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1.发明授权Method for positioning an object by an electromagnetic motor, stage apparatus and lithographic apparatus 有权用于通过电磁马达，平台装置和光刻设备定位物体的方法公开(公告)号：US08982327B2
公开(公告)日：2015-03-17
申请号：US13330161
申请日：2011-12-19
CPC分类号： G03B27/32 , G03B27/54 , G03F7/70725 , G03F7/70758
摘要： A method to enable positioning of an object by a positioning device that includes an electromagnetic motor to control the position of the object in a lithographic apparatus, the method including receiving desired motor signals at the electromagnetic motor to produce a plurality of primary forces and a pitch torque associated with the primary forces within a motor control cycle, wherein for the motor control cycle, the pitch torque is based on either the primary forces to be generated by the electromagnetic motor or the desired forces and torques for positioning the object; and in response to the desired motor signals, causing the electromagnetic motor to generate the primary forces, wherein prior to the primary forces are determined for a next motor control cycle, the desired forces and torques for positioning the object are modified using the pitch torque associated with a previous motor control cycle.
摘要翻译： 一种能够通过包括电磁马达的定位装置来定位物体的方法，以控制物体在光刻设备中的位置，该方法包括在电磁马达处接收所需的马达信号以产生多个主力和俯仰 与电动机控制周期内的主力相关联的扭矩，其中对于电动机控制循环，俯仰转矩基于要由电磁电动机产生的主要力或用于定位物体的期望力和扭矩; 并且响应于期望的电动机信号，使得电磁电动机产生主力，其中在为下一个电动机控制循环确定主力之前，用于定位物体的期望力和转矩使用相关的俯仰转矩来修改 与以前的电机控制周期。
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公开(公告)号：US08681316B2
公开(公告)日：2014-03-25
申请号：US13116934
申请日：2011-05-26
申请人： Henrikus Herman Marie Cox , Willem Herman Gertruda Anna Koenen , Thomas Augustus Mattaar , Martinus Theodorus Jacobus Pieterse , Rob Antonius Andries Verkooijen
发明人： Henrikus Herman Marie Cox , Willem Herman Gertruda Anna Koenen , Thomas Augustus Mattaar , Martinus Theodorus Jacobus Pieterse , Rob Antonius Andries Verkooijen
CPC分类号： G03F7/70775 , G03F7/70508
摘要： A measurement system is configured to derive a position quantity of an object, the measurement system includes at least one position quantity sensor configured to provide respective position quantity measurement signals; a position quantity calculator configured to determine a position quantity of the object from the position quantity measurement signal, wherein the position quantity calculator includes a torsion estimator configured to estimate a torsion of the object, the position quantity calculator being configured to correct the determined position quantity of the object for the estimated torsion.
摘要翻译： 测量系统被配置为导出物体的位置量，测量系统包括配置成提供各个位置量测量信号的至少一个位置量传感器; 位置量计算器，其被配置为根据所述位置量测量信号确定所述物体的位置量，其中所述位置量计算器包括被配置为估计所述物体的扭转的扭转估计器，所述位置量计算器被配置为校正所确定的位置量 的物体估计扭转。
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3.发明授权Method for positioning an object by an electromagnetic motor, stage apparatus and lithographic apparatus 有权用于通过电磁马达，平台装置和光刻设备定位物体的方法公开(公告)号：US08102513B2
公开(公告)日：2012-01-24
申请号：US12243233
申请日：2008-10-01
CPC分类号： G03B27/32 , G03B27/54 , G03F7/70725 , G03F7/70758
摘要： A method for positioning an object by an electromagnetic motor which, in use, produces a plurality of primary forces and a pitch torque associated with the primary forces. The method includes a cycle which includes: determining the desired forces and torques for positioning the object, determining the primary forces to be generated by the motor, determine the pitch torque from either the primary forces or from the desired forces and torques, determine the desired signals for the motor to generate the primary forces. In a next cycle, prior to the determination of the primary forces, the desired forces and torques for positioning the object are modified using the pitch torque determined in the previous cycle of steps.
