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    Additive For Copper Plating And Process For Producing Electronic Circiut Substrate Therewith
    3.
    发明申请
    Additive For Copper Plating And Process For Producing Electronic Circiut Substrate Therewith 审中-公开
    铜电镀用添加剂及其制造方法

    公开(公告)号：US20080087549A1

    公开(公告)日：2008-04-17

    申请号：US11573718

    申请日：2004-08-18

    申请人： Hiroshi Ishizuka ,  Nobuo Sakagawa ,  Ryoichi Kimizuka ,  Wei-ping Dow

    发明人： Hiroshi Ishizuka ,  Nobuo Sakagawa ,  Ryoichi Kimizuka ,  Wei-ping Dow

    IPC分类号： C25D5/02 ,  C07D257/04 ,  C07D245/02

    CPC分类号： C07C257/22 ,  C07C309/47 ,  C07C309/50 ,  C07D257/04 ,  C25D3/38 ,  H05K3/423

    摘要： An additive for copper plating comprising, as an effective ingredient, a nitrogen-containing biphenyl derivative represented by the following formula (I): [wherein X represents a group selected from the following groups (II)-(VII): and Y represents a lower alkyl group, lower alkoxy group, nitro group, amino group, sulfonyl group, cyano group, carbonyl group, 1-pyridyl group, or the formula (VIII): (wherein R′ represents a lower alkyl group)], a copper plating solution formed by adding the additive for copper plating to a copper plating solution containing a copper ion ingredient and an anion ingredient, and a method of manufacturing on an electronic circuit substrate having a fine copper wiring circuit, which comprises electroplating in the copper plating solution using as the cathode an electronic circuit substrate in which fine microholes or microgrooves in the shape of an electronic circuit are formed on the surface.The additive for copper plating can fill through holes or via holes at a micron or sub-micron level even in a case where it consists of one component, and the copper plating solution using the additive for copper plating can be prepared and handled extremely easily and can stably fill the through holes or via holes for a long time.

    摘要翻译： 一种镀敷用添加剂，其特征在于，含有下述式（I）表示的含氮联苯衍生物作为有效成分：[式中，X表示选自下述（II） - （VII）中的基团，Y表示 低级烷基，低级烷氧基，硝基，氨基，磺酰基，氰基，羰基，1-吡啶基或式（VIII）表示：（其中R'表示低级烷基）]，镀铜 通过将铜镀添加剂添加到含有铜离子成分和阴离子成分的铜电镀溶液中形成的溶液，以及在具有细铜布线电路的电子电路基板上制造方法，其包括在镀铜溶液中电镀使用 作为阴极，在表面上形成电子电路形状的细小微孔或微槽的电子电路基板。 用于镀铜的添加剂即使在由一种组分组成的情况下也可以通过微孔或亚微米级的孔或通孔填充，并且使用镀铜添加剂的镀铜溶液可以非常容易地制备和处理， 可以长时间稳定地填充通孔或通孔。

    Method for producing of polycrystalline silicon and apparatus thereof
    6.
    发明授权
    Method for producing of polycrystalline silicon and apparatus thereof 失效
    多晶硅的制造方法及其制造方法

    公开(公告)号：US4715317A

    公开(公告)日：1987-12-29

    申请号：US767079

    申请日：1985-10-15

    申请人： Hiroshi Ishizuka

    发明人： Hiroshi Ishizuka

    IPC分类号： C01B33/02 ,  C01B33/035 ,  C23C16/24

    CPC分类号： C01B33/035 ,  C23C16/24

    摘要： A method for production of polycrystalline silicon, comprising: heating a deposition substrate in a reaction vessel of metal, bringing a gaseous silicon hydride close to said substrate, decomposing said silicon hydride, and producing to deposit silicon on the substrate, while the wall of said vessel is regulated in temperature at levels of, approximately, 100.degree. to 450.degree. C. simultaneously with a decrease of 100.degree. to 700.degree. C. from the temperature of said substrate and an apparatus for production of polycrystalline silicon, comprising: a reaction vessel of metallic material closed with a detachable lid, an inlet and an outlet for gas connected to said vessel, a jacket arranged over the substantial part of said vessel to provide an interspace between the jacket and vessel, a closed circuit for a gas consisting partly of said interspace, a two-way temperature controlling means for heating and cooling the gas provided on the circuit, and a deposition substrate of electrical conductive material extending in the vessel axially from the lid.

