无电压双极电源装置。 至少三个目标相对于基板被布置成使得在基板的涂覆期间基板至少部分地位于放电电流的内部。 开关装置适于将目标连接到双极电源装置。 技术预定程序用于控制切换装置。 开关装置根据技术上预定的程序一次将至少两个目标物连接到双极电源装置。

    Compound body of vacuum-coated sintered material and process for its production
    8.
    发明授权
    Compound body of vacuum-coated sintered material and process for its production 失效
    真空包覆烧结材料的复合体及其生产工艺

    公开(公告)号：US5698314A

    公开(公告)日：1997-12-16

    申请号：US445521

    申请日：1995-05-22

    申请人： Klaus Goedicke ,  Gunter Hotzsch ,  Fred Fietzke ,  Olaf Zywitzki ,  Siegfried Schiller ,  Jonathan Reschke ,  Wolfgang Hempel

    发明人： Klaus Goedicke ,  Gunter Hotzsch ,  Fred Fietzke ,  Olaf Zywitzki ,  Siegfried Schiller ,  Jonathan Reschke ,  Wolfgang Hempel

    IPC分类号： C04B35/622 ,  C04B41/50 ,  C04B41/52 ,  C04B41/87 ,  C04B41/89 ,  C23C14/00 ,  C23C14/08

    CPC分类号： C04B41/87 ,  C04B35/62222 ,  C04B41/5031 ,  C04B41/52 ,  C04B41/89 ,  C23C14/0036 ,  C23C14/081 ,  Y10T428/2916

    摘要： Compound body of a vacuum coated sintered material and a process for its production. Such compound bodies, when coated in a known manner, have a carrier of sintered material coated with a layer that is thermally, mechanically and chemically unstable, with their surface showings cracks and being partially porous. These shortcomings are overcome via an improved eco-friendly vacuum deposition process, wherein at least one layer of a material, having an outer layer of Al.sub.2 O.sub.3, is applied to the carrier of sintered material at a maximum of 800.degree. C., with this layer being completely crystalline and comprised of an .alpha.Al.sub.2 O.sub..sub.3 phase and possibly of a .gamma.Al.sub.2 O.sub.3 phase with a (440) texture, having a compressive stress of at least 1 GPa and a hardness of at least 20 GPa, with the Al.sub.2 O.sub.3 layer being deposited via reactive magnetron sputtering, wherein the magnetrons are pulse driven, the pulse frequency lies between 20 and 100 Khz and the deposition rate is at least 1 nm/s, with the resulting compound bodies being utilized for cutting treatments, particularly as cemented carbide inserts.

    摘要翻译： 真空涂覆烧结材料的复合体及其制造方法。 这种复合体以已知的方式涂覆时，具有涂覆有热，机械和化学不稳定的层的烧结材料的载体，其表面显示出裂纹并且是部分多孔的。 通过改进的环保真空沉积工艺克服了这些缺点，其中至少一层具有Al 2 O 3外层的材料最多在800℃下施加到烧结材料的载体上，该层 是完全结晶的，并且由αAl 2 O 3相和可能具有（440）织构的γAl 2 O 3相组成，具有至少1GPa的压缩应力和至少20GPa的硬度，Al 2 O 3层通过反应性沉积 磁控管溅射，其中磁控管是脉冲驱动的，脉冲频率在20和100KHz之间，并且沉积速率为至少1nm / s，所得到的复合体用于切割处理，特别是作为硬质合金刀片。

    PVD Al2O3 coated cutting tool
    9.
    发明授权
    PVD Al2O3 coated cutting tool 有权
    PVD Al2O3涂层切割工具

    公开(公告)号：US06673430B2

    公开(公告)日：2004-01-06

    申请号：US10151821

    申请日：2002-05-22

    申请人： Siegfried Schiller ,  Klaus Goedicke ,  Fred Fietzke ,  Olaf Zywitzki ,  Mats Sjöstrand ,  Björn Ljungberg ,  Tomas Hilding ,  Viveka Alfredsson

    发明人： Siegfried Schiller ,  Klaus Goedicke ,  Fred Fietzke ,  Olaf Zywitzki ,  Mats Sjöstrand ,  Björn Ljungberg ,  Tomas Hilding ,  Viveka Alfredsson

