公开(公告)号：US07033726B2

公开(公告)日：2006-04-25

申请号：US10494686

申请日：2003-10-28

申请人： Masamichi Nishimura ,  Hiroshi Koyama ,  Kiyoharu Tsutsumi

发明人： Masamichi Nishimura ,  Hiroshi Koyama ,  Kiyoharu Tsutsumi

IPC分类号： G03F7/004 ,  G03F7/30

CPC分类号： C08F220/28 ,  G03F7/0397 ,  G03F7/085 ,  Y10S430/106 ,  Y10S430/111

摘要： A polymeric compound for photoresist of the present invention includes a monomer unit having 2,6-dioxabicyclo[3.3.0]octane skeleton in the structure. The monomer unit having 2,6-dioxabicyclo[3.3.0]octane skeleton includes a monomer unit represented by the following Formula (I): wherein R is a hydrogen atom or a methyl group. The polymeric compound for photoresist may include a monomer unit having 2,6-dioxabicyclo[3.3.0]octane skeleton, a monomer unit having a group of adhesion to substrate, and a monomer unit having an acid-eliminating group. The polymeric compound for photoresist of the present invention exhibits not only adhesion to substrate, acid-eliminating property and resistance to dry-etching but also has well-balanced solubility in solvents for photoresist and alkali-soluble property.

摘要翻译： 本发明的光致抗蚀剂用高分子化合物包括在该结构中具有2,6-二氧杂二环[3.3.0]辛烷骨架的单体单元。 具有2,6-二氧杂二环[3.3.0]辛烷骨架的单体单元包括由下式（I）表示的单体单元：其中R是氢原子或甲基。 用于光致抗蚀剂的聚合物可以包括具有2,6-二氧杂双环[3.3.0]辛烷骨架的单体单元，具有与基材的粘合性的单体单元和具有酸消除基团的单体单元。 本发明的光致抗蚀剂用高分子化合物不仅表现出对基材的粘附性，耐酸洗性，耐干蚀刻性，而且在光致抗蚀剂和碱溶性的溶剂中的溶解性也良好。

公开(公告)号：US20050014087A1

公开(公告)日：2005-01-20

申请号：US10494686

申请日：2003-10-28

申请人： Masamichi Nishimura ,  Hiroshi Koyama ,  Kiyoharu Tsutsumi

发明人： Masamichi Nishimura ,  Hiroshi Koyama ,  Kiyoharu Tsutsumi

IPC分类号： C08F20/28 ,  C08F220/28 ,  G03C1/76 ,  G03F7/039 ,  G03F7/085 ,  H01L21/027

CPC分类号： C08F220/28 ,  G03F7/0397 ,  G03F7/085 ,  Y10S430/106 ,  Y10S430/111

摘要： A polymeric compound for photoresist of the present invention includes a monomer unit having 2,6-dioxabicyclo[3.3.0]octane skeleton in the structure. The monomer unit having 2,6-dioxabicyclo[3.3.0]octane skeleton includes a monomer unit represented by the following Formula (I): wherein R is a hydrogen atom or a methyl group. The polymeric compound for photoresist may include a monomer unit having 2,6-dioxabicyclo[3.3.0]octane skeleton, a monomer unit having a group of adhesion to substrate, and a monomer unit having an acid-eliminating group. The polymeric compound for photoresist of the present invention exhibits not only adhesion to substrate, acid-eliminating property and resistance to dry-etching but also has well-balanced solubility in solvents for photoresist and alkali-soluble property.

