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    Transfer method for a mask or substrate, storage box, apparatus adapted for use in such method, and device manufacturing method including such a transfer method
    1.
    发明授权
    Transfer method for a mask or substrate, storage box, apparatus adapted for use in such method, and device manufacturing method including such a transfer method 有权
    用于掩模或基材的转移方法，储存盒，适用于这种方法的装置以及包括这种转印方法的装置制造方法

    公开(公告)号：US06753945B2

    公开(公告)日：2004-06-22

    申请号：US10374511

    申请日：2003-02-27

    申请人： Gert-Jan Heerens ,  Bastiaan Lambertus Wilhelmus Marinus Van De Ven ,  Robert Gabriel Maria Lansbergen ,  Erik Leonardus Ham

    发明人： Gert-Jan Heerens ,  Bastiaan Lambertus Wilhelmus Marinus Van De Ven ,  Robert Gabriel Maria Lansbergen ,  Erik Leonardus Ham

    IPC分类号： G03B2742

    CPC分类号： G03F1/66 ,  G03F7/70741 ,  G03F7/7075 ,  G03F7/70916 ,  G03F7/70991 ,  Y10S414/139

    摘要： A method for transferring one or more substrates or masks in a storage box to an apparatus for handling, processing or using the substrates or masks or vice versa, the storage box including a cover having an openable cover part. The method includes providing the storage box onto an openable wall part of a wall of an enclosed protective environment of the apparatus such that the openable cover part overlaps the openable wall part, the protective environment being adapted to be filled with an inert gas or to be evacuated; opening the openable cover part and the openable wall part, whereby the cover of the storage box forms part of the wall of the protective environment and an inside of the storage box becomes part of the protective environment; and transferring at least one of the substrates or masks from an inside space of the storage box to an inside space of the protective environment, or vice versa.

    摘要翻译： 一种用于将存储箱中的一个或多个衬底或掩模转移到用于处理，处理或使用衬底或掩模的装置或反之亦然的方法，所述存储盒包括具有可打开的盖部分的盖。 该方法包括将存放箱设置在设备的封闭保护环境的壁的可打开的壁部分上，使得可打开的盖部分与可开启的壁部分重叠，保护环境适于填充惰性气体，或者为 疏散 打开可打开的盖部分和可打开的壁部分，由此存储箱的盖形成保护环境的壁的一部分，并且存储箱的内部成为保护环境的一部分; 以及将所述基板或掩模中的至少一个从所述存储箱的内部空间传送到所述保护环境的内部空间，反之亦然。

    Lithographic apparatus and device manufacturing method
    2.
    发明授权
    Lithographic apparatus and device manufacturing method 失效
    平版印刷设备和器件制造方法

    公开(公告)号：US07123344B2

    公开(公告)日：2006-10-17

    申请号：US10671588

    申请日：2003-09-29

    申请人： Bastiaan Lambertus Wilhelmus Marinus Van De Ven ,  Erik Leonardus Ham

    发明人： Bastiaan Lambertus Wilhelmus Marinus Van De Ven ,  Erik Leonardus Ham

    IPC分类号： G03B27/42 ,  G03B27/62

    CPC分类号： G03F7/70741

    摘要： The invention relates to a lithographic apparatus including an illumination system for providing a projection beam of radiation, a support structure for supporting patterning means, the patterning means serving to impart the projection beam with a pattern in its cross-section, a dust-right storage container defining a storage space for storing patterning structures, wherein the storage container is arranged to be coupled with a transfer container such that the transfer container for exchanging patterning structures between the transfer container and the lithographic apparatus through a closeable passage between the transfer container and the storage container, a substrate table for holding a substrate and a projection system for projecting the patterned beam onto a target portion of the substrate. Furthermore, the invention relates to a method of using such an apparatus.

    摘要翻译： 本发明涉及一种光刻设备，其包括用于提供投影辐射束的照明系统，用于支撑图案形成装置的支撑结构，用于使投影光束在其横截面上具有图案的图案形成装置，灰尘存储 容器限定用于存储图案形成结构的存储空间，其中所述存储容器布置成与转移容器联接，使得所述转移容器通过所述转移容器和所述转印容器之间的可关闭通道在所述转印容器和所述光刻设备之间交换图案形成结构， 存储容器，用于保持基板的基板台和用于将图案化的光束投影到基板的目标部分上的投影系统。 此外，本发明涉及使用这种装置的方法。

    Lithographic apparatus and device manufacturing method
    3.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US07202934B2

    公开(公告)日：2007-04-10

    申请号：US11015770

    申请日：2004-12-20

    申请人： Johannes Hubertus Josephina Moors ,  Erik Leonardus Ham ,  Gert-Jan Heerens ,  Paulus Martinus Maria Liebregts ,  Erik Roelof Loopstra ,  Henri Gerard Cato Werij

    发明人： Johannes Hubertus Josephina Moors ,  Erik Leonardus Ham ,  Gert-Jan Heerens ,  Paulus Martinus Maria Liebregts ,  Erik Roelof Loopstra ,  Henri Gerard Cato Werij

    IPC分类号： G03B27/52 ,  G03B27/42 ,  G03F7/00

    CPC分类号： G03F7/70933 ,  G03F7/70908

    摘要： A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate is disclosed. The apparatus includes an optics compartment that contains a patterned surface of the patterning device and an optical element, and a substrate compartment connected to the optics compartment by a connection that is arranged to pass a patterned beam of radiation from the optical element to the substrate. The apparatus also includes a first flush gas inlet arranged to supply a first flush gas into the connection, a second flush gas inlet adjacent to the patterned surface and arranged to supply a second flush gas into the optics compartment and to create a region adjacent the patterned surface in which the second flush gas flows in a direction with a component normal to and away from the patterned surface, and a gas pump arranged to pump the flush gases from the optics compartment.

    摘要翻译： 公开了一种布置成将图案从图案形成装置转印到基底上的光刻设备。 该装置包括光学隔室，其包含图案形成装置的图案化表面和光学元件，以及通过布置成将图案化的辐射束从光学元件传递到衬底的连接部连接到光学隔室的衬底隔室。 该装置还包括第一冲洗气体入口，其布置成将第一冲洗气体供应到连接中，第二冲洗气体入口与图案化表面相邻，并且布置成将第二冲洗气体供应到光学隔室中并且产生邻近图案化的区域 表面，其中第二冲洗气体沿具有垂直于和远离图案化表面的部件的方向流动;以及气泵，其布置成泵送来自光学隔室的冲洗气体。