-
公开(公告)号：US09329485B2
公开(公告)日：2016-05-03
申请号：US14484333
申请日：2014-09-12
申请人： Christopher D. Simpson , Harald Baumann , Michael Flugel , Saija Werner , Oliver Piestert , Udo Dwars
发明人： Christopher D. Simpson , Harald Baumann , Michael Flugel , Saija Werner , Oliver Piestert , Udo Dwars
CPC分类号： G03F7/38 , B41C1/1008 , G03F7/32
摘要： Lithographic printing plates are provided by imagewise exposing negative-working lithographic printing plate precursors having a negative-working radiation-sensitive imageable layer, followed by contacting with a processing solution that has a pH of at least 7 and up to and including 11. This processing solution also includes component (1) that is a nitrogen-containing base having an atmospheric pressure melting point of at least 40° C.; component (2) that is a non-ionic surfactant that independently has an atmospheric pressure melting point, glass transition temperature, or pour point of at least 40° C.; component (3) that is a hydroxy-containing solution promoter; and component (4) that is a hydrophilic surface protective compound. The method is carried out in a manner such that the exposed and processed precursor is not further treated with any liquid (such as gumming or rinsing solution) between processing and mounting onto a printing press.
摘要翻译： 平版印刷版通过成像曝光具有负性辐射敏感可成像层的负性平版印刷版原版提供，然后与pH至少为7且高达11并且包括11的处理溶液接触。这种处理 溶液还包括作为大气压熔点至少为40℃的含氮碱的组分（1）。 组分（2），其是独立地具有至少40℃的大气压熔点，玻璃化转变温度或倾点的非离子表面活性剂。 作为含羟基溶液促进剂的组分（3）; 和作为亲水性表面保护性化合物的成分（4）。 该方法以这样的方式进行，使得在处理和安装到印刷机上之前，曝光和加工的前体不被任何液体（例如上胶或漂洗溶液）进一步处理。
-
2.发明授权公开(公告)号：US07442486B2
公开(公告)日：2008-10-28
申请号：US10544758
申请日：2004-02-20
申请人： Harald Baumann , Udo Dwars , Detlef Pietsch , Michael Flugel
发明人： Harald Baumann , Udo Dwars , Detlef Pietsch , Michael Flugel
摘要： Radiation-sensitive element comprising: (a) one or more types of monomers each comprising at least one ethylenically unsaturated group accessible to a free-radical polymerization, (b) at least one sensitizer, (c) at least one coinitiator capable of forming free radicals together with the sensitizer (b) and selected from the following classes of compounds: metallocenes; 1,3,5-triazine derivatives with one to three CX3 groups, wherein X represents chlorine or bromine; peroxides; hexaarylbiimidazoles; oxime ethers; oxime esters; N-aryl glycines and derivatives thereof; thiol compounds; N-aryl, S-aryl and O-aryl polycarboxylic acids with at least 2 carboxyl groups of which at least one is bonded to the N, S or O atom of the aryl unit; alkyltriarylborates; benzoin ethers; benzoin esters; trihalogenomethylarylsulfones; amines; N,N-dialkylaminobenzoic acid esters; aromatic sulfonyl halides; trihalogenomethylsulfones; imides; diazosulfonates; 9,10-dihydroanthracene derivatives; a-hydroxy and a-amino acetophenones; and (d) optionally one or more components selected from alkali-soluble binders, colorants, exposure indicators, plasticizers, chain transfer agents, leuco dyes, surfactants, inorganic fillers and thermopolymerization inhibitors characterized in that the at least one sensitizer is an oxazole derivative of the formula (I), wherein each R1, R2 and R3 is independently selected from a halogen atom, an optionally substituted alkyl group, an optionally substituted aryl group, which may also be fused, an optionally substituted aralkyl group, a group —NR4R5 and a group —OR6, wherein R4 and R5 are independently selected from a hydrogen atom, an alkyl, aryl or ralkyl group, R6 is an alkyl, aryl or aralkyl group or a hydrogen atom and k, m and n are independently 0 or an integer from 1 to 5.