摘要翻译： 本发明的光致抗蚀剂用高分子化合物包括在该结构中具有2,6-二氧杂二环[3.3.0]辛烷骨架的单体单元。 具有2,6-二氧杂二环[3.3.0]辛烷骨架的单体单元包括由下式（I）表示的单体单元：其中R是氢原子或甲基。 用于光致抗蚀剂的聚合物可以包括具有2,6-二氧杂双环[3.3.0]辛烷骨架的单体单元，具有与基材的粘合性的单体单元和具有酸消除基团的单体单元。 本发明的光致抗蚀剂用高分子化合物不仅表现出对基材的粘附性，耐酸洗性，耐干蚀刻性，而且在光致抗蚀剂和碱溶性的溶剂中的溶解性也良好。

公开(公告)号：US20050282985A1

公开(公告)日：2005-12-22

申请号：US10528111

申请日：2004-06-17

申请人： Hiroshi Koyama ,  Kiyoharu Tsutsumi

发明人： Hiroshi Koyama ,  Kiyoharu Tsutsumi

IPC分类号： C07C69/00 ,  C07C69/52 ,  C07C69/653 ,  C08F116/12 ,  C08F216/14 ,  C08F220/24 ,  C08F220/26

CPC分类号： C08F216/1416 ,  C07C69/653 ,  C07C2601/14 ,  C07C2603/74 ,  C08F220/24 ,  C08F220/26

摘要： A fluorine-atom-containing polymerizable unsaturated-monomer of the present invention is represented by the following formula (1a) or (1b): wherein each of a ring Z1 and a ring Z2 is an alicyclic carbon ring; when the alicyclic carbon ring is multi-cyclic, a part of atoms constituting the ring may be substituted by an oxygen atom, a sulfur atom or a nitrogen atom; an atom constituting the ring Z1 and the ring Z2 may have a substituent; each of R1, R2 and R3 is an alkyl group or a fluoroalkyl group; R is an specific unsaturated acyl group; provided that at least one of R1 and R2 is a fluorine atom or a fluoroalkyl group in the formula (1a), and in the formula (1b) (i) the ring Z2 is bonded by a fluorine atom or a fluoroalkyl group, or (ii) R3 is a fluoroalkyl group.

摘要翻译： 本发明的含氟原子的可聚合不饱和单体由下式（1a）或（1b）表示：其中Z 1和Z 2中的每一个 是脂环碳环; 当脂环碳环多环时，构成环的一部分原子可以被氧原子，硫原子或氮原子取代; 构成环Z 1和Z 2的原子可以具有取代基; R 1，R 2和R 3各自为烷基或氟烷基; R是特定的不饱和酰基; 条件是式（1a）和式（1b）（i）中的R 1和R 2中的至少一个是氟原子或氟代烷基， 环Z 2通过氟原子或氟代烷基键合，或（ii）R 3是氟代烷基。

公开(公告)号：US20050142487A1

公开(公告)日：2005-06-30

申请号：US11062459

申请日：2005-02-22

申请人： Hiroshi Koyama ,  Kiyoharu Tsutsumi

发明人： Hiroshi Koyama ,  Kiyoharu Tsutsumi

IPC分类号： C07C69/533 ,  C07C20060101 ,  C07C67/08 ,  C07C67/14 ,  C07C69/00 ,  C08F20/16 ,  C08F20/18 ,  G03C1/76

CPC分类号： C07C67/14 ,  C07C69/653 ,  C07C2603/74 ,  C08F220/18

摘要： A polymerizable adamantane derivative of the present invention is represented by the following formula (1): wherein R1 is a fluorine atom or a fluoroalkyl group; and the adamantane ring in the formula may have a substituent. As the said fluoroalkyl group, there may be mentioned, for example, a trifluoromethyl, a pentafluoroethyl, a 2,2,2-trifluoroethyl, a 2,2,2-trifluoro-1-(trifluoromethyl)ethyl, a heptafluoropropyl group and so on.

