High frequency induction coupled plasma torch with concentric pipes
having flanges thereon
    2.
    发明授权
    High frequency induction coupled plasma torch with concentric pipes having flanges thereon 失效
    具有同心管的高频感应耦合等离子体焰炬在其上具有凸缘

    公开(公告)号:US4578560A

    公开(公告)日:1986-03-25

    申请号:US532937

    申请日:1983-09-16

    CPC分类号: H05H1/30

    摘要: A high frequency induction coupled plasma torch is disclosed. The torch is comprised of a multi-pipe structure and is used for forming a plasma flame by high frequency power induction. The torch is comprised of a plurality of pipes which are coaxially arranged within each other. Each of the pipes has one or more flanged openings positioned on its surface whereby it is interconnected to the adjacent pipe. By means of the flanged openings any given pipe may be interconnected with any number of outer pipes. The torch can be economically produced and maintained.

    摘要翻译: 公开了一种高频感应耦合等离子体焰炬。 手电筒由多管结构组成,用于通过高频功率感应形成等离子火焰。 手电筒由多个彼此同轴布置的管道组成。 每个管道具有位于其表面上的一个或多个凸缘开口,由此其与相邻的管道互连。 通过法兰开口,任何给定的管可以与任何数量的外管相互连接。 火炬可以经济地生产和维护。

    SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD
    4.
    发明申请
    SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD 失效
    基板处理装置和基板处理方法

    公开(公告)号:US20090242517A1

    公开(公告)日:2009-10-01

    申请号:US12410049

    申请日:2009-03-24

    IPC分类号: B08B3/02 C03C15/00 C23F1/00

    CPC分类号: H01L21/67051 H01L21/67057

    摘要: A substrate treating apparatus for performing a predetermined treatment of substrates with a treating liquid. The apparatus includes a treating tank for storing the treating liquid; a lifter having holding elements for holding the substrates, and vertically movable between a standby position above the treating tank and a treating position inside the treating tank; lower nozzles arranged on opposite sides at a bottom of the treating tank for supplying the treating liquid; upper nozzles arranged above the lower nozzles for supplying the treating liquid toward the holding elements of the lifter; and a control device for controlling a flow ratio of the treating liquid between the upper nozzles and the lower nozzles according to the treatment.

    摘要翻译: 一种用处理液进行基板的预定处理的基板处理装置。 该装置包括用于储存处理液的处理槽; 具有用于保持基板的保持元件的升降器,并且能够在处理槽上方的备用位置与处理槽内的处理位置之间垂直移动; 在处理槽的底部设置在相对侧的下喷嘴,用于供给处理液; 上喷嘴布置在下喷嘴上方,用于将处理液朝向提升器的保持元件供应; 以及控制装置,用于根据处理来控制上喷嘴和下喷嘴之间的处理液的流量比。

    Filter cartridge for fluid for treating surface of electronic device substrate
    9.
    发明申请
    Filter cartridge for fluid for treating surface of electronic device substrate 审中-公开
    用于处理电子器件基板表面的流体滤芯

    公开(公告)号:US20070007196A1

    公开(公告)日:2007-01-11

    申请号:US10554585

    申请日:2004-04-28

    IPC分类号: B01D24/00

    摘要: It is the purpose of the present invention to provide filter cartridges which can suitably be utilized in purifying chemical fluids for treating the surface of an electronic device substrate to be used in the semiconductor industry, particularly fluids containing a basic compound such as ammonia and an ammonium salt, or hydrofluoric acid (HF). The filter cartridges relating to the present invention which are used in removing metallic impurities contained in a chemical fluid for treating the surface of an electronic device substrate by treating the chemical fluid, is characterized by having a filter material incorporated therein, into which functional groups compatible with the existing morphology of the metallic impurities to be removed are incorporated in compliance with the constituents of the chemical fluid to be treated and the types of the metallic impurities to be removed.

    摘要翻译: 本发明的目的是提供一种适用于净化用于半导体工业中使用的电子器件基板表面的化学流体的滤芯,特别是含有碱性化合物如氨和铵的流体 盐或氢氟酸(HF)。 通过处理化学流体处理用于处理电子器件基板的表面的化学流体中所含的金属杂质所使用的本发明的滤芯的特征在于,具有并入其中的过滤材料, 将要除去的金属杂质的现有形态与所要处理的化学流体的组分和要去除的金属杂质的类型相符合。