公开(公告)号：US07518125B2

公开(公告)日：2009-04-14

申请号：US11501629

申请日：2006-08-09

申请人： Yo Yamamoto ,  Haruo Takahashi ,  Toshiaki Fujii

发明人： Yo Yamamoto ,  Haruo Takahashi ,  Toshiaki Fujii

IPC分类号： G01N23/00

CPC分类号： G01N1/32

摘要： A processing apparatus uses a focused charged particle beam to process a micro sample that is supported on a micro mount part. The micro mount part is supported on a micro sample stage and locally cooled by a cooling unit. The micro mount part is thermally independent of the micro sample stage and, due to its small size, can be cooled rapidly by the cooling unit.

摘要翻译： 处理装置使用聚焦带电粒子束来处理支撑在微安装部件上的微样品。 微型安装部分支撑在微量样品台上，并由冷却单元局部冷却。 微型安装部件与微型样品台热独立，并且由于其小尺寸，可以通过冷却单元快速冷却。

公开(公告)号：US20070040128A1

公开(公告)日：2007-02-22

申请号：US11501629

申请日：2006-08-09

申请人： Yo Yamamoto ,  Haruo Takahashi ,  Toshiaki Fujii

发明人： Yo Yamamoto ,  Haruo Takahashi ,  Toshiaki Fujii

IPC分类号： H01J37/20

CPC分类号： G01N1/32

摘要： A sample to be observed or processed with a focused charged particle beam is formed small, and only the micro sample is locally cooled. Alternatively, a sample mount part is used which has the structure that can relax a thermal drift.

摘要翻译： 用聚焦带电粒子束观察或加工的样品形成较小，并且只有微样品局部冷却。 或者，使用具有可以放松热漂移的结构的样品安装部件。

公开(公告)号：US07442942B2

公开(公告)日：2008-10-28

申请号：US11509520

申请日：2006-08-24

申请人： Haruo Takahashi ,  Toshiaki Fujii ,  Yutaka Ikku ,  Kouji Iwasaki ,  Yo Yamamoto

发明人： Haruo Takahashi ,  Toshiaki Fujii ,  Yutaka Ikku ,  Kouji Iwasaki ,  Yo Yamamoto

IPC分类号： H01J37/20

CPC分类号： H01J37/304 ,  G01N1/32 ,  H01J2237/31745 ,  H01J2237/31749

摘要： To include a focused ion beam apparatus fabricating a sliced specimen by processing a specimen as well as observing the sliced specimen, a scanning electron microscope observing the slice specimen, a gas-ion beam irradiation apparatus performing finishing processing by irradiating a gas-ion beam onto a surface of the sliced specimen, a specimen stage on which the sliced specimen is fixed and having at least one or more rotation axis, a specimen posture recognition means recognizing positional relation of the sliced specimen with respect to the specimen stage and a specimen stage control means controlling the specimen stage based on a specimen posture recognized by the posture recognition means and an installation angle of the gas-ion beam irradiation apparatus in order to allow an incident angle of the gas-ion beam with respect to the obverse or the reverse of the sliced specimen to be a desired value.

摘要翻译： 为了包括聚焦离子束装置，通过加工试样和观察切片试样来制造切片样品，观察切片试样的扫描电子显微镜，气相离子束照射装置，通过将气体离子束照射到 切片试样的表面，切片试样固定并具有至少一个以上的旋转轴的试样台，识别切片试样相对于试样台的位置关系的试样姿势识别装置和试样台控制 意味着基于由姿势识别装置识别的样本姿势和气体离子束照射装置的安装角度来控制样本台，以便允许气体离子束相对于正面或反向的入射角 切片样品为期望值。

公开(公告)号：US07718981B2

公开(公告)日：2010-05-18

申请号：US12134919

申请日：2008-06-06

申请人： Haruo Takahashi ,  Yo Yamamoto ,  Toshiaki Fujii

发明人： Haruo Takahashi ,  Yo Yamamoto ,  Toshiaki Fujii

IPC分类号： G01N23/00

CPC分类号： H01J37/20 ,  H01J37/3056 ,  H01J2237/20242 ,  H01J2237/31745 ,  H01J2237/31749

摘要： There is provided a method of arranging, as a composite charged-particle beam system, a gas ion beam apparatus, an FIB and an SEM in order to efficiently prepare a TEM sample. The composite charged-particle beam system includes an FIB lens-barrel 1, an SEM lens-barrel 2, a gas ion beam lens-barrel 3, and a rotary sample stage 9 having an eucentric tilt mechanism and a rotating shaft 10 orthogonal to an eucentric tilt axis 8. In the composite charged-particle beam system, an arrangement is made such that a focused ion beam 4, an electron beam 5 and a gas ion beam 6 intersect at a single point, an axis of the FIB lens-barrel 1 and an axis of the SEM lens barrel 2 are orthogonal to the eucentric tilt axis 8, respectively, and the axis of the FIB lens-barrel 1, an axis of the gas ion beam lens-barrel 3 and the eucentric tilt axis 8 are in one plane.