-
公开(公告)号：US07574959B2
公开(公告)日：2009-08-18
申请号：US10580357
申请日：2004-11-18
申请人： Harald Baumann , Udo Dwars , Michael Flugel
发明人： Harald Baumann , Udo Dwars , Michael Flugel
CPC分类号： G03F7/031 , Y10T428/31591
摘要： Radiation-sensitive composition comprising (a) at least one photopolymerizable compound with at least one ethylenically unsaturated group accessible to a free-radical polymerization, wherein the at least one photopolymerizable compound has a molecular weight of 3,000 or less and can be obtained by reacting a diisocyanate with (I) an ethylenically unsaturated compound with a hydroxy group, and at the same time (ii) a saturated organic compound with an NH group and an OH group, wherein the reactants are used in amounts according to the following condition: Number of moles of isocyanate groups ≦number of moles of OH plus NH groups; (b) at least one sensitizer which absorbs radiation from the wavelength range of 250 to 450 nm of the electromagnetic spectrum and is selected from: dihydropyridines of formula (I) and oxazole derivatives of formula (II): (II) (c) at least one coinitiator capable of forming free radicals together with the sensitizer (b) and selected from 2,2′,4,4′,5′5-hexaarylbiimidazoles, compounds with at least one photolytically cleavable trihalogenmethyl group, diaryliodonium salts, triarylsulfonium salts and N-heterocyclic compounds with at least one nitrogen atom in the ring, having an oxy substituent at least one ring nitrogen atom, and mixtures of the above compounds; and (d) optionally one or more components selected from alkali-soluble binders, colorants, exposure indicators, plasticizers, chain transfer agents, leuco dyes, surfactants, inorganic fillers and thermopolymerization inhibitors; with the proviso that the radiation-sensitive composition does not comprise a metallocene.
摘要翻译： 辐射敏感性组合物，其包含（a）至少一种可光聚合化合物与至少一种可自由基聚合的烯键式不饱和基团，其中所述至少一种可光聚合化合物的分子量为3,000以下，可以通过使 二异氰酸酯与（I）具有羟基的烯属不饱和化合物，同时（ii）具有NH基和OH基的饱和有机化合物，其中反应物的用量按照以下条件使用： 异氰酸酯基团的摩尔数= OH加NH基团的摩尔数; （b）至少一种吸收来自电磁波谱的波长范围为250至450nm的辐射的敏化剂，并选自：式（I）的二氢吡啶和式（II）的恶唑衍生物：（II）（c） 能够与敏化剂（b）一起形成自由基的至少一种共引发剂，并选自2,2'，4,4'，5,5'-六芳基联咪唑，具有至少一个可光解裂解的三卤代甲基的化合物，二芳基碘鎓盐，三芳基锍盐 和环中具有至少一个氮原子的N-杂环化合物，至少一个环氮原子具有氧取代基，以及上述化合物的混合物; 和（d）任选的一种或多种选自碱溶性粘合剂，着色剂，曝光指示剂，增塑剂，链转移剂，无色染料，表面活性剂，无机填料和热聚合抑制剂的组分; 条件是辐射敏感组合物不包含金属茂。
-
公开(公告)号：US07285372B2
公开(公告)日：2007-10-23
申请号：US10536514
申请日：2003-11-28
申请人： Harald Baumann , Michael Flugel , Udo Dwars , Eduard Kottmair
发明人： Harald Baumann , Michael Flugel , Udo Dwars , Eduard Kottmair
CPC分类号： B41M5/46 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/20 , B41C2210/22 , B41C2210/24 , G03F7/029 , Y10S430/118
摘要： Radiation-sensitive element comprising (a) a substrate with at least one hydrophilic surface and (b) a radiation-sensitive coating on at least one hydrophilic surface of the substrate, wherein the coating comprises: (i) at least one free-radical polymerizable monomer and/or oligomer and/or polymer with at least one ethylenically unsaturated group each, (ii) at least one absorber selected from photoinitiators and sensitizers, which is capable of absorbing radiation of a wavelength in the range of 250 to 1,200 nm and (iii) at least one stabilizer comprising in its molecule at least one group capable of inhibiting free-radical polymerization, and at least one other group capable of sorption at the hydrophilic surface of the substrate.
