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    Lithographic projection apparatus and method of compensating perturbation factors
    3.
    发明授权
    Lithographic projection apparatus and method of compensating perturbation factors 有权
    光刻投影仪和补偿扰动因子的方法

    公开(公告)号：US08570489B2

    公开(公告)日：2013-10-29

    申请号：US12741960

    申请日：2008-11-07

    申请人： Jan Bernard Plechelmus Van Schoot ,  Antonius Johannes Josephus Van Dijsseldonk ,  Hans Van Der Laan ,  Diederik Jan Maas

    发明人： Jan Bernard Plechelmus Van Schoot ,  Antonius Johannes Josephus Van Dijsseldonk ,  Hans Van Der Laan ,  Diederik Jan Maas

    IPC分类号： G03B27/32 ,  G03B27/42 ,  G03B27/54

    CPC分类号： G03F7/70291 ,  G03F7/70208 ,  G03F7/70941

    摘要： A lithographic projection apparatus including a support structure configured to support a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section; a substrate holder configured to hold a substrate; a projection system configured to expose the patterned beam of radiation on a target portion of the substrate; and a system configured to compensate one or more perturbation factors by providing an additional beam of radiation to be exposed on the target portion of the substrate, the additional beam of radiation being imparted in its cross-section with an additional pattern which is based on the pattern of the patterning device and on lithographic projection apparatus property data, the lithographic projection apparatus property data characterizing a level and nature of one or more systematic perturbation factors of different lithographic apparatus.

    摘要翻译： 一种光刻投影设备，包括被配置为支撑图案形成装置的支撑结构，所述图案形成装置被配置为在其横截面中赋予图案的辐射束; 衬底保持器，其构造成保持衬底; 投影系统，被配置为将所述图案化的辐射束暴露在所述基板的目标部分上; 以及被配置为通过提供待暴露在所述基板的目标部分上的另外的辐射束来补偿一个或多个扰动因子的系统，所述附加辐射束在其横截面中被赋予附加图案，所述另外的图案基于 图案形成装置的图案和光刻投影装置的属性数据，光刻投影装置的属性数据表征不同光刻装置的一个或多个系统扰动因子的水平和性质。

    Lithographic apparatus and device manufacturing method
    8.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US07177010B2

    公开(公告)日：2007-02-13

    申请号：US10979798

    申请日：2004-11-03

    申请人： Hans Van Der Laan ,  Uwe Mickan ,  Markus Franciscus Antonius Eurlings ,  Jan Bernard Plechelmus Van Schoot

    发明人： Hans Van Der Laan ,  Uwe Mickan ,  Markus Franciscus Antonius Eurlings ,  Jan Bernard Plechelmus Van Schoot

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70941 ,  G03F7/70558 ,  G03F7/70666

    摘要： A lithographic apparatus comprises an illumination system for providing a projection beam of radiation, a support structure for supporting patterning device, the patterning device serving to transmit or reflect radiation in the projection beam and impart the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. A sensor is provided for measuring the spatial intensity distribution of the projection beam at the substrate. The spatial distribution of transmission or reflectance of the patterning device, together with the distribution of the projection beam incident on the patterning device, may be determined from the measured intensity distribution. By comparing the transmission or reflectance from regions having identical patterns the overall (macroscopic) distribution of the transmission or reflectance of the patterning device can be determined.

    摘要翻译： 光刻设备包括用于提供投影辐射束的照明系统，用于支撑图案形成装置的支撑结构，所述图案形成装置用于透射或反射投影光束中的辐射并且在其横截面中赋予投影光束图案， 用于保持基板的基板台，以及用于将图案化的光束投影到基板的目标部分上的投影系统。 提供了一种传感器，用于测量投影光束在基板处的空间强度分布。 可以根据测量的强度分布来确定图案形成装置的透射或反射率的空间分布以及入射在图案形成装置上的投影光束的分布。 通过比较具有相同图案的区域的透射率或反射率，可以确定透射率的总体（宏观）分布或图案形成装置的反射率。

    Illumination system for lithographic apparatus with control system to effect an adjustment of an imaging parameter
    10.
    发明授权
    Illumination system for lithographic apparatus with control system to effect an adjustment of an imaging parameter 有权
    用于具有控制系统的光刻设备的照明系统以实现成像参数的调整

    公开(公告)号：US09052605B2

    公开(公告)日：2015-06-09

    申请号：US13517480

    申请日：2010-11-19

    申请人： Koen Van Ingen Schenau ,  Jan Bernard Plechelmus Van Schoot ,  Gosse Charles De Vries

    发明人： Koen Van Ingen Schenau ,  Jan Bernard Plechelmus Van Schoot ,  Gosse Charles De Vries

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70116 ,  G03F7/70075

    摘要： In a lithographic apparatus, an illumination mode is set using a field mirror that includes a plurality of movable facets to direct radiation to selectable positions on a pupil facet mirror. A base illumination mode is selected from a set of predetermined illumination modes and the movable facets are set to effect that mode. In order to adjust an imaging parameter, a fraction of the movable facets are set to different positions. The determination of which facets to set to different positions is based on summing the effects of setting each facet to a different position.

    摘要翻译： 在光刻设备中，使用包括多个可移动小面的场反射镜来设置照明模式，以将辐射引导到瞳孔面反射镜上的可选位置。 从一组预定照明模式中选择基本照明模式，并且可移动小面被设置为实现该模式。 为了调整成像参数，可移动小面的一部分被设定为不同的位置。 确定哪些面设置到不同的位置是基于将每个方面设置为不同位置的效果的总和。