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公开(公告)号：US09046754B2
公开(公告)日：2015-06-02
申请号：US12605627
申请日：2009-10-26
CPC分类号： G03B27/54 , G01N2021/95676 , G03F7/70208 , G03F7/70275 , G03F7/7085 , G03F7/70991
摘要： Disclosed are apparatuses, methods, and lithographic systems for EUV mask inspection. An EUV mask inspection system can include an EUV illumination source, an optical system, and an image sensor. The EUV illumination source can be a standalone illumination system or integrated into the lithographic system, where the EUV illumination source can be configured to illuminate an EUV radiation beam onto a target portion of a mask. The optical system can be configured to receive at least a portion of a reflected EUV radiation beam from the target portion of the mask. Further, the image sensor can be configured to detect an aerial image corresponding to the portion of the reflected EUV radiation beam. The EUV mask inspection system can also include a data analysis device configured to analyze the aerial image for mask defects.
摘要翻译： 公开了用于EUV掩模检查的装置，方法和光刻系统。 EUV掩模检查系统可以包括EUV照明源，光学系统和图像传感器。 EUV照明源可以是独立的照明系统或集成到光刻系统中，其中EUV照明源可被配置为将EUV辐射束照射到掩模的目标部分上。 光学系统可以被配置为从掩模的目标部分接收反射的EUV辐射束的至少一部分。 此外，图像传感器可以被配置为检测对应于反射的EUV辐射束的该部分的空间图像。 EUV掩模检查系统还可以包括被配置为分析掩模缺陷的空中图像的数据分析装置。
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公开(公告)号：US20100149505A1
公开(公告)日：2010-06-17
申请号：US12605627
申请日：2009-10-26
CPC分类号： G03B27/54 , G01N2021/95676 , G03F7/70208 , G03F7/70275 , G03F7/7085 , G03F7/70991
摘要： Disclosed are apparatuses, methods, and lithographic systems for EUV mask inspection. An EUV mask inspection system can include an EUV illumination source, an optical system, and an image sensor. The EUV illumination source can be a standalone illumination system or integrated into the lithographic system, where the EUV illumination source can be configured to illuminate an EUV radiation beam onto a target portion of a mask. The optical system can be configured to receive at least a portion of a reflected EUV radiation beam from the target portion of the mask. Further, the image sensor can be configured to detect an aerial image corresponding to the portion of the reflected EUV radiation beam. The EUV mask inspection system can also include a data analysis device configured to analyze the aerial image for mask defects.
摘要翻译： 公开了用于EUV掩模检查的装置，方法和光刻系统。 EUV掩模检查系统可以包括EUV照明源，光学系统和图像传感器。 EUV照明源可以是独立的照明系统或集成到光刻系统中，其中EUV照明源可被配置为将EUV辐射束照射到掩模的目标部分上。 光学系统可以被配置为从掩模的目标部分接收反射的EUV辐射束的至少一部分。 此外，图像传感器可以被配置为检测对应于反射的EUV辐射束的该部分的空间图像。 EUV掩模检查系统还可以包括被配置为分析掩模缺陷的空中图像的数据分析装置。
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3.发明授权公开(公告)号：US09285687B2
公开(公告)日：2016-03-15
申请号：US13608069
申请日：2012-09-10
申请人： Stanislav Y Smirnov , Lev Ryzhikov , Eric Brian Catey , Adel Joobeur , David Heald , Yevgeniy Konstantinovich Shmarev , Richard Jacobs
发明人： Stanislav Y Smirnov , Lev Ryzhikov , Eric Brian Catey , Adel Joobeur , David Heald , Yevgeniy Konstantinovich Shmarev , Richard Jacobs
IPC分类号： G03F7/20
CPC分类号： G03F7/70625 , G01N21/956 , G03F7/70633
摘要： An inspection apparatus includes an illumination system that receives a first beam and produces second and third beams from the first beam and a catadioptric objective that directs the second beam to reflect from a wafer. A first sensor detects a first image created by the reflected second beam. A refractive objective directs the third beam to reflect from the wafer, and a second sensor detects a second image created by the reflected third beam. The first and second images can be used for CD measurements. The second beam can have a spectral range from about 200 nm to about 425 nm, and the third beam can have a spectral range from about 425 nm to about 850 nm. A third sensor may be provide that detects a third image created by the third beam reflected from the wafer. The third image can be used for OV measurements.