摘要翻译： 一种用于通过电磁马达定位物体的方法，该电磁马达在使用中产生与主力相关联的多个主力和俯仰力矩。 该方法包括循环，其包括：确定用于定位物体的期望的力和扭矩，确定由马达产生的主力，从主力或从所需的力和扭矩确定俯仰扭矩，确定期望的 电机产生主力的信号。 在下一个循环中，在确定主力之前，使用在前一步骤循环中确定的俯仰扭矩修改用于定位物体的期望力和扭矩。
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公开(公告)号：US20110317142A1
公开(公告)日：2011-12-29
申请号：US13116934
申请日：2011-05-26
申请人： Henrikus Herman Marie Cox , Willem Herman Gertruda Anna Koenen , Thomas Augustus Mattaar , Martinus Theodorus Jacobus Pieterse , Rob Antonius Andries Verkooijen
发明人： Henrikus Herman Marie Cox , Willem Herman Gertruda Anna Koenen , Thomas Augustus Mattaar , Martinus Theodorus Jacobus Pieterse , Rob Antonius Andries Verkooijen
CPC分类号： G03F7/70775 , G03F7/70508
摘要： A measurement system is configured to derive a position quantity of an object, the measurement system includes at least one position quantity sensor configured to provide respective position quantity measurement signals; a position quantity calculator configured to determine a position quantity of the object from the position quantity measurement signal, wherein the position quantity calculator includes a torsion estimator configured to estimate a torsion of the object, the position quantity calculator being configured to correct the determined position quantity of the object for the estimated torsion.
摘要翻译： 测量系统被配置为导出物体的位置量，测量系统包括配置成提供各个位置量测量信号的至少一个位置量传感器; 位置量计算器，其被配置为根据所述位置量测量信号确定所述物体的位置量，其中所述位置量计算器包括被配置为估计所述物体的扭转的扭转估计器，所述位置量计算器被配置为校正所确定的位置量 的物体估计扭转。
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公开(公告)号：US09274436B2
公开(公告)日：2016-03-01
申请号：US13693923
申请日：2012-12-04
申请人： Theodorus Wilhelmus Polet , Henrikus Herman Marie Cox , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Jimmy Matheus Wilhelmus Van De Winkel , Gregory Martin Mason Corcoran , Frank Johannes Jacobus Van Boxtel
发明人： Theodorus Wilhelmus Polet , Henrikus Herman Marie Cox , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Jimmy Matheus Wilhelmus Van De Winkel , Gregory Martin Mason Corcoran , Frank Johannes Jacobus Van Boxtel
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70758 , G03F7/70783
摘要： A lithographic apparatus having: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a substrate surface actuator including a fluid opening for fluid flow therethrough from/onto a facing surface facing the substrate surface actuator to generate a force between the substrate surface actuator and the facing surface, the facing surface being a top surface of the substrate or a surface substantially co-planar with the substrate; and a position controller to control the position and/or orientation of a part of the facing surface by varying fluid flow through the fluid opening to displace the part of the facing surface relative to the projection system.
摘要翻译： 一种光刻设备，具有：用于保持基板的基板台; 投影系统，被配置为将图案化的辐射束投影到所述基板的目标部分上; 衬底表面致动器，其包括流体开口，用于从面向衬底表面致动器的面向表面的流体流过，以在衬底表面致动器和面对表面之间产生力，面对表面是衬底的顶表面或表面 基本上与基板共面; 以及位置控制器，其通过改变通过流体开口的流体流动来控制面对表面的一部分的位置和/或取向，以相对于投影系统移位相对表面的一部分。
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公开(公告)号：US08279407B2
公开(公告)日：2012-10-02
申请号：US12408936
申请日：2009-03-23
申请人： Ramidin Izair Kamidi , Henrikus Herman Marie Cox , Emiel Jozef Melanie Eussen , Ronald Casper Kunst , Engelbertus Antonius Fransiscus Van Der Pasch , Marcel François Heertjes , Mark Constant Johannes Baggen
发明人： Ramidin Izair Kamidi , Henrikus Herman Marie Cox , Emiel Jozef Melanie Eussen , Ronald Casper Kunst , Engelbertus Antonius Fransiscus Van Der Pasch , Marcel François Heertjes , Mark Constant Johannes Baggen
CPC分类号： G03F7/70775
摘要： A stage system includes a movable stage, at least two encoder heads each constructed to provide an encoder signal representative of a position of the movable stage with respect to an encoder target structure, and a controller to control a position of the stage. The controller is provided with the encoder signals of each of the encoder heads. The controller is arranged to apply a weighting function to the encoder signals and to derive a position of the stage from the weighted encoder signals.