摘要翻译： 本发明的可聚合金刚烷衍生物由下式（1）表示：其中R 1是氟原子或氟代烷基; 并且式中的金刚烷环可以具有取代基。 作为所述氟代烷基，可以提及例如三氟甲基，五氟乙基，2,2,2-三氟乙基，2,2,2-三氟-1-（三氟甲基）乙基，七氟丙基等 上。

公开(公告)号：US20060058480A1

公开(公告)日：2006-03-16

申请号：US10516176

申请日：2004-06-09

申请人： Hiroshi Koyama ,  Kiyoharu Tsutsumi

发明人： Hiroshi Koyama ,  Kiyoharu Tsutsumi

IPC分类号： C08F214/18

CPC分类号： C07D493/04 ,  C08F20/30 ,  G03F7/0397

摘要： A polymerizable monomer of the present invention is represented by the following formula (1); R1, R2 and R3 are each a hydrogen atom, a fluorine atom, an alkyl group or a fluoroalkyl group, W is a single bond or a linkage group and n is 0 or 1, where at least one of R1, R2 and R3 is a fluorine atom or a fluoroalkyl group when n=1; and the ring in the formula may have a substituent. The polymerizable monomer of the present invention can provide an appropriate hydrophilicity or hydrophilicity and transparency to a photoresist polymer.

摘要翻译： 本发明的可聚合单体由下式（1）表示;

公开(公告)号：US20050245706A1

公开(公告)日：2005-11-03

申请号：US10522062

申请日：2004-06-17

申请人： Hiroshi Koyama ,  Kiyoharu Tsutsumi

发明人： Hiroshi Koyama ,  Kiyoharu Tsutsumi

IPC分类号： C07D307/77 ,  C07D307/93 ,  C08F16/26 ,  C08F12/20

CPC分类号： C07D307/93 ,  C08F16/26

摘要： 6-trifluoromethyl-2-vinyloxy-4-oxatricyclo[4.2.1.03,7]nonan-5-one of the present invention is represented by the following formula (1). This compound can be produced by reacting 6-trifluoromethyl-2-hydroxy-4-oxatricyclo[4.2.1.03,7]nonan-5-one represented by the following formula (2) with a compound represented by the following formula (3a) or (3b), wherein Ra and Rb are each a hydrogen atom or a hydrocarbon group.

摘要翻译： 本发明的6-三氟甲基-2-乙烯基氧基-4-氧杂三环[4.2.1.0 3,7]壬-5-酮由下式（1）表示。 该化合物可以通过使由下式（2）表示的6-三氟甲基-2-羟基-4-羟基三环[4.2.1.0 3,7]壬-5-酮与表示的化合物 通过下式（3a）或（3b），其中R a和R b各自为氢原子或烃基。

公开(公告)号：US20110099813A1

公开(公告)日：2011-05-05

申请号：US12674512

申请日：2008-10-02

申请人： Kazuto Kobayashi ,  Hiroshi Koyama

发明人： Kazuto Kobayashi ,  Hiroshi Koyama

IPC分类号： B21D53/10

CPC分类号： F16C33/64 ,  F16C19/186 ,  F16C2240/80 ,  F16C2326/02

摘要： A method for manufacturing a bearing ring member for a rolling bearing unit is provided. In this method, a blank hollow cylindrical portion having a smaller diameter than a hollow cylindrical portion is formed, the blank hollow cylindrical portion is radially expanded to form the hollow cylindrical portion, and a raceway surface is formed on either inner or outer circumferential surface of the hollow cylindrical portion along a circumferential direction thereof.

摘要翻译： 提供一种用于制造滚动轴承单元的轴承环构件的方法。 在该方法中，形成直径小于中空圆筒部的坯料中空圆筒部，使空心圆筒部径向膨胀，形成中空圆筒部，在内周面或外周面上形成有滚道面 中空圆筒部沿其圆周方向。

公开(公告)号：US20100101091A1

公开(公告)日：2010-04-29

申请号：US12522311

申请日：2008-01-16

申请人： Kazuto Kobayashi ,  Hiroshi Koyama

发明人： Kazuto Kobayashi ,  Hiroshi Koyama

IPC分类号： F16C33/64 ,  B21H1/12 ,  B21K1/04 ,  B21D53/12

CPC分类号： B23P15/003 ,  B21H1/12 ,  B21J1/00 ,  B21J1/04 ,  B21J5/02 ,  B21J5/10 ,  B21K1/04 ,  B21K21/02 ,  F16C19/184 ,  F16C33/62 ,  F16C33/64 ,  Y10T29/49636 ,  Y10T29/49643 ,  Y10T29/49689