    摘要翻译： 一种生产多晶硅的方法，包括：在金属的反应容器中加热沉积基板，使气态硅氢化物靠近所述衬底，分解所述硅氢化物，并在所述衬底上壁产生沉积硅， 容器的温度约为100〜450℃，同时从所述基板的温度和多晶硅的制造温度下降到100℃至700℃，所述装置包括：反应容器 用可拆卸的盖子封闭的金属材料，连接到所述容器的气体的入口和出口，设置在所述容器的大部分上方以提供夹套和容器之间的间隙的护套，用于气体的闭合回路，其部分由 所述间隙，用于加热和冷却设置在电路上的气体的双向温度控制装置和电导率沉积基板 e在容器中从盖子轴向延伸的材料。

    Electrolytic cell for a molten salt
    7.
    发明授权
    Electrolytic cell for a molten salt 失效
    熔盐电解池

    公开(公告)号：US4699704A

    公开(公告)日：1987-10-13

    申请号：US823405

    申请日：1986-01-28

    申请人： Hiroshi Ishizuka

    发明人： Hiroshi Ishizuka

    IPC分类号： C25C3/02 ,  C25C7/00

    CPC分类号： C25C7/005

    摘要： An electrolytic cell for a molten salt comprising alkali- or alkaline earth metal chloride, comprising: an assembly of anode and cathode in opposed relation with each other, a tightly closable vessel containing said assembly and capable of holding in molten state a salt comprising an alkali- or alkaline earth metal chloride, an insulative partition arranged around the anode and extending axially over a height range including the intended bath level, several projections formed to a length on an effective side of the anode opposed to the cathode, said projection having upper and lower surfaces declining outwards so an open bottom-closed top space is provided under each projection, a rise bore formed lengthwise within the anode to run along the axis and a lateral hole in communicating relation with an inward ascent between said space and rise bore.

    摘要翻译： 一种用于熔融盐的包括碱金属或碱土金属氯化物的电解池，包括：阳极和阴极彼此相对关系的组件，容纳所述组件并能够保持熔融状态的可紧密封闭的容器，所述盐包含碱 - 或碱土金属氯化物，绝缘隔板，其布置在阳极周围并且在包括预期浴槽水平的高度范围内轴向延伸，多个突起形成为与阴极相对的阳极的有效侧上的长度，所述突起具有上部和 下表面向外倾斜，因此在每个突起处设置开放的底部封闭的顶部空间，在阳极中纵向形成的上升孔沿着轴线延伸，以及与所述空间和上升孔之间的向内上升连通的侧向孔。

    Apparatus for molten salt electrolysis
    8.
    发明授权
    Apparatus for molten salt electrolysis 失效
    熔盐电解装置

    公开(公告)号：US4647355A

    公开(公告)日：1987-03-03

    申请号：US791558

    申请日：1985-10-25

    申请人： Hiroshi Ishizuka

    发明人： Hiroshi Ishizuka

    IPC分类号： C25C3/04 ,  C25C7/00 ,  C25C7/02 ,  C25C3/00

    CPC分类号： C25C7/005

    摘要： An apparatus for molten salt electrolysis, comprising: an electrolysis chamber which is capable of holding a molten salt of metallic chloride and is closed upwards with a top cover, a cathode placed in said chamber, a lead block of metallic material which runs through the top cover and comprises therealong a bottom-closed axial cavity with inlet and outlet for a fluid coolant connected thereto, said cathode and lead block connected to each other below the bath level to be employed of said salt, and said cavity reaching below said level.

