Machine component with IC tag attached thereto
    4.
    发明授权
    Machine component with IC tag attached thereto 有权
    附有IC标签的机器部件

    公开(公告)号:US07471198B2

    公开(公告)日:2008-12-30

    申请号:US10570982

    申请日:2004-09-07

    IPC分类号: G08B13/14 G08B21/00 F16C19/00

    摘要: To provide a machine component with an IC tag affixed thereto, in which with the IC tag having an increased storage capacity, the IC tag can be mounted with no difficulty and, also, reading or writing of information from or in the IC tag, respectively, can be facilitated. A plurality of IC tags 2 are attached to a machine component, which forms a part of a rolling bearing assembly 1, or to a machine component and an accessory with division made therebetween. Those plural IC tags 2 have different information stored therein. Where the machine component is a retainer incorporated rolling bearing assembly 1, those plural IC tags are attached to a roller retainer 5 at respective locations symmetrical with each other about the axis O of rotation thereof.

    摘要翻译: 为了提供附加有IC标签的机器部件,其中随着IC标签具有增加的存储容量,IC标签可以没有困难地安装,并且还分别从IC标签或IC标签中读取或写入信息 ,可以方便。 多个IC标签2被附接到形成滚动轴承组件1的一部分的机器部件上,或者连接到机器部件和在它们之间进行分割的附件。 这些多个IC标签2具有存储在其中的不同信息。 在机器部件是包括滚动轴承组件1的保持器的情况下,这些多个IC标签在其相对于其旋转轴线O彼此对称的各个位置附接到辊保持器5。

    Method for visualizing data on correlation between biological events, analysis method, and database
    5.
    发明申请
    Method for visualizing data on correlation between biological events, analysis method, and database 审中-公开
    可视化生物事件,分析方法和数据库之间相关性数据的方法

    公开(公告)号:US20060287831A1

    公开(公告)日:2006-12-21

    申请号:US10569494

    申请日:2004-07-12

    IPC分类号: G06F19/00

    CPC分类号: G16B45/00 G16B20/00 G16B40/00

    摘要: One of a plurality of data display formats with different units of correlation data that are prepared in advance is automatically selected depending on the variation of the amount of data in terms of the number of items thereof. One of a plurality of display methods with different summarization levels that are prepared in advance is also automatically selected for information (about correlation data or individual events) regarding individual cells. Information about the correlation data and individual cells is then displayed. The amount of work required to repeat the operation of observing the correlation data as a whole and the detailed observation of a small amount of data is reduced in a method for visualizing correlation data concerning two events in a matrix format.

    摘要翻译: 根据其数量项目的数据量的变化,自动选择预先准备的具有不同相关数据单位的多个数据显示格式之一。 对于关于各个单元的信息(关于相关数据或单个事件),还自动选择预先准备的具有不同总结级别的多个显示方法之一。 然后显示有关相关数据和单个单元格的信息。 在以矩阵格式显示关于两个事件的相关数据的方法中,减少了重复观察相关数据作为整体的操作所需的工作量和少量数据的详细观察。

    Machine element part with ic tag
    6.
    发明申请
    Machine element part with ic tag 有权
    机身元件与ic标签

    公开(公告)号:US20060289620A1

    公开(公告)日:2006-12-28

    申请号:US10570982

    申请日:2004-09-07

    IPC分类号: G06F17/00 G06K19/00

    摘要: To provide a machine component with an IC tag affixed thereto, in which with the IC tag having an increased storage capacity, the IC tag can be mounted with no difficulty and, also, reading or writing of information from or in the IC tag, respectively, can be facilitated. A plurality of IC tags 2 are attached to a machine component, which forms a part of a rolling bearing assembly 1, or to a machine component and an accessory with division made therebetween. Those plural IC tags 2 have different information stored therein. Where the machine component is a retainer incorporated rolling bearing assembly 1, those plural IC tags are attached to a roller retainer 5 at respective locations symmetrical with each other about the axis O of rotation thereof.

    摘要翻译: 为了提供附加有IC标签的机器部件,其中随着IC标签具有增加的存储容量,IC标签可以没有困难地安装,并且还分别从IC标签或IC标签中读取或写入信息 ,可以方便。 多个IC标签2被附接到形成滚动轴承组件1的一部分的机器部件上,或者连接到机器部件和在它们之间进行分割的附件。 这些多个IC标签2具有存储在其中的不同信息。 在机器部件是包括滚动轴承组件1的保持器的情况下,这些多个IC标签在其相对于其旋转轴线O彼此对称的各个位置附接到辊保持器5。

    GAS SUPPLY SYSTEM, SUBSTRATE PROCESSING APPARATUS AND GAS SUPPLY METHOD
    7.
    发明申请
    GAS SUPPLY SYSTEM, SUBSTRATE PROCESSING APPARATUS AND GAS SUPPLY METHOD 有权
    气体供应系统,基板加工设备和气体供应方法

    公开(公告)号:US20110120563A1

    公开(公告)日:2011-05-26

    申请号:US13012623

    申请日:2011-01-24

    IPC分类号: F15D1/00

    摘要: A gas supply system for supplying a gas into a processing chamber for processing a substrate to be processed includes: a processing gas supply unit; a processing gas supply line; a first and a second branch line; a branch flow control unit; an additional gas supply unit; an additional gas supply line; and a control unit. The control unit performs, before processing the substrate to be processed, a processing gas supply control and an additional gas supply control by using the processing gas supply unit and the additional gas supply unit, respectively, wherein the additional gas supply control includes a control that supplies the additional gas at an initial flow rate greater than a set flow rate and then at the set flow rate after a lapse of a period of time.

