摘要:
A micro-structure is manufactured by patterning a sacrificial film, forming an inorganic material film on the pattern, providing the inorganic material film with an aperture, and etching away the sacrificial film pattern through the aperture to define a space having the contour of the pattern. The patterning stage includes the steps of (A) forming a sacrificial film using a composition comprising a cresol novolac resin and a crosslinker, (B) exposing patternwise the film to first high-energy radiation, (C) developing, and (D) exposing the sacrificial film pattern to second high-energy radiation and heat treating for thereby forming crosslinks within the cresol novolac resin.
摘要:
A micro-structure is manufactured by patterning a sacrificial film, forming an inorganic material film on the pattern, providing the inorganic material film with an aperture, and etching away the sacrificial film pattern through the aperture to define a space having the contour of the pattern. The patterning stage includes the steps of (A) forming a sacrificial film using a composition comprising a cresol novolac resin and a crosslinker, (B) exposing patternwise the film to first high-energy radiation, (C) developing, and (D) exposing the sacrificial film pattern to second high-energy radiation and heat treating for thereby forming crosslinks within the cresol novolac resin.
摘要:
Siloxane compounds having the general formula [1]: ##STR1## wherein R is a substituted or unsubstituted monovalent hydrocarbon group having from 1 to 10 carbon atoms, and n is an integer of from 0 to 100. The compound, because of the two vinylsilyl groups and two acid anhydride groups introduced into the molecule thereof, is useful as an intermediate or modifying agent in the synthesis of various organic resins such as polyimide resins.
摘要:
In a resist composition, a novolak resin including at least one recurring unit of the formula (1): ##STR1## wherein n is an integer of 1 to 4 and m is an integer of 0 to 3, having a weight average molecular weight of 1,000 to 10,000 calculated as polystyrene, and having the hydrogen atom of a hydroxyl group therein replaced by a 1,2-naphthoquinonediazidosulfonyl group in a proportion of 0.03 to 0.27 mol per hydrogen atom serves as an alkali-soluble resin and a photosensitive agent. The composition is uniform in that the photosensitive agent is uniformly incorporated in the novolak resin, and thus forms a uniform resist film. It is a useful positive resist having improved sensitivity, resolution, heat resistance, and film retentivity.
摘要:
Siloxane compounds having the following formula [1]: ##STR1## wherein each R is a substituted or unsubstituted monovalent hydrocarbon group having from 1 to 10 carbon atoms, and n is an integer of from 0 to 100. The compounds are extremely high in reactivity and, therefore, useful as an intermediate or modifying agent in the synthesis of silicone resins and other various organic resins.
摘要:
Novel organosilicon compounds containing a mercapto group are provided, which compounds are of the following general formula, HSCH.sub.2 C.sub.6 H.sub.4 (CH.sub.2).sub.n Si(CH.sub.3).sub.3-m (OR).sub.m, wherein R represents a methyl group or an ethyl group, n is a value of 0,1 or 2, and m is a value or 1, 2 or 3. the ocmpounds are substantially free of any offensive odor derived from the mercapto group and are useful as a silane coupling or crosslinking agent.
摘要:
An aquatic antifouling composition characterized by containing as effective antifouling component a metal salt of hexamethylenedithiocarbamic acid represented by the formula below: ##STR1## (where M is a divalent or trivalent metal; n is 2 or 3.)
摘要:
A UV curable composition of a specific organopolysiloxane having mercaptoalkyl and phenylene groups and a vinyl-containing organopolysiloxane cures into a film which emits little stimulative sulfur odor and has enough resistance to light or UV radiation to retain its as-cured properties even after long-term exposure to sunlight or UV radiation.
摘要:
An indoor air-conditioning unit 10 which can effectively deactivate allergens includes an intake grill 11 for drawing in indoor air. Indoor heat exchangers 13, 14, and 15 exchange heat between air drawn in from the intake grill 11 and a refrigerant to thereby cool or heat the air. A diffuser 16 returns the air which has been heat-exchanged with the indoor heat exchangers 13, 14, 15, back into the room. A cross-flow fan 17 blows air which has been drawn in from the inlet and heat exchanged from the diffuser 16 into the room. An allergen deactivation filter 18 is arranged in an internal space 5 through which the air flows and supports an allergen deactivation enzyme. An enzyme activation device maintains the internal space S in an atmosphere for activating the allergen deactivation enzyme.
摘要:
A rubber composition includes (1) a diene rubber, (2) a silica and (3) an epoxidized liquid diene rubber having a number-average molecular weight of 10000 to 100000, wherein based on 100 parts by mass of the diene rubber (1), the rubber composition comprises 0.1 to 150 parts by mass of the silica (2) and 0.1 to 30 parts by mass of the epoxidized liquid diene rubber (3). A crosslinkable rubber composition includes the above rubber composition and crosslinking agent. A crosslinked article is prepared by crosslinking the above crosslinkable rubber composition. The rubber compositions have improved silica dispersibility in the case of mixing a silica with a diene rubber, excellent processability, and excellent mechanical properties after crosslinking.