摘要翻译： 舞台系统包括可移动舞台，至少两个编码器头，每个编码器头被构造成提供代表可移动平台相对于编码器目标结构的位置的编码器信号，以及控制器来控制舞台的位置。 控制器具有每个编码器头的编码器信号。 控制器被布置为对编码器信号应用加权函数并且从加权的编码器信号导出级的位置。
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公开(公告)号：US20110273683A1
公开(公告)日：2011-11-10
申请号：US13188026
申请日：2011-07-21
申请人： Bob STREEFKERK , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendman , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
发明人： Bob STREEFKERK , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendman , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
摘要： In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
摘要翻译： 在光刻设备中，将投影系统下的基板表面的局部区域浸入液体中。 可以使用致动器来改变衬底表面上方的液体供应系统的高度。 控制系统使用前馈或反馈控制输入基板的表面高度，以将液体供应系统保持在基板表面上方的预定高度。
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公开(公告)号：US20100149514A1
公开(公告)日：2010-06-17
申请号：US12714829
申请日：2010-03-01
申请人： Nicolaas Rudolf KEMPER , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel
发明人： Nicolaas Rudolf KEMPER , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel
IPC分类号： G03B27/58
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
摘要翻译： 在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。 多孔构件上的压差可以保持在多孔构件的起泡点以下，从而获得单相液体流。 或者，多孔构件可以用于减少两相流中的不均匀性。
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公开(公告)号：US07710540B2
公开(公告)日：2010-05-04
申请号：US11783115
申请日：2007-04-05
申请人： Erik Roelof Loopstra , Henrikus Herman Marie Cox , Jeroen Johannes Sophia Maria Mertens , Wilhelmus Franciscus Johannes Simons , Paul Petrus Joannes Berkvens
发明人： Erik Roelof Loopstra , Henrikus Herman Marie Cox , Jeroen Johannes Sophia Maria Mertens , Wilhelmus Franciscus Johannes Simons , Paul Petrus Joannes Berkvens
IPC分类号： G03B27/42
CPC分类号： G05B19/404 , G03F7/70725 , G03F7/709 , G05B2219/45031 , G05B2219/49189
摘要： A position control system for a substrate support of a lithographic apparatus includes a position measurement system configured to determine a position of a sensor or sensor target on the substrate support, a controller configured to provide a control signal based on a desired position of a target portion of the substrate and the determined position, and one or more actuators configured to act on the substrate support. The position control system includes a stiffness compensation model of the substrate support, the stiffness compensation model including a relation between a difference in a change in position of the target portion and a change in position of the sensor or sensor target as a result of a force exerted on the substrate support. The position control system is configured to substantially correct at least during projection of a patterned radiation beam on the target portion, the position of the target portion using the stiffness compensation model.
摘要翻译： 用于光刻设备的基板支撑件的位置控制系统包括：位置测量系统，被配置为确定传感器或传感器目标在基板支撑件上的位置;控制器，被配置为基于目标部分的期望位置提供控制信号 和一个或多个致动器构造成作用在基板支撑件上。 所述位置控制系统包括所述基板支撑件的刚度补偿模型，所述刚度补偿模型包括所述目标部分的位置变化的差异与所述传感器或传感器目标的位置变化之间的关系 施加在基板支撑件上。 位置控制系统被配置为至少在图案化的辐射束在目标部分上的投影期间基本上校正，目标部分的位置使用刚度补偿模型。
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公开(公告)号：US07602470B2
公开(公告)日：2009-10-13
申请号：US11212921
申请日：2005-08-29
申请人： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christian Alexander Hoogendam , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Joost Jeroen Ottens , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel
发明人： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christian Alexander Hoogendam , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Joost Jeroen Ottens , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
摘要翻译： 在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。 多孔构件上的压差可以保持在多孔构件的起泡点以下，从而获得单相液体流。 或者，多孔构件可以用于减少两相流中的不均匀性。
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