摘要翻译： 检查装置包括照明系统，其接收第一光束并产生来自第一光束的第二和第三光束;以及反射折射物镜，其引导第二光束从晶片反射。 第一传感器检测由反射的第二光束产生的第一图像。 折射物镜引导第三光束从晶片反射，第二传感器检测由反射的第三光束产生的第二图像。 第一张和第二张图像可用于CD测量。 第二光束可具有从约200nm至约425nm的光谱范围，并且第三光束可具有约425nm至约850nm的光谱范围。 可以提供第三传感器，其检测由从晶片反射的第三光束产生的第三图像。 第三个图像可用于OV测量。
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4.发明申请公开(公告)号：US20130083306A1
公开(公告)日：2013-04-04
申请号：US13608069
申请日：2012-09-10
申请人： Stanislav Y. Smirnov , Lev Ryzhikov , Eric Brian Catey , Adel Joobeur , David Heald , Yevgeniy Konstantinovich Shmarev , Richard Jacobs
发明人： Stanislav Y. Smirnov , Lev Ryzhikov , Eric Brian Catey , Adel Joobeur , David Heald , Yevgeniy Konstantinovich Shmarev , Richard Jacobs
CPC分类号： G03F7/70625 , G01N21/956 , G03F7/70633
摘要： An inspection apparatus includes an illumination system that receives a first beam and produces second and third beams from the first beam and a catadioptric objective that directs the second beam to reflect from a wafer. A first sensor detects a first image created by the reflected second beam. A refractive objective directs the third beam to reflect from the wafer, and a second sensor detects a second image created by the reflected third beam. The first and second images can be used for CD measurements. The second beam can have a spectral range from about 200 nm to about 425 nm, and the third beam can have a spectral range from about 425 nm to about 850 nm. A third sensor may be provide that detects a third image created by the third beam reflected from the wafer. The third image can be used for OV measurements.
摘要翻译： 检查装置包括照明系统，其接收第一光束并产生来自第一光束的第二和第三光束;以及反射折射物镜，其引导第二光束从晶片反射。 第一传感器检测由反射的第二光束产生的第一图像。 折射物镜引导第三光束从晶片反射，第二传感器检测由反射的第三光束产生的第二图像。 第一张和第二张图像可用于CD测量。 第二光束可具有从约200nm至约425nm的光谱范围，并且第三光束可具有约425nm至约850nm的光谱范围。 可以提供第三传感器，其检测由从晶片反射的第三光束产生的第三图像。 第三个图像可用于OV测量。
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公开(公告)号：US20090091734A1
公开(公告)日：2009-04-09
申请号：US12328251
申请日：2008-12-04
申请人： Huibert VISSER , Jacob Fredrik Friso Klinkhamer , Lev Ryzhikov , Scott D. Coston , Adel Joobeur , Henri Johannes Petrus Vink , Yevgeniy Konstantinovich Shmarev
发明人： Huibert VISSER , Jacob Fredrik Friso Klinkhamer , Lev Ryzhikov , Scott D. Coston , Adel Joobeur , Henri Johannes Petrus Vink , Yevgeniy Konstantinovich Shmarev
CPC分类号： G03F7/70583 , G02B27/0905 , G03F7/70075
摘要： A coherence remover is provided. In an embodiment the coherence remover includes a first mirror and a second mirror coupled to the first mirror. The coherence remover is configured to receive an input beam. Each of the first and second mirrors is configured to reflect a respective portion of the input beam to produce respective one or more intermediate beams. The intermediate beams collectively form an output beam that has a reduced coherence compared to the input beam.
