公开(公告)号：US10566172B2

公开(公告)日：2020-02-18

申请号：US16184107

申请日：2018-11-08

Applicant: Hitachi High-Technologies Corporation

Inventor： Tomohito Nakano ,  Toshiyuki Yokosuka ,  Yuko Sasaki ,  Minoru Yamazaki ,  Yuzuru Mochizuki

IPC: H01J37/21 ,  H01J37/141 ,  H01J37/244 ,  H01J37/22 ,  H01J37/20 ,  H01J37/28

Abstract: A charged particle beam apparatus with reduced frequency of lens resetting operations and thus with improved throughput. The apparatus includes an electron source configured to generate an electron beam, an objective lens to which coil current is adapted to be applied to converge the electron beam on a sample, a focal position adjustment device configured to adjust the focal position of the electron beam, a detector configured to detect electrons from the sample, a display unit configured to display an image of the sample in accordance with a signal from the detector, a storage unit configured to store information on the hysteresis characteristics of the objective lens, and an estimation unit configured to estimate a magnetic field generated by the objective lens on the basis of the coil current, the amount of adjustment of the focal position by the focal position adjustment device, and the information on the hysteresis characteristics.

公开(公告)号：US09627171B2

公开(公告)日：2017-04-18

申请号：US14410999

申请日：2013-06-10

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Hiroshi Makino ,  Hideyuki Kazumi ,  Minoru Yamazaki ,  Yuzuru Mizuhara ,  Miki Isawa

IPC: G21K7/00 ,  H01J37/147 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/147 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/24485 ,  H01J2237/2449 ,  H01J2237/2806 ,  H01J2237/281

Abstract: An objective of the present invention is to provide a charged particle beam device with which information based on a charged particle which is discharged from a bottom part of high-aspect structure is revealed more than with previous technology. To achieve the objective, proposed is a charged particle beam device comprising: a first orthogonal electromagnetic field generator which deflects charged particles which are discharged from a material; a second orthogonal electromagnetic field generator which further deflects the charged particles which are deflected by the first orthogonal electromagnetic field generator; an aperture forming member having a charged particle beam pass-through aperture; and a third orthogonal electromagnetic field generator which deflects the charged particles which have passed through the aperture forming member.

公开(公告)号：US10991542B2

公开(公告)日：2021-04-27

申请号：US16477986

申请日：2017-01-27

Applicant: Hitachi High-Technologies Corporation

Inventor： Ryota Watanabe ,  Yuko Sasaki ,  Kazunari Asao ,  Makoto Suzuki ,  Wataru Mori ,  Minoru Yamazaki

IPC: H01J37/22 ,  H01J37/244 ,  H01J37/10 ,  H01J37/28

Abstract: The purpose of the present invention is to provide a charged particle beam device which adjusts brightness and contrast or adjusts focus and the like appropriately in a short time even if there are few detected signals. Proposed as an aspect for achieving this purpose is a charged particle beam device provided with: a detector for detecting charged particles obtained on the basis of irradiation of a specimen with a charged particle beam emitted from a charged particle source; and a control unit for processing a signal obtained on the basis of the output of the detector, wherein the control unit performs statistical processing on gray level values in a predetermined region of an image generated on the basis of the output of the detector, and executes signal processing for correcting a difference between a statistical value obtained by the statistical processing and reference data relating to the gray level values of the image.

公开(公告)号：US10546715B2

公开(公告)日：2020-01-28

申请号：US15761294

申请日：2015-09-29

Applicant: Hitachi High-Technologies Corporation

Inventor： Shahedul Hoque ,  Hajime Kawano ,  Yoshinori Momonoi ,  Hideki Itai ,  Minoru Yamazaki ,  Hiroshi Nishihama

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/26 ,  G02B21/00

Abstract: The objective of the present invention is to provide a charged particle beam device wherein scanning is performed through a scanning pattern that may suppress the influence from charge accumulation without having to perform blanking. In order to achieve this objective, a charged particle beam device is proposed wherein a first scan line is scanned by deflecting a charged particle beam in a first direction. The charged particle beam is deflected in a manner where the ending point of the first scan line is connected to the scan starting point of a second scan line which is arranged to be parallel to the first scan line so as to draw a scanning trajectory, thereby modifying the scan line position. The second scan line is scanned by scanning the charged particle beam from the scan starting point of the second scan line toward a second direction that is opposite to the first direction. After scanning the second scan line, the charged particle beam device scans the interior of a first frame by repeating the scan line position modification and the scanning of the charged particle beam toward the opposite direction. After scanning the first frame, the charged particle beam device starts the scanning of a second frame with the scan ending point contained within the first frame serving as the scan starting point.