摘要翻译： 辐射敏感元件包括（a）具有至少一个亲水表面的基底和（b）基底的至少一个亲水表面上的辐射敏感涂层，其中所述涂层包括：（i）至少一种可自由基聚合的 具有至少一个烯键式不饱和基团的单体和/或低聚物和/或聚合物，（ii）至少一种选自光引发剂和敏化剂的吸收剂，其能够吸收波长在250-1200nm范围内的辐射和（ iii）至少一种稳定剂在其分子中包含至少一个能够抑制自由基聚合的基团，以及至少一种能够在基材亲水表面吸附的其它基团。
-
公开(公告)号：US07169534B2
公开(公告)日：2007-01-30
申请号：US10536510
申请日：2003-11-28
申请人： Harald Baumann , Michael Flugel , Udo Dwars , Hans-Horst Glatt
发明人： Harald Baumann , Michael Flugel , Udo Dwars , Hans-Horst Glatt
IPC分类号： G03F7/027
CPC分类号： G03F7/027 , C08G18/6715 , C08G18/7831
摘要： Radiation-sensitive elements are described whose radiation-sensitive coating comprises both a photopolymerizable oligomer with a biuret structural unit and a photopolymerizable phosphazene oligomer.
摘要翻译： 描述了辐射敏感元件，其辐射敏感性涂层包括具有缩二脲结构单元的光聚合低聚物和可光聚合的磷腈低聚物。
-
公开(公告)号：US20060051699A1
公开(公告)日：2006-03-09
申请号：US10536514
申请日：2003-11-28
申请人： Harald Baumann , Michael Flugel , Udo Dwars , Eduard Kottmair
发明人： Harald Baumann , Michael Flugel , Udo Dwars , Eduard Kottmair
IPC分类号： G03C1/76
CPC分类号： B41M5/46 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/20 , B41C2210/22 , B41C2210/24 , G03F7/029 , Y10S430/118
摘要： Radiation-sensitive element comprising (a) a substrate with at least one hydrophilic surface and (b) a radiation-sensitive coating on at least one hydrophilic surface of the substrate, wherein the coating comprises: (i) at least one free-radical polymerizable monomer and/or oligomer and/or polymer with at least one ethylenically unsaturated group each, (ii) at least one absorber selected from photoinitiators and sensitizers, which is capable of absorbing radiation of a wavelength in the range of 250 to 1,200 nm and (iii) at least one stabilizer comprising in its molecule at least one group capable of inhibiting free-radical polymerization, and at least one other group capable of sorption at the hydrophilic surface of the substrate.
摘要翻译： 辐射敏感元件包括（a）具有至少一个亲水表面的基底和（b）基底的至少一个亲水表面上的辐射敏感涂层，其中所述涂层包括：（i）至少一种可自由基聚合的 具有至少一个烯键式不饱和基团的单体和/或低聚物和/或聚合物，（ii）至少一种选自光引发剂和敏化剂的吸收剂，其能够吸收波长在250-1200nm范围内的辐射和（ iii）至少一种稳定剂在其分子中包含至少一个能够抑制自由基聚合的基团，以及至少一种能够在基材亲水表面吸附的其它基团。
-
公开(公告)号：US09201302B2
公开(公告)日：2015-12-01
申请号：US14044912
申请日：2013-10-03
CPC分类号： G03F7/033 , B41C1/1008 , B41C2210/04 , B41C2210/06 , B41C2210/24 , G03F7/0388 , G03F7/20
摘要： Negative-working lithographic printing plate precursors have improved bakeability and good shelf life and can be imaged using either UV or infrared radiation. These precursors have a negative-working imageable layer that has a unique polymeric binder comprising a polymeric backbone and further comprising at least (a) and (b) pendant groups distributed in random order along the polymeric backbone. The (a) pendant groups are ethylenically unsaturated polymerizable groups, and the (b) pendant groups are defined by Structures (I), (II), and (III) described in the disclosure.