    摘要翻译： 一种熔盐电解装置，包括：电解室，其能够保持金属氯化物的熔融盐，并且用顶盖封闭，向上放置在所述室中的阴极，穿过顶部的金属材料引线块 并且包括一个具有入口和出口的底部封闭的轴向空腔，用于连接到其上的流体冷却剂，所述阴极和铅块在所述盐水平面下方彼此连接以被用于所述盐，并且所述空腔达到所述水平以下。

    Vacuum separator
    9.
    发明授权
    Vacuum separator 失效
    真空分离器

    公开(公告)号：US4403769A

    公开(公告)日：1983-09-13

    申请号：US371417

    申请日：1982-04-23

    申请人： Hiroshi Ishizuka

    发明人： Hiroshi Ishizuka

    IPC分类号： C22B34/00 ,  C22B5/16 ,  C22B34/12 ,  C22B34/14 ,  F27B5/04

    CPC分类号： C22B5/16 ,  C22B34/1272 ,  C22B34/14

    摘要： In a vacuum separator for refractory metal from magnesium metal and magnesium chloride mixed therewith, comprising: a vertically elongated substantially cylindrical retort having, inside, a closed space, a lower section of which is capable of accommodating such mixture to be treated as held in a container and is provided with a heating means to evaporate the magnesium metal and magnesium chloride to a substantial part, and an upper section of which has a cooling means to provide, inside, a cylindrical face for condensing thereon magnesium metal and magnesium chloride which ascend as vapor, and a means for degassing the retort to an elevated level of vacuum, an improvement such that a heat shield unit is provided at an intermediate level between said upper and lower sections of the retort, said heat shield unit comprising, as a whole, opening so arranged as to block any direct sight of the surface of the retort lower section when holding the container from a substantial part of the condensation face in the upper section, thus intercepting a substantial part of primary heat radiation from the retort lower section, while allowing passage of ascending vapor

    摘要翻译： 在与镁混合的镁金属和氯化镁的难熔金属真空分离器中，包括：垂直延伸的大致圆柱形的蒸馏器，其具有在封闭空间的内部，其下部能够容纳待处理的混合物， 容器，并且设置有用于将镁金属和氯化镁蒸发到大部分的加热装置，并且其上部具有冷却装置，用于在其内部提供用于在其上冷凝的金属和氯化镁的圆柱形表面

    Apparatus for electrolytic production of magnesium metal from its chloride
    10.
    发明授权
    Apparatus for electrolytic production of magnesium metal from its chloride 失效
    用于从其氯化物电解生产镁金属的装置

    公开(公告)号：US4334975A

    公开(公告)日：1982-06-15

    申请号：US188589

    申请日：1980-09-18

    申请人： Hiroshi Ishizuka

    发明人： Hiroshi Ishizuka

    IPC分类号： C25C3/04 ,  C25C7/00 ,  C25C3/22 ,  C25C7/02

    CPC分类号： C25C3/04 ,  C25C7/005

    摘要： The present invention provides an apparatus for electrolytic production of magnesium metal from its chloride, which apparatus essentially comprises at least one externally unwired electrode which is made of graphite alone or graphite-iron composite and is placed between each pair of anode and cathode with the graphite side towards the cathode. The apparatus preferably comprises further a cooling passage for electrolyte bath which allows the electrolyte bath to flow outside an electrolysis chamber where the electrodes are contained, from a bath surface level to the bottom. The bath, while it passes there, is cooled a little, not enough to solidify, to exhibit an increased density so that it flows down back into the electrolysis chamber at the bottom, thus forming a continuous upflow along the electrodes, which facilitates separation of products of magnesium metal and chlorine gas and their recovery. Preferred anode construction is also illustrated.

    摘要翻译： 本发明提供了一种用于从其氯化物电解生产镁金属的装置，该装置主要包括由石墨单独制成的至少一个外部退绕电极或石墨 - 铁复合材料，并且被放置在每对阳极和阴极之间，石墨 一侧朝向阴极。 该装置还包括用于电解质浴的冷却通道，其允许电解液浴从包含电极的电解室流出，从浴表面水平到底部。 浴通过那里时，被冷却了一点，不足以固化，表现出增加的密度，使得其在底部向下流回电解室，从而沿着电极形成连续的向上流动，这便于分离 镁金属和氯气的产品及其回收。 还示出了优选的阳极结构。