LOW INTERNAL STRESS COPPER ELECTROPLATING METHOD
    5.
    发明申请
    LOW INTERNAL STRESS COPPER ELECTROPLATING METHOD 有权
    低内应力铜电镀方法

    公开(公告)号:US20130240368A1

    公开(公告)日:2013-09-19

    申请号:US13607737

    申请日:2012-09-09

    IPC分类号: C25D5/54

    CPC分类号: C25D5/54 C25D3/38

    摘要: Copper electroplating methods provide low internal stress copper deposits. Concentrations of accelerators in the copper electroplating bath vary as a function of the plating current density and the low internal stress copper deposit is observed as a matt copper deposit.

    摘要翻译: 铜电镀方法提供低内应力铜沉积。 铜电镀浴中的促进剂浓度随电镀电流密度的变化而变化,低内应力铜沉积物被观察为无光铜沉积物。

    Fluid delivery systems for electronic device manufacture
    10.
    发明授权
    Fluid delivery systems for electronic device manufacture 失效
    用于电子设备制造的流体输送系统

    公开(公告)号:US06265020B1

    公开(公告)日:2001-07-24

    申请号:US09387472

    申请日:1999-09-01

    IPC分类号: B05D136

    摘要: The present invention relates to new methods for delivering solutions during electronic device manufacture. Methods of the invention include delivering metallization solutions to the device at an angle of less than 90 degrees with the surface of the device. The method may further comprise partially treating the device by delivering the metallization solutions from above the device, turning the device over, and then completing treatment by delivering the metallization solutions from below the article. The method is particularly useful in the formation of printed circuit boards and other electronic packaging devices having through-holes and blind vias.

    摘要翻译: 本发明涉及在电子设备制造期间传送解决方案的新方法。 本发明的方法包括以与装置的表面成小于90度的角度将金属化溶液递送到装置。 该方法还可以包括通过从装置上方递送金属化溶液来部分地处理装置,使装置翻转,然后通过从制品下方递送金属化溶液来完成处理。 该方法在形成具有通孔和盲孔的印刷电路板和其它电子封装装置中特别有用。