摘要翻译： 负性平版印刷版前体具有改善的烘烤性和良好的保质期，并且可以使用UV或红外辐射成像。 这些前体具有负性可成像层，其具有包含聚合物主链的独特聚合物粘合剂，并且还包含至少（a）和（b）沿聚合物主链以随机顺序分布的侧基。 （a）侧基是烯属不饱和可聚合基团，（b）侧基由本发明中描述的结构（I），（II）和（III）定义。
-
公开(公告)号：US08354216B2
公开(公告)日：2013-01-15
申请号：US12173220
申请日：2008-07-15
CPC分类号： G03F7/031 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/10 , B41C2201/12 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/08 , B41C2210/20 , B41C2210/22 , B41C2210/24 , B41C2210/266 , G03F7/033 , G03F7/092 , G03F7/3035
摘要： Negative-working imageable elements such as lithographic printing plate precursors, include a free-radically polymerizable component, an initiator composition that is capable of generating free radicals sufficient to initiate polymerization of the free-radically polymerizable component upon exposure to imaging radiation in the presence of a radiation absorbing compound, a radiation absorbing compound, an aerobic free radical inhibitor, optionally a polymeric binder that is not a free radically polymerizable component, and an anaerobic free radical inhibitor. The molar ratio of the anaerobic free radical inhibitor to the aerobic free radical inhibitor is at least 1:1. This combination of inhibitors provides increased shelf life and good latent image stability particularly when the element includes a polymeric topcoat layer that functions as an oxygen barrier.
摘要翻译： 负面工作的可成像元件如平版印刷版前体包括可自由基聚合的组分，引发剂组合物，其能够产生足够的自由基，以便在存在可见光辐射的情况下暴露于成像辐射时引发可自由基聚合的组分的聚合 辐射吸收化合物，辐射吸收化合物，需氧自由基抑制剂，任选的不是可自由基自由基组分的聚合物粘合剂和厌氧自由基抑制剂。 厌氧自由基抑制剂与好氧自由基抑制剂的摩尔比至少为1:1。 这种抑制剂的组合提供了增加的保质期和良好的潜影稳定性，特别是当元件包括用作氧阻隔层的聚合物顶涂层时。
-
公开(公告)号：US20080145790A1
公开(公告)日：2008-06-19
申请号：US11815578
申请日：2006-02-01
申请人： Harald Baumann , Ulrich Fiebag , Udo Dwars , Michael Flugel , Bernd Strehmel , Hans-Joachim Timpe
发明人： Harald Baumann , Ulrich Fiebag , Udo Dwars , Michael Flugel , Bernd Strehmel , Hans-Joachim Timpe
IPC分类号： G03F7/12
CPC分类号： G03F7/322
摘要： Process for the production of lithographic printing plates comprising (a) providing a lithographic substrate with a hydrophilic surface; (b) applying a negative working radiation-sensitive composition onto the hydrophilic surface, wherein the composition comprises: (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a free-radical polymerization, (ii) at least one sensitizer which in the presence of at least one coinitiator and upon exposure to radiation of a wavelength of 300 to 750 to 1,100 nm initiates the free-radical polymerization of component (i); and (iii) at least one binder with acidic functional groups and is substantially not sensitive to the wavelength range of 480 to 750 nm; (c) image-wise exposure of the resulting negative working lithographic printing plate precursor to radiation selected from the wavelength range of 300 to 750 to 1,100 nm depending on the sensitizer or initiator system used; and (d) removing the non-irradiated areas by means of a treatment with an alkaline developer with a pH value in the range of 9 to 14 comprising (i) water, (ii) one or more alkali hydroxides in an amount sufficient for adjusting a pH value in the range of 9 to 14; and (iii) 1 to 30 wt.-% of at least one compound of formula (I) wherein R1, R2, R3 and R4 are each independently selected from C1-C12 alkyl groups and aryl groups, X is selected from —CH═CH—, —C≡C—, formula (II), formula (III), and formula (IV), n+m results in a value of 2 to 30 and p+q results in a value of 0 to 30, wherein in the case of p+q≠0 the ethylene oxide and propylene oxide units are present as blocks or randomly distributed.
-
公开(公告)号：US20060078819A1
公开(公告)日：2006-04-13
申请号：US10536510
申请日：2003-11-28
申请人： Harald Baumann , Michael Flugel , Udo Dwars , Hans-Horst Glatt
发明人： Harald Baumann , Michael Flugel , Udo Dwars , Hans-Horst Glatt
IPC分类号： G03C1/76
CPC分类号： G03F7/027 , C08G18/6715 , C08G18/7831
摘要： Radiation-sensitive elements are described whose radiation-sensitive coating comprises both a photopolymerizable oligomer with a biuret structural unit and a photopolymerizable phosphazene oligomer.
摘要翻译： 描述了辐射敏感元件，其辐射敏感性涂层包括具有缩二脲结构单元的光聚合低聚物和可光聚合的磷腈低聚物。
-
-
-
-
-
-
-
-
-
搜索结果
101 条记录 (耗时 0.027 秒)