摘要： Provided is a manufacturing method of an outer ring (3) of a back-to-back arrangement double-row angular ball bearing from a raw material (10) comprising a upsetting (A to B), a backward extrusion process (C to D), a punching (D to E), a rolling (E to F) and a finishing, wherein an outer diameter of a first intermediate material (11a) produced by the upsetting is equal to or smaller than an inside diameter of an inner periphery large diameter portion (18) of the inner circumference of a die (13) used in the backward extrusion process and larger than an inside diameter of an inner periphery small portion (19) of the die (13), and in a condition with the first intermediate material (11a) sitting on the inner periphery inclined portion (20) of the die (13), the intermediate material (11a) is pushed toward a base of the die (13) by a punch (14), to thereby the middle metal material (29) with the highest cleanliness of the raw material (10) is exposed to the two outer ring raceways (2) of the outer ring (3).

摘要翻译： 本发明提供从包括镦粗（A〜B），向后挤压工序（C〜D）的原料（10）的背靠背排列双列角球轴承的外圈（3）的制造方法 ），冲压（D〜E），轧制（E〜F）和精加工，其中通过镦锻制造的第一中间材料（11a）的外径等于或小于内周的内径 在向后挤压过程中使用的模具（13）的内周的大直径部分（18）大于模具（13）的内周小部分（19）的内径，并且在 第一中间材料（11a）位于模具（13）的内周倾斜部分（20）上，中间材料（11a）通过冲头（14）被推向模具（13）的基部，由此 原料（10）清洁度最高的中间金属材料（29）暴露于t的两个外圈滚道（2） 他外圈（3）。

公开(公告)号：US20080259473A1

公开(公告)日：2008-10-23

申请号：US11628075

申请日：2005-05-31

申请人： Takahiko Ueda ,  Hiroshi Koyama

发明人： Takahiko Ueda ,  Hiroshi Koyama

IPC分类号： G02B5/08

CPC分类号： G02B6/0055 ,  G02F1/133605 ,  Y10T428/24355

摘要： A light reflector including a laminate film having a light-diffusive layer on one surface of a substrate layer, wherein the surface roughness index of the light-reflective surface is at least 1, the reflectance thereof is at least 95%, and the regular reflectance thereof is at most 3%. The light reflector has higher brightness and higher reflectivity.

摘要翻译： 1.一种光反射器，包括在基板层的一个表面上具有光扩散层的层压膜，其中所述光反射表面的表面粗糙度指数至少为1，其反射率为至少95％，并且所述反射率为 至多3％。 光反射器具有更高的亮度和更高的反射率。

公开(公告)号：US20080246188A1

公开(公告)日：2008-10-09

申请号：US12078865

申请日：2008-04-07

申请人： Tsuyoshi Arai ,  Tadayoshi Takahara ,  Yoshihito Saigo ,  Tatsuya Inoyama ,  Hiroshi Koyama

发明人： Tsuyoshi Arai ,  Tadayoshi Takahara ,  Yoshihito Saigo ,  Tatsuya Inoyama ,  Hiroshi Koyama

IPC分类号： B29C45/00

CPC分类号： B29C45/76 ,  B29C2945/76588

摘要： The method of predicting the amount of deformation due to shrinkage of a molded article of the present invention finds a support point P of the bending moment M from a distribution of shrinkage rates of a molding material forming a molded article 10 and uses the support point P to predict the amount of deformation. At that time, it is preferable to use the support point P to find the bending moment M and to use the bending moment M to predict the amount of deformation.

摘要翻译： 由本发明的成形品收缩引起的变形量的预测方法根据成型品10的成形材料的收缩率的分布求出弯矩M的支撑点P，并使用支承点P 预测变形量。 此时，优选使用支撑点P来找到弯矩M，并且使用弯矩M来预测变形量。