公开(公告)号：US20130284921A1

公开(公告)日：2013-10-31

申请号：US13924213

申请日：2013-06-21

Applicant: Hitachi High-Technologies Corporation

Inventor： Minoru Yamazaki ,  Akira Ikegami ,  Hideyuki Kazumi ,  Osamu Nasu

IPC: G01N23/225

CPC classification number: G01N23/2251 ,  G01R29/24 ,  H01J37/28 ,  H01J37/292 ,  H01J2237/221 ,  H01J2237/244 ,  H01J2237/24564 ,  H01J2237/24592 ,  H01J2237/2594

Abstract: An object of the present invention is to provide a method and apparatus for measuring a potential on a surface of a sample using a charged particle beam while restraining a change in the potential on the sample induced by the charged particle beam application, or detecting a compensation value for a change in a condition for the apparatus caused by the sample being electrically charged. In order to achieve the above object, the present invention provides a method and apparatus for applying a voltage to a sample so that a charged particle beam does not reach the sample (hereinafter, this may be referred to as “mirror state”) in a state in which the charged particle beam is applied toward the sample, and detecting information relating to a potential on the sample using signals obtained by that voltage application.

公开(公告)号：US08648300B2

公开(公告)日：2014-02-11

申请号：US13939767

申请日：2013-07-11

Applicant: Hitachi High-Technologies Corporation

Inventor： Miki Isawa ,  Minoru Yamazaki ,  Yuzuru Mizuhara ,  Hiroshi Makino ,  Hideyuki Kazumi

IPC: G01N23/00 ,  G21K7/00

CPC classification number: G01N23/2258 ,  G01B2210/56 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/1508 ,  H01J2237/2448 ,  H01J2237/281 ,  H01J2237/2816

Abstract: The charged particle beam apparatus having an opening formation member formed with an opening for passage of a charged particle beam emitted from a charged particle source, and either a detector adapted to detect charged particles having passed through the passage opening or a detector adapted to detect charged particles resulting from bombardment on another member of the charged particles having passed through the opening, comprises an aligner for aligning charged particles discharged from the sample and a control unit for controlling the aligner, wherein the control unit controls the aligner to cause it to shift trajectories of the charged particles discharged from the sample so that length measurement may be executed on the basis of detection signals before and after the alignment by the aligner.

Abstract translation: 带电粒子束装置具有开口形成构件，该开口形成构件形成有用于通过从带电粒子源发射的带电粒子束的开口，以及适于检测通过通道开口的带电粒子的检测器或适于检测带电粒子的检测器 通过对通过开口的带电粒子的另一个部件进行轰击而产生的粒子包括用于对准从样品排出的带电粒子的对准器和用于控制对准器的控制单元，其中控制单元控制对准器使其移动轨迹 从样品排出的带电粒子可以根据校准器对准前后的检测信号进行长度测量。

公开(公告)号：US11152186B2

公开(公告)日：2021-10-19

申请号：US16354670

申请日：2019-03-15

Applicant: Hitachi High-Technologies Corporation

Inventor： Wataru Yamane ,  Minoru Yamazaki ,  Yuko Sasaki ,  Wataru Mori ,  Takashi Doi

IPC: H01J37/147 ,  H01J37/244 ,  H01J37/22 ,  H01J37/10 ,  H01J37/28

Abstract: An object of the present disclosure is to propose a charged particle beam device capable of appropriately evaluating and setting a beam aperture angle. As one aspect for achieving the above-described object, provided is a charged particle beam device which includes a plurality of lenses and controls the plurality of lenses so as to set a focus at a predetermined height of a sample and to adjust the beam aperture angle. The charged particle beam device generates a first signal waveform based on a detection signal obtained by scanning with the beam in a state where the focus is set at a first height that is a bottom portion of a pattern formed on the sample, calculates a feature amount of a signal waveform on a bottom edge of the pattern based on the first signal waveform, and calculates the beam aperture angle based on the calculated feature amount.

