OXIDE THIN FILM TRANSISTOR RESISTANT TO LIGHT AND BIAS STRESS, AND A METHOD OF MANUFACTURING THE SAME
    1.
    发明申请
    OXIDE THIN FILM TRANSISTOR RESISTANT TO LIGHT AND BIAS STRESS, AND A METHOD OF MANUFACTURING THE SAME 审中-公开
    氧化物薄膜晶体管耐光和偏应力及其制造方法

    公开(公告)号:US20120286271A1

    公开(公告)日:2012-11-15

    申请号:US13467674

    申请日:2012-05-09

    CPC分类号: H01L29/7869

    摘要: Disclosed are an oxide thin film transistor resistant to light and bias stress, and a method of manufacturing the same. The method includes forming a gate electrode on a substrate; forming a gate insulating layer on an upper part including the gate electrode; forming a source electrode and a drain electrode on the insulating layer; forming an active layer insulated from the gate electrode by the gate insulating layer and formed of an oxide semiconductor and a diffusion barrier film; and forming a protective layer on a portion of the source electrode and drain electrode and the upper part including the active layer, wherein the diffusion barrier film reduces movement of holes and prevents ionized oxygen vacancies from being diffused.

    摘要翻译: 公开了耐光和偏压应力的氧化物薄膜晶体管及其制造方法。 该方法包括在基板上形成栅电极; 在包括所述栅电极的上部形成栅极绝缘层; 在绝缘层上形成源电极和漏电极; 通过所述栅极绝缘层形成与所述栅极绝缘的有源层,并由氧化物半导体和扩散阻挡膜形成; 以及在源电极和漏电极以及包括有源层的上部的一部分上形成保护层,其中扩散阻挡膜减小空穴的移动并防止电离的氧空位扩散。

    MEMORY CELL AND MEMORY DEVICE USING THE SAME
    2.
    发明申请
    MEMORY CELL AND MEMORY DEVICE USING THE SAME 有权
    使用该存储单元的存储单元和存储器件

    公开(公告)号:US20120134197A1

    公开(公告)日:2012-05-31

    申请号:US13300688

    申请日:2011-11-21

    IPC分类号: G11C11/22

    CPC分类号: G11C11/22

    摘要: Provided is a memory cell including: a ferroelectric transistor; a plurality of switching elements electrically connected to the ferroelectric transistor; and a plurality of control lines for transmitting individual control signals to each of the plurality of switching element for separately controlling the plurality of switching elements. The plurality of switching elements are configured to be separately controlled on the basis of the individual control signals so as to prevent each electrode of the ferroelectric transistor from being floated.

    摘要翻译: 提供一种存储单元,包括:铁电晶体管; 电连接到所述铁电晶体管的多个开关元件; 以及多个控制线,用于将各个控制信号发送到多个开关元件中的每一个,用于分别控制多个开关元件。 多个开关元件被配置为基于各个控制信号单独控制,以防止铁电晶体管的每个电极浮动。

    POWER REDUCTION TELEVISION WITH PHOTO FRAME
    3.
    发明申请
    POWER REDUCTION TELEVISION WITH PHOTO FRAME 审中-公开
    电源减少电视与相框

    公开(公告)号:US20110249202A1

    公开(公告)日:2011-10-13

    申请号:US13080831

    申请日:2011-04-06

    IPC分类号: H04N5/66 H04N3/14

    CPC分类号: H04N5/63 H04N5/64

    摘要: A power reduction television with a photo frame is provided. The power reduction television includes a first display configured to display a first video image, a low power second display configured to display a second video image, and a display control unit configured to control the second display to display the second video image, when the first video image is not displayed through the first display.

    摘要翻译: 提供带有相框的减速电视机。 功率降低电视包括被配置为显示第一视频图像的第一显示器,被配置为显示第二视频图像的低功率第二显示器,以及显示控制单元,被配置为当第一视频图像被显示时控制第二显示器显示第二视频图像 视频图像不会通过第一个显示屏显示。

    Memory cell and memory device using the same
    4.
    发明授权
    Memory cell and memory device using the same 有权
    内存单元和内存设备使用相同

    公开(公告)号:US08493768B2

    公开(公告)日:2013-07-23

    申请号:US13300688

    申请日:2011-11-21

    IPC分类号: G11C11/22

    CPC分类号: G11C11/22

    摘要: Provided is a memory cell including: a ferroelectric transistor; a plurality of switching elements electrically connected to the ferroelectric transistor; and a plurality of control lines for transmitting individual control signals to each of the plurality of switching element for separately controlling the plurality of switching elements. The plurality of switching elements are configured to be separately controlled on the basis of the individual control signals so as to prevent each electrode of the ferroelectric transistor from being floated.