摘要翻译： 提供了一个相干去除器。 在一个实施例中，相干去除器包括耦合到第一反射镜的第一反射镜和第二反射镜。 相干去除器被配置为接收输入光束。 第一和第二反射镜中的每一个被配置为反射输入光束的相应部分以产生相应的一个或多个中间光束。 与输入光束相比，中间光束共同形成具有减小的相干性的输出光束。
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公开(公告)号：US20080019008A1
公开(公告)日：2008-01-24
申请号：US11488174
申请日：2006-07-18
IPC分类号： G02B27/10
CPC分类号： G03F7/70075
摘要： An optical integrator having a first surface and a second surface that is used in a lithographic apparatus to modify light. The first surface is reflective, defines a volume, and is configured to be disposed in an optical illumination system along an optical axis, to surround the optical axis, and to reflect a light along a path incident upon the first surface. The second surface is disposed in the volume and has a first section of the second surface that is semi-reflective and is configured to reflect a first portion of a light along a path incident upon the first section of the second surface and to transmit a second portion of the light along the path incident upon the first section of the second surface. The second surface increases the number of reflections of the light to increase the uniformity of the intensity distribution of the light.
摘要翻译： 具有第一表面和第二表面的光学积分器，其用于光刻设备中以修改光。 第一表面是反射的，限定了一个体积，并被配置为沿光轴布置在光学照明系统中，以围绕光轴，并且沿着入射在第一表面上的路径反射光。 第二表面设置在体积中并且具有半反射的第二表面的第一部分，并且被配置为沿着入射在第二表面的第一部分上的路径反射光的第一部分，并且透射第二表面 沿着入射到第二表面的第一部分的路径的光的一部分。 第二表面增加了光的反射数以增加光的强度分布的均匀性。
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公开(公告)号：US20070127005A1
公开(公告)日：2007-06-07
申请号：US11292275
申请日：2005-12-02
申请人： Huibert Visser , Jacob Klinkhamer , Lev Ryzhikov , Scott Coston , Adel Joobeur , Yevgeniy Konstantinovich Shmarev , HENRI JOHANNES VINK
发明人： Huibert Visser , Jacob Klinkhamer , Lev Ryzhikov , Scott Coston , Adel Joobeur , Yevgeniy Konstantinovich Shmarev , HENRI JOHANNES VINK
IPC分类号： G03B27/72
CPC分类号： G03F7/70583 , G02B27/0905 , G03F7/70075
摘要： A system and method are used to substantially homogenizing and removing at least some coherence from a beam of light.
摘要翻译： 使用系统和方法基本均匀化并从光束中去除至少一些相干性。
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8.发明授权公开(公告)号：US08259398B2
公开(公告)日：2012-09-04
申请号：US13267401
申请日：2011-10-06
IPC分类号： G02B17/00
CPC分类号： G02B17/0892 , G02B27/283 , G03F7/70225 , G03F7/7025 , Y10S359/90
摘要： Disclosed are high numerical (NA) catadioptric objectives without a central obscuration, and applications thereof. Such objectives can operate through a wide spectral bandwidth of radiation, including deep ultraviolet (DUV) radiation. Importantly, refractive elements in the catadioptric objectives can be manufactured from a single type of material (such as, for example, CaF2 and/or fused silica). In addition, the elements of such catadioptric objectives are rotationally symmetric about an optical axis. The catadioptric objectives eliminate the central obscuration by (1) using a polarized beamsplitter (which passes radiation of a first polarization and reflects radiation of a second polarization), and/or (2) using one or more folding mirrors to direct off-axis radiation into the pupil of the catadioptric objective. An example catadioptric objective is shown in FIG. 2.