摘要翻译： 提供了一种作为复合带电粒子束系统布置气体离子束装置，FIB和SEM以便有效地制备TEM样品的方法。 复合带电粒子束系统包括FIB透镜镜筒1，SEM透镜镜筒2，气体离子束透镜镜筒3以及具有偏心倾斜机构的旋转样品台9和与其垂直的旋转轴10 在复合带电粒子束系统中，使得聚焦离子束4，电子束5和气体离子束6在单点相交，FIB透镜镜筒的轴线 1并且SEM透镜镜筒2的轴线分别与偏心倾斜轴8正交，并且FIB透镜镜筒1的轴线，气体离子束透镜镜筒3的轴线和偏心倾斜轴线8是 在一架飞机上

公开(公告)号：US20070045560A1

公开(公告)日：2007-03-01

申请号：US11509520

申请日：2006-08-24

申请人： Haruo Takahashi ,  Toshiaki Fujii ,  Yutaka Ikku ,  Kouji Iwasaki ,  Yo Yamamoto

发明人： Haruo Takahashi ,  Toshiaki Fujii ,  Yutaka Ikku ,  Kouji Iwasaki ,  Yo Yamamoto

IPC分类号： H01J37/20 ,  G01N1/28

CPC分类号： H01J37/304 ,  G01N1/32 ,  H01J2237/31745 ,  H01J2237/31749

摘要： To include a focused ion beam apparatus fabricating a sliced specimen by processing a specimen as well as observing the sliced specimen, a scanning electron microscope observing the slice specimen, a gas-ion beam irradiation apparatus performing finishing processing by irradiating a gas-ion beam onto a surface of the sliced specimen, a specimen stage on which the sliced specimen is fixed and having at least one or more rotation axis, a specimen posture recognition means recognizing positional relation of the sliced specimen with respect to the specimen stage and a specimen stage control means controlling the specimen stage based on a specimen posture recognized by the posture recognition means and an installation angle of the gas-ion beam irradiation apparatus in order to allow an incident angle of the gas-ion beam with respect to the obverse or the reverse of the sliced specimen to be a desired value.

摘要翻译： 为了包括聚焦离子束装置，通过加工试样和观察切片试样来制造切片样品，观察切片试样的扫描电子显微镜，气相离子束照射装置，通过将气体离子束照射到 切片试样的表面，切片试样固定并具有至少一个以上的旋转轴的试样台，识别切片试样相对于试样台的位置关系的试样姿势识别装置和试样台控制 意味着基于由姿势识别装置识别的样本姿势和气体离子束照射装置的安装角度来控制样本台，以便允许气体离子束相对于正面或反向的入射角 切片样品为期望值。

公开(公告)号：US20110226948A1

公开(公告)日：2011-09-22

申请号：US13065238

申请日：2011-03-17

申请人： Keiichi Tanaka ,  Yo Yamamoto ,  Xin Man ,  Junichi Tashiro ,  Toshiaki Fujii

发明人： Keiichi Tanaka ,  Yo Yamamoto ,  Xin Man ,  Junichi Tashiro ,  Toshiaki Fujii

IPC分类号： H01J37/26

CPC分类号： H01J37/3056 ,  H01J37/222 ,  H01J37/28 ,  H01J37/3005 ,  H01J2237/226 ,  H01J2237/28 ,  H01J2237/2802 ,  H01J2237/31745 ,  H01J2237/31749

摘要： There is provided a sample processing and observing method including irradiating a focused ion beam to a sample to form an observed surface, irradiating an electron beam to the observed surface to form an observed image, removing the surface opposite to the observed surface of the sample, forming a lamella including the observed surface and obtaining a transmission observed image for the lamella.

摘要翻译： 提供了一种样品处理和观察方法，包括将聚焦离子束照射到样品上以形成观察表面，向观察表面照射电子束以形成观察图像，除去与样品的观察表面相反的表面， 形成包括观察表面的薄片并获得薄片的透射观察图像。

公开(公告)号：US08274049B2

公开(公告)日：2012-09-25

申请号：US13065238

申请日：2011-03-17

申请人： Keiichi Tanaka ,  Yo Yamamoto ,  Xin Man ,  Junichi Tashiro ,  Toshiaki Fujii

发明人： Keiichi Tanaka ,  Yo Yamamoto ,  Xin Man ,  Junichi Tashiro ,  Toshiaki Fujii

IPC分类号： H01L21/66

CPC分类号： H01J37/3056 ,  H01J37/222 ,  H01J37/28 ,  H01J37/3005 ,  H01J2237/226 ,  H01J2237/28 ,  H01J2237/2802 ,  H01J2237/31745 ,  H01J2237/31749

摘要： There is provided a sample processing and observing method including irradiating a focused ion beam to a sample to form an observed surface, irradiating an electron beam to the observed surface to form an observed image, removing the surface opposite to the observed surface of the sample, forming a lamella including the observed surface and obtaining a transmission observed image for the lamella.