    IPC分类号： B32B900

    CPC分类号： C23C14/081 ,  C23C14/352 ,  Y10T407/27 ,  Y10T428/24975 ,  Y10T428/25 ,  Y10T428/252 ,  Y10T428/265

    摘要： The present invention describes a coated cutting tool for metal machining. The coating is formed by one or more layers of refractory compounds of which at least one layer of fine-grained, crystalline &ggr;-phase alumina, Al2O3, with a grainsize less than 0.1 &mgr;m. The Al2O3 layer is deposited with a bipolar pulsed DMS technique (Dual Magnetron Sputtering) at substrate temperatures in the range 450° C. to 700° C. preferably 550° C. to 650° C., depending on the particular material of the tool body to be coated. Identification of the &ggr;-phase alumina is made by X-ray diffraction. Reflexes from the (400) and (440) planes occurring at the 2&thgr;0- angles 45.8 and 66.8 degrees when using CuK&agr; radiation identify the &ggr;-phase Al2O3. The alumina layer is also very strongly textured in the [440]-direction. The Al2O3 layer is virtually free of cracks and halogen impurities. Furthermore, the Al2O3 layer gives the cutting edge of the tool an extremely smooth surface finish.

    摘要翻译： 本发明描述了一种用于金属加工的涂层切割工具。 涂层由一层或多层难熔化合物形成，其中至少一层细晶粒结晶γ相氧化铝Al 2 O 3具有小于0.1μm的颗粒。 根据工具的具体材料，在450℃至700℃，优选550℃至650℃的衬底温度下，用双极脉冲DMS技术（双重磁控管溅射）沉积Al 2 O 3层。 身体涂层。 通过X射线衍射鉴定γ相氧化铝。 当使用CuKalpha辐射时，在2θ角45.8°和66.8°处发生的（400）和（440）平面的反射识别γ相Al2O3。 氧化铝层在[440] - 方向上也非常强烈地纹理化。 Al2O3层实际上没有裂纹和卤素杂质。 此外，Al2O3层使刀具的切削刃具有非常光滑的表面光洁度。

    Method of making a PVD Al2O3 coated cutting tool
    10.
    发明授权
    Method of making a PVD Al2O3 coated cutting tool 有权
    制造PVD Al2O3涂层切削工具的方法

    公开(公告)号：US06451180B1

    公开(公告)日：2002-09-17

    申请号：US09563419

    申请日：2000-05-02

    申请人： Siegfried Schiller ,  Klaus Goedicke ,  Fred Fietzke ,  Olaf Zywitzki ,  Mats Sjöstrand ,  Björn Ljungberg

    发明人： Siegfried Schiller ,  Klaus Goedicke ,  Fred Fietzke ,  Olaf Zywitzki ,  Mats Sjöstrand ,  Björn Ljungberg

    IPC分类号： C23C1434

    CPC分类号： C23C14/345 ,  C23C14/0042 ,  C23C14/081 ,  C23C14/35 ,  C23C28/044 ,  C23C30/005

    摘要： The present invention relates to a process for producing a coated cutting tool consisting of a coating and a substrate, wherein at least one refractory layer consisting of fine-grained, crystalline &ggr;-Al2O3 is deposited by reactive magnetron sputtering onto the moving substrate in a vacuum by pulsed magnetron sputtering in a mixture of a rare gas and a reactive gas at a pulse frequency set for 10 to 100 kHz. The deposition occurs with a rate of at least 1 nm/s with reference to a stationarily arranged substrate at a magnetron target power density in time average set for at least 10 W/cm2. The substrate temperature is in the range 400 to 700° C. and the flux of impinging particles onto each individual substrate is cyclically interrupted.

    摘要翻译： 本发明涉及一种用于生产由涂层和基材组成的涂层切割工具的方法，其中至少一个由细晶粒结晶γ-Al 2 O 3构成的难熔层通过反应性磁控溅射在真空中沉积到移动的基板上 通过脉冲磁控溅射在设定为10至100kHz的脉冲频率的稀有气体和反应性气体的混合物中。 相对于以至少10W / cm 2的时间平均值的磁控管目标功率密度的固定布置的基板，沉积以至少1nm / s的速率发生。 衬底温度在400至700℃的范围内，并且每个单独衬底上的入射颗粒的通量被循环地中断。