摘要翻译： 公开了没有中心遮蔽的高数值（NA）反折射目标及其应用。 这样的目标可以通过宽的光谱带宽进行工作，包括深紫外（DUV）辐射。 重要的是，反射折射物镜中的折射元件可以由单一类型的材料（例如，CaF 2和/或熔融石英）制造。 此外，这种反射折射物镜的元件关于光轴旋转对称。 反折射目标通过（1）使用偏振分束器（其通过第一偏振的辐射并反射第二偏振的辐射）消除中心遮蔽，和/或（2）使用一个或多个折叠反射镜来引导离轴辐射 进入反射折射目标的学生。 图1中示出了示例反射折射物镜。 2。
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9.发明授权公开(公告)号：US08064148B2
公开(公告)日：2011-11-22
申请号：US12419565
申请日：2009-04-07
IPC分类号： G02B17/00
CPC分类号： G02B17/0892 , G02B27/283 , G03F7/70225 , G03F7/7025 , Y10S359/90
摘要： Disclosed are high numerical (NA) catadioptric objectives without a central obscuration, and applications thereof. Such objectives can operate through a wide spectral bandwidth of radiation, including deep ultraviolet (DUV) radiation. Importantly, refractive elements in the catadioptric objectives can be manufactured from a single type of material (such as, for example, CaF2 and/or fused silica). In addition, the elements of such catadioptric objectives are rotationally symmetric about an optical axis. The catadioptric objectives eliminate the central obscuration by (1) using a polarized beamsplitter (which passes radiation of a first polarization and reflects radiation of a second polarization), and/or (2) using one or more folding mirrors to direct off-axis radiation into the pupil of the catadioptric objective. An example catadioptric objective is shown in FIG. 2.
摘要翻译： 公开了没有中心遮蔽的高数值（NA）反折射目标及其应用。 这样的目标可以通过宽的光谱带宽进行工作，包括深紫外（DUV）辐射。 重要的是，反射折射物镜中的折射元件可以由单一类型的材料（例如，CaF 2和/或熔融石英）制造。 此外，这种反射折射物镜的元件关于光轴旋转对称。 反折射目标通过（1）使用偏振分束器（其通过第一偏振的辐射并反射第二偏振的辐射）消除中心遮蔽，和/或（2）使用一个或多个折叠反射镜来引导离轴辐射 进入反射折射目标的学生。 图1中示出了示例反射折射物镜。 2。
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10.发明申请公开(公告)号：US20060126681A1
公开(公告)日：2006-06-15
申请号：US11270898
申请日：2005-11-10
申请人： Hako Botma , Joerg Bruebach , Mark Trentelman , Adel Joobeur
发明人： Hako Botma , Joerg Bruebach , Mark Trentelman , Adel Joobeur
IPC分类号： H01S3/13
CPC分类号： B23K26/0613 , B23K26/0622 , B23K26/066 , B23K26/067 , G03F7/7055
摘要： A pulse modifying unit is provided in the illumination system of the lithographic apparatus to reduce the degradation of the expensive lens elements by billions of the high intensity ultraviolet pulses from the laser is configured to receive an input pulse of radiation along a first optical axis and further configured to emit one or more corresponding output pulses of radiation along a second optical axis, including a divider disposed along the first optical axis and configured to divide the incoming pulse into a first and a second pulse portion, wherein the divider is further configured to direct the first pulse portion along the second optical axis. A first and a second mirror, each with a radius of curvature, are disposed facing each other with a predetermined separation, configured to receive the second pulse portion and to redirect the second portion along the second optical axis. The optical path of the second portion through the pulse modifier is longer than that of the first portion, and the separation is less than radius of curvature.
摘要翻译： 在光刻设备的照明系统中提供脉冲修改单元以减少昂贵的透镜元件的劣化，数十亿的来自激光器的高强度紫外线脉冲被配置成沿第一光轴接收辐射的输入脉冲 被配置为沿着第二光轴发射一个或多个对应的辐射输出脉冲，包括沿着所述第一光轴设置的分配器，并且被配置为将所述输入脉冲分成第一和第二脉冲部分，其中所述除法器还被配置为引导 沿第二光轴的第一脉冲部分。 每个具有曲率半径的第一和第二反射镜以预定间隔彼此面对地布置，被配置为接收第二脉冲部分并且沿着第二光轴重定向第二部分。 通过脉冲调制器的第二部分的光路比第一部分的光路长，并且分离小于曲率半径。
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