    摘要翻译: 一种用于将气体供应到用于处理待处理基板的处理室中的气体供应系统包括:处理气体供应单元; 处理气体供应管线; 第一和第二支线; 分支流量控制单元; 附加气体供应单元; 额外的气体供应线; 和控制单元。 控制单元在处理待处理的基板之前分别通过使用处理气体供应单元和附加气体供应单元执行处理气体供应控制和附加气体供应控制,其中附加气体供应控制包括控制, 以大于设定流量的初始流量提供额外的气体,然后在经过一段时间后以设定流量供应附加气体。

    Plasma display and method for manufacturing the same
    8.
    发明授权
    Plasma display and method for manufacturing the same 有权
    等离子显示器及其制造方法

    公开(公告)号:US06184621B2

    公开(公告)日:2001-02-06

    申请号:US09297143

    申请日:1999-04-26

    IPC分类号: H01J1100

    摘要: The plasma display of the present invention is a plasma display in which a dielectric layer and stripe-shaped barrier ribs are formed on a substrate, and it is characterized in that there are inclined regions at the lengthwise direction ends of said barrier ribs and, furthermore, the height (Y) of the inclined regions and the length (X) of the base of the inclined regions are within the range 0.5≦X/Y≦100. Moreover, the method of the present invention for manufacturing a plasma display is characterized in that the aforesaid stripe-shaped barrier ribs are formed via a process in which a pattern of stripe-shaped barrier ribs having inclined regions at the ends is formed on a substrate using a barrier rib paste comprising inorganic material and organic component, and a process in which said barrier rib pattern is fired.

    摘要翻译: 本发明的等离子体显示器是在基板上形成电介质层和条状隔壁的等离子体显示器,其特征在于,在所述隔壁的纵向端部存在倾斜区域,此外 ,倾斜区域的高度(Y)和倾斜区域的基底的长度(X)在0.5 <= X / Y <100的范围内。 此外,用于制造等离子体显示器的本发明的方法的特征在于,上述条形阻挡肋是通过在基板上形成有在端部具有倾斜区域的条状隔壁的图案的方法形成的 使用包含无机材料和有机组分的隔壁糊料以及其中所述隔壁图案被烧制的工艺。

    Plasma display with barrier rib of specific construction
    9.
    发明授权
    Plasma display with barrier rib of specific construction 失效
    等离子显示屏,具有特定结构的障壁

    公开(公告)号:US6043604A

    公开(公告)日:2000-03-28

    申请号:US29812

    申请日:1998-03-10

    摘要: With barrier ribs having a specified form, the strength and the adhesiveness to the substrate board are improved, and a high-resolution plasma display with suppressed meandering, falling and peeling of the barrier rib and wire breakage is provided. In addition, coating uniformity of the phosphor is improved, a high-resolution plasma display with low luminance irregularity is provided. Furthermore, a high-luminance high resolution plasma display with excellent luminance characteristic is provided.

    摘要翻译: PCT No.PCT / JP97 / 02404 Sec。 371日期1998年3月10日 102(e)1998年3月10日PCT 1997年7月10日PCT公布。 公开号WO98 / 01885 日期1998年1月15日具有规定形状的隔壁,提高了与基板的强度和粘合性,并且提供了抑制障壁的弯曲,下降和剥离以及断线的高分辨率等离子体显示。 此外,提高了荧光体的涂布均匀性,提供了具有低亮度不规则性的高分辨率等离子体显示器。 此外,提供了具有优异亮度特性的高亮度高分辨率等离子体显示器。

    GAS SUPPLY SYSTEM, SUBSTRATE PROCESSING APPARATUS AND GAS SUPPLY METHOD
    10.
    发明申请
    GAS SUPPLY SYSTEM, SUBSTRATE PROCESSING APPARATUS AND GAS SUPPLY METHOD 有权
    气体供应系统,基板加工设备和气体供应方法

    公开(公告)号:US20070181255A1

    公开(公告)日:2007-08-09

    申请号:US11671115

    申请日:2007-02-05

    IPC分类号: H01L21/306 C23F1/00 C23C16/00

    摘要: A gas supply system for supplying a gas into a processing chamber for processing a substrate to be processed includes: a processing gas supply unit; a processing gas supply line; a first and a second branch line; a branch flow control unit; an additional gas supply unit; an additional gas supply line; and a control unit. The control unit performs, before processing the substrate to be processed, a processing gas supply control and an additional gas supply control by using the processing gas supply unit and the additional gas supply unit, respectively, wherein the additional gas supply control includes a control that supplies the additional gas at an initial flow rate greater than a set flow rate and then at the set flow rate after a lapse of a period of time.

    摘要翻译: 一种用于将气体供应到用于处理待处理基板的处理室中的气体供应系统包括:处理气体供应单元; 处理气体供应管线; 第一和第二支线; 分支流量控制单元; 附加气体供应单元; 额外的气体供应线; 和控制单元。 控制单元在处理待处理的基板之前分别通过使用处理气体供应单元和附加气体供应单元执行处理气体供应控制和附加气体供应控制,其中附加气体供应控制包括控制, 以大于设定流量的初始流量提供额外的气体,然后在经过一段时间后以设定流量供应附加气体。