公开(公告)号：US06804003B1

公开(公告)日：2004-10-12

申请号：US09405716

申请日：1999-09-24

申请人： Haiming Wang ,  Patrick M. Maxton ,  Kenneth C. Johnson ,  Mehrdad Nikoonahad

发明人： Haiming Wang ,  Patrick M. Maxton ,  Kenneth C. Johnson ,  Mehrdad Nikoonahad

IPC分类号： G01J400

CPC分类号： G01J3/447 ,  G01B11/0641 ,  G01J4/02 ,  G01N21/21 ,  G01N21/211

摘要： Two phase modulators or polarizing elements are employed to modulate the polarization of an interrogating radiation beam before and after the beam has been modified by a sample to be measured. Radiation so modulated and modified by the sample is detected and up to 25 harmonics may be derived from the detected signal. The up to 25 harmonics may be used to derive ellipsometric and system parameters, such as parameters related to the angles of fixed polarizing elements, circular deattenuation, depolarization of the polarizing elements and retardances of phase modulators. A portion of the radiation may be diverted for detecting sample tilt or a change in sample height. A cylindrical objective may be used for focusing the beam onto the sample to illuminate a circular spot on the sample. The above-described self-calibrating ellipsometer may be combined with another optical measurement instrument such as a polarimeter, a spectroreflectometer or another ellipsometer to improve the accuracy of measurement and/or to provide calibration standards for the optical measurement instrument. The self-calibrating ellipsometer as well as the combined system may be used for measuring sample characteristics such as film thickness and depolarization of radiation caused by the sample.

摘要翻译： 采用两相调制器或偏振元件来调制光束已被待测样品修改之前和之后的询问辐射束的极化。 检测由样本调制和修改的辐射，并且可以从检测到的信号导出多达25个谐波。 可以使用多达25个谐波来导出椭偏和系统参数，例如与固定偏振元件的角度相关的参数，圆形去衰减，偏振元件的去极化和相位调制器的延迟。 可以转移一部分辐射以检测样品倾斜或样品高度的变化。 可以使用圆柱形物镜将光束聚焦到样品上以照亮样品上的圆形斑点。 上述自校准椭偏仪可以与另一种光学测量仪器如偏振计，分光光度计或其他椭偏仪组合，以提高测量精度和/或为光学测量仪器提供校准标准。 自校准椭偏仪以及组合系统可用于测量样品特性，如样品的膜厚度和辐射的去极化。

公开(公告)号：US06734968B1

公开(公告)日：2004-05-11

申请号：US09298007

申请日：1999-04-22

申请人： Haiming Wang ,  Patrick M. Maxton ,  Kenneth C. Johnson ,  Mehrdad Nikoonahad

发明人： Haiming Wang ,  Patrick M. Maxton ,  Kenneth C. Johnson ,  Mehrdad Nikoonahad

IPC分类号： G01N2121

CPC分类号： G01J4/02 ,  G01J3/447 ,  G01N21/21

摘要： Two phase modulators or polarizing elements are employed to modulate the polarization of an interrogating radiation beam before and after the beam has been modified by a sample to be measured. Radiation so modulated and modified by the sample is detected and up to 25 harmonics may be derived from the detected signal. The up to 25 harmonics may be used to derive ellipsometric and system parameters, such as parameters related to the angles of fixed polarizing elements, circular deattenuation, depolarization of the polarizing elements and retardances of phase modulators. A portion of the radiation may be diverted for detecting sample tilt or a change in sample height. A cylindrical objective may be used for focusing the beam onto the sample to illuminate a circular spot on the sample. The above-described self-calibrating ellipsometer may be combined with another optical measurement instrument such as a polarimeter, a spectroreflectometer or another ellipsometer to improve the accuracy of measurement and/or to provide calibration standards for the optical measurement instrument. The self-calibrating ellipsometer as well as the combined system may be used for measuring sample characteristics such as film thickness and depolarization of radiation caused by the sample.

公开(公告)号：US07253901B2

公开(公告)日：2007-08-07

申请号：US10056271

申请日：2002-01-23

申请人： Gary R. Janik ,  Patrick M. Maxton

发明人： Gary R. Janik ,  Patrick M. Maxton

IPC分类号： G01J4/00 ,  G01N21/55 ,  G01N23/00 ,  G01N21/86 ,  G01N23/223 ,  G01B11/30 ,  G01B11/24 ,  G01B11/28 ,  G01B15/02 ,  G02F1/01 ,  H01J40/14 ,  G21K7/00 ,  G01V8/00 ,  G01R31/26 ,  G01R27/26 ,  G01R31/305 ,  G01R31/302 ,  H01L21/66 ,  G01T1/36 ,  B08B3/12 ,  B08B6/00 ,  B08B7/00 ,  B08B7/02 ,  C25F1/00 ,  C25F3/30 ,  C25F5/00

CPC分类号： G01N21/211

摘要： A system for analyzing a thin film uses an energy beam, such as a laser beam, to remove a portion of a contaminant layer formed on the thin film surface. This cleaning operation removes only enough of the contaminant layer to allow analysis of the underlying thin film, thereby enhancing analysis throughput while minimizing the chances of recontamination and/or damage to the thin film. An energy beam source can be readily incorporated into a conventional thin film analysis tool, thereby minimizing total analysis system footprint. Throughput can be maximized by focusing the probe beam (or probe structure) for the analysis operation at the same location as the energy beam so that repositioning is not required after the cleaning operation. Alternatively, the probe beam (structure) and the energy beam can be directed at different locations to reduce the chances of contamination of the analysis optics.