公开(公告)号：US08766182B2

公开(公告)日：2014-07-01

申请号：US13924213

申请日：2013-06-21

Applicant: Hitachi High-Technologies Corporation

Inventor： Minoru Yamazaki ,  Akira Ikegami ,  Hideyuki Kazumi ,  Osamu Nasu

IPC: H01J37/26

CPC classification number: G01N23/2251 ,  G01R29/24 ,  H01J37/28 ,  H01J37/292 ,  H01J2237/221 ,  H01J2237/244 ,  H01J2237/24564 ,  H01J2237/24592 ,  H01J2237/2594

Abstract: An object of the present invention is to provide a method and apparatus for measuring a potential on a surface of a sample using a charged particle beam while restraining a change in the potential on the sample induced by the charged particle beam application, or detecting a compensation value for a change in a condition for the apparatus caused by the sample being electrically charged. In order to achieve the above object, the present invention provides a method and apparatus for applying a voltage to a sample so that a charged particle beam does not reach the sample (hereinafter, this may be referred to as “mirror state”) in a state in which the charged particle beam is applied toward the sample, and detecting information relating to a potential on the sample using signals obtained by that voltage application.

Abstract translation: 本发明的目的是提供一种方法和装置，用于使用带电粒子束测量样品表面上的电位，同时抑制由带电粒子束施加引起的样品上的电位变化，或检测补偿 用于由样品带电引起的装置的状况改变的值。 为了实现上述目的，本发明提供了一种向样品施加电压使得带电粒子束不能到达样品的方法和装置（以下称为“镜像状态”），其中 将带电粒子束施加到样品的状态，以及使用通过该电压施加获得的信号检测与样品上的电位有关的信息。

公开(公告)号：US10692687B2

公开(公告)日：2020-06-23

申请号：US16251563

申请日：2019-01-18

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Wen Li ,  Shinichi Murakami ,  Hiroyuki Takahashi ,  Yuko Sasaki ,  Minoru Yamazaki ,  Hajime Kawano

IPC: H01J37/147 ,  H01J37/04 ,  G01N23/2251 ,  H01L21/66

Abstract: A low noise blanking unit corresponds to a wide range of acceleration voltages (from several times higher than related voltages to low acceleration voltages) of an electron beam. A blanking unit of the measurement and inspection device includes a blanking control circuit, in which (i) an upper and a lower blanking electrodes are arranged in the irradiation direction of an electron beam; electrodes on the reverse sides of two opposing electrodes in each of the blanking electrodes arranged in the same direction are connected with the ground, (ii) when blanking is ON, positive voltages are output to remaining electrodes of the upper blanking electrode and negative voltages are output to remaining electrodes of the lower blanking electrode, and (iii) when the blanking is OFF, the same ground reference signal is output to the remaining electrodes of the upper blanking electrode and to the remaining electrodes of the lower blanking electrode.

公开(公告)号：US09502212B2

公开(公告)日：2016-11-22

申请号：US14760259

申请日：2014-01-22

Applicant: Hitachi High-Technologies Corporation

Inventor： Yuzuru Mizuhara ,  Miki Isawa ,  Minoru Yamazaki ,  Hitoshi Tamura ,  Hideyuki Kazumi

IPC: H01J37/26 ,  H01J37/147 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/268 ,  H01J37/1472 ,  H01J37/244 ,  H01J37/265 ,  H01J37/266 ,  H01J37/28 ,  H01J37/3178 ,  H01J2237/24564 ,  H01J2237/28 ,  H01J2237/2809

Abstract: An object of the present invention is to provide a method and an apparatus capable of measuring a potential of a sample surface by using a charged particle beam, or of detecting a compensation value of a variation in an apparatus condition which changes due to sample charging, by measuring a sample potential caused by irradiation with the charged particle beam. In order to achieve the object, a method and an apparatus are provided in which charged particle beams (2(a), 2(b)) emitted from a sample (23) are deflected by a charged particle deflector (33) in a state in which the sample (23) is irradiated with a charged particle beam (1), and information regarding a sample potential is detected by using a signal obtained at that time.

Abstract translation: 本发明的目的是提供一种能够通过使用带电粒子束来测量样品表面的电位或检测由于样品充电而发生变化的装置状态的变化的补偿值的方法和装置， 通过测量由带电粒子束的照射引起的样品电位。 为了实现该目的，提供了一种方法和装置，其中从样品（23）发射的带电粒子束（2（a），2（b））由带电粒子偏转器（33）在某种状态下偏转 其中样品（23）被带电粒子束（1）照射，并且通过使用当时获得的信号来检测关于样品电位的信息。