摘要翻译： 提供了一种样品处理和观察方法，包括将聚焦离子束照射到样品上以形成观察表面，向观察表面照射电子束以形成观察图像，除去与样品的观察表面相反的表面， 形成包括观察表面的薄片并获得薄片的透射观察图像。

公开(公告)号：US20080224198A1

公开(公告)日：2008-09-18

申请号：US12047013

申请日：2008-03-12

申请人： Toshiaki Fujii ,  Haruo Takahashi ,  Junichi Tashiro

发明人： Toshiaki Fujii ,  Haruo Takahashi ,  Junichi Tashiro

IPC分类号： G01N23/225

CPC分类号： H01J37/3056 ,  G01N1/286 ,  H01J2237/31745

摘要： The apparatus for working and observing samples comprises a sample plate on which a sample is to be placed; a first ion beam lens barrel capable of irradiating a first ion beam over a whole predetermined irradiation range at one time; a mask that can be arranged between the sample plate and the first ion beam lens barrel, and shields part of the first ion beam; mask-moving means capable of moving the mask; a charged particle beam lens barrel capable of scanning a focused beam of charged particles in the range irradiated with the first ion beam; and detection means capable of detecting a secondarily generated substance.

摘要翻译： 用于工作和观察样品的装置包括样品板，样品板将放置在样品板上; 一次能够在整个预定照射范围内照射第一离子束的第一离子束透镜镜筒; 可以在样品板和第一离子束透镜筒之间布置的掩模，并且屏蔽第一离子束的一部分; 掩模移动装置，能够移动面罩; 带电粒子束透镜镜筒，其能够扫描在第一离子束照射的范围内的聚集的带电粒子束; 以及能够检测次要生成物质的检测装置。

公开(公告)号：US07755044B2

公开(公告)日：2010-07-13

申请号：US12047013

申请日：2008-03-12

申请人： Toshiaki Fujii ,  Haruo Takahashi ,  Junichi Tashiro

发明人： Toshiaki Fujii ,  Haruo Takahashi ,  Junichi Tashiro

IPC分类号： G21K5/04 ,  G21K5/10

CPC分类号： H01J37/3056 ,  G01N1/286 ,  H01J2237/31745

摘要： The apparatus for working and observing samples comprises a sample plate on which a sample is to be placed; a first ion beam lens barrel capable of irradiating a first ion beam over a whole predetermined irradiation range at one time; a mask that can be arranged between the sample plate and the first ion beam lens barrel, and shields part of the first ion beam; mask-moving means capable of moving the mask; a charged particle beam lens barrel capable of scanning a focused beam of charged particles in the range irradiated with the first ion beam; and detection means capable of detecting a secondarily generated substance.

摘要翻译： 用于工作和观察样品的装置包括样品板，样品板将放置在样品板上; 一次能够在整个预定照射范围内照射第一离子束的第一离子束透镜镜筒; 可以在样品板和第一离子束透镜筒之间布置的掩模，并且屏蔽第一离子束的一部分; 掩模移动装置，能够移动面罩; 带电粒子束透镜镜筒，其能够扫描在第一离子束照射的范围内的聚集的带电粒子束; 以及能够检测次要生成物质的检测装置。

公开(公告)号：US08664598B2

公开(公告)日：2014-03-04

申请号：US12931411

申请日：2011-01-28

申请人： Masakatsu Hasuda ,  Atsushi Uemoto ,  Toshiaki Fujii ,  Junichi Tashiro

发明人： Masakatsu Hasuda ,  Atsushi Uemoto ,  Toshiaki Fujii ,  Junichi Tashiro

IPC分类号： H01J37/29

CPC分类号： G01N23/225 ,  H01J37/28

摘要： An electron microscope has a focused ion beam column positioned relative to an electron beam column so that the focused ion beam substantially perpendicularly intersects the electron beam. A backscattered electron detector is positioned relative to the focused ion beam column so that the direction normal to a detection plane of the backscattered electron detector is substantially perpendicular to the direction of the focused ion beam. The backscattered electron detector is configured and positioned to detect backscattered electrons released in a spread of at least about 70 degrees in width from the surface of the section by irradiation of the section with the electron beam 1a.

摘要翻译： 电子显微镜具有相对于电子束柱定位的聚焦离子束柱，使得聚焦离子束基本上垂直于电子束相交。 反向散射电子检测器相对于聚焦离子束柱定位，使得垂直于后向散射电子检测器的检测平面的方向基本上垂直于聚焦离子束的方向。 背散射电子检测器被配置和定位成通过照射具有电子束1a的部分来检测从该部分的表面以宽度至少约70度的扩散中释放的反向散射电子。