公开(公告)号：US07202951B1

公开(公告)日：2007-04-10

申请号：US10976438

申请日：2004-10-28

申请人： Gary R. Janik ,  Patrick M. Maxton

发明人： Gary R. Janik ,  Patrick M. Maxton

IPC分类号： G01J4/00 ,  G01N21/55 ,  G01N23/00 ,  G01N21/86 ,  G01N23/223 ,  G01N23/20 ,  G01B11/30 ,  G01B11/24 ,  G01B11/28 ,  G01B15/02 ,  G02F1/01 ,  H01J40/14 ,  G21K7/00 ,  G01V8/00 ,  G01R31/26 ,  G01R27/26 ,  G01R31/305 ,  G01R31/302 ,  H01L21/66 ,  G01T1/36 ,  B08B3/12 ,  B08B6/00 ,  B08B7/00 ,  B08B7/02 ,  C25F1/00 ,  C25F3/30 ,  C25F5/00

CPC分类号： G01N21/211

摘要： A system for analyzing a thin film uses an energy beam, such as a laser beam, to remove a portion of a contaminant layer formed on the thin film surface. This cleaning operation removes only enough of the contaminant layer to allow analysis of the underlying thin film, thereby enhancing analysis throughput while minimizing the chances of recontamination and/or damage to the thin film. An energy beam source can be readily incorporated into a conventional thin film analysis tool, thereby minimizing total analysis system footprint. Throughput can be maximized by focusing the probe beam (or probe structure) for the analysis operation at the same location as the energy beam so that repositioning is not required after the cleaning operation. Alternatively, the probe beam (structure) and the energy beam can be directed at different locations to reduce the chances of contamination of the analysis optics.

摘要翻译： 用于分析薄膜的系统使用诸如激光束的能量束来去除形成在薄膜表面上的污染物层的一部分。 这种清洁操作仅去除了足够的污染物层，以便分析下面的薄膜，从而增强分析产量，同时最小化再沉淀和/或损坏薄膜的机会。 能量束源可以容易地结合到传统的薄膜分析工具中，从而最小化总分析系统占用空间。 通过将探测光束（或探针结构）聚焦在与能量束相同的位置处，可以最大化吞吐量，从而在清洁操作之后不需要重新定位。 或者，探针光束（结构）和能量束可以被引导到不同的位置，以减少分析光学器件的污染机会。

公开(公告)号：US07190441B1

公开(公告)日：2007-03-13

申请号：US11021555

申请日：2004-12-22

申请人： James T. McWhirter ,  Liang-Guo Wang ,  Hidong Kwak ,  Haixing Zou ,  Dan Georgesco ,  Bernard Lautee ,  Jennming James Chen ,  Gary R. Janik ,  Patrick M. Maxton

发明人： James T. McWhirter ,  Liang-Guo Wang ,  Hidong Kwak ,  Haixing Zou ,  Dan Georgesco ,  Bernard Lautee ,  Jennming James Chen ,  Gary R. Janik ,  Patrick M. Maxton

IPC分类号： G01N1/00

CPC分类号： G01N1/32 ,  G01N1/2813 ,  H01L21/67028

摘要： Methods and systems for preparing a sample for thin film analysis are provided. One system includes an energy beam source configured to generate an energy beam. The system also includes an energy beam delivery subsystem configured to direct the energy beam to a sample and to modify the energy beam such that the energy beam has a substantially flat-top profile on the sample. The energy beam removes a portion of a contaminant layer on the sample to expose an analysis area of a thin film on the sample. One method includes generating an energy beam and modifying the energy beam such that the energy beam has a substantially flat-top profile. The method also includes directing the energy beam to a sample. The energy beam removes a portion of a contaminant layer on the sample to expose an analysis area of a thin film on the sample.

摘要翻译： 提供了制备用于薄膜分析的样品的方法和系统。 一个系统包括被配置为产生能量束的能量束源。 该系统还包括能量束传送子系统，其配置成将能量束引导到样品并修改能量束，使得能量束在样品上具有基本上平顶的轮廓。 能量束去除样品上的污染物层的一部分以暴露样品上薄膜的分析区域。 一种方法包括产生能量束并修改能量束，使得能量束具有基本平坦的轮廓。 该方法还包括将能量束引导到样品。 能量束去除样品上的污染物层的一部分以暴露样品上薄膜的分析区域。