    摘要翻译: 提供一种存储单元,包括:铁电晶体管; 电连接到所述铁电晶体管的多个开关元件; 以及多个控制线,用于将各个控制信号发送到多个开关元件中的每一个,用于分别控制多个开关元件。 多个开关元件被配置为基于各个控制信号单独控制,以防止铁电晶体管的每个电极浮动。

    MEMORY CELL AND MEMORY DEVICE USING THE SAME
    6.
    发明申请
    MEMORY CELL AND MEMORY DEVICE USING THE SAME 审中-公开
    使用该存储单元的存储单元和存储器件

    公开(公告)号:US20110305062A1

    公开(公告)日:2011-12-15

    申请号:US12887316

    申请日:2010-09-21

    IPC分类号: G11C11/22

    CPC分类号: G11C11/22

    摘要: Provided are a memory cell and a memory device using the same, particularly, a nonvolatile non-destructive readable random access memory cell including a ferroelectric transistor as a storage unit and a memory device using the same. The memory cell includes a ferroelectric transistor having a drain to which a reference voltage is applied, a first switch configured to allow a source of the ferroelectric transistor to be connected to a first line in response to a scan signal, and a second switch configured to allow a gate of the ferroelectric transistor to be connected to a second line in response to the scan signal. The memory device enables random access and performs non-destructive read-out (NDRO) operations.

    摘要翻译: 提供了一种存储器单元和使用该存储单元的存储器件,特别地,包括作为存储单元的铁电晶体管的非易失性非破坏性可读随机存取存储单元和使用该存储单元的存储器件。 存储单元包括具有施加了参考电压的漏极的铁电晶体管,被配置为允许铁电晶体管的源被响应于扫描信号连接到第一线的第一开关,以及被配置为 允许铁电晶体管的栅极响应于扫描信号连接到第二线。 存储器件允许随机访问并执行非破坏性读出(NDRO)操作。

    APPARATUS FOR REACTIVE SPUTTERING DEPOSITION
    7.
    发明申请
    APPARATUS FOR REACTIVE SPUTTERING DEPOSITION 审中-公开
    反应溅射沉积装置

    公开(公告)号:US20100258437A1

    公开(公告)日:2010-10-14

    申请号:US12741667

    申请日:2008-09-02

    IPC分类号: C23C14/34

    CPC分类号: C23C14/0047 C23C14/3464

    摘要: Provided is a reactive sputtering apparatus, and more particularly, a reactive sputtering apparatus capable of effectively ionizing a reactive gas using inductively coupled plasma (ICP). The reactive sputtering apparatus includes: a chamber having an inlet port for introducing a plasma gas thereinto and an outlet port for exhausting the gas used during reactive sputtering to the exterior; an ICP generator disposed on the chamber, ionizing a reactive gas, and injecting the ionized gas into the chamber; and at least one sputter gun located at a side surface of the chamber and supporting a target. Therefore, the reactive sputtering apparatus can improve an ionization rate of a reactive gas using inductively coupled plasma to reduce a process temperature and improve uniformity and step coverage of thin film deposition at low cost.

    摘要翻译: 提供了一种反应性溅射装置,更具体地,涉及一种使用电感耦合等离子体(ICP)能够有效地电离反应性气体的反应溅射装置。 反应性溅射装置包括:具有用于将等离子体气体引入其中的入口的室和用于将反应性溅射期间使用的气体排出到外部的出口; 设置在所述室上的ICP发生器,使反应气体电离,并将所述电离气体注入所述室中; 以及位于所述室的侧表面处并支撑靶的至少一个溅射枪。 因此,反应溅射装置可以使用电感耦合等离子体来提高反应气体的离子化速度,以降低处理温度,并以低成本提高薄膜沉积的均匀性和步骤覆盖。

    Method and apparatus for modeling source-drain current of thin film transistor
    9.
    发明授权
    Method and apparatus for modeling source-drain current of thin film transistor 有权
    薄膜晶体管源漏电流建模方法及设备

    公开(公告)号:US08095343B2

    公开(公告)日:2012-01-10

    申请号:US12201457

    申请日:2008-08-29

    IPC分类号: G06F17/11

    CPC分类号: G06F17/5036

    摘要: Provided are a method and apparatus for modeling source-drain current of a TFT. The method includes receiving sample data, the sample data including a sample input value and a sample output value; adjusting modeling variables according to the sample data; calculating a current model value according to the adjusted modeling variables; when a difference between the calculated current model value and the sample output value is smaller than a predetermined threshold value, fitting a current model by applying the adjusted modeling variables to the current model; applying actual input data to the fitted current model; and outputting a result value corresponding to the actual input data, wherein the current model is a model for predicting the source-drain current of the TFT.

    摘要翻译: 提供了一种用于建模TFT的源极 - 漏极电流的方法和装置。 该方法包括接收样本数据,样本数据包括样本输入值和样本输出值; 根据样本数据调整建模变量; 根据调整后的建模变量计算当前模型值; 当所计算的当前模型值与样本输出值之间的差小于预定阈值时,通过将调整的建模变量应用于当前模型来拟合当前模型; 将实际输入数据应用于拟合的当前模型; 并输出与实际输入数据对应的结果值,其中当前模型是用于预测TFT的源极 - 漏极电流的模型。